Patents for C08F 232 - Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system (1,954) |
---|
04/18/2006 | CA2147589C Process for production of cyclic olefin copolymer and copolymer produced by said process |
03/28/2006 | US7019092 Fluorinated copolymers for microlithography |
03/23/2006 | US20060063892 Method for producing petroleum resin and hydrogenated petroleum resin |
03/21/2006 | US7015293 Copolymer such as of endo-tricyclo[4.3.0.12,5]deca-3,7-diene or endo-tricyclo[4.3.0.12,5]deca-3-ene, with another cyclic olefin compound such as bicyclo[2.2.1]hept-2-ene, optionally with a cyclic olefin compound having a hydrolysable silyl group |
03/14/2006 | US7012107 Elastomeric rocket motor insulation |
03/01/2006 | CN1742031A Epoxy resin compositions, methods of preparing, and articles made therefrom |
02/23/2006 | US20060041082 Hydrogenated copolymer, process for producing the same, and hot-melt adhesive composition containing the same |
02/16/2006 | WO2006016925A1 Photosensitive compositions based on polycyclic polymers |
02/15/2006 | EP1626041A2 New materials useful as electolytic solutes |
02/14/2006 | CA2221569C Polymerization of crystalline copolymers of olefins and cyclic olefins |
02/08/2006 | CN1240666C Photoresist monomer, its copolymer and composition using the same |
02/07/2006 | US6995228 A polymer having random units of the title diene and vinyl aromatic monomer; excellent properties including heat resistance, transparency, nonhygroscopicity, chemical resistance, solvent resistance, molding processability; optic films |
02/01/2006 | CN1239947C An LCD light conducting board |
01/31/2006 | US6992154 Cyclic olefin addition copolymer and process for producing same, crosslinking composition, crosslinked product and process for producing same, and optically transparent material and application thereof |
01/26/2006 | US20060020068 Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
01/25/2006 | CN1726231A Process for the production of hydrogenated petroleum resin |
01/24/2006 | US6989426 Methods for producing di-block polymers |
01/24/2006 | CA2259438C Method for producing high melting-point polyolefins |
01/24/2006 | CA2259435C Method for producing thermoplastic elastomers |
01/24/2006 | CA2259434C Method for producing elastomers |
01/17/2006 | US6987155 Polymers for photoresist and photoresist compositions using the same |
01/11/2006 | CN1720272A Method for producing petroleum resin and hydrogenated petroleum resin |
01/04/2006 | EP1612602A2 Photosensitive composition and method for forming pattern using the same |
01/04/2006 | CN1715300A A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers |
01/03/2006 | US6982302 polymer of ethylene, an alpha-olefin, an unsaturated compound with functional group such as 5-methyl-5-carboxy-bicyclo[2.2.1]-2-heptene, and optional nonconjugated diene, with a metal compound crosslinker; gloss, scratch and weathering resistance |
12/29/2005 | WO2005076076A3 Directly photodefinable polymer compositions and methods thereof |
12/29/2005 | US20050287473 Photosensitive composition and method for forming pattern using the same |
12/21/2005 | EP1607413A1 A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers |
12/15/2005 | US20050277569 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers |
12/15/2005 | US20050277052 Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography |
12/13/2005 | US6974657 Compositions for microlithography |
12/07/2005 | CN1705686A Method for preparing cyclic olefin polymer having high bulk density and cyclic olefin polymer prepared thereby |
12/07/2005 | CN1230715C Photoresist composition for deep UV and process thereof |
12/07/2005 | CN1230455C Copolymer resin, preparation thereof, and photoresist using the same |
12/01/2005 | US20050267275 A fluorinated vinyl sulfonate-polyalkenamer-acrylic acid or ester terpolymer with excellent transparency, substrate adhesion, developer penetrability, and plasma etch resistance; lithographic microprocessing; photoresists |
11/30/2005 | CN1229409C Preparation of poly(2,5-diakoxy-1,4-benzene) |
11/29/2005 | US6969751 Method for preparing homo-and co-polymers of cyclic olefin compounds |
11/23/2005 | EP1597287A2 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof |
11/17/2005 | US20050256350 Hydrocarbon mixtures comprising modified polycyclic aromatic hydrocarbons |
11/17/2005 | DE19753276B4 Amid- oder Imid- enthaltendes Copolymer, Herstellungsverfahren für das Copolymer und dieses Copolymer enthaltendes Photoresist Amide or imide-containing copolymer manufacturing method of the copolymer and this copolymer containing photoresist |
11/16/2005 | CN1227272C Process for preparation polyolefin resins using supported ionic catalysts |
11/09/2005 | CN1694908A Copolymers of ethylene with various norbornene derivatives |
11/03/2005 | WO2005103098A1 Resist protecting film forming material for immersion exposure process and resist pattern forming method using the protecting film |
11/03/2005 | US20050245704 Method for preparing homo-and co-polymers of cyclic olefin compounds |
11/03/2005 | US20050245703 addition polymerization of nonaromatic cyclic olefins, such as alkylnorbornenes and dicyclopentadienes, in the presence of a catalyst complex also including a nickel II carboxylate and an aluminoxane compound; high molecular weight polymer in high yields; gelation inhibition |
11/02/2005 | CN1692138A Molding for automobile |
10/27/2005 | WO2005100412A1 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern |
10/27/2005 | US20050239984 Copolymers derived from fluorinated olefin, polycyclic ethylenically unsaturated polycyclic monomer with a fused 4-membered ring, useful for photoimaging, coated substrates, for imaging in the production of semiconductor devices, plasma etch resistance and adhesive properties |
10/19/2005 | EP1585776A1 Resin composition |
10/19/2005 | CN1223615C Polycyclic resist composition with increased etch resistance |
10/12/2005 | CN1222567C Inflatable tyre with tread containing resin |
10/12/2005 | CN1222554C Resin compound containing functional group derivated from quinone-cyclopentadiene affixture and light resistant agent composition |
10/06/2005 | US20050221221 Sensitive to high-energy radiation, resolution, and etching resistance |
10/05/2005 | EP1582535A2 Catalyst complexes for polymerization and co-polymerization of cyclic olefins and polymerisation process |
10/05/2005 | CN1221856C Polymer and forming method of micro pattern using the same |
09/29/2005 | US20050215735 Catalyst complexes for polymerization and co-polymerization of cyclic olefins |
09/28/2005 | CN1675264A Photoresists, fluorinated polymers and processes for 157 nm microlithography |
09/28/2005 | CN1675263A Photoresists, fluoropolymers and processes for 157 nm microlithography |
09/28/2005 | CN1675262A Fluorinated polymers useful as photoresists, and processes for microlithography |
09/28/2005 | CN1675179A Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
09/28/2005 | CN1673242A Catalyst complexes for polymerization and co-polymerization of cyclic olefins |
09/21/2005 | EP1577343A1 Molding for automobile |
09/20/2005 | US6946523 Microelectronics; hermetic sealed packages |
09/20/2005 | US6946235 Radiation transparent; bonding strength; lithography |
09/14/2005 | EP1574526A1 Process for the production of hydrogenated petroleum resin |
09/14/2005 | EP0738738B1 Polymer containing saturated cyclic molecular structure units |
09/01/2005 | WO2005081306A1 Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof |
09/01/2005 | US20050192409 Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof |
09/01/2005 | US20050191579 Protecting groups in polymers, photoresists and processes for microlithography |
09/01/2005 | DE10393129T5 Formen für die Herstellung von Kontaktlinsen Molds for the production of contact lenses |
08/31/2005 | EP1568722A1 Method for producing petroleum resin and hydrogenated petroleum resin |
08/30/2005 | US6936672 Mold addition polymerization of norbornene-type monomers using group 10 metal complexes |
08/25/2005 | US20050186502 Directly photodefinable polymer compositions and methods thereof |
08/18/2005 | WO2005076076A2 Directly photodefinable polymer compositions and methods thereof |
08/18/2005 | US20050182218 Methacrylic esters of (norbornenylalkoxycarbonylamino)alkanols, (norbornenylcarbonyloxyalkoxycarbonylamino)alkanols and epoxyalkyl norbornenes and their polymers with crosslinkable side chains; epoxy group may be subsequently quaternized; excellent solubility and narrow molecular weight distribution |
08/18/2005 | US20050181304 Method of forming fine pattern |
08/17/2005 | CN1654496A Novel polyfluorene derivative-polysilicofluorene and method for preparation thereof |
08/17/2005 | CN1215099C Polycyclic fluorine-contg. polymers and photoresists for microlithography |
08/11/2005 | WO2005073261A1 Method for preparing cyclic olefin polymer having high bulk density and cyclic olefin polymer prepared thereby |
08/11/2005 | US20050175936 Chemically amplified resist composition and method for forming patterned film using same |
08/11/2005 | US20050175935 Polymer, resist composition, and patterning process |
08/10/2005 | CN1653098A Cycloolefin addition copolymer and optical transparent material |
08/10/2005 | CN1214054C Compositions for microlithography |
08/04/2005 | WO2005070973A2 Method of preparing propionic acid-terminated polymers |
08/04/2005 | US20050171310 Cycloolefin addition copolymer and optical transparent material |
08/04/2005 | US20050171291 reacting a water soluble and non-peptidic polymer comprising at least one hydroxyl group with a tertiary alkyl acrylate in the presence of a catalyst to form a propionic acid ester of the polymer; acid treatment; may be further derivatized; particularly propionic acid-terminated poly(ethylene glycol)s |
08/04/2005 | US20050171258 Polymerizing a cyclic olefin (e.g., a norbornere) either with ethylene or another cyclic olefin, slowly adding a non-solvent to the product solution in a drop wise manner to precipitate the polymer, and filtering and drying the precipitated polymer; product preferably has a bulk density of 0.1 0.6 g/mL |
08/03/2005 | EP1131677B1 Photoresists, polymers and processes for microlithography |
08/02/2005 | US6924078 Multi-oxygen-containing compound which with polymerizable carbon-carbon double bond and ethyleneoxy moiety |
07/14/2005 | WO2005049657A3 Colored decorative material comprised of cyclo-olefin oligomers |
07/14/2005 | US20050153236 Novel polymer and chemically amplified resist composition containing the same |
07/14/2005 | US20050153232 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
07/13/2005 | EP1551886A1 Fluorinated polymers useful as photoresists, and processes for microlithography |
07/13/2005 | CN1639640A Fluorinated copolymers for microlithography |
07/13/2005 | CN1637603A Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
07/13/2005 | CN1210318C Addition polymers derived from norbornene-functional monomers and process therefor |
06/29/2005 | EP1546222A1 Photoresists, fluoropolymers and processes for 157 nm microlithography |
06/29/2005 | EP1546221A2 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY |
06/29/2005 | CN1631910A Processes for the preparation of polyolefin resins using supported ionic catalysts and uses of said resins |
06/29/2005 | CN1208360C In mold addition polymerization of norbornene-type monomers using group 10 metal complexes |