| Patents for C11D 7 - Compositions of detergents based essentially on non-surface-active compounds (16,781) |
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| 06/28/2007 | US20070149437 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers |
| 06/28/2007 | US20070149430 preferably containing tetramethyl ammonium hydroxide 1-15 wt %, tolyltriazole 1-5 wt %, propylene glycol 5-15 wt %, 2-aminobenzothiazole 1-10 wt %; dipropylene glycol monomethyl ether 20-45 wt %, remainder water |
| 06/28/2007 | US20070149429 Including alcohol; solubilizing inorganic salts and polar organic compounds; damage-free, residue-free cleaning |
| 06/28/2007 | US20070149425 Detergent, cleaning method and cleaning apparatus |
| 06/28/2007 | US20070145003 Method of etching semiconductor device |
| 06/28/2007 | DE102005060733A1 Reinigungstücher Cleaning Wipes |
| 06/27/2007 | EP1799803A1 Use of polyvinyl acetate dispersions for cleaning purposes |
| 06/27/2007 | CN1989275A 1,1,1,3,3 pentafluobutane composition |
| 06/27/2007 | CN1323149C Cleanser |
| 06/26/2007 | US7235518 can counter the undesirable yellowing of white fabrics and similar discoloration of other light colored fabrics without causing the build-up of an undesirable tint or the creation of undesirable stains on fabric |
| 06/26/2007 | US7235516 Semiconductor cleaning composition comprising an ethoxylated surfactant |
| 06/26/2007 | US7235494 CMP cleaning composition with microbial inhibitor |
| 06/26/2007 | US7235188 Aqueous phosphoric acid compositions for cleaning semiconductor devices |
| 06/26/2007 | US7235169 Alkaline electrolyte solution; circulation; decomposition oxidation; water treatment by electrolysis; water pollution control |
| 06/21/2007 | WO2007069011A1 Alkylsilanes as solvents for low vapor pressure precursors |
| 06/21/2007 | WO2007068939A1 Liquid hard surface treatment compositions and methods for cleaning |
| 06/21/2007 | WO2007068920A1 Method and composition |
| 06/21/2007 | WO2007068870A1 A liquid composition |
| 06/20/2007 | EP1796741A1 Cleaning solution and wipes and method for cleaning |
| 06/20/2007 | EP1511891B1 Method of sequentially dispensing a consumable layered liquid composition |
| 06/20/2007 | CN1322105C Cleaning solution and manufacturing method for semiconductor device |
| 06/20/2007 | CN1322090C Hydrocarbon composition and refrigeration agent and cleaning agent made therefrom |
| 06/20/2007 | CN1322073C Agent for cleaning |
| 06/19/2007 | CA2284755C Effervescent compositions and dry effervescent granules |
| 06/19/2007 | CA2174277C Potentiated aqueous ozone cleaning and sanitizing composition for removal of a contaminating soil from a surface |
| 06/19/2007 | CA2093624C Purified enzyme concentrate and method of preparation |
| 06/14/2007 | US20070135326 Compositions Comprising 1,1,1,3,3-Pentafluorobutane And Use of These Compositions |
| 06/14/2007 | US20070135322 Substrate surface cleaning liquid medium and cleaning method |
| 06/14/2007 | US20070135321 Removal of undesired matter from a semiconductor wafer by contacting the surface with a foam forming composition comprising: a fluoride, an organic polar solvent, a surfactant, water, and alkanolamine; forming a foam with a gas |
| 06/13/2007 | EP1381656A4 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 06/13/2007 | CN1981027A Method of removing laundry ash |
| 06/13/2007 | CN1981026A Method of removing laundry ash |
| 06/13/2007 | CN1981025A Stabilized thickened hydrogen peroxide containing compositions |
| 06/13/2007 | CN1981010A 护理组合物 Care compositions |
| 06/13/2007 | CN1980985A Pyrrolidone-carboxylic modified polysiloxanes having aqueous and detergent solubilities and water-in-oil emulsion capability |
| 06/13/2007 | CN1978618A Water-free pollution-removing agent |
| 06/13/2007 | CN1978617A Water-free pollution-removing spraying agent |
| 06/13/2007 | CN1978616A Detergent for cleaning ceramic filtering plate |
| 06/12/2007 | CA2210081C Method and cleaning agent composition for cleaning the barrel of a gun |
| 06/07/2007 | WO2007047490A3 Deodorizing compositions |
| 06/07/2007 | US20070129274 Depositing first thin film including aluminum on substrate, patterning by photolithography and etching, cleansing, and depositing second thin film on substrate; cleansing is performed using materials including ultrapure water, cyclic amine, pyrogallol, benzotriazole, and methyl glycol |
| 06/07/2007 | US20070129273 In situ fluoride ion-generating compositions and uses thereof |
| 06/06/2007 | EP1792634A1 Lens care product containing dexpanthenol |
| 06/06/2007 | EP1791942A2 Method for dissolving oil at low temperature |
| 06/06/2007 | EP1791941A2 Non-chlorinated concentrated all-in-one acid detergent and method for using the same |
| 06/06/2007 | EP1299518B1 Method of cleaning using clean room wipes for neutralizing caustic chemicals |
| 06/06/2007 | CN1977023A Azeotrope-like compositions of tetrafluoropropene and pentafluoropropene |
| 06/06/2007 | CN1976673A O/W-gel-compositions having pentaerythriol esters or oligomers thereof |
| 06/06/2007 | CN1974746A Detergent for eliminating dirt of car |
| 06/06/2007 | CN1974745A Process for making highly viscous cleaning agent |
| 06/06/2007 | CN1320165C Method for cleaning substrate |
| 06/06/2007 | CN1320088C Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic el device |
| 06/06/2007 | CN1319655C Liquid for cleansing uncured paint, its method apparatus and use |
| 06/05/2007 | US7226513 Silicon wafer cleaning method |
| 05/31/2007 | WO2007060778A1 n-PROPYL BROMIDE COMPOSITION |
| 05/30/2007 | EP1789527A1 Cleaning compositions for microelectronics substrates |
| 05/30/2007 | CN1970715A Cleaning liquid of medicinal liquor supply device for semiconductor manufacture |
| 05/30/2007 | CN1970714A Organism cleaning liquid for precise polished wafer |
| 05/30/2007 | CN1319132C Tantalum barrier removal solution |
| 05/30/2007 | CN1318555C Cleaning powder for gem, jade and gold and silver ornaments and its preparation process |
| 05/29/2007 | US7223721 N-(hydroxyalkyl)alkoxyalkanamide; and a swelling agent, especially a hydroxylamine salt; does not attack underlying layers and does not leave residues |
| 05/29/2007 | US7223352 Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal |
| 05/29/2007 | US7223299 Composition and process for improving the adhesion of a siccative organic coating compositions to metal substrates |
| 05/29/2007 | CA2277125C Stable solid block detergent composition |
| 05/24/2007 | WO2007056919A1 Aqueous cleaning composition |
| 05/24/2007 | WO2007037448A9 Detergent composition for automatic dishwashing machine |
| 05/23/2007 | EP1786381A1 Anti-bacterial compounds |
| 05/23/2007 | EP1567289B1 Acidic cleaning method for machine dishwashing |
| 05/23/2007 | EP1432759B1 Laundry treatment compositions |
| 05/23/2007 | EP1049763B1 Cleaning and disinfecting contact lenses with a biguanide and a phosphate-borate buffer |
| 05/23/2007 | CN1969028A Azeotrope-like compositions of tetrafluoropropene and trifluoroiodomethane |
| 05/23/2007 | CN1969027A Azeotrope-like compositions of difluoromethane and trifluoroiodomethane |
| 05/23/2007 | CN1317374C Aqueous-base type airfield runway degumming liquid |
| 05/23/2007 | CN1317257C Nitrogen-containing ortho ester-based surfactant, its preparation and use |
| 05/22/2007 | US7220714 comprises carbon dioxide, additive (tetramethylammoniumfluoride) for removing residues, inhibitor (ethylene glycol) of residues, and co-solvent for dissolving additive and inhibitor in carbon dioxide at pressurized fluid conditions; for removal of photoresists during semiconductor processing |
| 05/22/2007 | US7220712 Compositions and methods for cleaning and conditioning |
| 05/22/2007 | CA2279062C Process and agent for the sanitization of contaminations caused by viruses |
| 05/18/2007 | WO2007054034A1 Uses of laccase |
| 05/18/2007 | WO2006086683A3 Compositions comprising 1,1,1,2,2,3,4,5,5,6,6,7,7,7-tetradecafluoroheptane and uses thereof |
| 05/17/2007 | US20070111912 Dynamic multi-purpose composition for the removal of photoresists and methods for its use |
| 05/17/2007 | US20070111278 Endoglucanase stce and cellulase preparation containing the same |
| 05/16/2007 | EP1343933B1 Siloxane dry cleaning composition and process |
| 05/16/2007 | CN1965049A Azeotrope-like trifluoroiodomethane compositions |
| 05/16/2007 | CN1964941A 有机活化剂 Organic activator |
| 05/15/2007 | US7216653 Mixture containing oxidizer, water, reducing agents and charging controllers; removal oxides formed |
| 05/15/2007 | CA2407180C Washing apparatus |
| 05/10/2007 | WO2007053673A2 Solvent compositions comprising unsaturated fluorinated hydrocarbons |
| 05/10/2007 | WO2007053672A2 Solvent compositions comprising unsaturated fluorinated hydrocarbons |
| 05/10/2007 | WO2007053363A2 Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| 05/10/2007 | WO2007052544A1 Washing liquid and washing method |
| 05/10/2007 | WO2007052004A1 Delivery cartridge |
| 05/10/2007 | WO2006071535A3 Silicon electrode assembly surface decontamination by acidic solution |
| 05/10/2007 | US20070105744 Water-softening product |
| 05/10/2007 | US20070105735 Cleaner |
| 05/10/2007 | US20070102665 Cleaning disfection and indicator agent |
| 05/10/2007 | CA2627908A1 Delivery cartridge |
| 05/09/2007 | EP1690135A4 Resist, barc and gap fill material stripping chemical and method |
| 05/09/2007 | CN1961065A Nanoelectronic and microelectronic cleaning compositions |
| 05/09/2007 | CN1961054A Chelate compound-containing composition and use as detergents thereof |
| 05/09/2007 | CN1314639C Production and use of octafluoropropane |