Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2012
08/28/2012US8252151 Layout method of bridging electrode
08/28/2012US8252127 Sputtering target material
08/28/2012US8252126 Sputter targets and methods of forming same by rotary axial forging
08/28/2012CA2530443C Concentration-modulated coatings
08/23/2012WO2012112376A1 Diffusion-bonded sputtering target assembly and method of manufacturing
08/23/2012WO2012111568A1 Soft magnetic alloy for magnetic recording, sputtering target material and magnetic recoding medium
08/23/2012WO2012111301A1 Antimicrobial substance, method for producing same, and antimicrobial material
08/23/2012WO2012110936A1 Accessory consisting of a lock or the like
08/23/2012WO2012110914A1 Device for synthesising a nanostructured composite material, and associated method
08/23/2012WO2012110458A1 Method for producing a thin film made of lead zirconate titanate
08/23/2012WO2012091390A3 Dry coating apparatus
08/23/2012US20120214263 Fabrication System and Manufacturing Method of Light Emitting Device
08/23/2012US20120213989 Coated glass article and method for manufacturing same
08/23/2012US20120213964 Polycrystalline ferroelectric or multiferroic oxide articles on biaxially textured substrates and methods for making same
08/23/2012US20120213927 Surface coating method and device for exterior part
08/23/2012US20120212826 Substrate with antireflection coating and method for producing same
08/23/2012US20120212820 Optical diffraction gratings and methods for manufacturing same
08/23/2012US20120211359 Wafer processing deposition shielding components
08/23/2012US20120211358 Interior antenna for substrate processing chamber
08/23/2012US20120211355 Transparent conductive composition, target, transparent conductive thin film using the target and method for fabricating the same
08/23/2012US20120211354 Uniformity tuning capable esc grounding kit for rf pvd chamber
08/23/2012US20120211353 Method of coating metal shell with pure white film
08/23/2012US20120211352 Sputtering magnetron assembly
08/23/2012US20120211351 Method and apparatus for forming silicon dots and method and apparatus for forming a substrate with silicon dots and insulating film
08/23/2012DE102011012160A1 Coated substrate comprises multi-layer anti-reflection coating comprising layers with different refractive indices, where layers with higher refractive index and layers with lower refractive index are alternated
08/23/2012DE102011012044A1 Method for producing reflective layer system for solar application, involves providing reflection layers on substrate, and heat treating layered structure of reflection layers at different temperature
08/23/2012DE102011012034A1 Rohrförmiges Sputtertarget A tubular sputtering target
08/23/2012DE102011004450A1 Magnetron sputtering device comprises a hollow target and a magnet assembly arranged in the target, where the target and the magnet assembly are held in a holding unit and the magnet assembly is secured at a mechanism
08/23/2012DE102011004441A1 Verfahren und Vorrichtung zur Beschichtung von Substraten Method and apparatus for coating substrates
08/23/2012DE102011000800A1 Beschichtungsverfahren, Schichtsystem sowie Verglasungselement Coating method, system layer, and glazing element
08/22/2012EP2490049A1 Diffractive optical element and manufacturing method for the same
08/22/2012EP2489759A1 System for utilization improvement of process chambers and method of operating thereof
08/22/2012EP2489758A1 Methods of depositing aluminium layers
08/22/2012EP2489757A2 Plasma grid implant system for use in solar cell fabrications
08/22/2012EP2489756A1 Coating method, coat system and glazing element
08/22/2012EP2488677A1 Method and apparatus for production of rotatable sputtering targets
08/22/2012EP2488467A1 Tin oxide ceramic sputtering target and method of producing it
08/22/2012EP2142681B1 Arrangement for producing coatings on substrates in vacuo
08/22/2012EP1969613B1 Method of manufacturing at least one sputter-coated substrate and sputter source
08/22/2012CN202391591U High performance composite coating piston ring
08/22/2012CN202390535U Continuous vacuum plating facility with heating device
08/22/2012CN202390532U Mesh belt automatic adjusting mechanism of continuous film plating machines
08/22/2012CN202390531U Gas release buffering pipeline for vacuum cavities of vacuum film plating machines
08/22/2012CN202390530U Universal drive shaft of continuous coating machine
08/22/2012CN202390529U Continuous vacuum coating machine trolley correction frame
08/22/2012CN202390528U Stable continuous type coating machine trolley
08/22/2012CN202390527U Composite vacuum tube work frame for vacuum tube coating
08/22/2012CN202390526U Coating film work frame of vacuum tube
08/22/2012CN202390525U Manufacturing device of cell phone camera decorating parts
08/22/2012CN202390524U Improved product substrate fixture for vacuum coating machine
08/22/2012CN202390523U Combined magnetron sputtering target
08/22/2012CN202390522U High-speed vacuum aluminum plating machine
08/22/2012CN202390521U Wire feeding mechanism of vacuum aluminizing machine
08/22/2012CN102645681A Optical member, method of manufacturing same, and optical system using same
08/22/2012CN102644102A Diamond wire saw manufactured by adopting diamond micropowder
08/22/2012CN102644101A Method for preparing anodic aluminum oxide (AAO) template with large pore diameter and thin wall on silicon substrate
08/22/2012CN102644100A Rod - acicular nanometer array and preparation method thereof
08/22/2012CN102644077A Preparation technology for bionic ceramic/metal laminating composite support coating
08/22/2012CN102644060A Coating static electricity eliminating device
08/22/2012CN102644059A Continuous deposition device
08/22/2012CN102644058A Substrate overturning device for vacuum coating equipment
08/22/2012CN102644057A Coating hanger
08/22/2012CN102644056A Magnetron sputtering device used for thin film solar cell and control system thereof
08/22/2012CN102644055A Preparation method of nitrogen-doped tin dioxide film
08/22/2012CN102644054A Composite surface treatment process for preparing amorphous-nanocrystalline molybdenum disilicide base abrasion resistant and corrosion resistant coatings on titanium alloy surfaces
08/22/2012CN102644053A Tube-shaped sputtering target
08/22/2012CN102644052A Vacuum coating machine equipped with ultraviolet irradiation cleaning functions
08/22/2012CN102644051A Film forming device
08/22/2012CN102644050A Method for preparing porous AlN/GaN film
08/22/2012CN102644049A Micro-flow driving method based on TiO2 nano-film wettability
08/22/2012CN102644048A Preparing technology for bionic molybdenum silicide gradient laminate compositing nanometer coatings
08/22/2012CN102644047A Shell and manufacturing method thereof
08/22/2012CN102643035A Self-cleaning reflector and preparation method and application thereof
08/22/2012CN102642354A Flexible discontinuous-body wave absorbing coating and preparation method
08/22/2012CN102194956B Method for evaporating indium tin oxide (ITO)
08/22/2012CN102122006B Solar spectrum selective absorbing coating and preparation method thereof
08/22/2012CN102024864B Method for manufacturing solar module
08/22/2012CN101981224B Sputtering target of nonmagnetic-in-ferromagnetic dispersion type material
08/22/2012CN101956177B Rotary bin for vacuum continuous coating production line
08/22/2012CN101842511B Film forming apparatus and film forming method
08/22/2012CN101737479B Wear-resistant gear with alloy steel on surface
08/22/2012CN101676436B Surface treatment method
08/22/2012CN101665909B Method for preparing target material
08/22/2012CN101631692B Low glare mirror plate and rear-view mirror with this type of mirror plate
08/22/2012CN101583735B Multilayer film forming method and multilayer film forming apparatus
08/22/2012CN101445914B Magnetic shunts in tube targets
08/22/2012CN101417520B Multilayer medium double silver layer low-radiation film and production technique thereof
08/22/2012CN101008076B Sputtering target having high fusion phase
08/21/2012USRE43590 Aluminum alloy electrode for semiconductor devices
08/21/2012US8247036 Method for making coaxial cable
08/21/2012US8246798 Substrate processing apparatus and apparatus and method of manufacturing magnetic device
08/21/2012US8246795 Lens module fabrication method
08/21/2012US8246794 Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source
08/21/2012US8246764 Copper alloy sputtering target and semiconductor element wiring
08/16/2012WO2012109591A1 Direct liquid vaporization for oleophobic coatings
08/16/2012WO2012109549A1 Methodology for forming pnictide compositions suitable for use in microelectronic devices
08/16/2012WO2012109069A2 Pvd sputtering target with a protected backing plate
08/16/2012WO2012108509A1 Oxide sintered body and sputtering target
08/16/2012WO2012108506A1 Oxide sintered body, and sputtering target
08/16/2012WO2012108504A1 Oxide sintered body, and sputtering target