C11D 7 - Compositions of detergents based essentially on non-surface-active compounds

Patents for C11D 7 - Compositions of detergents based essentially on non-surface-active compounds (16,781)
12/2006
12/12/2006	US7148189 Halides and salts on silica, alumina, titania and polishing films for integrated circuits
12/12/2006	US7147670 Dry cleaning process where the usual drying cycle is not performed but replaced by a system utilizing the solubility of the solvent in pressurized fluid solvents to remove it from the substrate, e.g. textiles; efficiency; antisoilants
12/07/2006	WO2006130406A2 Compositions comprising 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene
12/07/2006	WO2006129880A1 Resin composition for cleaning
12/07/2006	WO2006129549A1 Semiconductor cleaning liquid composition containing phosphonic acid and ascorbic acid, and method of cleaning
12/07/2006	WO2006129538A1 Semiconductor wafer cleaning composition containing phosphonic acid and method of cleaning
12/07/2006	US20060272682 Supplemental ozone treatment for ensuring the sterility of instrument cleaning systems
12/06/2006	EP1727618A2 Method of manufacture and use of hybrid anion exchanger for selective removal of contaminating ligands from fluids
12/06/2006	CN1875464A Cleaning composition for semiconductor containing unsaturated dicarboxylic acid and ethylene urea and cleaning method
12/06/2006	CN1875326A Composition for separating photoresist and separating method
12/06/2006	CN1875325A Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors
12/06/2006	CN1875090A Cleaning agent for substrate and cleaning method
12/06/2006	CN1872976A Semiconductor wafer cleaning agent and cleaning method
12/06/2006	CN1288231C Solvent composition
12/05/2006	US7144849 Water mixture comprising hydroxylamine or a derivative thereof, solvent, aromatic hydroxy-functional compounds, like 1,2-dihydroxy-4-t-butylbenzene and 1,2-dihydroxybenzene, or optionally chelating agents; removing resist and etching residue; cleaning micro-circuitry
12/05/2006	US7144848 Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal
12/05/2006	US7144847 Removing deposits on a mold for use in molding a thermoplastic resin, comprising limonene and ethanol is disclosed. Provided, is a detergent for removing mold deposits, said detergent being capable of easily removing deposits and
12/05/2006	US7144846 Acidic phenolic disinfectant compositions
12/05/2006	US7144523 Azeotropic compositions of cyclopentane
11/2006
11/30/2006	WO2006126744A1 N-vinyl cyclic lactam polymer, production method thereof, and application thereof
11/30/2006	WO2005100643A3 Method and apparatus for local fluorine and nitrogen trifluoride production
11/30/2006	WO2005097055A3 O/w-gel-compositions having pentaerythriol esters or oligomers thereof
11/30/2006	US20060270575 Cleaning solution and cleaning method of a semiconductor device
11/30/2006	US20060270573 Cleaning solution for substrate for semiconductor device and cleaning method
11/30/2006	US20060270242 Cleaning method and solution for cleaning a wafer in a single wafer process
11/30/2006	DE19622749B4 Verfahren zum Entfernen von Klebemitteln A process for removing adhesives
11/29/2006	EP1726706A2 A method for a semi-aqueous wash process
11/29/2006	EP1725647A1 Improved acidic chemistry for post-cmp cleaning
11/29/2006	CN1871553A Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials
11/29/2006	CN1871333A Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers
11/29/2006	CN1870887A Drip tray tablet
11/29/2006	CN1869187A Cleaning agent for waste teletron broken glass and its preparation method
11/28/2006	US7141121 An organic acid ammonium (NH4) salt added to a mixed solution of ammonium hydroxide, hydrogen peroxide and water.
11/28/2006	CA2271386C Aqueous disinfecting cleaning composition
11/28/2006	CA2227252C Hand cleanser comprising a blend of paramenthadienes
11/23/2006	WO2006124583A1 Liquid acidic hard surface cleaning composition
11/23/2006	US20060264343 Cleaning method and solution for cleaning a wafer in a single wafer process
11/23/2006	US20060260647 Cleaning method and solution for cleaning a wafer in a single wafer process
11/23/2006	CA2606452A1 Liquid acidic hard surface cleaning composition
11/22/2006	EP1724334A1 Pentafluorobutane composition and solvent composition for cleaning
11/22/2006	EP1723225A1 Multi-phase tablet
11/22/2006	EP1723224A2 Solvent compositions for removing petroleum residue from a substrate and methods of use thereof
11/22/2006	EP1421164B1 Surface treatment composition and method for removing si component and reduced metal salt produced on the aluminum dicast material in etching process
11/22/2006	EP1368095B1 Basic, non-aqueous decontamination fluid
11/22/2006	CN1867659A Cleaning agent
11/22/2006	CN1865423A Aqueous phase cleaning composition for semiconductor copper manufacture process
11/22/2006	CN1286154C Method and equipment of removing organic film
11/21/2006	US7138552 precursor for the preparation of compounds having surfactant properties and of plasticizers
11/21/2006	US7138363 Use of metal complex compounds as oxidation catalysts
11/21/2006	US7138362 Washing liquid composition for semiconductor substrate
11/21/2006	US7138342 Combined chemical cleaning and etching of parts made of aluminum or alloys by contacting with a solution of phosphoric acid, hydrogen fluoride, sulfamic acid, glycol ether, and water; periodically restoring etching rate by adding HF; adding sufficient sulfamic acid to prevent the formation of scale
11/21/2006	CA2107889C Reduced residue hard surface cleaner
11/16/2006	WO2006120011A1 Fast-dissolving bentonite granulate
11/16/2006	WO2006036368A3 Composition and process for ashless removal of post-etch photoresist and/or bottom anti-reflective material on a substrate
11/16/2006	WO2006010109A3 Method and apparatus for creating ozonated process solutions having high ozone concentration
11/16/2006	US20060258554 Bgl6 beta-glucosidase and nucleic acids encoding the same
11/16/2006	US20060254001 Stabilization of hydrogen peroxide during the dissolving of an alkalizing agent in hydrogen peroxide-containing systems
11/15/2006	EP1721961A1 Liquid acidic hard surface cleaning composition
11/15/2006	EP1721960A1 Liquid acidic hard surface cleaning composition
11/15/2006	EP1720966A1 Nanoelectronic and microelectronic cleaning compositions
11/15/2006	EP1720965A1 Improved alkaline chemistry for post-cmp cleaning
11/15/2006	CN1863901A Partially azeotropic composition
11/15/2006	CN1861775A Degreased cleaning agent and its using method
11/15/2006	CN1861774A Degreased cleaning agent
11/14/2006	US7135450 hydrogen peroxide, an alkoxylated reducing sugar-based surfactant, an alkylene oxide fatty alcohol adduct or etherified polyoxyalkylene glycol, and water; improved bleaching effect
11/14/2006	US7135447 Fuel additive to clean the fuel system and injector, engine oil additive to be added to the oil crank case, an aerosol air intake cleaner to be sprayed and then scrubbed, an air induction cleaner and decarbonizer to be injected while the engine is running, and a piston and ring cleaner fluid
11/14/2006	US7135446 System for cleaning and protecting windshields
11/14/2006	US7135445 For removal of photoresist and flux while minimizing any etching of the substrate
11/14/2006	US7135444 Aqueous solutions of phosphoric acid and another acid; removal residues
11/14/2006	US7135442 Preferably also containing sorbitol
11/14/2006	US7135413 Cleaning solution for removing damaged portion of ferroelectric layer and cleaning method using the same
11/09/2006	WO2006026048A3 Bleaching with improved whitening
11/09/2006	US20060252970 Reacting gas mixture containing pentafluoroethane and a compound having chlorine atom with hydrogen fluoride in the gaseous phase in the presence of a fluorination catalyst, reacting product with a fluorine gas
11/09/2006	US20060252664 Process for preparing bleach activator cogranulates
11/09/2006	US20060249179 Dipping an article having water attached on its surface in a solvent mixture of hydrochlorofluorocarbon, hydrofluorocarbon or hydrofluorocarbyl ether, and an alcohol; specific gravity separation of water from solvent; andpassing dried solvent through a coalescer type filter to remove remaining water
11/09/2006	DE4329178B4 Dampfphasenreinigung Vapor phase cleaning
11/08/2006	EP1719550A1 Method of dewatering and dewatering apparatus
11/08/2006	EP1718723A2 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
11/08/2006	EP1718721A2 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
11/08/2006	EP1718271A2 Stabilized body care products, household products, textiles and fabrics
11/08/2006	CN1860163A Azeotrope-like compositions containing hexafluoropropylene dimer and use thereof
11/08/2006	CN1283773C Solvent composition
11/08/2006	CN1283772C Precision electronic equipment live cleaning agent
11/07/2006	US7132390 Phyllosilicate adsorbate and its use
11/02/2006	WO2006116373A1 Heat transfer and refrigerant compositions comprising 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene and a hydrocarbon
11/02/2006	WO2006116372A1 Heat transfer and refrigerant compositions comprising 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene and a fluoroether
11/02/2006	WO2006116371A1 Heat transfer and refrigerant compositions comprising 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene and a hydrofluorocarbon
11/02/2006	WO2006114937A1 Detergent composition for resin
11/02/2006	US20060247147 Compositions for lipophilic fluid systems
11/02/2006	US20060247142 Composition and method for treating a semiconductor substrate
11/02/2006	EP1716216A2 Compositions containing fluorine substituted olefins
11/02/2006	EP1377677A4 Composition and method for destruction of infectious prion proteins
11/02/2006	EP1024965B9 Process for removing residues from a semiconductor substrate
11/01/2006	CN1856594A Composition and process for improving the adhesion of a siccative organic coating compositions to metal substrates
11/01/2006	CN1282738C Anti-virus sterilizing purifying cleaning mixture
10/2006
10/31/2006	US7129200 Domestic fabric article refreshment in integrated cleaning and treatment processes
10/31/2006	US7129199 Reducing defects in the manufacture of semiconductor devices by contacting with acetylenic diol derivatives
10/31/2006	US7129029 For selectively removing photoresist residues from a microstructure
10/26/2006	WO2006112881A1 COMPOSITIONS OF HFC-152a AND CF3I
10/26/2006	US20060241012 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith

1 ... 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 ... 168