Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
---|
10/02/2014 | WO2014156840A1 Polishing pad and polishing method |
10/02/2014 | WO2014156798A1 Method of manufacturing glass substrate for information recording medium |
10/02/2014 | WO2014156114A1 Method for manufacturing glass substrate for information recording medium |
10/02/2014 | US20140295740 Ultra fine lapping substrate through use of hard coated material on lapping kinematics |
10/02/2014 | US20140295737 Polishing apparatus and wear detection method |
09/30/2014 | US8845915 Abrading agent and abrading method |
09/30/2014 | US8845852 Polishing pad and method of producing semiconductor device |
09/30/2014 | US8845398 Chemical mechanical polisher and polishing pad component thereof |
09/30/2014 | US8845396 Polishing apparatus |
09/30/2014 | US8845395 Method and device for the injection of CMP slurry |
09/30/2014 | US8845394 Bellows driven air floatation abrading workholder |
09/30/2014 | US8845391 Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus |
09/25/2014 | WO2014150884A1 Methods of polishing sapphire surfaces |
09/25/2014 | WO2014149676A1 Polishing pad cleaning with vacuum apparatus |
09/25/2014 | WO2014148399A1 Polishing composition, method for producing polishing composition, and kit for preparing polishing composition |
09/25/2014 | WO2014147969A1 Template assembly and method for manufacturing template assembly |
09/25/2014 | US20140287663 Multilayer Polishing Pads Made by the Methods for Centrifugal Casting of Polymer Polish Pads |
09/25/2014 | US20140287662 Retaining ring with attachable segments |
09/25/2014 | US20140287657 Cmp retaining ring with soft retaining ring insert |
09/25/2014 | US20140287656 Method for polishing a semiconductor material wafer |
09/25/2014 | US20140287653 Method of adjusting profile of a polishing member used in a polishing apparatus, and polishing apparatus |
09/25/2014 | US20140283995 Gas nozzle, plasma apparatus using the same, and method for manufacturing gas nozzle |
09/23/2014 | US8842297 Method for measurement of the thickness of any deposit of material on inner wall of a pipeline |
09/18/2014 | WO2014141889A1 Polishing pad and polishing method |
09/18/2014 | WO2014139954A1 Methods for making actinic radiation curable elastomers thick films free from oxygen inhibition during curing |
09/18/2014 | US20140273777 Polishing pad having polishing surface with continuous protrusions having tapered sidewalls |
09/18/2014 | US20140273766 Polishing System with Front Side Pressure Control |
09/18/2014 | US20140273765 Polishing System with Front Side Pressure Control |
09/18/2014 | US20140273764 Lapping carrier having hard and soft properties, and methods |
09/18/2014 | US20140273762 Polishing Pad with Secondary Window Seal |
09/18/2014 | US20140273760 Double-Sided Polishing of Hard Substrate Materials |
09/18/2014 | US20140273756 Substrate precession mechanism for cmp polishing head |
09/18/2014 | US20140273753 Polishing apparatus and polishing method |
09/18/2014 | US20140273752 Pad conditioning process control using laser conditioning |
09/18/2014 | US20140273749 Dynamic residue clearing control with in-situ profile control (ispc) |
09/18/2014 | US20140273748 Single side polishing using shape matching |
09/18/2014 | US20140273746 Cmp polishing pad detector and system |
09/18/2014 | US20140273745 X-ray metrology for control of polishing |
09/17/2014 | EP2779216A1 Polishing composition and polishing method using same, and substrate manufacturing method |
09/17/2014 | EP2777878A1 Polishing composition |
09/16/2014 | US8834234 Double-side polishing apparatus |
09/16/2014 | US8834230 Wafer polishing method and double-side polishing apparatus |
09/11/2014 | US20140256232 Broad Spectrum, Endpoint Detection Window Multilayer Chemical Mechanical Polishing Pad |
09/11/2014 | US20140256231 Multilayer Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Detection Window |
09/11/2014 | US20140256230 Multilayer Chemical Mechanical Polishing Pad |
09/11/2014 | US20140256227 Double-side polishing method |
09/11/2014 | US20140256226 Broad spectrum, endpoint detection window chemical mechanical polishing pad and polishing method |
09/11/2014 | US20140256225 Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Detection Window and Method of Polishing Therewith |
09/11/2014 | DE112012004211T5 Doppelseitiges Polierverfahren Double-sided polishing process |
09/11/2014 | DE102014002844A1 Chemisch-mechanisches Polierkissen mit Breitspektrum-Endpunkterfassungsfenster und Verfahren zum Polieren damit Chemical-mechanical polishing pad having broad-spectrum endpoint detection window and method for polishing so |
09/11/2014 | DE102014002616A1 Chemisch-mechanisches Mehrschicht-Polierkissen mit Breitspektrum-Endpunkterfassungsfenster Chemical mechanical polishing pad with multi-layer broad-spectrum endpoint detection window |
09/11/2014 | DE102014002615A1 Chemisch-mechanisches Mehrschicht-Polierkissen Chemical mechanical polishing pad multilayer |
09/09/2014 | US8831767 Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool |
09/09/2014 | US8827771 Polishing composition and polishing method using the same |
09/09/2014 | US8827769 Method of producing substrate for magnetic recording media |
09/04/2014 | WO2014131937A1 A method to provide an abrasive product and abrasive products thereof |
09/04/2014 | WO2014131936A1 A method to provide an abrasive product surface and abrasive products thereof |
09/04/2014 | US20140248823 Composition and method for polishing glass |
09/04/2014 | DE102013202488A1 Verfahren zum Abrichten von Poliertüchern zur gleichzeitig beidseitigen Politur von Halbleiterscheiben A method of dressing of the polishing cloth for simultaneously two-sided polishing of semiconductor wafers |
09/04/2014 | DE102010046551B4 Verfahren zur Herstellung eines Kolbenrings A process for producing a piston ring |
09/02/2014 | US8821746 Fabrication method of semiconductor device and chemical mechanical polishing apparatus |
09/02/2014 | US8821644 Bevel/backside polymer removing method and device, substrate processing apparatus and storage medium |
09/02/2014 | US8821219 Wafer unloading system and wafer processing equipment including the same |
09/02/2014 | US8821215 Polypyrrolidone polishing composition and method |
09/02/2014 | US8821214 Polishing pad with porous elements and method of making and using the same |
08/28/2014 | WO2014129708A1 Wafer processing apparatus and method |
08/28/2014 | US20140242894 Polishing pad and method for producing same |
08/28/2014 | US20140242886 Polishing head in chemical mechanical polishing apparatus and chemical mechanical polishing apparatus including the same |
08/28/2014 | US20140242881 Feed forward parameter values for use in theoretically generating spectra |
08/28/2014 | US20140242880 Optical model with polarization direction effects for comparison to measured spectrum |
08/28/2014 | US20140242878 Weighted regression of thickness maps from spectral data |
08/28/2014 | US20140242877 Spectrographic metrology with multiple measurements |
08/26/2014 | US8815110 Composition and method for polishing bulk silicon |
08/21/2014 | WO2014124554A1 Abrasive grain with controlled aspect ratio |
08/21/2014 | US20140235144 Chemical mechanical polishing machine and polishing head assembly |
08/21/2014 | US20140231011 Flattening method and flattening apparatus |
08/21/2014 | DE10392995B4 Verfahren und Vorrichtung zum Polieren Glassubstrats A method and apparatus for polishing the glass substrate |
08/20/2014 | EP2767568A1 Polishing slurry, and polishing method |
08/14/2014 | US20140227951 Conductive chemical mechanical planarization polishing pad |
08/14/2014 | US20140223832 Polyurethane, composition for formation of polishing layers that contains same, pad for chemical mechanical polishing, and chemical mechanical polishing method using same |
08/13/2014 | CN203765445U 用于研磨机的工件台 For workpiece table grinder |
08/13/2014 | CN203765444U 一种晶体抛光夹具 A crystal polishing jig |
08/13/2014 | CN203765443U 一种合成的镀铜研磨机台 A synthetic copper grinding machine |
08/13/2014 | CN203765442U 多样位可编程全自动研磨装置 Diverse bit programmable automatic grinding apparatus |
08/13/2014 | CN203765441U 多卡位自动抛光研磨机 Multi-card bit auto polishing and grinding machines |
08/13/2014 | CN203765440U 一种轴颈在线研磨修复机 One kind of online journal grinding machine repair |
08/13/2014 | CN103987494A 层叠抛光垫的制造方法 The method of manufacturing a laminated polishing pad |
08/13/2014 | CN103978423A 一种陶瓷插芯加工用锡棒浇锡固定机 A ceramic ferrule processing pouring tin tin rods fixed machine |
08/13/2014 | CN103978422A 磁记录介质用玻璃基板的制造方法及磁记录介质用玻璃基板 The method of manufacturing a magnetic recording medium and magnetic recording medium of the glass substrate with a glass substrate |
08/13/2014 | CN103978421A 化学机械抛光终点侦测装置及方法 The chemical mechanical polishing endpoint detection apparatus and method |
08/13/2014 | CN103978420A 一种用于千分尺的示值超差修复装置及其修复方法 An indication micrometer device and fix ultra-poor repair |
08/13/2014 | CN103978419A 一种陶瓷插芯毛刷研磨机密封结构 A ceramic ferrule brush grinding machine sealing structure |
08/13/2014 | CN103978410A 一种陶瓷插芯毛刷研磨机 A ceramic ferrule brush grinding machine |
08/13/2014 | CN103978406A 一种铌酸锂晶体高效超光滑化学机械抛光方法 One kind of lithium niobate super smooth and efficient method for chemical mechanical polishing |
08/13/2014 | CN103978405A 一种工件的镜面保护方法及研磨装置 Mirror protection method and apparatus for grinding a workpiece |
08/13/2014 | CN102554763B 磁记录介质用玻璃基板的制造方法 The method of manufacturing a glass substrate for a magnetic recording medium |
08/13/2014 | CN102513919B 一种基于软质磨料固着磨具的氧化铝陶瓷球研磨方法 Alumina ceramic ball milling method based on soft abrasive fixed abrasive |
08/13/2014 | CN102240962B 化学机械研磨设备的调节器及调节方法 Regulator chemical mechanical polishing apparatus and method for regulating |
08/12/2014 | US8801949 Method of forming open-network polishing pads |
08/07/2014 | US20140220864 Polishing apparatus |