C11D 11 - Special methods for preparing compositions containing mixtures of detergents

Patents for C11D 11 - Special methods for preparing compositions containing mixtures of detergents (14,845)
11/2004
11/11/2004	DE202004010855U1 Liquid for cleaning small diameter pipes, to remove and disperse deposits, is a hydrogen and bio-oil compound
11/11/2004	DE20122209U1 Geschirrspülprodukt Dishwashing
11/11/2004	DE10317931A1 Chemothermisches Desinfektionsverfahren Chemo thermal disinfection procedures
11/10/2004	EP1475350A1 Coated sodium percarbonate granules with improved storage stability
11/10/2004	EP1474602A1 Delivery device for removing interior engine deposits in a reciprocating internal combustion engine
11/10/2004	EP1474502A1 Cleaning and maintenance composition for stone surfaces
11/10/2004	EP1086191A4 Methods and apparatus for cleaning semiconductor substrates after polishing of copper film
11/10/2004	EP0985011A4 Detergent particle
11/10/2004	CN1175099C Process for producing detergent particles
11/10/2004	CN1175097C Process for making low density detergent composition
11/09/2004	US6814816 Using such as phenolphthalein and base to evaluate hand cleanliness without need of ultraviolet light
11/09/2004	US6814088 At least one low residue surfactant such as alkyl polyglycoside and/or an alkyl ethoxylate surfactant, and a polybiguanide, at an acidic ph; cleaning hard surfaces
11/04/2004	WO2004094581A1 Aqueous fluoride compositions for cleaning semiconductor devices
11/04/2004	WO2004094080A1 Endoscope cleaning pad
11/04/2004	WO2004094001A2 Supplemental ozone treatment for ensuring the sterility of instrument cleaning systems
11/04/2004	WO2004085491A3 Removal of cmp and post-cmp residue from semiconductors using supercritical carbon dioxide process
11/04/2004	WO2004059700A3 Photoresist removal
11/04/2004	WO2003078691A3 Alkaline sensitive metal cleaning composition, method for cleaning an alkaline sensitive metal surface, and washing facility
11/04/2004	US20040220066 removal polymeric material using quaternizating ammonium silicate
11/04/2004	US20040220065 stripping photoresists
11/04/2004	US20040219848 Water insoluble substrate impregnated with cleaning solution
11/04/2004	CA2523133A1 Endoscope cleaning pad
11/03/2004	EP1472018A1 Copper polishing cleaning solution
11/03/2004	EP1472017A1 Method for cleaning an article
11/03/2004	EP1313833B1 Cleaning aid
11/03/2004	CN1543592A Sulfoxide pyrolid(in)one alkanolamine cleaner composition
11/03/2004	CN1543494A Method to remove iron sulfide deposits from pipe lines
11/03/2004	CN1543449A Solvents containing cycloalkyl alkyl ethers and process for production of the ethers
11/03/2004	CN1542910A Process and apparatus for removing residues from the microstructure of an object
11/03/2004	CN1542110A Cleaning liquid composition for semiconductor substrate
11/03/2004	CN1174138C System and method for extracting water in dry cleaning process involving siloxane solvent
11/03/2004	CN1173785C Cleaning agent, method and drying method
11/02/2004	US6812200 Process for coating detergent tablets
11/02/2004	US6812194 Alkaline metal cleaner comprising sulfonated-hydrophobically modified polyacrylate
11/02/2004	US6812193 Mixture of oxidizer, corrosion resistant, abrasive particles, surfactant, halogen compound and sulfate
11/02/2004	US6811616 Cleaning of an object via a cleaning liquid (containing water and organic phase) that under first designated conditions form a solubility gap and under second designated conditions form a mixture, and partially separating the impurities
11/02/2004	US6810887 Method for cleaning semiconductor fabrication equipment parts
10/2004
10/28/2004	WO2004091749A1 Method of regenerating nonaqueous solvent used for cleaning and apparatus therefor
10/28/2004	WO2004069974A3 Method for reinforcing cleaning power of washing agents by means of a combination of cellulose derivatives
10/28/2004	US20040214736 Water soluble backbone selected from hydroxyethylcellulose, hydroxyoropylcellulose, methylcellulose, hydroxypropylmethylcellulose, ethyl hydroxyethylcellulose, and methyl hydroxyethylcellulose, agar, dextran, locust bean gum, starch or guar; and a 3-alkoxy-2-hydroxypropyl group hydrophobic moiety
10/28/2004	US20040211008 Modification of printed and dyed materials
10/28/2004	DE10356178A1 Cleaning solution for photoresist patterns used for manufacture of semiconductor device, comprises water as solvent, and surfactant of phosphate-alcohol amine salt as an additive
10/27/2004	EP1471077A2 Process for cleaning reactors
10/27/2004	EP1470211A1 Cleaning and disinfection of surgical and medical instruments and appliances
10/27/2004	EP1470207A1 Aqueous stripping and cleaning composition
10/27/2004	EP1470206A1 Anionic surfactant powder
10/27/2004	CN1541260A Process for prodn. of detergent granules
10/27/2004	CN1173026C Stain removal method
10/26/2004	US6808729 Microorganism reduction methods and compositions for food
10/21/2004	WO2004090219A2 Natural aqueous composition and machine for dry-cleaning textiles and leathers
10/21/2004	US20040208782 1-(2-ethylhexyl)glycerol ether for thermochemical disinfection.
10/21/2004	US20040206514 Methods for extinguishing petroleum-based fires, suppressing petroleum-released vapors and cleaning petroleum-contaminated surfaces
10/21/2004	CA2524788A1 Natural aqueous composition and machine for dry-cleaning textiles and leathers
10/20/2004	EP1468700A1 Use of 1-(2-ethylhexyl)-glycerol for the disinfection of surfaces above room temperature
10/20/2004	EP1468335A1 A cleaning agent composition for a positive or a negative photoresist
10/20/2004	EP1468135A1 A method of dry cleaning articles using densified carbon dioxide
10/20/2004	EP1468065A1 Cleaning agents for the outer surfaces of means of transport
10/20/2004	EP1268734B1 Fluorinated solvent compositions containing ozone
10/20/2004	CN1539008A Thickened cleaning agent for toilet
10/19/2004	US6806193 Reducing particle deposits on scouring pads used for chemical mechanical polishing (cmp) of semiconductor wafers, using cleaners comprising mixtures of water, ammonium citrate, surfactants and benzotriazole
10/19/2004	US6805135 Cleaning fluid and cleaning method for component of semiconductor-treating apparatus
10/14/2004	WO2004088735A1 Cleaning method, method for removing foreign particle, cleaning apparatus and cleaning liquid
10/14/2004	US20040204329 Cleaning liquid composition for semiconductor substrate
10/14/2004	US20040200511 Method for washing a vehicle
10/14/2004	DE10313456A1 Packaged detergent or cleaning compositions, including dispersion of solid particles in medium, e.g. polyethylene glycol, providing high solubility, high density and good cleaning performance
10/13/2004	EP1466963A1 Cleaning liquid composition for semiconductor substrate
10/13/2004	EP1465973A2 Hydrophobically modified polymer formulations
10/13/2004	EP1465972A1 Process for cleaning filters
10/13/2004	EP1360271B1 Washing and cleaning agent coated moulding body
10/13/2004	EP1341894A4 Thickened silicone dissolving agent
10/13/2004	EP1027414B1 Compositions and processes for drying substrates
10/13/2004	EP0993505B1 Production of detergent granulates
10/13/2004	CN1536624A Stripping device and method for protective layer
10/13/2004	CN1170921C Granular base and particulate detergent
10/13/2004	CN1170918C Process for making low density detergent composition by controlling nozzle height in fluid bed dryer
10/13/2004	CN1170917C Production of detergent granulates
10/12/2004	US6803354 Stabilization of hydrogen peroxide in acidic baths for cleaning metals
10/12/2004	US6803034 Compositions and methods for odor and fungal control in ballistic fabric and other protective garments
10/12/2004	US6802911 Dipping a semiconductor device in the vessel containing a solution of hf and ozone water.
10/12/2004	US6802909 Soap is applied as a film to the interior wall as the soap pig moves through the pipeline and slowly dissolves, emulsifying and removing water
10/07/2004	WO2004085599A1 Shape-retaining detergent portion
10/07/2004	WO2004085591A1 Cleaning solution and cleaning method for lacquer conduits and/or lacquer application devices
10/07/2004	WO2004085491A2 Removal of cmp and post-cmp residue from semiconductors using supercritical carbon dioxide process
10/07/2004	US20040198627 Process and apparatus for removing residues from the microstructure of an object
10/07/2004	US20040198625 Peroxo modified titania or titanic acid, or a mixture thereof or zinc oxide[ sensitizer to absorb visible, ultraviolet, or infrared radiation and enhance photocatalytic action; antisoilants, microbiocides, antiallergens; deodorizing
10/07/2004	US20040198624 Use of polyoxypropylene/polyoxyethylene terpene compounds as degreasing agents for hard surfaces
10/07/2004	US20040198622 Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist
10/07/2004	US20040198621 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
10/07/2004	US20040194816 Apparatus for supplying a car wash with chemical additives
10/07/2004	US20040194814 Apparatus and process for stripping resist
10/07/2004	US20040194810 Methods and compositions for the removal of starch
10/07/2004	DE10313461A1 Reinigungslösung und Reinigungsverfahren für Lackleitungen und/oder Lackauftragsgeräte Cleaning solution and cleaning method for coating lines and / or paint applicators
10/06/2004	EP1464913A2 Machine for cleaning firearms and firearm components, and detergent solutions to be used in machines for cleaning firearms
10/06/2004	EP1305392B1 Cleaning compositions
10/06/2004	EP1212393B1 Fabric care composition containing polycarboxylate polymer and compound derived from urea
10/06/2004	EP1005522B1 Process for making a low density detergent composition by controlling nozzle height in a fluid bed dryer
10/05/2004	US6800600 Cleaning agent containing alcoholate
10/05/2004	US6800142 Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment
10/05/2004	US6800141 Semi-aqueous solvent based method of cleaning rosin flux residue
10/05/2004	US6799589 Method and apparatus for wet-cleaning substrate

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