| Patents for C08F 232 - Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system (1,954) |
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| 07/09/2002 | US6416927 Chemically amplified resist compositions |
| 07/03/2002 | EP1070087B1 A catalyst combination and a process for preparing linear, isotactic polymers |
| 06/27/2002 | US20020081524 Excellent in transmittance for the wavelength of fluorine excimer light, suitable for fine processing of semiconductors |
| 06/27/2002 | US20020081521 Acid labile groups increase alkali solubility; having increased alkali dissolution rate before and after radiation exposure, high sensitivity, high resolution, and etching resistance |
| 06/27/2002 | DE10162971A1 Chemisch verstärkende, positiv arbeitende Resistmasse Chemically amplified positive resist composition |
| 06/25/2002 | US6410670 Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same |
| 06/20/2002 | WO2002048221A1 Thermally polymerized copolymers made from styrene and dicyclopentadiene monomers |
| 06/19/2002 | CN1086395C Amine-thiol chain transfer agents |
| 06/11/2002 | US6403281 Alkylene glycol di(meth)acrylate or alkylene glycol di(2-norbornene-5-carboxylate) crosslinking monomers; durability, contrast, resolution, adhesion; photolithography; semiconductors |
| 06/06/2002 | WO2002044845A2 Protecting groups in polymers, photoresists and processes for microlithography |
| 06/06/2002 | US20020068803 High transparency at 193 nm wavelength, provides increased etching resistance; formed without 5-norbonen-2-carboxylate monomers which do not have offensive odors of the free acid |
| 06/05/2002 | EP1210650A1 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
| 05/30/2002 | WO2001092269A3 Method for producing transition metal compounds and their use for the polymerization of olefins |
| 05/30/2002 | US20020064896 Curing a cladding layer to form a core/cladding combination and removing the core/cladding to expose a portion of the core that has refractive index .05% higher than the cured cladding composition |
| 05/28/2002 | US6395851 Norbornene monomers for polymers |
| 05/23/2002 | US20020061461 Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same |
| 05/21/2002 | US6391518 Copolymer of 5-norbornene-2,3-dicarboxylic acid and 5-norbornene-2-carboxylate derivatives; semiconductors, photolithography |
| 05/16/2002 | US20020058769 Copolymerization of norbornene and functional norbornene monomers |
| 05/16/2002 | US20020058767 Copolymerizing ethylene and dicyclopentadiene or tricyclopentadiene, and cyclic olefin in presence of metallocene catalyst to produce copolymer |
| 05/15/2002 | EP1205497A2 Method for producing an olefin type copolymer having a cyclic structure |
| 05/14/2002 | US6387589 Copolymer; semiconductor |
| 05/08/2002 | EP1204001A1 Resist composition and patterning process |
| 05/08/2002 | DE10054649A1 New monocyclopentadienyl-alkyl-phosphido, -oxido, -amino and -sulfido compounds of group 3 to 8 transition metals are used as olefin polymerization catalyst components |
| 04/25/2002 | WO2002033489A2 Compositions for microlithography |
| 04/25/2002 | US20020049287 Novel polymers for photoresist and photoresist compositions using the same |
| 04/23/2002 | US6376700 Alicyclic compound |
| 04/23/2002 | US6376630 Copolymer and process for producing the same |
| 04/18/2002 | WO2002031002A1 Nanostructures formed through cyclohexadiene polymerization |
| 04/11/2002 | US20020042016 Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics |
| 04/11/2002 | DE10047023A1 Aqueous polymer dispersions, e.g. useful in coatings and mineral binders, comprises a polymer containing norbornene dicarboxylic acid, anhydride or ester units |
| 04/10/2002 | EP1194456A1 Hydroxyl group-containing copolymers and their use for producing fuel oils with improved lubricity |
| 04/09/2002 | US6369181 Copolymer resin, preparation thereof, and photoresist using the same |
| 04/09/2002 | US6369143 Copolymer of maleic anhydride and carboxylic acid-grafted norbornene derivatives, photoacid generator, and solvent; dry etch resistance, bonding strength, transparency |
| 04/09/2002 | US6368771 Photoresist polymers and photoresist compositions containing the same |
| 04/09/2002 | US6368770 Photoresist monomers, polymers thereof, and photoresist compositions containing the same |
| 04/04/2002 | WO2001096406A3 Copolymerization of norbornene and functional norbornene monomers |
| 04/04/2002 | US20020040115 Hardness and adhesive properties, high-temperature stability |
| 04/02/2002 | US6365686 Lanthanide cocatalyst for olefin polymerization |
| 04/02/2002 | US6364918 Oil soluble polymer of an acrylic acid, olefin and an alkyl acrylate modifed with a hydroxy compound which also has an additional reactive group |
| 03/28/2002 | WO2001037047A3 Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography |
| 03/27/2002 | CN1342173A Polymerization process |
| 03/19/2002 | US6358666 Photoresists, acid generators and styrene polymers |
| 03/19/2002 | US6357499 Polymeric resinous material derived from limonene, dicyclopentadiene, indene and tertiary-butyl styrene |
| 03/07/2002 | WO2002018510A1 Hot-melt composition and modified aromatic petroleum resin for use therein |
| 03/07/2002 | DE10102086A1 Single-stage synthesis of crosslinked polyolefin, useful e.g. as supports for organic synthesis, by catalytic ring-opening reaction between cyclic and bicyclic olefins |
| 02/26/2002 | US6350837 Norbornene monomers and heterocyclic substituted norbornene monomers |
| 02/26/2002 | US6350832 Mold addition polymerization of norbornene-type monomers using group 10 metal complexes |
| 02/21/2002 | DE10036692A1 Novel olefin-cycloolefin-alkylstyrene copolymers are useful in the production of polymer blends and adhesives. |
| 02/19/2002 | US6348296 Copolymer resin, preparation thereof, and photoresist using the same |
| 02/14/2002 | US20020018960 High etching resistance, heat resistance and adhesiveness; low ultraviolet light absorbance; can be developed in aqueous tetramethylammonium hydroxide solution; for fabricating circuits for high integration semiconductors |
| 02/07/2002 | WO2002010810A2 Optical waveguides and methods for making the same |
| 02/07/2002 | WO2002010231A2 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 02/06/2002 | EP1178057A2 A catalyst composition and a process for preparing linear, isotactic polymers |
| 01/30/2002 | CN1333788A In mold addition polymerization of norbornene-type monomers using group 10 metal complexes |
| 01/24/2002 | WO2002006901A2 Photoresist composition for deep uv and process thereof |
| 01/24/2002 | US20020009667 Radiation-sensitive resin composition |
| 01/24/2002 | US20020009635 Novel materials for use as electrolytic solutes |
| 01/17/2002 | US20020007030 Processes for the preparation polyolefin resins using supported ionic catalysts |
| 01/16/2002 | EP1172694A1 Polymeric compound for photoresist and resin composition for photoresist |
| 01/10/2002 | US20020004570 Polymer and photoresist compositions |
| 01/10/2002 | US20020004569 Polymer, chemically amplified resist composition and patterning process |
| 01/10/2002 | US20020004567 Electrical devices from polymer resins prepared with ionic catalysts |
| 01/10/2002 | US20020004178 Photosensitivity, resolution, chemical resistance |
| 12/27/2001 | WO2000078824A9 Hydroxyl group-containing copolymers and their use for producing fuel oils with improved lubricity |
| 12/26/2001 | CN1328070A Phenylnaphthalene polymer and its preparing process and application |
| 12/20/2001 | WO2001096406A2 Copolymerization of norbornene and functional norbornene monomers |
| 12/20/2001 | US20010053834 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same |
| 12/20/2001 | US20010053455 Covering material |
| 12/13/2001 | US20010051316 Micropatterning using electron beams or ultraviolet rays |
| 12/13/2001 | US20010051315 Polymers, resist compositions and patterning process |
| 12/12/2001 | EP1162506A1 Radiation-sensitive resin composition |
| 12/06/2001 | WO2001092269A2 Method for producing transition metal compounds and their use for the polymerization of olefins |
| 12/06/2001 | DE10026786A1 New monocyclopentadienyl-alkyl-phosphido, -oxido, -amino and -sulfido compounds of group 3 to 8 transition metals are used as olefin polymerization catalyst components |
| 12/05/2001 | CN1325410A Polymerization of olefins |
| 11/28/2001 | EP0837887B1 Polymerization of crystalline copolymers of olefins and cyclic olefins |
| 11/28/2001 | CN1075536C 环烯共聚物组合物 Cycloolefin copolymer composition |
| 11/22/2001 | US20010044071 Cycloalkyl-substituted cycloalkyl or cycloalkenyl acrylates; polymers that are sensitive to high energy radiation; patterning using electron beams or deep UV |
| 11/21/2001 | EP1155057A1 In mold addition polymerization of norbornene-type monomers using group 10 metal complexes |
| 11/15/2001 | US20010041303 Mixture of polymer and acid generators |
| 11/14/2001 | EP1153947A1 Olefin copolymer, film, and sheet |
| 11/14/2001 | CN1321698A Covering material |
| 11/13/2001 | US6316567 Durability of tire treads |
| 11/13/2001 | US6316565 For forming patterns of integrated semiconductor device, resolution in photolithography |
| 11/13/2001 | US6316560 Method for producing cycloolefin polymers |
| 11/13/2001 | US6316162 Polymer and a forming method of a micro pattern using the same |
| 11/08/2001 | US20010038968 Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition |
| 11/06/2001 | US6312865 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same |
| 10/31/2001 | EP1150167A1 Polymers, resist compositions and patterning process |
| 10/31/2001 | EP1150166A1 Polymers, resist compositions and patterning process |
| 10/30/2001 | US6310163 Polymerizing ethylene, acyclic olefins, and/or selected cyclic olefins, and optionally selected olefinic esters or carboxylic acids, and other monomers. the polymerizations are catalyzed by selected transition metal compounds |
| 10/25/2001 | US20010033989 Fluoropolymer |
| 10/25/2001 | US20010033987 Chemically amplified positive resist composition |
| 10/24/2001 | EP1148045A1 Ester compounds, polymers, resist compositions and patterning process |
| 10/24/2001 | EP1148044A1 Ester compounds, polymers, resist compositions and patterning process |
| 10/24/2001 | CN1319199A Photoresists, polymers and process for microlithography |
| 10/23/2001 | US6306990 Maleic acid diester monomers for polymer films and heat stable polymers |
| 10/18/2001 | US20010031845 Using coordination catalyst |
| 10/18/2001 | US20010031802 Used in food packing, image recording papers, printed sheets, magnetic recording cards |
| 10/18/2001 | US20010031420 Partially crosslinked polymer for bilayer photoresist |
| 10/17/2001 | EP1146081A2 Covering material |