Patents
Patents for B08B 3 - Cleaning by methods involving the use or presence of liquid or steam (36,920)
03/2002
03/05/2002US6352082 The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance to accelerate fluid flow of the attached liquid
02/2002
02/28/2002WO2002017355A2 Semiconductor wafer container cleaning apparatus
02/28/2002WO2002016053A1 Method for protecting surfaces of ferromagnetic materials from sediments and for removing said sediments from the surfaces
02/28/2002WO2002016052A1 Device for cleaning repeatedly usable implements
02/28/2002US20020026097 Jet nozzle for washing observation window of endoscopic insertion instrument
02/28/2002US20020023717 System for processing a workpiece
02/28/2002US20020023671 Wet treatment apparatus
02/28/2002US20020023669 Positioning a semiconductor wafer within an enclosed vessel, etching polycrystalline silicon with hydrogen fluoride, filling the vessel with inert nitrogen gas, rinsing the wafer with deionized water, forming anhydrous liquid layer over it
02/28/2002US20020023668 Offer a short cycle of operation, and minimize the amount of time that the wafer is exposed to external air
02/28/2002US20020023667 Apparatus and method for cleaning a probe tip
02/28/2002US20020023663 High pressure gas water forms bubbles on the surface of the wafer to push away particles, and the bubbles repulse the particles and prevent re-adherence; will not etch silicon oxide, tungsten silicide, and photoresist, noncontaminating
02/28/2002US20020023662 Cleaning sorbent materials using pressurized solvents such as liquid propane, dimethyl ether, and supercritical carbon dioxide; allows for recycling of the sorbent materials, the solvent and the contaminents, such as oils and gasoline
02/28/2002US20020023661 Ultrasonic cleaning a substrate such as glass while being carried by a carrier roller by ultrasonic vibration units arranged in two rows in widthwise direction; vibration plate and the vibrator detach easily by removing a bolt
02/28/2002US20020023660 For removing foreign substances adhering to an inner race or an outer race of a rolling bearing using ultrasonic waves and a washing jig; bearings are inclined with respect to the ultrasonic vibration plate
02/28/2002US20020023564 Self-cleaning web-threading apparatus for a web-fed printing press
02/28/2002CA2356169A1 Method and apparatus for processing device with fluid submersion
02/27/2002EP1181989A2 Method for cleaning a solid surface and washing composition for carrying out the method
02/27/2002EP1181112A1 Temperature controlled gassification of deionized water for megasonic cleaning of semiconductor wafers
02/27/2002CN2478699Y Live line water flushing device for high-voltage electrical equipment in traction substation
02/27/2002CN1079988C Method and device for wet-processing substrates in a vessel
02/27/2002CN1079694C Catalyst seal support device for exothermic heterogeneous catalytic synthesis reactor
02/27/2002CN1079691C Dilution dispensing system with product lock-out
02/26/2002US6350727 Non-streaking no-wipe cleaning compositions with improved cleaning capability
02/26/2002US6350322 Method of reducing water spotting and oxide growth on a semiconductor structure
02/26/2002US6350319 Micro-environment reactor for processing a workpiece
02/21/2002WO2002015255A1 System and method for cleaning semiconductor fabrication equipment parts
02/21/2002WO2002013981A1 Method for cleaning ultrapure water supplying system
02/21/2002US20020022445 Substrate cleaning apparatus
02/21/2002US20020020763 Cleaning nozzle and substrate cleaning apparatus
02/21/2002US20020020436 Condensing steam on first surface to form a liquid boundary layer, to heat the surface, ozone diffuses through the boundary layer and reacts with material on the surface, maintaining condensation of steam; cleaning wafers
02/21/2002US20020020432 Method of cleaning a wafer
02/21/2002US20020020431 By providing an active substance with a charge; and providing a voltage to the wafer to attract the active substance to the wafer surface and repulse the mobile ion to the surface, to react the two and form a material separable from the wafer
02/21/2002US20020020430 Reactor for processing a workpiece using sonic energy
02/21/2002DE10118751A1 Method for drying a manufactured object, e.g. a wafer, after the object has been immersed in a cleaning fluid comprises feeding an inert gas and a liquid having a lower surface tension than the cleaning fluid over the cleaning fluid
02/21/2002DE10037082A1 High pressure cleaning device for horizontal flat surfaces has pressure distributor through which by adjustable hydraulic control element or static connecting components the pressure in the different outlet pipes can be set
02/20/2002EP1180346A2 Jet nozzle for washing observation window of endoscopic insertion instrument
02/20/2002CN1079580C Process and apparatus for the treatment of semiconductor wafers in a fluid
02/20/2002CN1079579C Semiconductor substrate cleaning method and semiconductor device fabricating method
02/20/2002CN1079427C Process for washing refillable plastic bottles
02/19/2002US6348157 Semiconductor wet rinsing suppresses formation of surface oxide films, pure water containing ozone, second step uses hf, h2o and a surfactant while applying vibration
02/19/2002US6348101 Degreasing, cleaning and drying of sensitive components, particularly components having complex configurations in computers, aerospace parts and medical devices; contacting with organic solvent and then removing solvent by direct
02/19/2002US6348100 From devices for depositing photoresists on semiconductor substrates; adding acetic acid, ultrasonic energy at a temperature above room temperature to remove the polymer, neutralization with tetramethyl ammonium hydroxide
02/19/2002US6347637 Cleaning method of containers and apparatus thereof
02/14/2002US20020019136 Method of manufacturing optical element
02/14/2002US20020018735 Device for sterilizing a chamber
02/14/2002US20020017316 Endoscope cleaning apparatus
02/14/2002US20020017315 Apparatus for and method of cleaning object to be processed
02/14/2002US20020017314 Parts washing system
02/14/2002US20020017313 Having a movable section e.g. a pump, releasably engageable with the other sections of the line and transported to a cleaning station to be washed; replacement with another clean moveable section; reuse of washings
02/14/2002US20020017237 Apparatus for processing a workpiece
02/14/2002DE10129310A1 Cleaning device has spray pipe with at least one spray head or water outlet hole located and constructed so that at least one jet of water is delivered approximately at right angles to longitudinal axis of spray pipe
02/14/2002DE10066009A1 High pressure cleaning device for horizontal flat surfaces has pressure distributor through which by adjustable hydraulic control element or static connecting components the pressure in the different outlet pipes can be set
02/14/2002DE10036809A1 Product surface cleaning and/or modifying equipment has a treatment chamber fed with solvent by supply lines
02/13/2002EP1179100A1 System and method for vent hood cleaning and comprehensive bioremediation of kitchen grease
02/13/2002EP1178863A1 A method for removing a polymer coating from a carrier part
02/13/2002EP0784585B1 Conveyor belt treatment apparatus
02/13/2002CN2476357Y Automatic washing and separating device
02/12/2002US6346038 Wafer loading/unloading device and method for producing wafers
02/12/2002US6345632 A section of the system is isolated and chemically cleaned, then is immediately passivated using a high concentration of passivating agent.
02/07/2002WO2002010649A1 Device for a ventilation system
02/07/2002WO2002009894A2 Gas-vapor cleaning method and system therefor
02/07/2002WO2001055291B1 Non-streaking no-wipe cleaning compositions
02/07/2002US20020016082 Method and apparatus for liquid-treating and drying a substrate
02/07/2002US20020016067 Method of cleaning porous body, and process for producing porous body, non-porous film or bonded substrate
02/07/2002DE10035246A1 Anlage und Verfahren zum Schmieren, Reinigen und/oder Desinfizieren einer Transporteinrichtung System and method for lubricating, cleaning and / or disinfecting a transport device
02/06/2002EP1177840A2 Container for cleaning whisks and stirring tools by means of freely moving cleaning elements
02/06/2002EP1177048A1 Automatically controlled washer system for headlamps
02/06/2002EP0693977B1 Methods and fluids for removal of contaminants from surfaces
02/06/2002CN1334359A Method and device for making multistage counterflow series water trough work
02/05/2002US6343612 Portable pacifier cleaner and container
02/05/2002US6343609 Impinging the surface of the substrate with the liquid stream to remove the contaminating particles from the substrate surface when the megasonically energized liquefied gas vaporizes upon contact with the substrate surface
02/05/2002US6343389 Water outlets for an ablutionary device or appliance
01/2002
01/31/2002WO2002009161A2 Process for cleaning ceramic articles
01/31/2002WO2002008379A1 Bituminous substance removal composition
01/31/2002WO2002008095A1 Installation and method for lubricating, cleaning, and/or disinfecting a conveyor device
01/31/2002WO2002007892A2 Nozzle device for a high-pressure cleaner
01/31/2002WO2001069131A3 Chamber cleaning mechanism
01/31/2002US20020011259 Filter cleaning device and system
01/31/2002US20020011258 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
01/31/2002US20020011256 Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid.
01/31/2002US20020011255 Method for post chemical-mechanical planarization cleaning of semiconductor wafers
01/31/2002US20020011254 Methods for cleaning microelectronic substrates using ultradilute cleaning liquids
01/31/2002US20020011253 Methods for cleaning microelectronic substrates using ultradilute cleaning liquids
01/31/2002US20020010965 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
01/31/2002DE10052400C1 Cleaner, for motor-driven manual mixers for plaster, mortar, has stand with vertical column, base plate, holder for manual mixer, container, stirrer bar, blades, brushes with bristles
01/30/2002EP1175681A1 Apparatus and method for ultrasonically cleaning irradiated nuclear fuel assemblies
01/30/2002EP1175173A2 Method and device for cleaning extractor hoods
01/30/2002EP1163014A4 Method and device for sanitizing bottled water dispensers
01/30/2002EP1091811A4 Selective treatment of the surface of a microelectronic workpiece
01/30/2002CN2474240Y Vacuum cleaning machine for small opening medicine bottle
01/30/2002CN1333812A Cleaning products which uses sonic or ultrasonic waves
01/30/2002CN1333668A Ultrasonic cleaning device
01/30/2002CN1333557A Weft cleaner
01/30/2002CN1078505C Method for guiding carbon black cleaner
01/29/2002US6342104 Method of cleaning objects to be processed
01/29/2002US6341738 Power washer wand
01/29/2002US6341688 Apparatus and method for denture cleaning and storage
01/29/2002CA2096426C Process and composition for cleaning contaminants with terpene and monobasic ester
01/27/2002CA2353376A1 Pressure washer with duty cycle temperature controller and method
01/24/2002WO2002006431A2 Hollow body with a compartment, containing a portion of a washing, cleaning or rinsing agent