| Patents for C08F 232 - Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system (1,954) |
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| 07/21/2004 | EP1438343A2 Copolymers of ethylene with various norbornene derivatives |
| 07/15/2004 | US20040137363 maleic anhydride; high resistance to etching and improved adhesion to a substrate; excellent photolithographic performance |
| 07/14/2004 | EP0889780B1 Compositions and methods for selectively cross-linking films and improved film articles resulting therefrom |
| 07/13/2004 | US6762268 Radiation transparent, sensitivity, chemical resistance |
| 07/13/2004 | US6762266 Phase retarder |
| 07/08/2004 | WO2004056882A1 Process for the production of hydrogenated petroleum resin |
| 07/08/2004 | US20040131968 Containing 2-hydroxyethyl-5-norbornene-2-carboxylate units; etch and heat resistance; substrate adhesiveness; tetramethylammonium hydroxide solution development; polymer and monomer synthesis |
| 07/08/2004 | CA2510274A1 Process for the production of hydrogenated petroleum resin |
| 06/24/2004 | WO2004052955A1 Method for producing petroleum resin and hydrogenated petroleum resin |
| 06/24/2004 | CA2508627A1 Method for producing petroleum resin and hydrogenated petroleum resin |
| 06/22/2004 | US6753124 Radiation-sensitive resin composition |
| 06/08/2004 | US6746817 Acid labile groups increase alkali solubility; having increased alkali dissolution rate before and after radiation exposure, high sensitivity, high resolution, and etching resistance |
| 06/08/2004 | US6746722 Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition |
| 06/08/2004 | CA2166160C Cycloolefin copolymer composition |
| 06/02/2004 | CN1151866C Microparticles produced from cyclic olefin copolymers and their use for the controlled release of active agents |
| 06/01/2004 | US6743566 Cyclic acetal compound, polymer, resist composition and patterning process |
| 05/27/2004 | US20040102591 Polymerization of olefins |
| 05/26/2004 | CN1500099A Polycyclic fluorine-contg. polymers and photoresists for microlithography |
| 05/18/2004 | US6737217 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same |
| 05/18/2004 | US6737215 Photoresist composition for deep ultraviolet lithography |
| 05/18/2004 | CA2338542C .alpha.-olefins and olefin polymers and processes therefor |
| 05/12/2004 | CN1496496A Protecting groups in polymers, photoresists and processes for microlithography |
| 05/12/2004 | CN1149237C Copolymer resin, Preparation thereof, and photoresist using the same |
| 05/05/2004 | CN1148396C Photoeresist composition comprising polycyclic polymers with acid labile pendant groups |
| 04/29/2004 | US20040082724 Novel heterobifunctional monomers and uses therefor |
| 04/22/2004 | US20040075039 Molds for producing contact lenses |
| 04/21/2004 | CN1146602C Polymer and forming method of micro pattern using the same |
| 04/20/2004 | US6723486 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 04/20/2004 | CA2055397C Bulk polymerization using specific metallocene catalysts for the preparation of cycloolefin polymers |
| 04/01/2004 | US20040063885 Photo-imageable compositions that include polymers of acrylate- type monomers and norbornene-type monomers. In some embodiments a catalyst system comprising a cationic or a neutral Pd(II) dimer component having the formula |
| 03/30/2004 | US6713582 Copolymerizing alpha -olefin (such as 1-decene) and at bulky olefin (such as norbornene) in the presence of hydrogen and catalyst comprising the product obtained by combining metallocene procatalyst with a cocatalyst |
| 03/30/2004 | US6713229 May be exposed to light using arf lasers, may have strong resistances to dry etching processes, may possess excellent adhesion to film materials, and may be developed using conventional developers |
| 03/25/2004 | US20040058846 Detergent for dishwasher containing addition polymer |
| 03/24/2004 | CN1484659A Compositions for microlithography |
| 03/23/2004 | US6710148 Polymers, resist compositions and patterning process |
| 03/18/2004 | WO2004022612A1 Photoresists, fluoropolymers and processes for 157 nm microlithography |
| 03/18/2004 | WO2004014964A3 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY |
| 03/10/2004 | CN1141619C Chemically amplitied resist composition |
| 03/03/2004 | EP1392745A1 Polymer suitable for photoresist compositions |
| 03/03/2004 | CN1479755A Thermally polymerized copolymers made from styrene and dicyclopentadiene monomers |
| 03/03/2004 | CN1478800A Photoetch resist copolymer |
| 03/03/2004 | CN1140549C Blends and alloy of polycylic polymers |
| 02/26/2004 | WO2004016664A1 Fluorinated polymers useful as photoresists, and processes for microlithography |
| 02/26/2004 | WO2004016405A1 Molds for producing contact lenses |
| 02/26/2004 | WO2003099782A3 Acetal protected polymers and photoresists compositions thereof |
| 02/19/2004 | WO2004014964A2 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY |
| 02/19/2004 | WO2004014960A2 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
| 02/19/2004 | US20040034160 Mixtures of addition copolymers, acid generators and solvents, used as photosensitive coatings in lithography; relief images |
| 02/19/2004 | US20040033436 Copolymers containing units derived from hydroxyfluoroalkyl group-containing norbornenes |
| 02/19/2004 | US20040033381 Interlayer insulating film, method for forming the same and polymer composition |
| 02/18/2004 | CN1476087A Layer insulated film and its forming method and polymer composition |
| 02/12/2004 | US20040030079 Radiation transparent; bonding strength; lithography |
| 02/11/2004 | EP1388548A2 Interlayer insulating film, method for forming the same and polymer composition |
| 02/11/2004 | EP1388027A1 Photoresist composition for deep ultraviolet lithography |
| 02/05/2004 | US20040023157 Protecting groups in polymers, photoresists and processes for microlithography |
| 02/05/2004 | US20040023152 Photoresists, polymers and processes for microlithography |
| 02/04/2004 | CN1472231A Light sensitive polymer containing adamantane alkyl vinyl ether and optical retardent composition containing same |
| 02/03/2004 | US6686429 Copolymer of an ethenically unsaturated nitrile-containing monomer and a nonaromatic cyclic unit such as tert-butyl norborenecarboxylate; sensitive in deep ultraviolet region; microlithography |
| 01/29/2004 | US20040018442 Resist composition comprising photosensitive polymer having lactone in its backbone |
| 01/28/2004 | EP1383812A1 Polycyclic fluorine-containing polymers and photoresists for microlithography |
| 01/22/2004 | US20040013973 Ether, polymer, resist composition and patterning process |
| 01/21/2004 | EP0986590B1 Polymerisable composition for making optical lens with high refractive index and high abbe number, and resulting lens |
| 01/14/2004 | EP1379331A2 Process for producing film forming resins for photoresist compositions |
| 01/14/2004 | CN1134469C Optical material mainly composed of alpha-olefin-cycloolefin copolymers |
| 01/13/2004 | US6677175 Optical waveguides and methods for making the same |
| 01/08/2004 | WO2004003041A1 High-softening-point copolymer, process for producing the same, and product of hydrogenation thereof |
| 01/08/2004 | WO2004003026A1 Hydrogenated copolymer, process for producing the same, and hot-melt adhesive composition containing the same |
| 01/08/2004 | US20040006191 Silicon-containing polymer, resist composition and patterning process |
| 01/08/2004 | US20040006189 For use in fine patterning of semiconductors |
| 01/08/2004 | CA2490891A1 High softening point copolymer, production process for the same and hydrogenated product thereof |
| 01/08/2004 | CA2490340A1 Hydrogenated copolymer, production process for the same and hot melt adhesive composition using the same |
| 01/07/2004 | CN1133667C Phenylnaphthalene polymer and its preparing process and application |
| 01/07/2004 | CN1133662C Linear, Isotactic polymers, process for preparing same, and use thereof |
| 01/06/2004 | US6673513 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same |
| 01/02/2004 | EP1373451A1 Copolymers that prevent glass from corroding |
| 12/31/2003 | CN1464895A Olefinic thermoplastic elastomer, process for production thereof, olefinic thermoplastic elastomer compositions, process for producing the same and moldings thereof |
| 12/30/2003 | US6670426 Olefinic thermoplastic elastomer, process for production thereof, olefinic thermoplastic elastomer compositions, process for producing the same, and moldings thereof |
| 12/30/2003 | US6670297 Late transition metal diimine catalyst |
| 12/16/2003 | US6664351 Ethylene copolymers, process for the preparation of ethylene-based polymers and catalyst system used therein |
| 12/09/2003 | US6660448 Lactone ring-substituted norbornene based polymers; photoresists; resolution, etching resistance, use in micropatterning with electron beams or deep-ultraviolet radation |
| 12/09/2003 | CA2338526C .alpha.-olefins and olefin polymers and processes therefor |
| 12/04/2003 | WO2003099887A1 Cycloolefin addition copolymer and optical transparent material |
| 12/04/2003 | WO2003099782A2 Acetal protected polymers and photoresists compositions thereof |
| 11/26/2003 | CN1129166C Photoresist polymer, composition and its preparing method |
| 11/26/2003 | CN1128826C Polymer resin material derived from limonene, bicyclopentadiene, indene and tert-butyl styrene |
| 11/26/2003 | CN1128816C Catalyst combination and process for preparing linear, isotactic polymer |
| 11/25/2003 | US6653047 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same |
| 11/20/2003 | US20030215758 Photosensitive polymer and chemically amplified resist composition comprising the same |
| 11/20/2003 | US20030215742 Novel copolymers and photoresist compositions comprising same |
| 11/20/2003 | US20030215740 Polymers, resist compositions and patterning process |
| 11/19/2003 | CN1456580A Photosensitive polymer and amplified chemical photoresist agent composition containing it |
| 11/18/2003 | US6649707 Blends and alloys of polycyclic polymers |
| 11/12/2003 | CN1127527C Method for producing cycloolefin polymers |
| 11/06/2003 | US20030208023 Electrical devices from polymer resins prepared with ionic catalysts |
| 11/06/2003 | US20030208016 High molecular weight, low volatility monomers comprising a 1,3-bis(2-bicyclo(2,2,1)hept-5-ene-disiloxane derivatives and a maleimides to form a crosslinked thermoset resin; use as adhsives to bond semiconductor die and connectors |
| 11/06/2003 | US20030207205 Provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such |
| 11/04/2003 | US6642336 Photosensitive polymer |
| 10/29/2003 | CN1451671A Blue light-emitting superbranched conjugated polymer and preparing process thereof |
| 10/29/2003 | CN1125837C Copolymer, thermoplastic resin composition and process for producing the same |
| 10/28/2003 | US6639036 Acid-labile polymer and resist composition |