Patents
Sitemap › C11 - Animal or vegetable oils, fats, fatty substances or waxes; Fatty acids therefrom; Detergents; Candles › C11D - Detergent compositions; Use of single substances as detergents; Soap or soap-making; Resin soaps; Recovery of glycerol › C11D 7 - Compositions of detergents based essentially on non-surface-active compounds
Patents for C11D 7 - Compositions of detergents based essentially on non-surface-active compounds (16,781)
11/2003
11/06/2003US20030205241 An organic acid ammonium (NH4) salt added to a mixed solution of ammonium hydroxide, hydrogen peroxide and water.
11/05/2003EP1358670A2 Process and apparatus for removing residues from the microstructure of an object
11/05/2003CN1454334A Photoresist remover composition comprising ammonium fluoride
11/05/2003CN1453350A Scavenger specially for lane in expressway toll gate
11/05/2003CN1453349A Body surface scavenger
11/05/2003CN1127121C Detergent for producing process of semiconductor device or liquid crystal device
11/05/2003CN1126749C Granular N-alkyl ammonium acetonitrile composition
10/2003
10/30/2003WO2002070612A8 System and method for cleaning and/or treating vehicle surfaces
10/30/2003US20030204048 Method for purifying a thermoplastic norbornene resin, a substrate using such a resin, and a magnetic recording medium using such a substrate
10/30/2003US20030203827 Method of simultaneously cleaning and disinfecting industrial water systems
10/30/2003US20030200997 Forming chlorine dioxide in situ using alakli halites or halates; killing microorganisms
10/29/2003EP1355992A1 System and method for cleaning and/or treating vehicle surfaces
10/29/2003CN1452019A Corrosion inhibitor stripper composition using conductive material with high equivalent electric conductivity in aqueous bolution
10/29/2003CN1451733A Cleaning solvent and applicator
10/29/2003CN1451683A Solvent composition for dissolving plastics
10/28/2003US6638365 Method for obtaining clean silicon surfaces for semiconductor manufacturing
10/28/2003US6637671 By using a non-pressurized spray bottle comprising a reduced volume sprayer and a removal resistant neck closure; lower risk is also obtained by addition of a thixotropic thickener such as Versagel"; furniture oil, baby oil for example
10/23/2003WO2003087284A1 Composition comprising a mixture of alkyl mono and polylactyllactate
10/23/2003WO2003086442A2 Ophthalmic, pharmaceutical and other healthcare preparations with naturally occuring plant compounds, extracts and derivatives
10/23/2003WO2003053479A3 Composition for treating contact lenses
10/23/2003WO2001094679A8 Process for treating a lipophilic fluid
10/23/2003US20030199407 Composition of a resist stripper using electrolytic material with high equivalent conductivity in an aqueous solution
10/23/2003US20030199406 A cleaning composition composed of a non-chelating organic acid, salt or ester thereof, and a chelating organic acid, salt or ester thereof that may be used to clean residue and scum from a substrate. The cleaning composition is suitable
10/22/2003EP1354985A1 Composition for cleaning cooling installations, process and apparatus using this composition
10/22/2003EP1354937A1 Cleaning solvent and dispenser
10/22/2003EP1354549A2 Cleaning agent dosing device for dishwashers
10/22/2003EP1354019A2 Azeotrope-like composition of 1,2-dichloro-3,3,3-trifluoropropene and hydrogen fluoride
10/22/2003EP1353709A1 Lens care product containing dexpanthenol
10/22/2003CN1450939A Cleaning processes using hydrofluorocarbon and/or hydrochlorofluorocarbon compounds
10/22/2003CN1450156A Detergent composition for cleaning precision parts
10/22/2003CN1450155A Pressure-sensitive adhesive trace cleaning agent
10/22/2003CN1125167C Cleaner for removing residual organophosphorus in agricultural chemical from vegetables and its cleaning process
10/22/2003CN1125142C Cleansing thermoplastic resin composition
10/21/2003US6635686 Refrigerants, aerosol propellants
10/21/2003US6635612 Process for delivering chelant agglomerate into detergent composition for improving its storage stability, flowability and scoopability
10/21/2003US6635562 Methods and solutions for cleaning polished aluminum-containing layers
10/21/2003US6634371 Apparatus for removing contaminants from a workpiece using a chemically reactive additive
10/21/2003US6634369 Process to clean polymeric article, such as polyurethane glove, so as to remove non-volatile residues and low-volatility residues
10/21/2003CA2077910C Azeotropic composition of 1,1,1,2-tetrafluoroethane and dimethyl ether
10/17/2003CA2425431A1 Product for cleaning refrigeration facilities, process and implementing device
10/16/2003WO2002098549A3 Compositions of alkanolamine salts of alkyl phosphate esters
10/16/2003WO2002008370A3 Cleaning composition
10/16/2003US20030192572 Hydrogen peroxide is used to remove residues from glass surfaces; asphalt removal enhanced by heating
10/15/2003EP1351782A2 Biological cleaning system
10/15/2003EP0837913B1 Cleaning composition
10/15/2003CN1124335C Water-free car-cleaning agent and preparation method thereof
10/14/2003CA2263279C Bleaching agent compositions
10/14/2003CA2087199C Method and compositions for removing deposits from cooling water systems
10/09/2003WO2003083920A1 Tantalum barrier removal solution
10/09/2003WO2003083582A1 Ph buffered compositions for cleaning semiconductor substrates
10/09/2003WO2003083028A2 Cleaning and desinfecting herbal compositions and their preparation
10/09/2003WO2003083020A2 Method of operating internal combustion engine by introducing detergent into combustion chamber
10/09/2003US20030191037 Detergent composition for cleaning precision parts
10/09/2003US20030190816 Method for post-CMP conversion of a hydrophobic surface of a low-k dielectric layer to a hydrophilic surface
10/09/2003CA2480644A1 Method of operating internal combustion engine by introducing detergent into combustion chamber
10/08/2003EP1349972A1 Azeotrope mixtures with perfluorobutylethylene
10/08/2003EP1349969A1 Semiconductor stripping composition containing 1,3-dicarbonyl compounds
10/08/2003EP1349678A1 Method of cleaning a solid surface by removing organic and/or mineral soils using a microemulsion
10/08/2003CN1447853A Enzxyme compsns. in tablet form
10/08/2003CN1447852A Method of making compsn., product from such method, and use thereof in removing or dissolving contaminant from environment
10/08/2003CN1446893A Environmental protection washing power made from concavo-convex rhabdolith of nano meerschaum
10/07/2003US6630074 Etching composition and use thereof
10/02/2003WO2003080788A2 Composition containing organopolysiloxanes, method for the production thereof and use of the same
10/02/2003WO2003079794A1 Use of olive tree extracts in detergents, rinsing agents and cleaning agents
10/02/2003WO2003035814A3 Improved post plasma ashing wafer cleaning formulation
10/02/2003US20030186378 Useful mutations of bacterial alkaline protease
10/01/2003EP1347740A1 Fragrance compositions
10/01/2003CN1446255A Clean room wipes for neutrilizing caustic chemicals
10/01/2003CN1446254A 生物降解醚干洗溶剂 Biodegradable ether dry cleaning solvent
10/01/2003CN1445352A Cleaning agent for electronics equipments
09/2003
09/30/2003US6627594 Peroxy-carboxylic acid and aqueous compositions thereof
09/30/2003US6627593 A high concentration monoester peroxy dicarboxylic acid composition comprising: 6 wt-% monoester peroxy dicarboxylic acid; about 10 wt-% diester dicarboxylate; anionic surfactant, amine oxide surfactant, or a mixture thereof; hydrogen
09/30/2003US6627588 Liquid cleaning composition and method for removal of photoresist including an aliphatic alcohol. Preferably, the alcohol is isopropyl alcohol. Additionally, an alcohol/base mixture can be used to remove photoresist, rather than alcohol
09/30/2003US6627587 Mixture of alkanolamine, tetraalktlammonium hydroxide, fluoride compound and corrosion inhbitor
09/30/2003US6627546 Process for removing contaminant from a surface and composition useful therefor
09/30/2003US6627001 Method for cleaning a semiconductor wafer
09/30/2003CA2130353C Solvent mixtures having enhanced evaporation
09/25/2003WO2003078559A1 Cleaning formulation and method of cleaning surfaces
09/25/2003WO2003078539A1 Compositions of pentafluoropropane
09/25/2003WO2003078082A1 Liquid waste absorbing compositions
09/25/2003WO2003078039A1 P/o emulsions comprising aminofunctional polyols
09/25/2003WO2003077849A2 Biosolvent composition of lactate ester and d-limonene with improved cleaning and solvating properties
09/25/2003US20030181350 Cleaning agent, a particulate clay material and an aqueous carrier. In a preferred embodiment, the formulation has a pH less than about 1.0 and is characterized by: (i) at least a 90% reduction in viscosity at 25 degrees C., acid stability,
09/25/2003US20030181345 Tantalum barrier removal solution
09/25/2003US20030181344 The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1: wherein R1 to R3 are as defined in the specification. Of the oxymethylamine
09/25/2003US20030181343 Composition and method for removing photoresist materials from electronic components
09/25/2003US20030181342 A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation comprising a buffering system a polar organic
09/25/2003CA2479503A1 Cleaning formulation and method of cleaning surfaces
09/25/2003CA2479087A1 Liquid waste absorbing compositions
09/25/2003CA2478776A1 P/o emulsions comprising aminofunctional polyols
09/24/2003EP1347039A1 Process for Cleaning Dishes
09/24/2003EP1346056A1 Methods for the production of multimeric proteins, and related compositions
09/24/2003EP0998550B1 n-PROPYL BROMIDE BASED CLEANING SOLVENT AND IONIC RESIDUE REMOVAL PROCESS
09/24/2003CN1444103A Optical photoresist stripping composition and cleaning composition
09/24/2003CN1443838A Leguminous plant cleaning powder
09/23/2003US6624128 An aqueous water miscible composition composed of carboxylic acid diesters and a fatty acid salt. The fatty acid salt may be represented by the formula: R1COO-X+ (I) carboxylic acid diester may be represented by the formula: ROOC(CH2)nCOOR'
09/23/2003US6624127 Highly polar cleans for removal of residues from semiconductor structures
09/23/2003US6623859 Water quality improving materials and method for producing the same materials
09/23/2003US6622736 With P2O5
09/18/2003US20030176307 For use in home laundering; fabric cleaning
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