Patents for C11D 11 - Special methods for preparing compositions containing mixtures of detergents (14,845)
03/2004
03/25/2004US20040058846 Detergent for dishwasher containing addition polymer
03/25/2004US20040058839 Cleaning solutions for carbon removal
03/25/2004US20040058837 Process of making gel detergent compositions
03/25/2004US20040058833 Graffiti remover, paint stripper, degreaser
03/25/2004US20040058551 Fluorous cleaning solution for lithographic processing
03/25/2004US20040055621 Separate sealed pressurized vessels; using critical fluid
03/25/2004DE10242222A1 Mechanically compacted washing or detergent agents containing neutralizable organic polycarboxylic acids are given improved odor values by having specific non-water-soluble builder content and pH
03/25/2004DE10242048A1 Removing organochlorine biocides from surface layers of objects made of e.g. wood, textiles or leather involves treatment with composition containing fat releaser, surfactant and water miscible solvent
03/24/2004EP1399532A2 Composition for dishwashing machines
03/24/2004EP1399530A1 Biocidal cleaning composition
03/24/2004EP1154868A4 Non-corrosive cleaning composition and method for removing plasma etching residues
03/24/2004CN1484719A reagent modified particulate polymers for treatment of the surface of textile and non-textile materials
03/23/2004CA2258643C Nonaqueous detergent compositions containing enzymes
03/18/2004WO2004022694A1 Detergent particles
03/18/2004WO2004022688A1 Detergent particles
03/18/2004WO2004022684A1 Extruded cleansing product
03/18/2004US20040053808 Detergent tablet of gas-filled porous cells delimited by solid partitions
03/18/2004US20040053798 Fabric care provided by a product comprising discrete layers of different densities in direct contact with each other and dispensed separately; multiple refreshing and/or finishing benefits; accuracy; packaging
03/18/2004US20040052957 Method of applying nanoparticles
03/18/2004DE10340882A1 Cleaning of annealed silicon wafer by oxidizing silicon wafer with ozonized water, and cleaning the oxidized silicon wafer with hydrofluoric acid
03/17/2004EP1397475A2 Compactable powders
03/17/2004EP1397446A1 Process and formulations to remove paint and primer coatings from thermoplastic polyolefin substrates
03/17/2004CN1483093A Semiconductor stripping composition containing 1,3-dicarbonyl compounds
03/16/2004US6706773 Process for preparing a foam component
03/16/2004US6706677 Bleaching in conjunction with a lipophilic fluid cleaning regimen
03/16/2004US6706676 Containing limonene and/or a terpene and/or dimethyl adipate, glutarate or succinate; C1-C8 sulfonated anionic surfactant, Dodecylbenezene Sulfonic Acid, Monoethanolamine and defoamer; low VOC's; near neutral pH; for removing ink
03/16/2004US6706518 Clearing waste water pipes or grease traps clogged with grease with a grease solvent
03/16/2004US6706076 Using a cyclosiloxane compound
03/16/2004CA2079076C A layered cementitious composition which time releases permanganate ion
03/11/2004WO2004020569A1 Detergent particle
03/11/2004WO2004020568A1 Solvent composition
03/11/2004US20040048766 For use as cleaner, foaming agent, emulsifier
03/11/2004US20040048761 Cleaning composition
03/11/2004US20040048759 For single use personal cleaning; can disintegrate upon contact with water when used in the standard fashion to wash
03/11/2004US20040045588 Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide
03/11/2004US20040045580 Cleaning method of silicon wafer for obtaining a silicon wafer in which micro roughness thereof under spatial frequency of 20/ mu m is 0.3 to 1.5 nm3 in terms of power spectrum density, by passing a process of oxidizing the silicon wafer with
03/11/2004US20040045574 Semiconductor fabrication equipment parts includes determining a definition for a clean part including multiple maximum acceptable impurity levels; determining an initial multiple impurity levels of a part prior to its cleaning process and
03/11/2004US20040045094 Agent for removing solid particles
03/11/2004US20040045093 Textile care composition
03/11/2004DE10241878A1 Vehicle cleaner, used e.g. for removing firmly-adhering metal dust or metal grindings residue or cleaning rims, contains complex-forming polyamino- or polycarboxylic acids or salt
03/10/2004EP1395521A1 Article for deionization of water
03/10/2004EP1232114B1 Segmented process for cleaning-in-place
03/10/2004CN1141736C Composition for removing sidewall and method of removing sidewall
03/10/2004CN1141436C Dry cleaning method
03/09/2004US6703358 Cleaning composition for hard surfaces
03/09/2004US6702903 Washing method of petroleum equipment and washing solution for use with the method
03/04/2004WO2004019134A1 Removing solution
03/04/2004WO2004018607A2 Method for maufacturing liquid gel automatic dishwashing detergent compositions comprising anhydrous solvent
03/04/2004WO2004018599A1 Acidic hard surface cleaners
03/04/2004WO2004018074A1 Silicone foam control compositions
03/04/2004WO2003054279A3 Treatment of fabric articles
03/04/2004US20040043400 Zygomycetes-derived endoglucanase enzyme lacking cellulose-binding domain
03/04/2004DE10056541B4 Verfahren zum Reinigen von Quarzsubstraten unter Verwendung von leitenden Lösungen A method for purifying quartz substrates using conductive solutions
03/04/2004CA2495980A1 Acidic hard surface cleaners
03/03/2004EP1392812A2 Cleaning product
03/03/2004EP1392810A1 Dishwashing method
03/03/2004EP1392807A1 Cleaning method for removing starch
03/03/2004EP1392785A1 System for releasing active substances and active agents
03/03/2004EP1123377B1 Method for laundering delicate garments in a washing machine
03/03/2004EP1076686B1 A process for producing a water-dispersable non-particulate detergent product from low-density particulate detergent particles
03/03/2004CN1479784A Method of laundering clothes and detergent composition thereof
03/03/2004CN1479783A Improvements relating to fabric care
03/03/2004CN1479780A Method for cleaning etcher parts
03/03/2004CN1140664C Fabric care method
03/02/2004US6699330 Cleaning with aqueous acetic acid containing ozone
02/2004
02/26/2004WO2004016827A1 Remover solution
02/26/2004WO2004016723A1 Technique on ozone water for use in cleaning semiconductor substrate
02/26/2004WO2004016681A2 Multi-functional color concentrate compositions
02/26/2004WO2003031987A3 In vitro model for priocidal activity
02/26/2004US20040038847 Hard surface cleaning composition
02/26/2004US20040038841 For use in detergents, treating paper pulp, deinking waste paper
02/26/2004US20040038840 Useful for stripping photoresists and cleaning organic and inorganic compounds from a semiconductor substrate
02/26/2004US20040038839 Organic stripping composition and method of etching oxide using the same
02/26/2004US20040035354 Process for removing contaminant from a surface and composition useful therefor
02/26/2004US20040034940 Cleaning method
02/26/2004US20040034911 Preventing adherence of an exudate on a toilet bowl surface
02/26/2004DE10239773B3 Cleaning a semiconductor wafer comprises treating the wafer under megasound with an aqueous solution containing ozone, and treating the wafer with an aqueous solution containing hydrofluoric acid and hydrochloric acid
02/25/2004EP1390461A1 Granular detergent composition
02/25/2004EP1390161A1 Stable liquid or gel bleaching composition containing diacyl peroxide particles
02/24/2004US6696228 Use of ethylene carbonate and/or propylene carbonate treatment using ozone, for the stripping and removal of resist films
02/24/2004US6695927 Method and cleaning solution for cleaning a container
02/24/2004US6694989 Using a potable rinse or a dilute solution of an aqueous food grade rinse aid to rinse alkaline washed kitchen ware; two step rinse insures complete and sanitary cleaning of the ware
02/19/2004WO2004015185A1 Fabric treatment article and corresponding method of using it
02/19/2004WO2004015050A1 Detergent composition
02/19/2004WO2004015049A1 Improvements in or relating to cleaning
02/19/2004WO2003104900A3 Microelectronic cleaning compositions containing oxidizers and organic solvents
02/19/2004US20040034157 Coating dishes by spraying with mixtures of nanostructure laponite particles, dispersants, surfactants, buffers and wetting agents, then drying to form clear coats; durability; antisoilants
02/19/2004US20040033923 Method of making a composition, a product from such method, and the use thereof in removing or dissolving a contaminant from an environment
02/19/2004US20040033919 High temperature rapid soil removal method
02/19/2004US20040033917 Combines deionized water, an organic acid and a fluoride compound for cleaning a semiconductor after polishing a copper layer.
02/19/2004US20040031107 Planar-like structure to which host substances are applied that can contain and release active components; textile dry cleaning
02/19/2004CA2492144A1 Detergent composition
02/18/2004EP1389496A1 Method for cleaning surface of substrate
02/18/2004EP1389231A1 Bio-active de-inking or cleaning foam
02/18/2004EP1389229A1 Method of hydrocarbon impurities removal from surfaces
02/18/2004EP1021513B1 A process for combined desizing and "stone-washing" of dyed denim
02/18/2004CN1476473A Anti-slip floor coating remover composition
02/18/2004CN1138849C Etheric ester type solvent composition for dry cleaning
02/17/2004US6693071 Rinse aid surface coating compositions for modifying dishware surfaces
02/17/2004US6692579 Vapor phase condensation with a thermally vaporized cleaning agent, a hydrocarbon vaporized by pressure variation, or a combination of the two
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