Patents for C11D 7 - Compositions of detergents based essentially on non-surface-active compounds (16,781)
01/2006
01/18/2006CN1721516A Semiconductor process residue removal composition
01/18/2006CN1721515A Rinsing composition, and method for rinsing and manufacturing silicon wafer
01/18/2006CN1721480A Quick cleaning agent for paint, printing ink, adhesive and chewing gum and method for making same
01/18/2006CN1236866C Method for cleaning solid surface by removing organic and/or mineral soils using microemulsion
01/17/2006US6986358 Contacting the surface with tris(hydroxymethyl)phosphine or tetrakis(hydroxymethyl)phosphonium salt and an amine, ammonium derivative, or ammonia in the presence of an aqueous solvent
01/12/2006WO2006002714A1 Care composition
01/12/2006CA2854912A1 Alpha-amylase variants with altered properties
01/12/2006CA2568698A1 Care composition
01/11/2006EP1614740A2 Polyphenolics as lubricant oil additives
01/11/2006CN1720352A Aqueous composition for the chemical removal of metallic surfacing present on turbine blades, and its use
01/11/2006CN1236130C Method for use of aqueous vapor and lipophilic fluid during fabric cleaning and/or treating process
01/11/2006CN1236037C Detergent for equipment for producing and processing synthetic fibre
01/10/2006US6984616 Water-based purge composition
01/10/2006US6984614 Composition and method for removing deposits
01/10/2006US6984336 Clothes treatment for dry wrinkle resistance
01/10/2006US6984269 Cleaning surfaces
01/10/2006CA2180241C Composition and improved ph driven method for wastewater separation using an amphoteric carboxylate and a cationic destabilizer composition
01/05/2006US20060005279 Polypeptides having cellulolytic enhancing activity and polynucleotides encoding same
01/05/2006US20060003909 Water mixture comprising hydroxylamine or a derivative thereof, solvent, aromatic hydroxy-functional compounds, like 1,2-dihydroxy-4-t-butylbenzene and 1,2-dihydroxybenzene, or optionally chelating agents; removing resist and etching residue; cleaning micro-circuitry
01/04/2006EP1612611A2 Composition for removing photoresist residue and polymer residue
01/04/2006EP1612271A2 Multiply-substituted protease variants with altered net charge for use in detergents
01/04/2006CN1716104A Composition for removing photoresist residue and polymer residue
01/04/2006CN1715389A Composition for stripping and cleaning and use thereof
01/04/2006CN1715388A Cleaning powder for gem, jade and gold and silver ornaments and its prepn process
01/04/2006CN1235093C Corrosion inhibitor stripper composition using conductive material with high equivalent electric conductivity in aqueous solution
01/04/2006CN1234833C Stain cleaning agent for pressure-sensitive adhesive and chewing gum
01/04/2006CN1234832C 洗涤溶剂 Cleaning solvent
01/03/2006US6982241 Cleaning composition comprising an inorganic acid mixture and a cationic surfactant
01/03/2006CA2164849C Enzymatic compositions and methods for producing stonewashed look on indigo-dyed denim fabric
12/2005
12/29/2005WO2005123148A1 Composition for contact lens
12/29/2005WO2005105947A3 Compositions containing fluorine substituted olefins
12/29/2005US20050288201 Cleaning textiles
12/29/2005US20050288199 ammonium fluroride, an acid selected from oxalic acid, tartaric acid, citric acid, malonic acid, and malic acid, an organic amine such as morpholine, piperidine, piperizine, N-methylmonoethanolamine, etc., glyoxyl acid and water; copper corrosion inhibitor
12/29/2005US20050288194 Reacting an oil soluble alkylphenol with calcium oxide, calcium hydroxide, lime or dolomite, an alpha amino acid, and a C1 to C6 aldehyde, in the in the presence of a C2 to C6 alkylene glycol and a C2 to C4 carboxylic acid to make an optionally overbased, oil soluble detergent
12/29/2005US20050284844 Cleaning composition for semiconductor components and process for manufacturing semiconductor device
12/29/2005CA2507136A1 Polyphenolics as lubricant oil additives
12/28/2005EP1609847A1 Cleaning composition for semiconductor components and process for manufacturing semiconductor device
12/28/2005EP1499457A4 Methods of simultaneously cleaning and disinfecting industrial water systems
12/28/2005EP1423496B1 Azeotrope-like compositions and their use
12/28/2005EP1390161A4 Stable liquid or gel bleaching composition containing diacyl peroxide particles
12/28/2005EP1141190B2 Water-soluble glass as corrosion protection for glassware in dishwashing machines
12/28/2005EP1025240B1 Multiply-substituted protease variants with altered net charge for use in detergents
12/28/2005CN1712507A Water-based liquid-crystal cleaning agent
12/28/2005CN1712506A Cleaning composition for semiconductor components and process for manufacturing semiconductor device
12/27/2005US6979668 Removing the aerosol can containing the medication from the actuator, placing an aerosol can containing a cleaning compound in the actuator, and dispensing the cleaning solution through the actuator; residual medication is thereby removed
12/22/2005WO2005121297A1 Cleaning composition
12/22/2005WO2005121270A1 Aqueous thickener and bleaching detergent
12/22/2005WO2005110957A3 Fluorinated ethers
12/22/2005US20050282720 Efficient method for cleaning by using detergent
12/22/2005US20050282719 Vehicular cleaning concentrate
12/22/2005US20050282718 water soluble polysaccharide, polyvinyl alcohol, polyethylene oxide, polypropylene oxide; hydrophilic polymer obtained by alkylating the water soluble polymer; triethylenetetraminehexaacetic acid or ethylenediaminetetrakismethylenephosphonic acid chelating agent; water; no alkaline compound; no abrasive
12/22/2005US20050278881 Bag for cleaning oil film on windshield of vehicle
12/21/2005EP1349678B1 Method of cleaning a solid surface by removing organic and/or mineral soils using a microemulsion
12/21/2005EP1290259B1 Washing apparatus
12/21/2005CN1711627A Cleaning composition and method of cleaning therewith
12/21/2005CN1711626A Polishing composition and rinsing composition
12/21/2005CN1711349A Semiconductor surface treatment and mixture used therein
12/21/2005CN1232627C Cleaning agent and preparing method, and application in cleaning without stopping machine
12/21/2005CN1232626C Cleaning agent
12/21/2005CN1232625C Method of laundering clothes and detergent composition thereof
12/15/2005WO2005118762A1 Products and method for the decontamination of prions
12/15/2005WO2005118526A1 Organic activator
12/15/2005WO2005118000A1 Inactivation of a pathogen in a sample by a treatment with formalin and uv light
12/15/2005WO2005013913A3 Peroxygen containing particle in an alcohol containing gel
12/15/2005US20050277571 Facility parts cleaning solution for processing of (meth)acrylic acid and/or (meth)acrylic esters and cleaning method using said cleaning solution
12/15/2005US20050274817 Perfume gel composition
12/15/2005US20050274624 Nontoxic antiseptic of silver salt of citric acid; use in homes, hospitals, restaurants
12/15/2005US20050274392 Cleaning process for photomasks
12/15/2005DE4314365B4 Reinigungszusammensetzung für Präzisionsteile oder -vorrichtungen Cleaning composition for precision parts or devices
12/15/2005DE10357389B4 Verfahren zur Reinigung von Speckstein Methods for cleaning up of soapstone
12/15/2005DE102005004110A1 Korrosionshemmende Reinigungszusammensetzungen für Metallschichten und Muster an Halbleitersubstraten The corrosion inhibiting compositions for cleaning metal layers and patterns on semiconductor substrates
12/15/2005CA2567353A1 Organic activator
12/15/2005CA2565529A1 Products and method for the decontamination of prions
12/14/2005EP1310989B1 Detergent composition
12/14/2005EP1225869B1 Skin cleansing composition for removing ink
12/14/2005CN1708578A Method of removing a biofilm
12/14/2005CN1708572A Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal
12/14/2005CN1708364A Removal of particle contamination on patterned slilicon/silicon dioxide using supercritical carbon dioxide/chemical formulations
12/14/2005CN1708362A Supercritical carbon dioxide/chemical formulation for removal of photoresists
12/14/2005CN1706926A Sand dirt detergent and its prepn process
12/14/2005CN1706925A Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
12/14/2005CN1231267C Lens care product containing dexpanthenol and use for cleaning contact lenses thereof
12/08/2005WO2005116177A1 Stable wetting concentrate
12/08/2005WO2005116158A1 Chelate compound-containing composition and use as detergents thereof
12/08/2005WO2005074639A3 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
12/08/2005US20050272631 able to be employed in colder solutions; cleaning products
12/08/2005US20050272625 Method of removing organic materials using aqueous cleaning solutions
12/08/2005US20050272621 Composition and method for removing copper-compatible resist
12/08/2005CA2566474A1 Stable wetting concentrate
12/07/2005EP1602714A1 Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
12/07/2005CN1705735A 组合物 The composition
12/07/2005CN1230718C Method and composition for removing sodium-containing material from microcircuit substrates
12/07/2005CN1230512C Mud bath soap and its preparation method
12/07/2005CN1230510C Color stable hypochlorous sanitizer and use method
12/01/2005WO2005113243A1 Nonwoven fabric for cleaning printing machines
12/01/2005US20050267006 Azeotrope-like compositions of 1,1,1,3,3-pentafluorobutane
12/01/2005US20050267004 Composition and method for surface treatment of oxidized metal
12/01/2005US20050263739 Method and composition to decrease iron sulfide deposits in pipe lines
11/2005
11/30/2005EP1600204A1 Detergent for selectively permeable film and method of cleaning
11/30/2005CN1702164A Pure natural plant hand cleanser
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