Patents for B24B 37 - Lapping machines or devices; Accessories (20,836)
10/2014
10/02/2014WO2014156840A1 Polishing pad and polishing method
10/02/2014WO2014156798A1 Method of manufacturing glass substrate for information recording medium
10/02/2014WO2014156114A1 Method for manufacturing glass substrate for information recording medium
10/02/2014US20140295740 Ultra fine lapping substrate through use of hard coated material on lapping kinematics
10/02/2014US20140295737 Polishing apparatus and wear detection method
09/2014
09/30/2014US8845915 Abrading agent and abrading method
09/30/2014US8845852 Polishing pad and method of producing semiconductor device
09/30/2014US8845398 Chemical mechanical polisher and polishing pad component thereof
09/30/2014US8845396 Polishing apparatus
09/30/2014US8845395 Method and device for the injection of CMP slurry
09/30/2014US8845394 Bellows driven air floatation abrading workholder
09/30/2014US8845391 Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus
09/25/2014WO2014150884A1 Methods of polishing sapphire surfaces
09/25/2014WO2014149676A1 Polishing pad cleaning with vacuum apparatus
09/25/2014WO2014148399A1 Polishing composition, method for producing polishing composition, and kit for preparing polishing composition
09/25/2014WO2014147969A1 Template assembly and method for manufacturing template assembly
09/25/2014US20140287663 Multilayer Polishing Pads Made by the Methods for Centrifugal Casting of Polymer Polish Pads
09/25/2014US20140287662 Retaining ring with attachable segments
09/25/2014US20140287657 Cmp retaining ring with soft retaining ring insert
09/25/2014US20140287656 Method for polishing a semiconductor material wafer
09/25/2014US20140287653 Method of adjusting profile of a polishing member used in a polishing apparatus, and polishing apparatus
09/25/2014US20140283995 Gas nozzle, plasma apparatus using the same, and method for manufacturing gas nozzle
09/23/2014US8842297 Method for measurement of the thickness of any deposit of material on inner wall of a pipeline
09/18/2014WO2014141889A1 Polishing pad and polishing method
09/18/2014WO2014139954A1 Methods for making actinic radiation curable elastomers thick films free from oxygen inhibition during curing
09/18/2014US20140273777 Polishing pad having polishing surface with continuous protrusions having tapered sidewalls
09/18/2014US20140273766 Polishing System with Front Side Pressure Control
09/18/2014US20140273765 Polishing System with Front Side Pressure Control
09/18/2014US20140273764 Lapping carrier having hard and soft properties, and methods
09/18/2014US20140273762 Polishing Pad with Secondary Window Seal
09/18/2014US20140273760 Double-Sided Polishing of Hard Substrate Materials
09/18/2014US20140273756 Substrate precession mechanism for cmp polishing head
09/18/2014US20140273753 Polishing apparatus and polishing method
09/18/2014US20140273752 Pad conditioning process control using laser conditioning
09/18/2014US20140273749 Dynamic residue clearing control with in-situ profile control (ispc)
09/18/2014US20140273748 Single side polishing using shape matching
09/18/2014US20140273746 Cmp polishing pad detector and system
09/18/2014US20140273745 X-ray metrology for control of polishing
09/17/2014EP2779216A1 Polishing composition and polishing method using same, and substrate manufacturing method
09/17/2014EP2777878A1 Polishing composition
09/16/2014US8834234 Double-side polishing apparatus
09/16/2014US8834230 Wafer polishing method and double-side polishing apparatus
09/11/2014US20140256232 Broad Spectrum, Endpoint Detection Window Multilayer Chemical Mechanical Polishing Pad
09/11/2014US20140256231 Multilayer Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Detection Window
09/11/2014US20140256230 Multilayer Chemical Mechanical Polishing Pad
09/11/2014US20140256227 Double-side polishing method
09/11/2014US20140256226 Broad spectrum, endpoint detection window chemical mechanical polishing pad and polishing method
09/11/2014US20140256225 Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Detection Window and Method of Polishing Therewith
09/11/2014DE112012004211T5 Doppelseitiges Polierverfahren Double-sided polishing process
09/11/2014DE102014002844A1 Chemisch-mechanisches Polierkissen mit Breitspektrum-Endpunkterfassungsfenster und Verfahren zum Polieren damit Chemical-mechanical polishing pad having broad-spectrum endpoint detection window and method for polishing so
09/11/2014DE102014002616A1 Chemisch-mechanisches Mehrschicht-Polierkissen mit Breitspektrum-Endpunkterfassungsfenster Chemical mechanical polishing pad with multi-layer broad-spectrum endpoint detection window
09/11/2014DE102014002615A1 Chemisch-mechanisches Mehrschicht-Polierkissen Chemical mechanical polishing pad multilayer
09/09/2014US8831767 Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
09/09/2014US8827771 Polishing composition and polishing method using the same
09/09/2014US8827769 Method of producing substrate for magnetic recording media
09/04/2014WO2014131937A1 A method to provide an abrasive product and abrasive products thereof
09/04/2014WO2014131936A1 A method to provide an abrasive product surface and abrasive products thereof
09/04/2014US20140248823 Composition and method for polishing glass
09/04/2014DE102013202488A1 Verfahren zum Abrichten von Poliertüchern zur gleichzeitig beidseitigen Politur von Halbleiterscheiben A method of dressing of the polishing cloth for simultaneously two-sided polishing of semiconductor wafers
09/04/2014DE102010046551B4 Verfahren zur Herstellung eines Kolbenrings A process for producing a piston ring
09/02/2014US8821746 Fabrication method of semiconductor device and chemical mechanical polishing apparatus
09/02/2014US8821644 Bevel/backside polymer removing method and device, substrate processing apparatus and storage medium
09/02/2014US8821219 Wafer unloading system and wafer processing equipment including the same
09/02/2014US8821215 Polypyrrolidone polishing composition and method
09/02/2014US8821214 Polishing pad with porous elements and method of making and using the same
08/2014
08/28/2014WO2014129708A1 Wafer processing apparatus and method
08/28/2014US20140242894 Polishing pad and method for producing same
08/28/2014US20140242886 Polishing head in chemical mechanical polishing apparatus and chemical mechanical polishing apparatus including the same
08/28/2014US20140242881 Feed forward parameter values for use in theoretically generating spectra
08/28/2014US20140242880 Optical model with polarization direction effects for comparison to measured spectrum
08/28/2014US20140242878 Weighted regression of thickness maps from spectral data
08/28/2014US20140242877 Spectrographic metrology with multiple measurements
08/26/2014US8815110 Composition and method for polishing bulk silicon
08/21/2014WO2014124554A1 Abrasive grain with controlled aspect ratio
08/21/2014US20140235144 Chemical mechanical polishing machine and polishing head assembly
08/21/2014US20140231011 Flattening method and flattening apparatus
08/21/2014DE10392995B4 Verfahren und Vorrichtung zum Polieren Glassubstrats A method and apparatus for polishing the glass substrate
08/20/2014EP2767568A1 Polishing slurry, and polishing method
08/14/2014US20140227951 Conductive chemical mechanical planarization polishing pad
08/14/2014US20140223832 Polyurethane, composition for formation of polishing layers that contains same, pad for chemical mechanical polishing, and chemical mechanical polishing method using same
08/13/2014CN203765445U 用于研磨机的工件台 For workpiece table grinder
08/13/2014CN203765444U 一种晶体抛光夹具 A crystal polishing jig
08/13/2014CN203765443U 一种合成的镀铜研磨机台 A synthetic copper grinding machine
08/13/2014CN203765442U 多样位可编程全自动研磨装置 Diverse bit programmable automatic grinding apparatus
08/13/2014CN203765441U 多卡位自动抛光研磨机 Multi-card bit auto polishing and grinding machines
08/13/2014CN203765440U 一种轴颈在线研磨修复机 One kind of online journal grinding machine repair
08/13/2014CN103987494A 层叠抛光垫的制造方法 The method of manufacturing a laminated polishing pad
08/13/2014CN103978423A 一种陶瓷插芯加工用锡棒浇锡固定机 A ceramic ferrule processing pouring tin tin rods fixed machine
08/13/2014CN103978422A 磁记录介质用玻璃基板的制造方法及磁记录介质用玻璃基板 The method of manufacturing a magnetic recording medium and magnetic recording medium of the glass substrate with a glass substrate
08/13/2014CN103978421A 化学机械抛光终点侦测装置及方法 The chemical mechanical polishing endpoint detection apparatus and method
08/13/2014CN103978420A 一种用于千分尺的示值超差修复装置及其修复方法 An indication micrometer device and fix ultra-poor repair
08/13/2014CN103978419A 一种陶瓷插芯毛刷研磨机密封结构 A ceramic ferrule brush grinding machine sealing structure
08/13/2014CN103978410A 一种陶瓷插芯毛刷研磨机 A ceramic ferrule brush grinding machine
08/13/2014CN103978406A 一种铌酸锂晶体高效超光滑化学机械抛光方法 One kind of lithium niobate super smooth and efficient method for chemical mechanical polishing
08/13/2014CN103978405A 一种工件的镜面保护方法及研磨装置 Mirror protection method and apparatus for grinding a workpiece
08/13/2014CN102554763B 磁记录介质用玻璃基板的制造方法 The method of manufacturing a glass substrate for a magnetic recording medium
08/13/2014CN102513919B 一种基于软质磨料固着磨具的氧化铝陶瓷球研磨方法 Alumina ceramic ball milling method based on soft abrasive fixed abrasive
08/13/2014CN102240962B 化学机械研磨设备的调节器及调节方法 Regulator chemical mechanical polishing apparatus and method for regulating
08/12/2014US8801949 Method of forming open-network polishing pads
08/07/2014US20140220864 Polishing apparatus
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