Patents
Patents for B08B 3 - Cleaning by methods involving the use or presence of liquid or steam (36,920)
04/2002
04/02/2002US6363952 Cleaning apparatus for paint applicator heads
04/02/2002US6363884 Device for preparing cleaning liquid for a milking device, and a cleaning agent, for example for use in the device
03/2002
03/29/2002CA2357882A1 Device processing apparatus and method having positive pressure with two partitions to minimize leakage
03/28/2002WO2002024025A1 Device for applying an active material to a surface and container containing a single dosage of active material
03/28/2002US20020038400 Electronic device, electronic device system and communication method
03/28/2002US20020037371 Placing substrate in a processing liquid stored in a processing bath; feeding liquid different in specific gravity into the processing bath, thereby forming a first layer; causing relative movement of interface and substrate
03/28/2002US20020036196 Apparatus and method for cleaning the interior of a cooking device
03/28/2002US20020036006 Wet cleaning process and wet cleaning equipment
03/28/2002US20020036005 Method of and appratus for processing substrate
03/28/2002US20020036004 Rotating a substrate in a chamber, spraying a cleaning solution onto the substrate, thereby forming a cleaning gas mist in the chamber, introducing a cleaning gas into the chamber and exhausting mist and cleaing gas from the chamber
03/28/2002US20020036002 Cleaning processing method and cleaning processing apparatus
03/28/2002US20020036001 A container which retains the substrate has an inlet port for introducing a solution into the container in controllable manner and an outlet for discharging the solution, an oxygen water high concentration inlet pipe for feeding oxygen-water
03/28/2002US20020035763 Substrate cleaning tool and substrate cleaning apparatus
03/28/2002US20020035762 Substrate processing apparatus
03/28/2002DE10136613A1 Guiding process for tool or machine for cleaning surfaces involves guiding tool along facade or wall with its weight being relieved by traction cable with spring
03/28/2002DE10043604A1 Fließfähige, amphiphile und nichtionische Oligoester Flowable amphiphilic nonionic and Oligoesters
03/27/2002EP1191575A2 Centrifugal wafer carrier cleaning apparatus
03/27/2002EP1191166A1 Process of cleaning the inner surface of a water-containing vessel
03/27/2002EP1191095A2 Method for cleaning objects
03/27/2002EP1190643A1 Device for applying an active material to a surface and containing a single dosage of active material
03/27/2002EP1189752A1 Surface treatment device
03/27/2002EP1189710A1 High rpm megasonic cleaning
03/27/2002CN1341494A Packing ring cleaning device
03/26/2002US6361617 Method and device for cleaning objects
03/26/2002US6361614 Eliminates light-induced galvanic corrosion in semiconductor wafers and integrated circuit devices during cleaning and drying
03/26/2002US6360964 Pressure washer
03/26/2002US6360756 Wafer rinse tank for metal etching and method for using
03/21/2002WO2001068279A3 Dense fluid cleaning centrifugal phase shifting separation process and apparatus
03/21/2002US20020033550 Method for recycling used-up plastic products and washing process of crushed plastic and apparatus therefor
03/21/2002US20020033186 Processes and apparatus for treating electronic components
03/21/2002US20020033185 Multi-container pressure washer and related product selecting valve
03/21/2002US20020032973 Method of and apparatus for drying a wafer using isopropyl alcohol
03/21/2002US20020032942 Automatic cleansing device for outer wall and window-pane of building
03/21/2002DE10144559A1 Carbon dioxide cleaning of data storage tapes involves directing carbon dioxide by nozzle(s) to point(s) on tape under tension in contact with rigid surface with temperature above dew point
03/21/2002DE10122433A1 Cleaning objects with water involves moving water at high pressure through heated high pressure line to spray nozzle; water is outputted from nozzle almost boiling and sprayed against object
03/21/2002DE10043433A1 Wäßrige 2-K-PUR-Systeme Aqueous 2-component polyurethane systems
03/20/2002EP1188540A2 Method for recycling plastic products and process with apparatus for washing crushed plastic
03/20/2002EP1188177A1 Post-plasma processing wafer cleaning method and system
03/20/2002EP0938745B1 Wafer cleaning system
03/20/2002EP0914216B1 Apparatus for delivery of two chemical products through a brush
03/20/2002EP0886548A4 Method and apparatus for drying and cleaning objects using aerosols
03/20/2002CN2482462Y Crawler type high-pressure water circulating cleaning machine
03/20/2002CN1341276A Method and apparatus for cleaning semiconductor wafer
03/20/2002CN1340848A 湿式处理装置 Wet processing device
03/19/2002US6358329 Resist residue removal apparatus and method
03/19/2002US6358325 Polysilicon-silicon dioxide cleaning process performed in an integrated cleaner with scrubber
03/19/2002US6357474 System and method for shielding an opening of a tube from a liquid
03/19/2002US6357458 Cleaning apparatus and cleaning method
03/19/2002US6357457 Substrate cleaning apparatus and method
03/19/2002US6357142 Method and apparatus for high-pressure wafer processing and drying
03/19/2002US6357139 Washing device for cleaning machines incorporating at least one of said washing device
03/19/2002US6357138 Drying apparatus and method
03/14/2002WO2001094508A3 Cleaning composition and device for electronic equipment
03/14/2002US20020032141 For cleaning plaster, drywall, concrete, linoleum, counter tops, wood, metal, tile, carpets
03/14/2002US20020032140 As cleaning solution for removal of tar, oils, asphalt and other bituminous materials solid surfaces
03/14/2002US20020031983 Electronic component chip feeder and manufacturing method of electronic devices using electronic component chips
03/14/2002US20020031914 Post-plasma processing wafer cleaning method and system
03/14/2002US20020030122 Method and apparatus for generating water sprays, and methods of cleaning using water sprays
03/14/2002US20020029789 A processing container formed so as to surround a processing chamber in which substrates to be cleaned are accommodated, a nozzle for supplying processing liquid, the nozzle having ejecting apertures to eject liquid in the form of a plane
03/14/2002US20020029788 Method and apparatus for wafer cleaning
03/14/2002US20020029787 Hole processing apparatus and method thereof and dynamic pressure bearings cleaning method
03/14/2002US20020029775 Method and device for sanitizing bottled water dispensers
03/14/2002US20020029431 Substrate cleaning apparatus
03/14/2002DE10043320A1 Ultrasonic device for exposing liquid or paste media to ultrasound has ultrasonic oscillator systems on each interconnected sub-surface of emitter plate
03/14/2002DE10041154A1 High-pressure cleaning apparatus has heating unit for heating up hydraulic fluid, housing whose shell is part of the liquid supply and bypass valve for unblocking outlet when operation element is closed
03/14/2002DE10029375A1 Steuerungsvorrichtung für eine Hochdruck-Reinigungsvorrichtung A control apparatus for a high-pressure cleaning device
03/13/2002EP1186307A2 Method and apparatus for processing device with fluid submersion
03/13/2002EP1185604A1 Cleaning compositions
03/12/2002US6355111 Method for removing contaminants from a workpiece using a chemically reactive additive
03/12/2002US6355072 Dry cleaning
03/12/2002US6354313 Apparatus for rinsing and drying semiconductor wafers in a chamber with a movable side wall
03/12/2002US6354312 Connector without occlusion
03/12/2002US6354310 Apparatus and process to clean and strip coatings from hardware
03/07/2002WO2002019390A2 Cleaning of semiconductor process equipment chamber parts using organic solvents
03/07/2002WO2002018531A1 Cleaning aid
03/07/2002WO2002018474A1 Free-flowing, amphiphilic, non-ionic oligoesters
03/07/2002WO2002018061A1 Device at washing apparatus for washing objects, preferably spray guns, with washing liquid, preferably a solvent
03/07/2002WO2001081017A3 System and method for cleaning a screen
03/07/2002WO2001072430A3 Drip manifold for uniform chemical delivery
03/07/2002US20020028585 Containing hydrogen peroxide, chelate compound, hydrogen and fluorine gases
03/07/2002US20020028501 System and method for vent hood cleaning and comprehensive bioremediation of kitchen grease
03/07/2002US20020028288 Long lasting coatings for modifying hard surfaces and processes for applying the same
03/07/2002US20020026976 For cleaning in the manufacturing of semiconductor devices, liquid crystal display panels
03/07/2002US20020026954 Cleaning method and apparatus
03/07/2002US20020026953 Cleaning method of containers and apparatus thereof
03/07/2002US20020026729 Method and apparatus for high-pressure wafer processing and drying
03/07/2002DE10038154A1 System solution for waste water-less paint cleaning by chemical means involves using cleaning process divided into cleaning step with suitable chemical cleaning agents, rinsing step
03/06/2002EP1184171A1 Self-cleaning web-threading apparatus for a web-fed printing press
03/06/2002EP1184091A1 Wet treatment apparatus
03/06/2002EP1183417A1 Cleaning device and method for cleaning, using liquid and/or supercritical gases
03/06/2002EP1183112A1 Label separator for bottle purifying machines
03/06/2002EP1182921A2 Method and apparatus for harvesting crops
03/06/2002EP0785829B1 Warewasher employing infrared burner
03/06/2002CN1339062A Liquid cleaning agent or detergent composition
03/06/2002CN1338771A Method for cleaning semiconductor wafer
03/06/2002CN1080454C Cleaning method and system of semiconductor substrate and production method of cleaning liquid
03/06/2002CN1080147C Cleaning apparatus
03/05/2002US6352470 Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates
03/05/2002US6352084 Substrate treatment device
03/05/2002US6352083 Substrate treating apparatus and substrate treating method