Patents
Patents for B24B 7 - Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor (8,400)
04/2007
04/05/2007US20070077868 Cerium-based abrasive, abrasive slurry, and production of cerium-based abrasive
04/05/2007US20070077867 Polishing pad and polishing apparatus
04/05/2007US20070077866 Method and apparatus for chemical mechanical polishing
04/05/2007US20070077865 Method for controlling polysilicon removal
04/05/2007US20070077862 System for Endpoint Detection with Polishing Pad
04/05/2007US20070077861 Polishing apparatus and method with direct load platen
04/04/2007EP1173307B1 Abrasive article suitable for abrading glass and glass ceramic workpieces
04/04/2007CN2885496Y Railway steel rail flatness repairing and grinding device
04/04/2007CN2885495Y Digital control fine grinding machine for rail welded seam
04/04/2007CN1943009A Work-piece processing system
04/04/2007CN1939857A Self-cleaning glass and its production
04/03/2007US7198558 Knife blade dressing apparatus
04/03/2007US7198557 Sanding machine incorporating multiple sanding motions
04/03/2007US7198556 Grinding apparatus
04/03/2007US7198551 Substrate polishing apparatus
04/03/2007US7198547 Lens edger
03/2007
03/29/2007US20070072527 Shape controlled abrasive article and method
03/29/2007US20070072524 Sanding block
03/29/2007US20070072522 Driver for abrasive disks
03/29/2007US20070072518 Grinding machine
03/29/2007DE19980562B4 Glättmaschine Trowel
03/28/2007EP1767311A1 Milling arrangement for tunnel walls
03/28/2007CN1938126A Floor processing machine
03/27/2007US7195541 Endpoint detection system for wafer polishing
03/27/2007US7195535 Metrology for chemical mechanical polishing
03/27/2007CA2435855C Sanding sponge
03/22/2007US20070066191 Cutting or grinding machine
03/22/2007US20070066188 Cutting method and cutting apparatus
03/22/2007US20070066187 Chemical mechanical polishing device including a polishing pad and cleaning method thereof and method for planarization
03/22/2007US20070066186 Flexible abrasive article and methods of making and using the same
03/22/2007US20070066185 Conformable abrasive articles and methods of making and using the same
03/22/2007US20070066184 Surface-protecting sheet and semiconductor wafer lapping method
03/22/2007US20070066182 Machine for grinding internal diameter and end surface of workpiece
03/22/2007US20070062124 Abrasive grain and method for producing it, polishing tool and method for producing it, grinding wheel and method for producing it, and polishing apparatus
03/21/2007CN1933940A Wafer clamping device for a double side grinder
03/20/2007US7191618 Large-sized substrate and method of producing the same
03/15/2007WO2007030779A2 Apparatus and method for polishing objects using object cleaners
03/15/2007WO2007030348A2 Platen endpoint window with pressure relief
03/15/2007WO2007030347A2 Grooved platen with channels or pathway to ambient air
03/15/2007US20070060027 Equipment and method for polishing both sides of a rectangular substrate
03/15/2007US20070060024 Polishing machine, workpiece supporting table pad, polishing method and manufacturing method of semiconductor device
03/15/2007US20070060023 Apparatus and method for polishing objects using object cleaners
03/15/2007US20070059935 Polishing method for semiconductor wafer
03/14/2007EP1761373A1 Facing machine for large plates of natural stone, like granite and hard stones
03/14/2007CN1929952A Devices and methods for optical endpoint detection during semiconductor wafer polishing
03/14/2007CN1305115C Magma flow control method and system utilizing compound control mode
03/13/2007US7189153 Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces
03/13/2007US7189151 Embedding tool designed to embed grains into faceplate for lapping apparatus
03/13/2007US7189147 Lens layout block device
03/13/2007US7189144 Centerless grinding apparatus and centerless grinding method
03/13/2007US7189142 Sharpening-trimming assembly
03/08/2007US20070054603 Wafer carrier with pressurized membrane and retaining ring actuator
03/08/2007US20070054602 Platen endpoint window with pressure relief
03/08/2007US20070054601 Grooved platen with channels or pathway to ambient air
03/08/2007US20070054600 Polishing pad, method of producing same and method of polishing
03/06/2007US7186298 Wafer support system
03/06/2007US7186168 Chemical mechanical polishing apparatus and methods for chemical mechanical polishing
03/01/2007WO2007025226A1 Polishing pad and method for manufacturing polishing pads
03/01/2007US20070049180 Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion, chemical mechanical polishing process, and process for producing semiconductor devices
03/01/2007US20070049179 Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces
03/01/2007US20070049172 Apparatus and method for removing material from microfeature workpieces
03/01/2007US20070044386 Polishing composition
02/2007
02/28/2007EP1755828A2 Abrasive cleaning device
02/28/2007CN1921985A Rotary surface plate for lapping machine
02/28/2007CN1302522C Terminal detection system for chemical and mechanical polisher
02/27/2007US7182676 Machining apparatus and machining method of work end face, roller and roller bearing
02/22/2007US20070042689 Device for Grinding Spinning Cots
02/22/2007US20070042687 Method and device for feeding a chemical-mechanical polishing machine with a polishing product
02/22/2007US20070042686 Method and apparatus for cleaning slurry depositions from a water carrier
02/22/2007US20070042685 System and method for cutting granite or similar materials
02/22/2007US20070042683 Optical fiber polishing and finishing system, device and method
02/22/2007US20070042678 Plating removing apparatus for three-piece wheel
02/22/2007US20070042677 Methods for Lapping Using Pneumatically Actuated Flexible Coupling End Effectors
02/22/2007CA2618898A1 Floor treating machine with improved rotary drive
02/21/2007EP1754570A1 Floor treating machine comprising individually driven discs
02/21/2007EP1691951A4 Lens blocking system
02/21/2007EP1281199B1 Metal chemical mechanical polishing process for minimizing dishing during semiconductor wafer fabrication
02/21/2007CN2871098Y Manual stone polisher
02/20/2007US7179155 Device for grinding liquid crystal display panel
02/20/2007US7179154 Method and apparatus for cleaning a wafer bevel edge and notch using a pin and an abrasive film cassette
02/15/2007US20070037491 Chemically modified chemical mechanical polishing pad, process of making a modified chemical mechanical polishing pad and method of chemical mechanical polishing
02/15/2007US20070037490 Methods and apparatus for selectively removing conductive material from a microelectronic substrate
02/15/2007US20070037486 Polishing pad, method of manufacturing the polishing pad, and chemical mechanical polishing apparatus comprising the polishing pad
02/15/2007DE102005039095A1 Halterung für Polier- oder Scheuerscheibe Holder for polishing or scouring disc
02/14/2007EP1458520B1 Methods for planarization of group viii metal-containing surfaces using a fixed abrasive article
02/14/2007CN1914712A Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift
02/14/2007CN1914004A Multi-step pad conditioning system and method for chemical planarization
02/13/2007US7175508 Polishing apparatus, method of manufacturing semiconductor device using the same, and semiconductor device manufactured by this method
02/09/2007CA2792142A1 Stump grinding disk and wear strips therefor
02/09/2007CA2544675A1 Stump grinding disk and wear strips therefor
02/08/2007WO2007015322A1 Device for processing braking surfaces of brake disk
02/08/2007WO2007015163A1 Precision machining apparatus and precision machining method
02/08/2007WO2007014732A2 Method and device for subsequently treating glass panes
02/08/2007US20070032176 Method for polishing diamond wafers
02/08/2007US20070032175 Polishing cloth, polishing cloth processing method, and substrate manufacturing method using same
02/08/2007US20070032174 Polishing apparatus
02/08/2007US20070032171 Methods and systems for conditioning planarizing pads used in planarizing susbstrates
02/08/2007DE102005036779A1 Flat glass substrates treatment comprises removing material on at least one side by polishing
02/07/2007CN1299335C Method and pad for polishing wafer
02/06/2007US7172498 Drill sharpener
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