Patents
Sitemap › B08 - Cleaning › B08B - Cleaning in general; Prevention of fouling in general › B08B 3 - Cleaning by methods involving the use or presence of liquid or steam
Patents for B08B 3 - Cleaning by methods involving the use or presence of liquid or steam (36,920)
10/2003
10/22/2003CN1125193C Apparatus for cleaning
10/21/2003US6635232 Dissolving ozone gas into acid solution having specified pH and consisting of water and nitric or sulfuric acid, contacting contaminated object with heated ozone solution to oxidatively dissolve oxide film containing radionuclides
10/21/2003US6635118 Aqueous cleaning of polymer apply equipment
10/21/2003US6634372 For cleaning of rotating filter media employed in treatment of fluids such as water, wastewater and industrial process streams
10/21/2003US6634371 Apparatus for removing contaminants from a workpiece using a chemically reactive additive
10/21/2003US6634368 Application of ozonated DI water to scrubbers for resist strip and particle removal processes
10/21/2003US6634192 System and method for flushing a membrane web using a vacuum roller
10/16/2003WO2003085705A1 Transition flow treatment process and apparatus
10/16/2003WO2003084818A1 Method and installation for decontaminating preform necks
10/16/2003WO2003084684A1 In-situ local heating using megasonic transducer resonator
10/16/2003WO2003084576A1 Vacuum ultrasonic cleaning and dezymotizing device
10/16/2003WO2003053204A3 Method for cleaning a soiled article
10/16/2003WO2003018902A3 Method of patterning, installing, renewing and/or recycling carpet tiles
10/16/2003WO2002095813A3 Differential cleaning for semiconductor wafers with copper circuitry
10/16/2003US20030192963 Application apparatus for multiple solution cleaner
10/16/2003US20030192577 Method and apparatus for wafer cleaning
10/16/2003US20030192575 Turbine part mount for supercritical fluid processor
10/16/2003US20030192574 Method of reducing water spotting and oxide growth on a semiconductor structure
10/16/2003US20030192571 Apparatus and method for cleaning a semiconductor wafer
10/16/2003US20030192570 Method and apparatus for wafer cleaning
10/16/2003DE20214179U1 Floor cleaning device to be attached to power washer, comprising lower sealing area assembled of two serrated rubber strips
10/16/2003CA2480785A1 Method and installation for decontaminating preform necks
10/15/2003EP1353136A2 Device for cleaning a helical freezer
10/15/2003EP1352692A1 Fluid injection and recovery device
10/15/2003EP1351893A1 Device and method for generating and applying ozonated water
10/15/2003EP1351782A2 Biological cleaning system
10/15/2003CN1448994A Device for treating substrate
10/14/2003US6632973 Detoxification of solutions of dioxin with oxidation catalysts Introducing a liquid containing dioxins and/or PCBs, and oxygen containing gas to a reactor in which catalyst exists, and conducting wet-oxidation reaction under liquid phase
10/14/2003US6632751 Method and apparatus for liquid-treating and drying a substrate
10/14/2003US6632743 Post-planarization, pre-oxide removal ozone treatment
10/14/2003US6632289 Use of an acid liquid agent in a cleaning cup; remaining acid washed out by use of pure water; alkaline liquid agent emitted to substrate surface to neutralize the acid left on surface
10/14/2003US6632287 Cleaning sample dispensers by injecting cleaning compounds into the bores, then heating to vaporize the fluids and ejecting the remaining liquids; reuse
10/09/2003WO2003082487A1 Ferrule cleaning method
10/09/2003WO2003082486A1 Removal of contaminants using supercritical processing
10/09/2003WO2003010036A3 Mobile self-contained vehicle wash
10/09/2003US20030190870 Cleaning ceramic surfaces
10/09/2003US20030189109 Telescopic spray arm
10/09/2003US20030188770 Cleaning apparatus for semiconductor wafer
10/09/2003US20030188766 Use of high vapor pressure liquid with cryogenic cleaning to aid in removal of foreign materials from semiconductor surfaces
10/09/2003US20030188765 Transition flow treatment process and apparatus
10/09/2003DE20312618U1 Steam cleaner has temperature sensor at outlet of water tank, and connected to microprocessor which regulates power of pump and heater according to detected temperature
10/08/2003EP1351280A2 Method and apparatus for cleaning and drying semiconductor wafers
10/08/2003EP1350143A1 Method and assembly for auditing the operation of a mechanical washing apparatus
10/08/2003EP1349678A1 Method of cleaning a solid surface by removing organic and/or mineral soils using a microemulsion
10/08/2003EP1349454A1 Antimicrobial compositions containing quaternary ammonium compounds, silanes and other disinfectants with furanones
10/08/2003EP0822869B1 Method and apparatus for cleaning hollow elements
10/08/2003CN2578678Y Steaming boiler with temperature inhibiting device for preventing from dry combustion
10/08/2003CN2577987Y Steam cleaner with universal nozzle
10/08/2003CN2577986Y Cleaner attached to centerless grinding machines
10/08/2003CN2577985Y Automatic cleaner for various planar walls
10/08/2003CN2577984Y Monitorible floor cleaner
10/08/2003CN1447395A Substrate processing appts.
10/08/2003CN1447392A Strong sonic wave cleaning equipment for mfg. semiconductor device
10/08/2003CN1123400C High pressure cleaning device with hose drum
10/07/2003US6630035 Cleaning unit for recording rotational drum and cleaning method
10/07/2003US6630033 Method and apparatus for conserving water in a car washing apparatus
10/07/2003US6630031 Apparatus comprising means for generating superheated or saturated steam, means for spraying steam onto surface of substrates, and means for irradiating with ultraviolet rays
10/07/2003US6629540 Wet treatment apparatus
10/02/2003WO2003058686A3 Device and method for the treatment of disk-shaped substrates
10/02/2003US20030185732 With a high yield, permitting substantially complete emptying thereof; full utilisation of their contents.
10/02/2003US20030183250 Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber
10/02/2003US20030183246 An apparatus for cleaning a semiconductor substrate is provided. In embodiment of the present invention, a megasonic cleaner capable of providing localized heating is provided. The megasonic cleaner includes a transducer and a resonator.
10/01/2003EP1348631A1 Method and apparatus for emptying blood plasma containers
10/01/2003EP1347840A1 Method, device and installation for cleaning contaminated parts, with a dense pressurised fluid
10/01/2003EP1146999B1 A method in processing gypsum boards or tiles
10/01/2003CN2576359Y Brush for steam cleaning machine
10/01/2003CN1445825A Device for cleaning single type chips
10/01/2003CN1445625A Processing cassette, regeneration method for processing cassette and regeneration device for processing cassette
09/2003
09/30/2003US6627546 Process for removing contaminant from a surface and composition useful therefor
09/30/2003US6627001 Method for cleaning a semiconductor wafer
09/30/2003US6626374 Dual pump high pressure cleaning apparatus
09/30/2003US6626196 Arrangement and method for degassing small-high aspect ratio drilled holes prior to wet chemical processing
09/30/2003US6626194 Electric shaver cleaning apparatus
09/30/2003US6626193 Machine usable for washing scraps of fibrous material, which have been impregnated with resin
09/30/2003US6626190 Method for automatically cleaning cooking devices
09/30/2003US6626189 Method of processing substrates using pressurized mist generation
09/30/2003US6625844 Modular vacuum system and method
09/25/2003US20030181343 Composition and method for removing photoresist materials from electronic components
09/25/2003US20030180466 Long lasting coatings for modifying hard surfaces and processes for applying the same
09/25/2003US20030180127 Substrate processing system with positioning device and substrate positioning method
09/25/2003US20030178785 Rotary shaft sealing mechanism and liquid processing apparatus
09/25/2003US20030178216 Structure of retaining cut-processed components, method of fabricating cut-processed components, tray for housing cut-processed components, and method of cleaning cut-processed components
09/25/2003US20030178049 Megasonic cleaning apparatus for fabricating semiconductor device
09/25/2003US20030178048 Cleaning equipment for cleaning a moving surface particularly in a paper machine
09/25/2003US20030178047 Comprises isopropyl alcohol/nitrogen gas spouting nozzle; semiconductors
09/25/2003DE20311191U1 Artificial sponge washing assembly directs water jets tangentially at sponge on rotating spindle
09/24/2003EP1346779A2 Device for receiving a workpiece carrier and for supplying a first and a second fluid
09/24/2003EP1346244A1 Automatic fiber preparation unit for splicing
09/24/2003EP1345848A2 Composition comprising an oxidizing and complexing compound
09/24/2003EP0998550B1 n-PROPYL BROMIDE BASED CLEANING SOLVENT AND IONIC RESIDUE REMOVAL PROCESS
09/24/2003CN2574786Y Dust suction cylinder of vacuum cleaner
09/24/2003CN1444256A Method and device for washing base plate
09/23/2003US6624133 Product kits, devices and processes for removing using sonic or ultrasonic waves with ultrasonically enhanced cleaning agents.
09/23/2003US6623859 Water quality improving materials and method for producing the same materials
09/23/2003US6622941 Method and apparatus for cleaning jet pump nozzles
09/23/2003US6622738 Apparatus and system for removing photoresist through the use of hot deionized water bath, water vapor and ozone gas
09/23/2003US6622737 Rinser/dryer housing is rotated by a rotor motor, fluids are distributed across by centrifugal force
09/23/2003US6622335 Drip manifold for uniform chemical delivery
09/23/2003CA2072829C Surface processing jet
09/18/2003WO2003048288A3 Peroxygen compositions and methods for carpet or upholstery cleaning or sanitizing
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