Patents for C11D 7 - Compositions of detergents based essentially on non-surface-active compounds (16,781)
08/2003
08/07/2003US20030148911 Such as benzyl alcohol, which forms single liquid phase upon agitation, and forms two or more laminar liquid phases after application; for stripping floors
08/07/2003US20030148910 Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature
08/07/2003US20030148907 Composition and method for cleaning dishwashers
08/07/2003US20030148906 Such as dibenzoyl peroxide, for automatic dishwashing machines
08/07/2003US20030148903 At least two immiscible liquids having a high interfacial tension, small difference in density; for hand laundry washing, soft furnishing and carpets; dry cleaning
08/07/2003US20030148495 Useful mutations of bacterial alkaline protease
08/07/2003US20030146108 Electrolysis of brine
08/06/2003EP1332202A2 Compositions and methods for mitigating corrosion of applied color designs
08/06/2003EP0906086B1 Skin wash composition
08/06/2003CN1434857A Betengent product
08/05/2003US6602843 Enzyme containing granule
08/05/2003CA2231617C A crystalline calcium carbonate builder encapsulated with a hydrotrope for use in detergent compositions
07/2003
07/31/2003WO2003062360A1 Improved solubility aids for use in detergent compositions
07/31/2003WO2003062294A1 Polyurethane coating compositions
07/31/2003WO2003061550A2 Novel catalytic activities of oxidoreductases for oxidation and/or bleaching
07/31/2003US20030144166 Bleach activator cogranulates
07/31/2003US20030144162 Composition and method for removing copper-compatible resist
07/31/2003US20030143495 For removing photoresist residues after dry etching without attacking the wiring material or the interlayer insulating film
07/31/2003US20030141202 Alkaline electrolyte solution; circulation; decomposition oxidation; water treatment by electrolysis; water pollution control
07/31/2003US20030140426 Using organosilicon solovents
07/31/2003CA2514475A1 Novel catalytic activities of oxidoreductases for oxidation and/or bleaching
07/31/2003CA2473795A1 Polyurethane coating compositions
07/30/2003EP1331212A1 Agent for removing and preventing of depositions on mineral surfaces
07/30/2003CN1433567A Post chemical-mechanical planarization (CMP) cleaning composition
07/30/2003CN1433492A Home laundry method
07/30/2003CN1433491A Domestic fabric article refreshment in integrated cleaning and treatment processes
07/30/2003CN1433461A Fabric care compositions systems for delivering clean, fresh scent in lipophilic fluid treatment process
07/30/2003CN1433335A Process for treating lipophilic fluid
07/30/2003CN1432640A Water-free bacteriostatic hand-washing agent
07/30/2003CN1432639A 洗涤溶剂和涂布器 Washing solvent and applicator
07/30/2003CN1432638A Water-containing detergent composition for low-pressure foam generator
07/30/2003CN1432637A Water-containing detergent composition for the bottom of injection system
07/29/2003US6599370 For stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants
07/24/2003WO2003060052A1 Process for cleaning filters
07/24/2003WO2003060051A1 Fabric rinse compositions
07/24/2003WO2003060049A2 Alkylglycol alkoxylates or alkyldiglycol alkoxylates, mixtures thereof with tensides and their use
07/24/2003WO2003060045A1 Aqueous stripping and cleaning composition
07/24/2003WO2003059539A2 Countermeasure washdown system cleaning
07/24/2003US20030139308 Using sorbic acid, or salt thereof
07/24/2003US20030139046 Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor device
07/24/2003US20030139045 Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device
07/24/2003US20030138737 Photoresist stripping solution and a method of stripping photoresists using the same
07/24/2003CA2472966A1 Alkylglycol alkoxylates or alkyldiglycol alkoxylates, mixtures thereof with tensides and their use
07/23/2003EP1329498A1 Process for cleaning filters
07/23/2003EP1328614A1 Catalase as an oxidative stabilizer in solid particles and granules
07/23/2003EP0958068B1 Novel cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
07/23/2003CN1432060A Cleaning agent, cleaning method and cleaning appts.
07/22/2003US6596677 Propylene carbonate based cleaning compositions
07/22/2003US6596676 Protective composition and method for ovens
07/22/2003US6596647 Dilute cleaning composition and method for using the same
07/22/2003US6596092 Non-detergent washing using electrolyzed water as disinfectant detergent, softening a solution of alkali metal ion and carbonate and/or bicarbonate ion to precipitate magnesium or calcium carbonate and calcium bicarbonate
07/17/2003WO2003058350A1 A cleaning agent composition for a positive or a negative photoresist
07/17/2003WO2003057811A1 Supercritical fluid cleaning of semiconductor substrates
07/17/2003WO2003057642A1 Processes for cleaning semiconductor equipment parts
07/17/2003WO2003057377A1 Method for cleaning an article
07/17/2003WO2002083082A3 Composition and method for destruction of infectious prion proteins
07/17/2003US20030134768 Cleaning solvent and dispenser
07/17/2003US20030134767 A liquid cleaning solvent is formulated from a terpene hydrocarbon present in a concentration of about 50 percent to about 80 percent of the cleaning solvent and tetrahydrofuran compatible with the terpene hydrocarbon present in a
07/17/2003US20030134763 Composition for engine cleaning
07/17/2003US20030133905 Composition for treating contact lenses in the eye
07/17/2003US20030133827 Method to remove iron sulfide deposits from pipe lines
07/17/2003US20030132423 Synergistic combination of five solvents which rapidly loosens, dissolves and removes both dried and wet cyanoacrylate glues from most surfaces; safe for human skin
07/17/2003CA2472478A1 Method for cleaning an article
07/16/2003EP1327675A1 Cleaning solvent and dispenser
07/16/2003EP1327674A1 Detergent concentrate and method for cleaning surgical instruments
07/16/2003EP1326951A1 Stabilized alkaline compositions for cleaning microelectronic substrates
07/16/2003CN1430689A Method for use of aqueous vapor and lipophilic fluid during fabric cleaning
07/16/2003CN1114686C Stable solid block metal protecting warewashing detergent composition
07/16/2003CN1114566C Methods for treating semiconductor wafers
07/15/2003US6593283 Comprising a diluting solvent, a microbiacidally-active solvent having a density different from the density of the diluting solvent; a 1-log order reduction in spores and/or bacteria of Bacillus cereus; concentrates; surgery; food
07/15/2003US6593282 Cleaning solutions for semiconductor substrates after polishing of copper film
07/15/2003US6592677 Method of forming a semiconductor device by simultaneously cleaning both sides of a wafer using different cleaning solutions
07/15/2003US6592676 Chemical solution and method for reducing the metal contamination on the surface of a semiconductor substrate
07/11/2003CA2413270A1 Cleaning solvent and dispenser
07/10/2003US20030130153 Hard surface cleaning composition comprising a solvent system
07/10/2003US20030130151 Polycarboxylic acid containing three-in-one dishwashing composition
07/10/2003US20030130149 Sulfoxide pyrolid(in)one alkanolamine cleaner composition
07/10/2003US20030130148 Aqueous solution containing surfactant; exposure photoresist pattern to development; removal residues
07/10/2003US20030130147 Stripping composition
07/10/2003US20030130146 Aqueous stripping and cleaning composition
07/10/2003US20030127115 Contacting a printed circuit board or silicon wafer with supercritical 1,1,1,3,3-pentafluoropropane fluid
07/10/2003US20030127111 Cleaning composition and method for using the same
07/10/2003US20030126689 Whitening cellulosic fabric, e.g., cotton, by contacting the fabric with hydrogen peroxide in an alkaline solution also containing a bleach stabilizer, carriers and adjuvants; heating and rinsing with water; removing residue
07/09/2003EP1325101A1 A detergent composition and method for warewashing
07/09/2003EP0909311B1 Post clean treatment
07/09/2003CN1428659A Stripping liquid for photoresist and photoresist stripping method using said stripping liguid
07/09/2003CN1113956C Rinsing composition
07/09/2003CN1113848C Method for cleaning equipment components
07/09/2003CN1113838C Improved method to defoul bisphenol-phenol adduct fouled crystallizer coolers
07/08/2003US6589439 Hydroxylammonium salt
07/08/2003US6589355 1,1,1,3,3-pentafluoropropane as a supercritical fluid; printed circuit board
07/03/2003WO2003054281A1 Treatment of fabric articles with specific fabric care actives
07/03/2003WO2003054279A2 Treatment of fabric articles
07/03/2003WO2003054127A2 Subtilisin variants with improved characteristics
07/03/2003WO2003053602A1 Copper polishing cleaning solution
07/03/2003WO2003053480A1 Composition for treating contact lenses in the eye
07/03/2003WO2003053479A2 Composition for treating contact lenses
07/03/2003US20030125225 Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The formulations utilize a supercritical
07/03/2003US20030125221 Method and composition for cleaning and disinfecting contact lenses
07/03/2003CA2473935A1 Composition for treating contact lenses
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