| Patents for C08F 232 - Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system (1,954) |
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| 03/25/2003 | US6538085 Copolymerization of norbornene and functional norbornene monomers |
| 03/25/2003 | US6537727 Resist composition comprising photosensitive polymer having loctone in its backbone |
| 03/19/2003 | EP1293521A2 Cyclic olefin addition copolymer and process for producing same, crosslinking composition, crosslinked product and process for producing same, and optically transparent material and application thereof |
| 03/19/2003 | EP1070089B1 Linear, isotactic polymers, process for preparing same, and use thereof |
| 03/12/2003 | EP1290048A2 Copolymerization of norbornene and functional norbornene monomers |
| 03/12/2003 | CN1102935C Process for production of cycloolefin random copolymer |
| 03/11/2003 | US6531562 Such as 2-(1-tert- butoxycarbonylpiperidin-2-yl)ethyl 5-norbornene-2-carboxylate; photolithography; etching/heat resistance; semiconductors |
| 03/06/2003 | US20030045731 (1,3-dioxolan-4-yl)alkyl 5-norbornene-2-carboxylate useful-as a monomer to form a polymer |
| 03/06/2003 | US20030045656 Prepared by polymerization of symmetrical polycyclic olefin, acyclic olefin, and, if desired, monocyclic olefin in presence of catalyst comprising aluminoxane and metallocene; copolymer contains less than 100 ppm catalyst residue |
| 03/04/2003 | US6528229 Mixture of polymer and acid generators |
| 02/27/2003 | WO2003016365A1 Copolymer of conjugated cyclodiene |
| 02/27/2003 | US20030040592 Hydrocarbon resin with ethylidene group and rubber composition including the same |
| 02/26/2003 | EP1284981A2 Method for producing transition metal compounds and their use for the polymerization of olefins |
| 02/25/2003 | US6525144 Norbornene polymer and production process |
| 02/20/2003 | US20030036618 Exposing polymer and photoacid generator with a light of 180 nm or less wavelength, and conducting baking and development. |
| 02/18/2003 | US6521731 Radical polymerizable compositions containing polycyclic olefins |
| 02/05/2003 | EP0894098B1 High impact lldpe films |
| 02/05/2003 | CN1100799C Method for proudcing cycloolefin or (co) polymers for industrial applications |
| 02/04/2003 | US6515150 Photoresist resin; exposure to high energy radiation; development |
| 01/30/2003 | US20030022103 Such as poly(maleic anhydride/hexafluorobutyl-5-norbornene-2-carboxylate/2,6-difluoro-1 -methylbenzylacrylate); for production of semiconductors/integrated circuits; photolithography |
| 01/28/2003 | US6512065 Copolymers of norbornene and functional norbornene monomers |
| 01/23/2003 | US20030017412 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same |
| 01/16/2003 | US20030013831 Novel polymer suitable for photoresist compositions |
| 01/16/2003 | US20030013037 Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same |
| 01/14/2003 | US6506920 Polymerization of olefins |
| 01/09/2003 | WO2003002657A1 Olefinic thermoplastic elastomer, process for production thereof, olefinic thermoplastic elastomer compositions, process for producing the same and moldings thereof |
| 01/09/2003 | US20030008992 Radical polymerizable compositions containing polycyclic olefins |
| 01/08/2003 | EP1273598A2 Hydrocarbon resin with ethylidene group and rubber composition including the same |
| 01/07/2003 | US6503687 Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition |
| 01/07/2003 | US6503686 Photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneously mpart high ultraviolet (UV) transparency and developability in basic media |
| 01/02/2003 | US20030004289 Radiation transparent, sensitivity, chemical resistance |
| 01/02/2003 | EP1268661A1 Polymer mixture containing an amorphous polyolefin which contains cycloaliphatic olefins |
| 12/26/2002 | US20020198356 For producing electronic components, such as, for example, printed circuit boards; hydrophobicity, low dielectric constant |
| 12/26/2002 | US20020197555 One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers |
| 12/25/2002 | CN1097060C Method for producing elastomers |
| 12/25/2002 | CN1097059C Method for producing thermoplastic elastomers |
| 12/19/2002 | WO2002077712A3 Photoresist composition |
| 12/19/2002 | US20020193542 Photosensitive polymer and chemically amplified photoresist composition containing the same |
| 12/18/2002 | CN1385718A Phase delay device |
| 12/12/2002 | WO2002084402A3 Process for producing film forming resins for photoresist compositions |
| 12/12/2002 | US20020187419 Photoresist composition for deep ultraviolet lithography |
| 12/10/2002 | US6492090 Micropatterning using electron beams or ultraviolet rays |
| 11/28/2002 | US20020177067 Includes perfluoro-2,2-dimethy-1,3-dioxole derivatives and vinyl derivatives; for F2 excimer laser |
| 11/21/2002 | WO2002093263A1 Photoresist composition for deep ultraviolet lithography |
| 11/21/2002 | WO2002092651A1 Polymer suitable for photoresist compositions |
| 11/21/2002 | WO2002033489A3 Compositions for microlithography |
| 11/19/2002 | US6482565 Photoresist cross-linker and photoresist composition comprising the same |
| 11/14/2002 | US20020169267 Terpolymer of ethylene/alpha-olefin, a cyclic olefin such as norbornene, and an aromatic vinyl monomer such as styrene allows uniform polarizing conversion within a wide wavelength range using a single phase retarder |
| 11/14/2002 | US20020169266 Polymeric compound and resin composition for photoresist |
| 11/12/2002 | US6479606 Polymerizable compositions for making optical lens with high refractive index and high abbe number, and resulting lens |
| 11/12/2002 | US6479212 Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method |
| 11/07/2002 | DE10147011A1 Chemisch verstärkte Resistzusammensetzung und Verfahren zur Bildung eines gemusterten Films unter Verwendung derselben A chemically amplified resist composition and method for forming a patterned film using the same |
| 11/06/2002 | EP1254915A2 Acid-labile polymer and resist composition |
| 11/06/2002 | EP0920465B1 Elastomeric cycloolefinpolymer |
| 10/31/2002 | US20020161150 Ether, polymer, resist composition and patterning process |
| 10/31/2002 | US20020161148 Copolymer of fluorinated acrylate and norbornene compound |
| 10/30/2002 | EP0871675B1 Tackifiers and a process to obtain tackifiers |
| 10/29/2002 | US6472120 Photosensitive polymer and chemically amplified photoresist composition containing the same |
| 10/24/2002 | WO2002084402A2 Process for producing film forming resins for photoresist compositions |
| 10/24/2002 | US20020156216 Acid generating agent, additive, solvent and a copolymer of an acrylic acid, ester, anhydride and a cyclic non-aromatic monomers |
| 10/23/2002 | EP1250362A1 Processes for the preparation polyolefin resins using supported ionic catalysts |
| 10/17/2002 | US20020151666 Such as 2-(1-tert- butoxycarbonylpiperidin-2-yl)ethyl 5-norbornene-2-carboxylate; photolithography; etching/heat resistance; semiconductors |
| 10/17/2002 | US20020150835 Copolymer of a (meth)acrylic acid derivative with a vinyl ether monomer, an allyl ether monomer and an oxygen-containing alicyclic olefin monomer, as a base resin; sensitive to high energy radiation, and etching resistance |
| 10/17/2002 | US20020150834 An acrylate or methacrylate resin reacting in the presence of an acid, a photo acid generator which generates acid upon exposure, and a compound having the combination of an acetal group and a site which is eliminated by acid in its molecule |
| 10/16/2002 | CN1092672C Ethylene copolymer, process for producing vinyl polymer and catalyst system used therein |
| 10/10/2002 | WO2002079287A1 Polycyclic fluorine-containing polymers and photoresists for microlithography |
| 10/10/2002 | US20020147290 Cyclic acetal compound, polymer, resist composition and patterning process |
| 10/03/2002 | WO2002077712A2 Photoresist composition |
| 10/01/2002 | US6458919 Fibers made of cycloolefin copolymers |
| 10/01/2002 | US6458910 Blown films of linear low density polyethylene are produced by a high stalk process comprising extruding the linear low density polyethylene through an annular die to form an extruded tube of molten material, cooling the extruded tube |
| 09/26/2002 | US20020137863 Cycloolefin copolymers and a process for their preparation |
| 09/24/2002 | US6455226 Polymer formed by polymerizing mixture of norbornylene and maleic anhydride derivative, reducing polymer with reducing agent, reacting with hydroxy protecting group precursor |
| 09/24/2002 | US6455225 Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same |
| 09/19/2002 | US20020132186 May be exposed to light using ArF lasers, may have strong resistances to dry etching processes, may possess excellent adhesion to film materials, and may be developed using conventional developers |
| 09/19/2002 | US20020132185 Copolymer photoresist with improved etch resistance |
| 09/18/2002 | EP1240554A2 Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography |
| 09/17/2002 | US6451499 Polycyclic resist compositions with increased etch resistance |
| 09/12/2002 | US20020128408 Polymerizing at least two types of polycyclic (norbornene) monomers one of which containing a pendant acid labile group and another of which containing a pendnt polar functional group using a group 8 transition metal catalyst |
| 09/10/2002 | US6448352 Photoresist monomer, polymer thereof and photoresist composition containing it |
| 09/10/2002 | US6447980 Photoresist composition for deep UV and process thereof |
| 08/29/2002 | US20020119391 Using cyclic olefin polymer; forming relief images |
| 08/28/2002 | CN1089771C Process for preparation of cyclenes copolymer |
| 08/27/2002 | US6441115 Photosensitive polymer |
| 08/22/2002 | WO2002064719A1 Copolymers that prevent glass from corroding |
| 08/22/2002 | WO2002006901A3 Photoresist composition for deep uv and process thereof |
| 08/21/2002 | CN1364819A N-substituted pyrrole copolymer and its preparation and use |
| 08/15/2002 | WO2002062859A2 Radical polymerizable compositions containing polycyclic olefins |
| 08/15/2002 | WO2002062757A1 Norbornene-based heterobifunctional monomers and uses therefor |
| 08/15/2002 | US20020111449 Copolymerization of norbornene and functional norbornene monomers |
| 08/08/2002 | US20020107332 Thermally polymerized copolymers made from styrene and dicyclopentadiene monomers |
| 08/08/2002 | DE10104469A1 Copolymere zur Verhinderung von Glaskorrosion Copolymers for preventing corrosion of glass |
| 08/01/2002 | US20020103317 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 08/01/2002 | US20020102490 Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions |
| 07/30/2002 | US6426171 Photoresist monomer, polymer thereof and photoresist composition containing it |
| 07/24/2002 | CN1088070C Novel amide- and imide-contg. copolymer, preparation thereof and photoresist comprising same |
| 07/23/2002 | US6423780 Heterobifunctional monomers and uses therefor |
| 07/11/2002 | WO2002053622A1 Addition copolymers of cyclic olefins containing sulfur |
| 07/11/2002 | WO2002010231A3 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 07/11/2002 | US20020091216 5-norbornene-2-carboxylic acid-3-hydroxyethyl carboxylate for example; far ultraviolet photolithography |
| 07/11/2002 | US20020091215 Lactone ring-substituted norbornene based polymers; photoresists; resolution, etching resistance, use in micropatterning with electron beams or deep-ultraviolet radation |