Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2014
06/12/2014WO2014086767A1 Sliding bearing composite material
06/12/2014WO2014025876A3 Lithium metal oxide materials for electrochromic devices
06/12/2014US20140161987 Implant method and implanter by using a variable aperture
06/12/2014US20140158951 Zn-Si-O-BASED OXIDE SINTERED BODY, METHOD FOR PRODUCING THE SAME, AND TRANSPARENT CONDUCTIVE FILM
06/12/2014US20140158532 High-purity copper-manganese-alloy sputtering target
06/12/2014US20140158531 Sputtering apparatus
06/12/2014US20140158530 Apparatus for sputtering and a method of fabricating a metallization structure
06/12/2014US20140158524 Reactive sputtering method and reactive sputtering apparatus
06/12/2014US20140158523 Adjustable Shunt Assembly For A Sputtering Magnetron And A Method For Adjusting Such A Shunt
06/12/2014US20140158295 Erosion Resistant Wellbore Screen and Associated Methods of Manufacture
06/12/2014US20140158049 Process kit shield for plasma enhanced processing chamber
06/12/2014DE102013206474A1 Sputtering method for locally differentiable vaporization of substrates of transfer mask, involves heating absorbing and evaporation layers to a temperature below melting, evaporation or sublimation temperature of evaporation material
06/12/2014DE102012112064A1 Dämpfer, Kühlkreislauf und Apparatur für eine schwingungsempfindliche Substratbehandlungsapparatur Damper, cooling system and apparatus for vibration-sensitive substrate processing apparatus
06/11/2014EP2740815A1 Method for forming silicon carbide thin film
06/11/2014EP2739764A2 Ion source
06/11/2014EP2739763A2 Rotary cathodes for magnetron sputtering system
06/11/2014EP2739762A1 Target for barium - scandate dispenser cathode
06/11/2014EP2739320A1 Method for sanifying/sterilizing cork stoppers
06/11/2014CN203641407U 真空离子镀膜机多级传动装置 Vacuum ion plating machine multistage gear
06/11/2014CN203639546U 一种镀膜机用磁密封装置 One kind of coating machines with magnetic seal
06/11/2014CN203639545U 一种三片式椭圆栅极 A three-piece oval gate
06/11/2014CN203639544U 射频等离子体裂解Se蒸气装置 RF plasma Se steam cracking unit
06/11/2014CN203639543U 一种硒源蒸发装置 One kind of selenium source evaporation plant
06/11/2014CN203639542U 一种真空蒸镀装置 A vacuum vapor deposition apparatus
06/11/2014CN203639541U 柔性化多功能真空镀膜设备及其智能控制系统 Flexible multi-function vacuum coating equipment and intelligent control systems
06/11/2014CN203639540U 一种仿金属镀膜制品 A humanoid metal coating products
06/11/2014CN203639539U 一种超光滑表面无损垂直装夹夹具 An ultra-smooth surface lossless vertical clamping fixture
06/11/2014CN203639538U 具有阳极壳体的磁控管溅射刻蚀设备 Magnetron sputter etching apparatus having an anode casing
06/11/2014CN103857824A Film forming device and manufacturing method for glass with film
06/11/2014CN103855318A Organic light-emitting device and preparation method thereof
06/11/2014CN103854819A Hybrid film coating method of neodymium iron boron rare earth permanent magnet device
06/11/2014CN103849857A Thin film deposition source, deposition apparatus and deposition method using the same
06/11/2014CN103849851A Roll-to-roll sputtering method
06/11/2014CN103849850A Film thickness monitoring method of optical film and irregular film system optical film thickness instrument
06/11/2014CN103849849A Method of preparing film on body surface
06/11/2014CN103849848A Physical vapor deposition apparatus
06/11/2014CN103849847A Method of preparing diamond-like membrane by film sputtering in SiNx middle layer
06/11/2014CN103849846A Regulating mechanism for magnet
06/11/2014CN103849845A Magnetron sputtering coating production line
06/11/2014CN103849844A Fluorine-doped stannic oxide target for magnetron sputtering and preparation method thereof
06/11/2014CN103849843A Magnetron co-sputtering equipment with five target heads
06/11/2014CN103849842A Sputtering target and conductive metallic oxide thin film
06/11/2014CN103849841A Sputtering apparatus and method
06/11/2014CN103849840A Physical vapor deposition equipment
06/11/2014CN103849839A Aluminum-titanium alloy sputtering target material and production method thereof
06/11/2014CN103849838A Quickly-replaceable glass die of vacuum coating equipment and heating box body
06/11/2014CN103849837A Evaporation source device
06/11/2014CN103849836A Plasma equipment and reaction chamber thereof
06/11/2014CN103849835A Zr-Co-Re thin film getter provided with protection layer, and preparation method thereof
06/11/2014CN103849834A Compound cutting tool coating based on titanium diboride and preparation method thereof
06/11/2014CN103849833A Substrate and mask attachment clamp device
06/11/2014CN103849832A Preparation method of pixelated scintillating material film
06/11/2014CN103847205A Coated cutting tool and manufacturing method thereof
06/11/2014CN102936717B Compact and efficient cold cathode arc source of quasi diffusion arc
06/11/2014CN102936714B Device and method for preparing hard carbide ceramic coating based on composite treatment of large-area high-current pulsed electron beam
06/11/2014CN102787297B Steel and zinc based alloy vacuum ion chromium plating technology capable of substituting current chromium electroplating technologies
06/11/2014CN102747327B Atmospheric pressure evaporation method for anti-fouling film, atmospheric pressure evaporation apparatus and device for manufacturing anti-fouling film
06/11/2014CN102634768B Substrate fixing device for film coating process
06/11/2014CN102634761B Method for magnetic filtration of strip-sectional vacuum cathodic arc plasma
06/11/2014CN102459688B Protective coating, a coated member having a protective coating as well as method for producing a protective coating
06/11/2014CN101798676B Microwave ECR plasma-aid magnetron sputtering deposition device
06/10/2014US8747960 Processes and systems for engineering a silicon-type surface for selective metal deposition to form a metal silicide
06/10/2014US8747633 Tantalum sputtering target and method for manufacturing the same, and method for manufacturing semiconductor element
06/10/2014US8747631 Apparatus and method utilizing a double glow discharge plasma for sputter cleaning
06/10/2014US8747630 Transparent conducting oxides and production thereof
06/10/2014US8747629 TMR device with novel free layer
06/10/2014US8747628 Perpendicular magnetic recording media with oxide-containing exchange coupling layer
06/10/2014US8747627 Method and device for reversing the feeding of sputter coating systems in clean rooms
06/10/2014US8747626 Method of generating high purity bismuth oxide
06/10/2014US8747558 Manufacturing apparatus
06/10/2014US8746169 Mask frame assembly for thin film deposition
06/10/2014DE202008018481U1 Magnetronplasmaanlage Magnetronplasmaanlage
06/06/2014DE202014102370U1 Vakuum-Substratbehandlungsanlage Vacuum substrate treatment plant
06/05/2014WO2014085315A2 High rate deposition systems and processes for forming hermetic barrier layers
06/05/2014WO2014084338A1 Surface-coated cutting tool
06/05/2014WO2014084270A1 Thin-film formation device for organic electroluminescent element, and thin-film formation method
06/05/2014WO2014083965A1 Electrostatic chuck, glass substrate processing method, and said glass substrate
06/05/2014WO2014083909A1 Method for manufacturing zinc oxide-based sputtering target
06/05/2014WO2014083728A1 Sputtering device and substrate treatment device
06/05/2014WO2014083727A1 Sputtering device and substrate treatment device
06/05/2014WO2014083218A1 Method for producing a dielectric and/or barrier layer or multilayer on a substrate, and device for implementing said method
06/05/2014WO2014083028A1 Process of depositing a metallic pattern on a medium
06/05/2014WO2014082746A1 Method for structuring layer surfaces and device therefor
06/05/2014WO2014082554A1 Physical vapor deposition apparatus
06/05/2014US20140154510 Film structure and method for producing same
06/05/2014US20140154424 Roll-to-roll sputtering method
06/05/2014US20140154127 Alloy and Sputtering Target Material for Soft-Magnetic Film Layer in Perpendicular Magnetic Recording Medium, and Method for Producing the Same
06/05/2014US20140153613 Measuring shunt comprising protective frame
06/05/2014US20140151624 Target, method for producing the same, memory, and method for producing the same
06/05/2014US20140150723 Ion implantation apparatus
06/05/2014DE102013208118A1 Arrangement for reactive magnetron sputtering of moving substrate in vacuum continuous coating installation, sets distance ratio of reactive gas channel of racetrack half fitting directly and more distant racetrack half to preset value
06/05/2014DE102013108994A1 Method for setting process gas flow to elongated magnetron, involves determining plasma stoichiometry in each plasma zone segment for each partial process gas flow, and setting flow of process gas portion per sub-process gas flow
06/05/2014DE102012222327B3 Gleitlagerverbundwerkstoff Sliding bearing composite material
06/05/2014DE102012111636A1 Device for thermal treatment of substrates in treatment chamber, comprises transport device for transporting substrates, gas conducting device, and radiation device comprising electrode pair comprising anode, cathode and discharge chamber
06/05/2014DE102012023260A1 Verfahren zur Strukturierung von Schichtoberflächen und Vorrichtung dazu Method for structuring layer surfaces and apparatus therefor
06/05/2014DE102012022113A1 Piezoelektrische Kraftmessvorrichtung mit integrierten Verschleissschutz- und Gleiteigenschaften Piezoelectric force-measuring device with built-wear and sliding properties
06/04/2014EP2738285A1 Titanium target for sputtering
06/04/2014EP2738284A1 Mask frame assembly for thin film deposition
06/04/2014CN203625464U 连续式镀膜机动力引入装置 The introduction of continuous coating machine power unit
06/04/2014CN203625463U 一种真空沉积系统及其旋转馈入装置 A vacuum deposition system and rotary feedthroughs
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