| Patents for C11D 7 - Compositions of detergents based essentially on non-surface-active compounds (16,781) |
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| 03/16/2004 | US6706076 Using a cyclosiloxane compound |
| 03/16/2004 | CA2287967C Acidic limescale removal compositions |
| 03/16/2004 | CA2097017C Non-chlorinated cleaner-drier |
| 03/11/2004 | WO2004020568A1 Solvent composition |
| 03/11/2004 | WO2004020567A1 Solvent compositions |
| 03/11/2004 | WO2004020376A1 Halogenated alcohol and process for producing the same |
| 03/11/2004 | WO2003103726A3 Denaturing of a biochemical agent using an activated cleaning fluid mist |
| 03/11/2004 | US20040048761 Cleaning composition |
| 03/11/2004 | US20040045588 Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide |
| 03/11/2004 | US20040045580 Cleaning method of silicon wafer for obtaining a silicon wafer in which micro roughness thereof under spatial frequency of 20/ mu m is 0.3 to 1.5 nm3 in terms of power spectrum density, by passing a process of oxidizing the silicon wafer with |
| 03/11/2004 | US20040045574 Semiconductor fabrication equipment parts includes determining a definition for a clean part including multiple maximum acceptable impurity levels; determining an initial multiple impurity levels of a part prior to its cleaning process and |
| 03/11/2004 | CA2440530A1 Coating removal compositions |
| 03/10/2004 | EP1396557A1 Metal cleaning composition and process |
| 03/10/2004 | EP1395521A1 Article for deionization of water |
| 03/10/2004 | EP1395357A2 Compositions of alkanolamine salts of alkyl phosphate esters |
| 03/10/2004 | EP1232114B1 Segmented process for cleaning-in-place |
| 03/10/2004 | EP1230200B1 C13 alcohol mixture and functionalised c13 alcohol mixture |
| 03/10/2004 | CN1481299A Detergent |
| 03/10/2004 | CN1480520A Cleanser for sanitary towel |
| 03/10/2004 | CN1141736C Composition for removing sidewall and method of removing sidewall |
| 03/09/2004 | US6701843 Gentle cleaning using a water emulsion of an alcohol and cyclic hydrocarbon having at least one double bond with phosphoric acid, a phosphate salt, or a polyvinylphosphonic acid |
| 03/04/2004 | WO2004019134A1 Removing solution |
| 03/04/2004 | WO2004018611A1 Liquid gel automatic dishwashing detergent composition comprising anhydrous solvent |
| 03/04/2004 | WO2003054279A3 Treatment of fabric articles |
| 03/04/2004 | WO2003054127A3 Subtilisin variants with improved characteristics |
| 03/04/2004 | DE10056541B4 Verfahren zum Reinigen von Quarzsubstraten unter Verwendung von leitenden Lösungen A method for purifying quartz substrates using conductive solutions |
| 03/04/2004 | CA2496227A1 Liquid gel automatic dishwashing detergent composition comprising anhydrous solvent |
| 03/03/2004 | EP1394245A1 Allergen removing agent |
| 03/03/2004 | EP1392812A2 Cleaning product |
| 03/03/2004 | EP1392807A1 Cleaning method for removing starch |
| 03/03/2004 | CN1479784A Method of laundering clothes and detergent composition thereof |
| 03/03/2004 | CN1479780A Method for cleaning etcher parts |
| 03/03/2004 | CN1140661C Boidegradable dry cleaning solvent |
| 03/03/2004 | CN1140260C Aqueous cleansing composition |
| 03/02/2004 | US6699829 Also containing additive selected from highly fluorinated compound and enhancement agent or mixtures |
| 03/02/2004 | US6699825 Acidic hard-surface antimicrobial cleaner |
| 03/02/2004 | US6699330 Cleaning with aqueous acetic acid containing ozone |
| 02/26/2004 | WO2004016827A1 Remover solution |
| 02/26/2004 | WO2004016723A1 Technique on ozone water for use in cleaning semiconductor substrate |
| 02/26/2004 | US20040038840 Useful for stripping photoresists and cleaning organic and inorganic compounds from a semiconductor substrate |
| 02/26/2004 | US20040038839 Organic stripping composition and method of etching oxide using the same |
| 02/26/2004 | US20040035354 Process for removing contaminant from a surface and composition useful therefor |
| 02/26/2004 | US20040034938 Method for treating textile fibre materials or leather |
| 02/26/2004 | DE10239773B3 Cleaning a semiconductor wafer comprises treating the wafer under megasound with an aqueous solution containing ozone, and treating the wafer with an aqueous solution containing hydrofluoric acid and hydrochloric acid |
| 02/26/2004 | DE10236918A1 Production of alkyl phenyl carbinol for use in perfumery involves hydrogenation of alkyl phenyl ketone in presence of a nickel catalyst and a basic additive |
| 02/26/2004 | DE10202167B4 Verwendung eines Mittels zur Beseitigung und Verhinderung von Ablagerungen auf mineralischen Oberflächen Using a means of eliminating and preventing deposits on mineral surfaces |
| 02/25/2004 | EP1391501A2 Stabilised liquid compositions containing active chlorine |
| 02/25/2004 | EP1391468A1 Resin cleaning method |
| 02/25/2004 | EP1390161A1 Stable liquid or gel bleaching composition containing diacyl peroxide particles |
| 02/24/2004 | US6696228 Use of ethylene carbonate and/or propylene carbonate treatment using ozone, for the stripping and removal of resist films |
| 02/24/2004 | US6696068 Cosmetic cream cleanser |
| 02/24/2004 | US6694881 Direct-to-plate lithographic printing method using automatic plate-coating and cleaning |
| 02/24/2004 | CA2305750C Stable solution of zinc and bicarbonate ions |
| 02/19/2004 | WO2004014443A2 Rinsing solution for contact lenses |
| 02/19/2004 | WO2003104900A3 Microelectronic cleaning compositions containing oxidizers and organic solvents |
| 02/19/2004 | US20040033930 Containing water-soluble permanganate which is provided for initiating oxidation of organic substances, an agent for securing an alkaline environment with a pH value of 10-12, used in combination with further oxidant |
| 02/19/2004 | US20040033923 Method of making a composition, a product from such method, and the use thereof in removing or dissolving a contaminant from an environment |
| 02/19/2004 | US20040033919 High temperature rapid soil removal method |
| 02/19/2004 | US20040033918 Contacting with a swelling solvent that can be homogenously mixed with water; contacting a polarity modifier solvent selected from the group consisting of water and/or a C 1-6 alcohol |
| 02/19/2004 | US20040033917 Combines deionized water, an organic acid and a fluoride compound for cleaning a semiconductor after polishing a copper layer. |
| 02/19/2004 | US20040033912 Composition for hard article surface cleaning liquid |
| 02/19/2004 | DE10236791A1 Preservation, disinfection or sterilization of textiles or apparatus used in medical, pharmaceutical or hygiene applications involves use of liquid carbon dioxide containing ozone |
| 02/19/2004 | CA2797272A1 Antimicrobial compositions comprising benzoic acid |
| 02/18/2004 | EP1389496A1 Method for cleaning surface of substrate |
| 02/18/2004 | EP1021513B1 A process for combined desizing and "stone-washing" of dyed denim |
| 02/18/2004 | EP0972807B1 Cleansing thermoplastic resin composition |
| 02/18/2004 | CN1475553A 纯天然洗洁液 Natural detergent solution |
| 02/18/2004 | CN1138849C Etheric ester type solvent composition for dry cleaning |
| 02/17/2004 | US6692579 Vapor phase condensation with a thermally vaporized cleaning agent, a hydrocarbon vaporized by pressure variation, or a combination of the two |
| 02/17/2004 | US6691536 Washing apparatus |
| 02/12/2004 | US20040029753 Resist stripping liquid containing fluorine compound |
| 02/12/2004 | US20040029051 Stripping agent composition and method of stripping |
| 02/12/2004 | US20040026665 Non-surfactant solubilizing agent |
| 02/12/2004 | DE10331033A1 Cleaning composition, used for removing resist or residues of resist or from dry etching in semiconductor device production, contains fluoride of non-metal base, water-soluble organic solvent, acid and water |
| 02/12/2004 | DE10234998A1 Method of cleaning semiconductor substrate, especially silicon wafer, uses sequence giving hydrophobic surface, then cleaning with aqueous solution of organic nitrogen base giving hydrophilic surface and rinsing |
| 02/11/2004 | EP1387881A1 Granular carbonate and silicate-containing compositions |
| 02/11/2004 | EP1071324B1 Blooming type germicidal hard-surface cleaners |
| 02/11/2004 | EP0904343B1 Germicidal acidic hard surface cleaning compositions |
| 02/11/2004 | CN1137979C Composite lysostaphin washings and preparing method |
| 02/11/2004 | CN1137978C Method for treating textile |
| 02/10/2004 | US6689822 Blowing agent to produce closed-cell foams |
| 02/10/2004 | US6689734 And mixtures with highly fluorinated compounds and/or other agents that improve and enhance the properties of the mixture; degreasing, photoresist stripping |
| 02/10/2004 | US6689727 Agent for removing adhesive products |
| 02/10/2004 | US6689418 Apparatus for wafer rinse and clean and edge etching |
| 02/10/2004 | US6688118 Azeotropic compositions of cyclopentane |
| 02/05/2004 | WO2004011587A1 Cleaner/degreaser compositions comprising non-surfactant solubilizing agent |
| 02/05/2004 | WO2003036021A3 Treating composition |
| 02/05/2004 | US20040023837 Stabilised liquid compositions containing active chlorine |
| 02/05/2004 | US20040023834 Liquid detergent composition which is safe, has an excellent detergency and contains a hydrophobic organic solvent stable despite of a large water content. The present invention relates to a liquid detergent composition with alkyl or |
| 02/05/2004 | US20040023827 Stabilization of hydrogen peroxide in acidic baths for cleaning metals |
| 02/05/2004 | US20040023823 Detergent |
| 02/05/2004 | CA2436632A1 Stabilization of hydrogen peroxide in acidic baths for cleaning metals |
| 02/04/2004 | EP1387393A2 Improved chemical drying and cleaning system |
| 02/04/2004 | EP1385474A2 Cosmetic cream cleanser |
| 02/04/2004 | EP1169423B1 Multiple component hard surface cleaning compositions |
| 02/03/2004 | US6686326 Azeotrope-like compositions or pentafluorobutane |
| 02/03/2004 | US6686322 Cleaning agent and cleaning process using the same |
| 02/03/2004 | CA2187736C Azeotropic composition |
| 01/30/2004 | CA2433903A1 Stabilised liquid compositions containing active chlorine |
| 01/29/2004 | WO2004009140A1 Cleaning, detergent, disinfectant and decontaminating composition with wide spectrum of application |