Patents
Patents for B08B 3 - Cleaning by methods involving the use or presence of liquid or steam (36,920)
01/2003
01/02/2003US20030001458 Ultrasound portable tubular transducer
01/02/2003US20030000555 Circuit board-washing device capable of minimizing detergent residue on circuit boards
01/02/2003US20030000554 Method of reducing water spotting and oxide growth on a semiconductor structure
01/02/2003US20030000552 process for removing oil containing machining fluid from machined chips
01/02/2003US20030000548 Semiconductor wafers are cleaned by immersing in cleaning solution of ultra- pure water containing ozone in a first cleaning tank; immersing them cleaning solution of ultra-pure water containing hydrogen, applying ultrasonic waves
01/02/2003US20030000546 Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method
01/02/2003EP1270094A2 Device and method for testing the efficiency of an ultrasonic cleaning apparatus
01/02/2003EP1270093A1 System and process for removing oil containing machining fluid from machined chips
01/02/2003EP1268330A1 Rewinding machine and method for winding up rolls of weblike material on extractable mandrels
01/02/2003EP1268079A2 Drip manifold for uniform chemical delivery
01/02/2003EP1268039A2 Chamber cleaning mechanism
01/02/2003EP1268028A1 Method for flushing particle-bearing filter beds, to sterilise and decontaminate the same
01/02/2003EP1047490B1 Method for generating and circulating a foam in an installation and device for carrying out said method
01/02/2003EP0869077B1 Highly purified plastic film or sheet and method of manufacturing same
01/01/2003CN2528554Y Vapour-water coboiling cleaning machine
01/01/2003CN1097490C Spinning processing apparatus
12/2002
12/31/2002US6500274 Apparatus and method for wet cleaning wafers without ammonia vapor damage
12/31/2002US6499494 Denture cleaner
12/31/2002US6499333 Calibration element for adjustment nozzle
12/31/2002CA2219448C Continuous flat-rolled steel strip cleansing and finishing operations
12/29/2002CA2389960A1 System and process for removing oil containing machining fluid from machined chips
12/27/2002WO2002103254A1 Method and apparatus for changing the temperature of a pressurized fluid
12/27/2002WO2002102527A1 Surface cleaner and retrieval unit
12/27/2002WO2002090615A9 Duo-step plasma cleaning of chamber residues
12/27/2002WO2002087635A9 System and method for cleaning high level disinfection, or sterilization of medical or dental instruments or devices
12/26/2002US20020197853 Substrate cleaning method and method for producing an electronic device
12/26/2002US20020196891 Scale conditioning agents
12/26/2002US20020195200 Gas assisted method for applying resist stripper and gas-resist stripper combinations
12/26/2002US20020195133 Bath system with sonic transducers on vertical and angled walls
12/26/2002US20020195129 Micro-environment chamber and system for rinsing and drying a semiconductor workpiece
12/26/2002US20020195126 Emptying the plant parts, flushing the plant parts with aqueous alkali metal hydroxide solution, if required, washing the plant parts with water and if required, drying; hydrolyzes undesired by-products: polymers and/or oligomers
12/26/2002US20020195120 Device and method for testing the efficiency of an ultrasonic cleaner
12/26/2002US20020194689 Method and apparatus for eliminating wafer breakage during wafer transfer by a vacuum pad
12/25/2002CN2527370Y Disposal cleaning machine before paint-spraying
12/25/2002CN2527369Y Cleaning dust-remover for solar water heater
12/25/2002CN2527368Y Hand-held multifunctional cleaning machine
12/25/2002CN1387235A Method and system for washing semiconductor chip
12/25/2002CN1386590A Hand-held cleaning steam gun
12/25/2002CN1096874C Method for cleaning filtering housings
12/24/2002US6497768 Process for treating a workpiece with hydrofluoric acid and ozone
12/24/2002US6497240 Ultrasound cleaning device and resist-stripping device
12/19/2002WO2002101799A2 Stackable process chambers
12/19/2002WO2002101798A2 Method of applying liquid to a megasonic apparatus for improved cleaning control
12/19/2002WO2002101797A2 Megasonic cleaner and dryer system
12/19/2002WO2002101796A2 Megasonic cleaner and dryer system
12/19/2002WO2002101795A2 Megasonic cleaner and dryer system
12/19/2002WO2002100993A1 Cleaning method for removing starch
12/19/2002WO2002100992A1 Methyl ester-based chewing gum remover
12/19/2002WO2002086223B1 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
12/19/2002US20020193278 For cleaning of hard surfaces including toilet bowls and the like
12/19/2002US20020191970 Method and apparatus for changing the temperature of a pressurized fluid
12/19/2002US20020190608 Indium or tin bonded megasonic transducer systems
12/19/2002US20020190407 System and method for treating articles with fluids
12/19/2002US20020190145 Roof cleaning system
12/19/2002US20020189653 Gun rack for ultrasonic cleaning
12/19/2002US20020189652 Reactor for processing a semiconductor wafer
12/19/2002US20020189649 Label, container comprising said lable and method of washing such a container
12/19/2002US20020189648 Method and apparatus for cleaning electrical probes
12/19/2002US20020189647 Method of cleaning passageways using a mixed phase flow of a gas and a liquid
12/19/2002US20020189646 Devices, systems, and methods for transporting a liquid
12/19/2002US20020189643 Method and apparatus for cleaning/drying hydrophobic wafers
12/19/2002US20020189641 Performing a cleaning by using a two-fluid nozzle for forming mist by mixing a cleaning solution and a pressurized gas
12/19/2002US20020189639 Cleaning water for cleaning a wafer and method of cleaning a wafer
12/19/2002US20020189638 Configurable single substrate wet-dry integrated cluster cleaner
12/19/2002US20020189637 Utilization of an ultrasonic prewetting in a liquid bath preceding cleaning for the electroless plating, thereby enabling all the holes to be degassed, and allowing cleansing solution to easily flow into the respective holes
12/19/2002US20020189635 Ultrasonic cleaning
12/19/2002US20020189634 Cleaning process which uses ultrasonic waves
12/19/2002US20020189633 Contacting a surface to be cleaned with a cleaning formulation, applying ultrasonic energy to the above surface, wherein the cleaning formulation has a surface tension sufficient to minimize entrapment of gas during application
12/19/2002US20020189543 High pressure processing chamber for semiconductor substrate including flow enhancing features
12/19/2002US20020189025 Carpet stain removal product which uses sonic or ultrasonic waves
12/19/2002DE10127919A1 Washing processes, for removing mineral or starch deposits in industrial or domestic dishwashers is effected with both alkaline and acidic stages
12/18/2002CN2525935Y Tableware washing machine
12/18/2002CN1385608A Plane cam for high-pressure plunger type water pump cleaning machine
12/18/2002CN1385252A Pipe dredging device
12/18/2002CN1385251A Method for cleaning deep inner pore canal of zirconium oxide ceramic contact pin
12/18/2002CN1096312C Industrial cleaning facility
12/18/2002CN1096311C Wet processing methods for the manufactur of electronic components using sequential chemical processing
12/18/2002CN1096310C Method and apparatus for sheet products treatment like circuit board
12/17/2002US6495215 Method and apparatus for processing substrate
12/17/2002US6494967 Chemical treating apparatus and flow rate controlling method thereof
12/17/2002US6494964 An apparatus and method for monitoring a cleaning process for a medical device. the apparatus comprises a soil detector. the soil detector is capable of detecting inorganic and/or organic soil on a medical device or in a liquid utilized in a
12/17/2002US6494956 System for processing a workpiece
12/17/2002US6494223 Wet cleaning apparatus utilizing ultra-pure water rinse liquid with hydrogen gas
12/17/2002US6494222 Ultrasonic cleaning apparatus for an endoscope
12/17/2002US6494220 Apparatus for cleaning a substrate such as a semiconductor wafer
12/12/2002WO2002098798A1 Article for deionization of water
12/12/2002US20020185423 Device and method for generating and applying ozonated water
12/12/2002US20020185420 Sprayer and filter therefor
12/12/2002US20020185164 Apparatus for applying cleaning treatment to the surface of a processed member
12/12/2002US20020185163 Reactor for processing a semiconductor wafer
12/12/2002US20020185161 Comprises cylindrical trough and insert with nozzles screwed in for flushing
12/12/2002US20020185160 Method and apparatus for stripping coating
12/12/2002US20020185159 Cleaning system and method
12/12/2002US20020185155 Method of applying liquid to a megasonic apparatus for improved cleaning control
12/12/2002US20020185154 Includes rotatable chuck for supporting substrate and splash guard which deflects fluid flung off from centrifugal force; for cleaning semiconductor wafers
12/12/2002US20020185153 Stackable process chambers
12/12/2002US20020185152 For cleaning semiconductor substrates
12/12/2002US20020185150 Ultrasonic cleaning method
12/12/2002US20020184729 High pressure printing press cleaner
12/12/2002US20020184720 Integrated substrate processing system