Patents
Patents for B08B 3 - Cleaning by methods involving the use or presence of liquid or steam (36,920)
03/2004
03/04/2004US20040042788 Washing method and apparatus
03/04/2004US20040040587 Substrate detecting apparatus
03/04/2004US20040040586 Cleaning apparatus and method
03/04/2004US20040040583 Semiconductor wafers; vertical stacked modules; ozone generator
03/04/2004US20040040573 Multi-process system
03/04/2004DE10239243A1 High pressure cleaning device for garden hard surfacing e.g. patios, paths or steps, with recycling of soiled water for reducing use of mains water
03/04/2004DE10056541B4 Verfahren zum Reinigen von Quarzsubstraten unter Verwendung von leitenden Lösungen A method for purifying quartz substrates using conductive solutions
03/03/2004EP1394711A1 Filter control method, and filter controlled by the method
03/03/2004EP1394609A1 Washing method and apparatus
03/03/2004EP1394608A1 Washing method and apparatus
03/03/2004EP1393824A2 Pressure washer with improved mobility
03/03/2004EP1392807A1 Cleaning method for removing starch
03/03/2004EP1084016B1 Machine for the treatment of products made of plastic material of the recyclable type
03/03/2004EP0873199B1 High-pressure cleaning apparatus
03/03/2004CN1479585A Device for monitoring wash process
03/03/2004CN1479072A Sonic scale preventing device and method
03/03/2004CN1478609A Washing method using reversal diaphram eletrolytic water and its device
03/02/2004US6699829 Also containing additive selected from highly fluorinated compound and enhancement agent or mixtures
03/02/2004US6699330 Cleaning with aqueous acetic acid containing ozone
02/2004
02/26/2004WO2004016808A1 Method and apparatus for washing solid substrate with ultrasonic wave after hybridization reaction
02/26/2004WO2004016723A1 Technique on ozone water for use in cleaning semiconductor substrate
02/26/2004WO2002007892A3 Nozzle device for a high-pressure cleaner
02/26/2004US20040035525 Production method for bonded substrates
02/26/2004US20040035451 Ultrasonic cleaner and wet treatment nozzle comprising the same
02/26/2004US20040035449 Wet cleaning facility having bubble-detecting device
02/26/2004US20040035446 Low-pressure cleaning system using high-velocity-high volume air
02/26/2004US20040035443 Method of chemically decontaminating components of radioactive material handling facility and system for carrying out the same
02/26/2004US20040035354 Process for removing contaminant from a surface and composition useful therefor
02/26/2004DE20316317U1 Mercury thermometer cleaning beaker is robust plastic with eddy generation grooves flexible cap, stand and rotating mount
02/26/2004DE10239773B3 Cleaning a semiconductor wafer comprises treating the wafer under megasound with an aqueous solution containing ozone, and treating the wafer with an aqueous solution containing hydrofluoric acid and hydrochloric acid
02/26/2004DE10237527A1 Procedure for loosening of materials from surfaces by fluid impacting action involves feeding of working fluid under pressure to operating head followed by ejection of working fluid through operating head in form of number of fine jets
02/26/2004CA2495643A1 Method and apparatus for washing solid substrate with ultrasonic wave after hybridization reaction
02/25/2004EP1390166A1 An apparatus and a method for cleaning a folding roller
02/25/2004EP1390161A1 Stable liquid or gel bleaching composition containing diacyl peroxide particles
02/25/2004EP1390129A1 Mixing eductor
02/25/2004EP1389939A1 A washing device for a baby bottle
02/25/2004EP1047509B1 Liquid waste disposal and canister flushing system and method
02/25/2004CN1478210A Automatic fiber preparation unit for splicing
02/25/2004CN1139438C Method for cleaning valves or conduits
02/24/2004US6696228 Use of ethylene carbonate and/or propylene carbonate treatment using ozone, for the stripping and removal of resist films
02/24/2004US6695988 Method and apparatus for washing or hydration of ophthalmic devices
02/24/2004US6695925 Immersion in aqueous solution containing 12% hydrogen peroxide (h2o2), sodium and potassium ions; immersing in water tank; immersing in isopropyl alcohol; drying with heated nitrogen gas
02/24/2004US6695914 System for processing a workpiece
02/24/2004US6695235 Foldable power washer
02/24/2004US6694991 Ball/roller bearing cleaning apparatus
02/24/2004US6694804 Method and device for evaluating and/or adjusting the cleaning performance of a cleaning liquid
02/19/2004WO2004014805A1 Improvements relating to water treatment
02/19/2004WO2004014604A1 Post-cmp cleaning of semiconductor wafer surfaces using a combination of aqueous and cryogenic cleaning techniques
02/19/2004WO2004002875A3 Sanitary manifold system and method for hygienically dispensing fluids
02/19/2004WO2003037536A3 A method and system for cleaning work utensils particulary in the food industry
02/19/2004US20040034157 Coating dishes by spraying with mixtures of nanostructure laponite particles, dispersants, surfactants, buffers and wetting agents, then drying to form clear coats; durability; antisoilants
02/19/2004US20040033050 Fiber-optic endface cleaning apparatus and method
02/19/2004US20040031507 Systems and method for automated cart washing
02/19/2004US20040031503 Substrate treatment apparatus and substrate treatment method
02/19/2004US20040031441 High-pressure treatment apparatus and high-pressure treatment method
02/19/2004US20040031168 Method and apparatus for drying substrate
02/19/2004US20040031095 Article washing apparatus
02/19/2004DE20313908U1 Tray cleaning system for fruit sales outlets uses jet-fitted guide element below tray conveyor to spray fluid or compressed air into trays as guide approaches all under computer control.
02/19/2004DE10237061A1 Verfahren zur Reinigung von Apparaten, in welchen(Meth)acrylsäure enthaltende organische Lösungsmittel behandelt und/oder erzeugt wurden Were treated and / or generated process for cleaning apparatus in which (meth) acrylic acid-containing organic solvents
02/18/2004EP1389496A1 Method for cleaning surface of substrate
02/18/2004EP1389495A1 Closing device for the liquid delivery line of a high-pressure cleaning apparatus
02/18/2004EP1389229A1 Method of hydrocarbon impurities removal from surfaces
02/18/2004EP1389156A1 A process for the functional regeneration of the porosity of moulds used for moulding ceramic objects
02/18/2004EP1100630B1 Process and apparatus for treating a workpiece such as a semiconductor wafer
02/18/2004EP0895655B1 Device for treating substrates in a fluid container
02/18/2004CN1475886A Device for changing delivered fluid pressure of spray scrubber
02/18/2004CN1138874C Cleaning device
02/17/2004US6693071 Rinse aid surface coating compositions for modifying dishware surfaces
02/17/2004US6692613 Reactor for processing a semiconductor wafer
02/17/2004US6692579 Vapor phase condensation with a thermally vaporized cleaning agent, a hydrocarbon vaporized by pressure variation, or a combination of the two
02/17/2004US6691720 Multi-process system with pivoting process chamber
02/17/2004US6691719 Adjustable nozzle for wafer bevel cleaning
02/17/2004US6691718 Wafer container cleaning system
02/17/2004US6691578 Measurement systems for ultrasound in a vessel
02/17/2004CA2311261C Method and apparatus for harvesting crops
02/12/2004US20040029764 Hollow body with a compartment, containing a portion of a washing, cleaning or rinsing agent
02/12/2004US20040029752 Single step hospital grade disinfection in solution with a protease, stabilized by an activity protector, not irreversibly denatured; biocidal activity; boron anions, boric acid, sodium tetraborate
02/12/2004US20040029494 Post-CMP cleaning of semiconductor wafer surfaces using a combination of aqueous and CO2 based cryogenic cleaning techniques
02/12/2004US20040028569 Multiple contents container assembly for ultrapure solvent purging
02/12/2004US20040026228 Cleaning of apparatus in which meth(acrylic) acid-containing organic solvents have been treated and/or generated
02/12/2004US20040026213 Cleaning system for a particulate material conveyor
02/12/2004US20040025911 Apparatus for cleaning a semiconductor substrate by vibrating cleaning solution supplied onto the substrate
02/12/2004US20040025904 Methods and compositions for removing group VIII metal-containing materials from surfaces
02/12/2004US20040025901 Stationary wafer spin/spray processor
02/12/2004US20040025483 Device for a ventilation system
02/12/2004DE20314874U1 General-purpose hand-held steam cleaner for domestic purposes has electrical pump transferring water from reservoir to heater
02/12/2004DE19810881B4 Hochdruckreiniger mit abnehmbarem Schubbügel High pressure cleaner with removable push handle
02/12/2004DE10234998A1 Method of cleaning semiconductor substrate, especially silicon wafer, uses sequence giving hydrophobic surface, then cleaning with aqueous solution of organic nitrogen base giving hydrophilic surface and rinsing
02/12/2004DE10234407A1 Spülflüssigkeitsaufbereitungsgerät Rinsing fluid purification
02/12/2004DE10232072A1 Verfahren zur Reinigung eines von einem Gasstrom umströmten Messelementes A method for purifying a gas stream flowed around by a measuring element
02/11/2004EP1328356B1 High-pressure cleaning device
02/11/2004EP0906390B1 Cleaning compositions
02/11/2004EP0772770B2 Determining biodegradability of iminodiacetic acid derivatives, degradable chelants, uses and compositions thereof
02/11/2004CN2602845Y Signal generator for direct cooling type ultrasonic wave cleaner
02/11/2004CN2602844Y Cleaning machine for high storeyed buildings
02/11/2004CN1473665A Full washing machine
02/10/2004US6689730 Garment stain removal product which uses sonic or ultrasonic waves
02/10/2004US6689418 Apparatus for wafer rinse and clean and edge etching
02/10/2004US6689284 Surface treating method
02/10/2004US6688540 Power washer standoff