Patents
Patents for H01L 27 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate (229,248)
04/2002
04/30/2002US6380028 Semiconductor device and a method of manufacturing thereof
04/30/2002US6380027 Dual tox trench dram structures and process using V-groove
04/30/2002US6380026 Processing methods of forming integrated circuitry memory devices, methods of forming DRAM arrays, and related semiconductor masks
04/30/2002US6380024 Method of fabricating an SRAM cell featuring dual silicide gates and four buried contact regions
04/30/2002US6380023 Methods of forming contacts, methods of contacting lines, methods of operating integrated circuitry, and integrated circuits
04/30/2002US6380020 Method for fabricating a semiconductor device having a device isolation insulating film
04/30/2002US6380018 Semiconductor device and method for the production thereof
04/30/2002US6380015 Aoped polysilicon layer is formed over a silicon or silicon oxide substrate, and is counterdoped with boron to adjust work function
04/30/2002US6380011 Semiconductor device and a method of manufacturing the same
04/30/2002US6380010 Shielded channel transistor structure with embedded source/drain junctions
04/30/2002US6380007 Semiconductor device and manufacturing method of the same
04/30/2002US6380006 Infiltrating solution of organic solvent into film and reflowing, etching exposed region using film as mask
04/30/2002US6380005 Charge transfer device and method for manufacturing the same
04/30/2002US6380004 Process for manufacturing radhard power integrated circuit
04/30/2002US6379993 Solid-state imaging device with a film of low hydrogen permeability and a method of manufacturing same
04/30/2002US6379992 Method for fabricating an image sensor
04/30/2002US6379979 Method of making infrared and visible light detector
04/30/2002US6379978 Memory cell configuration in which an electrical resistance of a memory element represents an information item and can be influenced by a magnetic field, and method for fabricating it
04/30/2002US6379977 Method of manufacturing ferroelectric memory device
04/30/2002US6379577 Hydrogen peroxide and acid etchant for a wet etch process
04/30/2002US6379510 Thin film deposition and mirror light beams
04/25/2002WO2002033922A2 Method and device for the recording and processing of signal waves and corresponding method
04/25/2002WO2002033817A1 Method and device for detecting and processing signal waves
04/25/2002WO2002033760A1 Method for the production of a semiconductor component made from gan
04/25/2002WO2002033755A2 Method of fabricating heterojunction photodiodes integrated with cmos
04/25/2002WO2002033754A1 Non-volatile semiconductor storage location configuration and method for the production thereof
04/25/2002WO2002033753A2 Integrated circuit provided with overvoltage protection and method for manufacture thereof
04/25/2002WO2002033748A2 Method and apparatus for introducing an equivalent rc circuit in a mos device using resistive wells
04/25/2002WO2002033746A1 Layer transfer of low defect sige using an etch-back process
04/25/2002WO2002033740A1 Etching process
04/25/2002WO2002033385A2 Biochip excitation and analysis structure
04/25/2002WO2002033366A1 Infrared camera
04/25/2002WO2001063766A3 Programmable logic array embedded in mask-programmed asic
04/25/2002WO2001048822A3 Thin-film transistor circuitry
04/25/2002US20020049957 Method of designing semiconductor integrated circuit device, and apparatus for designing the same
04/25/2002US20020048971 Manufacturing method of semiconductor integrated circuit device
04/25/2002US20020048970 Method of controlling a shape of an oxide layer formed on a substrate
04/25/2002US20020048967 Fabrication process of a semiconductor integrated circuit device
04/25/2002US20020048961 Semiconductor device and method for manufacturing semiconductor device
04/25/2002US20020048947 Semiconductor integrated circuit device and the process of the same
04/25/2002US20020048941 Process for producing semiconductor integrated circuit device
04/25/2002US20020048930 Interconnects are held to a minimum in length by using polyimide or polyarylenecyclobutane as an intermetal dielectric thus enabling the integration of very small integrated circuits within a larger circuit environment
04/25/2002US20020048921 A diffusion region is formed in semiconductive material, conductive line is formed which is laterally spaced from the diffusion region; integrated memory circuitry
04/25/2002US20020048919 Inactivating ions are implanted only to the source region of the semiconductor layer, to damage the crystal near the surface of the semiconductor layer, promoting siliciding reaction; parasitic resistance reduced
04/25/2002US20020048917 Semiconductor device and method of fabricating same
04/25/2002US20020048916 Thinned, stackable semiconductor device having low profile
04/25/2002US20020048914 Complementary metal oxide semiconductor (CMOS); transistor of a second conductivity type is Lateral MOS (LMOS) structure, and transistor of a first conductivity type is a Lateral Double-diffused (LDMOS) structure
04/25/2002US20020048899 Process for forming shallow isolating regions in an integrated circuit and an integrated circuit thus formed
04/25/2002US20020048898 Method of forming active and isolation areas with split active patterning
04/25/2002US20020048897 Method of forming a self-aligned shallow trench isolation
04/25/2002US20020048893 Semiconductor device having a metal gate with a work function compatible with a semiconductor device
04/25/2002US20020048892 Bipolar transistor with trenched-groove isolation regions
04/25/2002US20020048889 Method of manufacturing semiconductor device with sidewall metal layers
04/25/2002US20020048886 Semiconductor device and method for fabricating the same
04/25/2002US20020048885 Method for fabricating semiconductor device
04/25/2002US20020048884 Angled dopant implantation is followed by the formation of vertical trenches
04/25/2002US20020048883 Method of forming a semiconductor-on-insulator transistor
04/25/2002US20020048880 Method of manufacturing a semiconductor device including metal contact and capacitor
04/25/2002US20020048879 Structure of a lower electrode of a capacitor and a process for fabricating the same
04/25/2002US20020048878 Method of manufacturing capacitor in semiconductor devices
04/25/2002US20020048877 Forming a tantalum oxynitride film with a high dielectric constant on a rubidium film, and further forming an upper electrode
04/25/2002US20020048876 Method for fabricating capacitor of semiconductor device
04/25/2002US20020048874 Method for manufacturing semiconductor integrated circuit and semiconductor integrated circuit manufactured by this method
04/25/2002US20020048873 Semiconductor device and production thereof
04/25/2002US20020048871 Semiconductor device and manufacturing method therefor
04/25/2002US20020048869 Method of forming semiconductor thin film and plastic substrate
04/25/2002US20020048868 Insulated gate field effect transistor and method for forming the same
04/25/2002US20020048867 Process for forming thin film transistor
04/25/2002US20020048865 Method of forming a local interconnect
04/25/2002US20020048859 Stripe photodiode element with high quantum efficiency for an image sensor cell
04/25/2002US20020048855 Semiconductor device and method of manufacturing the same
04/25/2002US20020048844 Semiconductor substrate, method of manufacturing the same, and bonded substrate stack surface shape measuring method
04/25/2002US20020048840 Solid-state imaging device
04/25/2002US20020048837 Fabrication of a high-precision blooming control structure for an image sensor
04/25/2002US20020048829 Light emitting device and fabricating method thereof
04/25/2002US20020048289 Devices with optical gain in silicon
04/25/2002US20020048210 Semiconductor memory device having hierarchical word line structure
04/25/2002US20020048205 Dynamic random access memory
04/25/2002US20020048204 Semiconductor integrated circuit device
04/25/2002US20020048200 Integrated circuit memory devices having non-volatile memory transistors and methods of fabricating the same
04/25/2002US20020048192 Triple well flash memory cell and fabrication process
04/25/2002US20020048190 Insulated-gate field-effect transistor integrated with negative differential resistance (NDR) FET
04/25/2002US20020048189 Data line disturbance free memory block divided flash memory and microcomputer having flash memory therein
04/25/2002US20020048182 Memory circuit/logic circuit integrated device capable of reducing term of works
04/25/2002US20020048141 Enhanced capacitor shape
04/25/2002US20020047956 Display apparatus
04/25/2002US20020047949 Liquid crystal displays
04/25/2002US20020047852 Method of driving EL display device
04/25/2002US20020047836 Active matrix display device
04/25/2002US20020047827 Display device
04/25/2002US20020047822 Liquid crystal display device, electroluminescent display device, method of driving the devices, and method of evaluating subpixel arrangement patterns
04/25/2002US20020047817 Display device and electronic apparatus including the same
04/25/2002US20020047790 Correction of operational amplifier gain error in pipelined analog to digital converters
04/25/2002US20020047789 Method of designing semiconductor integrated circuit
04/25/2002US20020047757 Filters implemented in integrated circuits
04/25/2002US20020047741 Semiconductor device reduced in through current
04/25/2002US20020047733 Transistor circuit
04/25/2002US20020047723 Arrangement for testing integrated circuits
04/25/2002US20020047632 Semiconductor integrated circuit
04/25/2002US20020047581 Light emitting device and method of driving the same