B08B 3 - Cleaning by methods involving the use or presence of liquid or steam

Patents for B08B 3 - Cleaning by methods involving the use or presence of liquid or steam (36,920)
12/2002
12/11/2002	EP1263537A1 Cleaning of surfaces
12/11/2002	EP1263303A1 Car washing brush with means for pressure-lubricating and cleaning the brush bristles from the inside thereof
12/11/2002	CN2524845Y Steam cleaning machine capable of cleaning heating tube without dismantling machine body
12/10/2002	US6492311 Ethyenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process
12/10/2002	US6492284 Reactor for processing a workpiece using sonic energy
12/10/2002	US6491763 Processes for treating electronic components
12/10/2002	US6491762 Method for removal of cured films from cookware and bakeware products
12/10/2002	US6491046 Vertical batch type wafer cleaning apparatus
12/10/2002	US6491045 Apparatus for and method of cleaning object to be processed
12/10/2002	US6491043 Ultra-low particle semiconductor cleaner
12/10/2002	CA2078325C Cavity cleaning apparatus
12/05/2002	WO2002096581A1 An apparatus and a method for cleaning a folding roller
12/05/2002	WO2002054456A3 A rinsing solution and rinsing and drying methods for the prevention of watermark formation on a surface
12/05/2002	US20020183222 Cleaning composition
12/05/2002	US20020183221 Method for removing polymer films in the manufacture of aqueous compositions containing acrylates copolymer
12/05/2002	US20020179732 Substrate cleaning apparatus
12/05/2002	US20020179129 Localized acidic underwater surface cleaning apparatus
12/05/2002	US20020179128 Monitoring of cleaning process
12/05/2002	US20020179124 Ultrasonic implement
12/05/2002	US20020179123 Adjustable pressurized water jets; spray nozzle
12/05/2002	US20020179122 Dual cassette centrifugal processor
12/05/2002	US20020179112 Method of cleaning electronic device
12/05/2002	DE10135743C1 Washing machine used for washing metal strips comprises a housing with an inlet and an outlet, devices for applying cleaning liquid to the metal strip, a squeezing device arranged
12/05/2002	DE10134448A1 Bearbeitungsvorrichtung Processing apparatus
12/04/2002	EP1262306A1 System and method for treating articles like ophthalmic lenses, contact lenses or medical devices with fluids
12/04/2002	EP1262246A2 Device for treating surfaces
12/04/2002	EP1261439A1 Substrate with photocatalytic and/or hydrophilic coating
12/04/2002	EP1261438A1 Well-cleaning system
12/04/2002	CN2523525Y Multifunctional vaccum spindle cleaning devices
12/04/2002	CN2523376Y Cleaner
12/04/2002	CN1383191A High voltage processing appts.
12/03/2002	US6488993 Cleaning moving length of sheet metal using non-solvent based technology to remove surface contaminants that may interfere with the coating adhering to the sheet metal, applying an electron beam curable coating, curing
12/03/2002	US6488779 Semiconductor wafer cleaning
12/03/2002	US6488271 Method to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized
12/03/2002	US6488040 Capillary proximity heads for single wafer cleaning and drying
12/03/2002	US6488039 State of the art constant flow device
12/03/2002	US6488038 Method for cleaning semiconductor substrates
12/03/2002	US6488037 Programmable physical action during integrated circuit wafer cleanup
11/2002
11/28/2002	WO2002095813A2 Differential cleaning for semiconductor wafers with copper circuitry
11/28/2002	WO2002094524A1 A process for the functional regeneration of the porosity of moulds used for moulding ceramic objects
11/28/2002	WO2002094462A1 Method for cleaning surface of substrate
11/28/2002	WO2002094076A1 Self-propelled brushless surface cleaner with reclamation
11/28/2002	US20020177310 Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor device
11/28/2002	US20020177262 Gas assisted method for applying resist stripper and gas-resist stripper combinations
11/28/2002	US20020177220 A first aqueous use dispersion including a protease enzyme; and a second aqueous use dispersion including an acid and a surfactant.
11/28/2002	US20020176982 Coatings for modifying hard surfaces and processes for applying the same
11/28/2002	US20020175122 Method and apparatus for washing polycarbonate/organic solvent solution
11/28/2002	US20020174879 Method for cleaning a semiconductor wafer
11/28/2002	DE10125280A1 Method for producing high pressure fluids for processing takes account of the different pressure and temperature characteristics of the fluids in mixing and applying to dosing jets
11/28/2002	DE10121645A1 Gas-tight coal mechanical handling system has bulkhead doors with gas seal pressure varied in proportion to system internal gas pressure
11/27/2002	EP1260613A2 Method for de-oiling scraps of aluminium materials
11/27/2002	EP1259586A1 Multipurpose, multifunctional complex cleaning and washing agent
11/27/2002	EP1259333A1 Contact lens treatment apparatus and methods
11/27/2002	CN2522187Y Fully automatic washing machine
11/27/2002	CN2522186Y Finished-bearing washing machine
11/27/2002	CN2522185Y Rotary head of bearing washing machine
11/26/2002	US6485576 Method for removing coating bead at wafer flat edge
11/26/2002	US6484635 Variable-width spray applicator for a printing press
11/26/2002	US6484347 Steam cleaner
11/21/2002	WO2002092208A1 Eductor
11/21/2002	US20020173254 Chemical Mechanical polishing apparatus
11/21/2002	US20020173156 Adjustment concentration of ozone dissolved in acid solution; corrosion resistance
11/21/2002	US20020172773 Rinse aid surface coating compositions for modifying dishware surfaces
11/21/2002	US20020170981 Method and apparatus for cleaning a surface
11/21/2002	US20020170978 Paint gun washer
11/21/2002	US20020170585 Spa filter cleaning and rinsing device
11/21/2002	US20020170583 Electric shaver cleaning apparatus
11/21/2002	US20020170579 For cleaning semiconductor wafers, comprising: a chuck for holding a wafer to be cleaned; and a hydraulic broom for automatically sweeping said wafer with solvent fluid.
11/21/2002	US20020170578 Apparatus and process for collecting trace metals from wafers
11/21/2002	US20020170574 Application of different chemistries to the two sides of the wafer
11/21/2002	US20020170573 Spraying a rinsing fluid onto a surface of a microelectronic device in an atmosphere of a gaseous surface tension reducing agent, to rinse away etching agent or oxidizing agent; and drying the device
11/21/2002	US20020170572 Minimize the adhesion of mist in a cleaning tank to realize a high removal effect of residual polishing particles
11/21/2002	US20020170571 Rotary substrate processing apparatus and method
11/21/2002	DE10146289A1 Method for controlling the pressure in a pressurised water cleaning machine has a pressure sensor and microprocessor to switch the electric motor.
11/20/2002	EP1258908A2 Automated spray cleaning apparatus for semiconductor wafers
11/20/2002	EP1107867A4 Removal of thermal barrier coatings
11/20/2002	CN1094338C 手提式蒸汽真空吸尘器 Portable steam vacuum cleaner
11/19/2002	US6482750 Using cleaning fluid that will not corrode silicon or tungsten materials, comprising an ethylene oxide-propylene oxide adduct or polymer, optionally endcapped with alcohols, amines or amino acids, a hydroxide, and organic solvent
11/19/2002	US6481448 Washing and recycling unit for on-site washing of heavy machinery
11/19/2002	US6481350 Self-cleaning web-threading apparatus for a web-fed printing press
11/19/2002	US6481247 Cleaning method and apparatus with dense phase fluid
11/14/2002	WO2002090615A1 Duo-step plasma cleaning of chamber residues
11/14/2002	WO2002090482A1 Method of hydrocarbon impurities removal from surfaces
11/14/2002	WO2002090007A1 Device for cleaning installations
11/14/2002	WO2002089997A1 Quick-release coupling for the lance of a high-pressure cleaning device
11/14/2002	WO2002080233A3 Process and apparatus for removing residues from the microstructure of an object
11/14/2002	US20020168880 Cleaning solid or granular polysilicon with an aqueous solution of dissolved ozone, and then cleaning with hydrofluoric acid to remove organic impurities adsorb on the surface of the polysilicon
11/14/2002	US20020166906 Power washer wand
11/14/2002	US20020166901 Window washer nozzle and molding device for molding the same
11/14/2002	US20020166593 Eductor
11/14/2002	US20020166578 Rotative cleaning and sanitizing device
11/14/2002	US20020166577 Method for cleaning polysilicon
11/14/2002	US20020166572 Placing the wafer in a chemical cleaning tank and cleaning the wafer with a chemical cleaning solution; placing the wafer in a cleansing tank that fills with deionized water; adding a neutralizer in the cleansing tank; removing solution
11/14/2002	US20020166571 Semiconductor wafers are dipped in a cleaning solution tank to which a cleaning solution is fed; ultrasonic waves are fed into the aforementioned cleaning solution for removing particles on semiconductor wafers
11/14/2002	US20020166570 Placing wafer having metal layer into first chemical cleaning equipment unit to clean wafer surface with chemical cleaning solution while protecting metal layer by cathodic protection; rinsing chemical cleaning solution; drying
11/14/2002	US20020166569 Disposing wafer in a chamber to restrain other than rotational wafer movement; striking wafer surface with a fluid to generate a force tangential to the wafer surface of sufficient magnitude to rotate the wafer; cleaning the wafer
11/14/2002	DE10220882A1 Fensterwaschanlagendüse und Formwerkzeug zum Formen derselben Fensterwaschanlagendüse and molding die for molding the same
11/14/2002	DE10215759A1 Reinigungsprozeß für eine Photomaske Cleaning process for a photomask
11/14/2002	DE10123288A1 Ultrasonic device for cleaning or assisting chemical processes in treatment baths, has system for balancing out pressure of transfer medium
11/13/2002	EP1255621A1 Device and method for the precision cleaning of objects

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