Patents for B24B 37 - Lapping machines or devices; Accessories (20,836)
11/2013
11/27/2013CN103406830A Constant-temperature pestle
11/27/2013CN103406829A Digital pressure regulating device of optical fiber grinding miller
11/27/2013CN103406828A Vibrating type central hole grinding device and method providing shaft part positioning reference
11/26/2013US8592317 Polishing solution for CMP and polishing method using the polishing solution
11/26/2013US8592314 Polishing composition and polishing method
11/26/2013US8592313 Polishing method and polishing apparatus
11/26/2013US8591288 Method and device for mechanically processing diamond
11/21/2013WO2013172111A1 Polishing composition, polishing method using same, and method for producing substrate
11/21/2013US20130309951 Thin polishing pad with window and molding process
11/21/2013US20130309950 Bore finishing tool
11/21/2013US20130309946 Method for manufacturing magnetic disc substrate
11/21/2013DE112012000575T5 Polierzusammensetzung, Polierverfahren unter Verwendung derselben und Substrat-Herstellungsverfahren Polishing composition, the polishing method using the same and substrate manufacturing method
11/20/2013CN203293039U Silicon block grinding wheel and silicon block grinding machine with same
11/20/2013CN203293005U Soft magnetic ferrite magnetic core bottom surface grinding fixture
11/20/2013CN203293004U Clamp for grinding electrochemistry sample
11/20/2013CN203293003U Disk grinding machine
11/20/2013CN203293002U Curved surface light sweeping machine for lens manufacturing
11/20/2013CN103403123A Polishing composition, polishing method using same, and substrate production method
11/20/2013CN103402706A Polishing pad
11/20/2013CN103402705A Polishing material and polishing composition
11/20/2013CN103400759A Grinding method of indium phosphide-based plane light wave light path waveguide chip and clamp applied to same
11/20/2013CN103396765A Polishing agent and method for polishing substrate using polshing agent
11/20/2013CN103394996A Fixed ring
11/20/2013CN103394995A Rocker arm type grinding device
11/20/2013CN103394994A Method for polishing wafers
11/19/2013US8588956 Apparatus and method for deterministic control of surface figure during full aperture polishing
11/19/2013US8586464 Chemical mechanical polishing slurry composition for polishing phase-change memory device and method for polishing phase-change memory device using the same
11/19/2013US8585468 Retaining ring with shaped surface
11/14/2013US20130303061 Alkaline-Earth Metal Oxide-Polymeric Polishing Pad
11/14/2013DE112012000788T5 Verfahren zum Herstellen eines Siliziumwafers A method for manufacturing a silicon wafer
11/14/2013DE102013008076A1 Bildung eines Erdalkalimetalloxid-Polierkissens Formation of an alkaline earth metal oxide polishing pad
11/14/2013DE102013008061A1 Erdalkalimetalloxid-Polymerpolierkissen Alkaline earth metal-polymer polishing pad
11/13/2013CN203282333U Inner cooling grinding polishing device
11/13/2013CN203282332U Plunger piston grinding clamp
11/13/2013CN203282331U Air floating ultraprecise abrasive processing device
11/13/2013CN203282330U Chemical mechanical lapping device
11/13/2013CN203282329U Grinding device of valve plate of compressor
11/13/2013CN203282328U Polishing device and base plate processing device
11/13/2013CN203282327U Grinding device for machining center holes of shaft parts
11/13/2013CN203282326U Grinding machine tool and oscillation buffer element for grinding machine tool
11/13/2013CN203282325U Hydraulic cylinder grinding device
11/13/2013CN103386655A Forming alkaline-earth metal oxide polishing pad
11/13/2013CN103386649A Finishing disc, grinding pad finishing device and grinding device
11/13/2013CN103386648A Hollow Polymeric-Alkaline Earth Metal Oxide Composite
11/13/2013CN103386647A Device capable of rapidly grinding
11/13/2013CN102159609B Two-pack urethane resin composite for use in an abrasive pad, polyurethane abrasive pad, and method for manufacturing a polyurethane abrasive pad
11/12/2013US8582122 Polishing monitoring method, polishing method, and polishing monitoring apparatus
11/12/2013US8579679 Conditioning method and conditioning apparatus for polishing pad for use in double side polishing device
11/07/2013US20130295826 Polishing pad for endpoint detection and related methods
11/07/2013US20130295821 Abrasive article with replicated microstructured backing and method of using same
11/06/2013EP2660006A2 Device for simultaneously deburring and/or machining the top and bottom surfaces of workpieces
11/06/2013CN203266658U Glass panel fetching device
11/06/2013CN203266390U Seal cover of silicon dioxide wafer grinder
11/06/2013CN203266389U Heterogeneous medium composite grinding locating ring
11/06/2013CN203266388U Wafer grinding magnetic loading and clamping device
11/06/2013CN203266387U Magnetic-loading wafer polishing device
11/06/2013CN203266386U Material bearing rotary disc of grinding machine
11/06/2013CN203266385U Novel mixing magnetic fluid grinding test clamp
11/06/2013CN203266384U Wafer grinding machine
11/06/2013CN203266383U Ball socket grinding machine
11/06/2013CN203266382U Floating disc suspension polishing device
11/06/2013CN203266381U Floating and separating polishing device of main-drive polishing base plate
11/06/2013CN203266380U 防碰撞悬浮抛光装置 Anti-collision device suspended polishing
11/06/2013CN203266379U Suspension polishing device based on permanent magnet rings
11/06/2013CN203266378U Air pressure floating anti-collision suspension basal disc polishing device
11/06/2013CN203266377U Grinder for electrolytic cathode plate conductive contact
11/06/2013CN103382575A A sapphire substrate
11/06/2013CN103381573A Chemical mechanical grinding plate for consolided grinding material used in SiC single crystal wafer grinding process
11/06/2013CN102145475B Ball crusher with double-rotor hydrostatic bearing structure
11/06/2013CN102124545B Chemical mechanical polisher having movable slurry dispensers and method
11/06/2013CN101722447B Device for the double-sided processing of flat workpieces and uses thereof
11/05/2013US8574330 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor device
11/05/2013US8574033 Wafer support member, method for manufacturing the same and wafer polishing unit comprising the same
11/05/2013US8574028 Grinder/polisher
10/2013
10/31/2013WO2013162950A1 Methods and apparatus for pre-chemical mechanical planarization of buffing module
10/31/2013WO2013162856A1 Printed chemical mechanical polishing pad
10/31/2013WO2013161701A1 Method for manufacturing polishing composition
10/31/2013WO2013161591A1 SiC SINGLE CRYSTAL SUBSTRATE
10/31/2013WO2013161049A1 SiC SINGLE CRYSTAL SUBSTRATE
10/31/2013US20130288578 Methods and apparatus for pre-chemical mechanical planarization buffing module
10/31/2013US20130288577 Methods and apparatus for active substrate precession during chemical mechanical polishing
10/31/2013US20130288573 Polishing Composition and Polishing Method Using The Same
10/30/2013EP2656970A2 Abrasive article having multi-directional abrasion protrusion
10/30/2013EP2655014A2 System for magnetorheological finishing of substrates
10/30/2013CN203254267U Silica wafer grinding disc
10/30/2013CN203254266U Silica wafer grinding machine
10/30/2013CN103373809A One-vertical-shaft two-horizontal-shaft rotary-disc type engraving and milling machine
10/30/2013CN103372809A Method for improving silicon block ground surface quality
10/30/2013CN103372808A Deep hole bottom surface grinding tool
10/30/2013CN103372807A CMP (chemical mechanical polishing) method
10/30/2013CN102398211B Grinding device for gate plate of gate valve
10/30/2013CN102191964B Cylinder head for improved fluid flow performance
10/30/2013CN102152233B 抛光垫 Polishing pad
10/30/2013CN101636821B High-density power MOSFET with planarized metalization
10/29/2013US8569148 Final polishing method for silicon single crystal wafer and silicon single crystal wafer
10/29/2013US8568199 Polishing endpoint detection apparatus
10/24/2013WO2013157554A1 Composition for silicon wafer polishing liquid
10/24/2013WO2013157465A1 Polishing composition to be used to polish semiconductor substrate having silicon through electrode structure, and polishing method using polishing composition
10/24/2013WO2013157442A1 Polishing composition
10/24/2013US20130276979 Retaining ring for chemical mechanical polishing
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