Patents
Patents for B08B 3 - Cleaning by methods involving the use or presence of liquid or steam (36,920)
06/2004
06/30/2004CN2621837Y Multifunctional cleaner for auto window wiper of high building wall
06/30/2004CN2621836Y Overheat steam decomposing furnace
06/30/2004CN1509213A Automatic cleansing sprayer
06/30/2004CN1508841A Method for washing fluoro-gum formed product for semiconductor producing device and formed product to be washed
06/30/2004CN1507957A Rotary wet preparing process and apparatus for crystal circle washing
06/30/2004CN1155472C Cleaning system and process for making same employing highly viscous solvent
06/29/2004US6755871 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
06/29/2004US6754980 For cleaning semiconductor substrates
06/24/2004WO2004052548A1 Nozzle assembly for a high-pressure cleaning device
06/24/2004WO2004052411A1 Workpiece processing system
06/24/2004WO2004032160A3 Methods and systems for processing a substrate using a dynamic liquid meniscus
06/24/2004US20040118947 Activating mechanism for an intercept valve for a spray gun used in water cleaner apapratus
06/24/2004US20040118430 Pressure processing apparatus with improved heating and closure system
06/24/2004US20040118427 Compact, portable; frame holder, ultraviolet radiation lamp; hydrogen peroxide solution; vibration
06/24/2004US20040117940 Vacuum cleaner
06/24/2004US20040117939 Direct drive industrial carpet cleaner
06/24/2004DE10255884A1 Düsenanordnung Nozzle assembly
06/24/2004CA2508981A1 Nozzle assembly for a high-pressure cleaning device
06/23/2004EP1430954A2 An activating mechanism for an intercept valve for a spray gun used in water cleaner apparatus
06/23/2004EP1429875A1 Dense-phase fluid cleaning system utilizing ultrasonic transducers
06/23/2004EP1370374A4 Rotative cleaning and sanitizing device
06/23/2004CN2621091Y Dynamic environmental protection cleaning apparatus
06/23/2004CN1507502A Duo-step plasma cleaning of chamber residues
06/23/2004CN1506171A Horizontal great-flow rate high-pressure cleaning machine for large bearing and bearing box
06/23/2004CN1154770C Nozzle arrangement
06/22/2004US6752692 Cleaning method and polishing apparatus employing such cleaning method
06/22/2004US6752345 Rewinding machine and method for winding up rolls of weblike material on extractable mandrels
06/22/2004US6752192 Label release and separation system
06/22/2004US6751824 Cleaning apparatus for semiconductor wafer
06/17/2004WO2004050256A1 Nozzle arrangement
06/17/2004WO2004049925A1 Device and method for washing and disinfecting endoscope
06/17/2004WO2004049924A1 Apparatus for cleaning/sterilizing endoscope and method for cleaning/sterilizing endoscope
06/17/2004WO2003107396A3 Substrate processing apparatus and related systems and methods
06/17/2004WO2003043751A8 An apparatus and method for cleaning glass substrates using a cool hydrogen flame
06/17/2004US20040116314 Bituminous substance removal composition
06/17/2004US20040115957 Apparatus and method for enhancing wet stripping of photoresist
06/17/2004US20040112869 Cleaning composition
06/17/2004US20040112411 Method and apparatus for cleaning a photoactive and/or hydrophilic surface
06/17/2004US20040112410 Substrate treating apparatus and substrate treating method
06/17/2004US20040112404 Cleaning tank; power sources; intake pipes; contactor membrane; changing concentration of nitrogen gas; semiconductor wafer smoothness aftertreatment
06/17/2004DE202004005386U1 Reinigungsanlage, insbesondere Entzunderungsanlage Cleaning system, especially descaling
06/17/2004DE10255388A1 Beheizter Hochdruckreiniger mit multifunktionalem Zentralrohr Heated high-pressure cleaner with multifunctional central tube
06/16/2004EP1427549A1 Spray beam for a hydraulic descaling facility
06/16/2004EP1200789B1 An ultrasonic cleaning method
06/16/2004EP1177048A4 Automatically controlled washer system for headlamps
06/16/2004EP0954385B1 Fluid delivery apparatus and method
06/16/2004CN2620595Y Washer for surgical equipment
06/16/2004CN1505099A Basic plate processing plant and cleaning method
06/16/2004CN1504556A Washing agent, washing unit and washing process
06/16/2004CN1504274A Washing device
06/16/2004CN1153635C Toothbrush cleaning apparatus
06/16/2004CN1153607C Method and device for cleaning filter
06/15/2004US6750188 Washing
06/15/2004US6750154 Gas assisted method for applying resist stripper and gas-resist stripper combinations
06/15/2004US6749692 Branching a portion of a water flow, which circulates through a rinsing water circuit associated with each of the washer units, off in form of a bypass stream, feeding the stream to a washer unit located upstream of a respective washer unit
06/15/2004US6749691 Methods of cleaning discolored metallic arrays using chemical compositions
06/15/2004US6749183 Production method of electronic parts and water treatment apparatus
06/10/2004WO2004048008A1 Cleaning sheet and method for cleaning substrate processing apparatus
06/10/2004US20040109797 Ozone destructor
06/10/2004US20040107978 Cleaning systems for bearings used in inline skates, quad skates, skateboards and other similar bearings
06/09/2004EP1425459A1 Removal of contaminants from a lipophilic fluid
06/09/2004EP1425376A1 Cleaning composition and method for using the same
06/09/2004EP1425115A1 Supercritical fluid delivery and recovery system for semiconductor wafer processing
06/09/2004DE20306695U1 Storage strap for high pressure cleaning hose consists essentially of a tab with an elongated slit through which a tongue is inserted.
06/09/2004DE202004005160U1 Spray lance for high pressure cleaning device, has nozzle pivotable about axis transverse to main spray direction
06/09/2004CN2619733Y Foaming cleaner
06/09/2004CN2619732Y Improved steam cleaner
06/09/2004CN1153085C Washing or hydrating apparatus and method for device for eyes
06/08/2004US6746544 Simultaneously rinsing and drying a semiconductor substrate by the marongoni drying effect
06/08/2004US6746543 Cleaning bath; drying enclosure; sliding door closure
06/08/2004US6745783 Cleaning processing method and cleaning processing apparatus
06/08/2004US6745782 An oxygen line cleaning device for supplying oxygen uses silicated alkaline cleaner
06/08/2004US6745494 Method and apparatus for processing wafers under pressure
06/03/2004WO2004047152A2 Robotic paint/surface coating removal apparatus
06/03/2004WO2004046713A1 Device movable along body surface
06/03/2004WO2004045739A2 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
06/03/2004US20040105781 Method for flushing particle-bearing filter beds, to sterilize and decontaminate the same
06/03/2004US20040103933 Paint gun washer
06/03/2004US20040103922 Method of high pressure treatment
06/03/2004US20040103919 Single wafer cleaning with ozone
06/03/2004US20040103915 Assisted rinsing in a single wafer cleaning process
06/03/2004US20040103913 Apparatus for washing glass substrates and process for producing a liquid crystal device
06/03/2004DE20301565U1 Fit former for treatment of endoscopes is as underpressure chamber which can fit onto correspondingly formed bottom section designed as trough, the edge of which lies above fluid level, and supports former as shaped cover
06/03/2004CA2506566A1 Robotic paint/surface coating removal apparatus
06/02/2004EP1424143A2 Heated high pressure cleaning device having multifunctional central tube
06/02/2004EP1423496A1 Azeotrope-like compositions and their use
06/02/2004EP1423491A1 Method and composition to decrease iron sulfide deposits in pipe lines
06/02/2004EP1259333A4 Contact lens treatment apparatus and methods
06/02/2004CN1501891A Device and method for generating and applying ozonated water
06/02/2004CN1501742A Portable terminal equipment
06/02/2004CN1501450A Method of manufacturing semiconductor device and apparatus for cleaning substrate
06/02/2004CN1500912A Improved cleaning c omposition
06/02/2004CN1500567A Sudden heating type steam cleaner
06/02/2004CN1500566A 蒸汽清洁器 Steam Cleaner
06/02/2004CN1500565A Steam jet cleaner
06/01/2004US6745108 Robotic paint/surface coating removal apparatus
06/01/2004US6743301 Substrate treatment process and apparatus
06/01/2004US6743300 Parts that require solvent processing can be subjected to multiple processing steps in one containment chamber.
06/01/2004US6743297 For processing a substrate to be processed, such as semiconductor wafer, by using liquid, for example, chemical liquid, pure water, etc.
06/01/2004US6743074 Method and system for manufacturing a photocathode