Patents for C11D 11 - Special methods for preparing compositions containing mixtures of detergents (14,845)
12/2004
12/09/2004US20040247895 System for releasing active substances and active agents
12/09/2004US20040247784 Process to coat granular and powdered materials
12/09/2004US20040245496 Diamond-like carbon that may be partially covered with a ceramic that is inert to light; a thickener; and an oxidant; especially calcium phosphate supported on titanium oxide as an environmental photocatalyst for cleaning buildings or building materials, jewelry, teeth, or dentures
12/09/2004US20040245281 Beverage line purifier
12/09/2004US20040244823 Cleaning solution and cleaning method of a semiconductor device
12/09/2004US20040244818 System and method for cleaning of workpieces using supercritical carbon dioxide
12/09/2004DE10235942B4 Mittel und Vorrichtung sowie Verfahren zu seiner Herstellung für Wasch-, Reinigungs- oder Pflegemittel Means and apparatus and method for its preparation for washing, cleaning or maintenance products
12/09/2004CA2526622A1 Improved flushing for refrigeration system components
12/08/2004EP1484389A1 Detergent products, methods and manufacture
12/08/2004EP1438380A4 High retention sanitizer systems
12/08/2004CN1553949A Cleaning composition and method for using the same
12/08/2004CN1179032C Particulate detergent
12/08/2004CN1179030C High density detergent-making process involving moderate speed mixed/densifier
12/08/2004CN1179029C Production of detergent granulates
12/07/2004US6828295 For cleaning soiled, water-sensitive clothing, linen and drapery
12/07/2004US6828294 High retention sanitizer systems
12/07/2004US6828292 Washing in the presence of a predominant fluid and a surfactant; at least partially removing the cleaning composition; treating with a fabric refresher and a lipophilic cleaning fluid; all in same appliance
12/07/2004US6828289 Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature
12/02/2004US20040242451 Compound derived from urea and a phosphorus-containing acid, together with a carrier therefor; for optical lens surfaces, contact lenses
12/02/2004US20040242449 Nitric acid and chromic acid-free compositions and process for cleaning aluminum and aluminum alloy surfaces
12/02/2004US20040242446 Cleaning agent including a corrosion inhibitor used in a process of forming a semiconductor device
12/02/2004US20040242442 Heterogeneous cleaning composition and methods
12/02/2004US20040242016 Compositions for dissolution of low-k dielectric films, and methods of use
12/02/2004US20040241820 Genetically engineered substilisin for use as degratory agent in cleaning or laundering detergent
12/02/2004US20040238012 Cleaning solution and method of cleaning anti-reflective coating composition using the same
12/01/2004EP1274828B1 Method for the production of detergent granules
12/01/2004EP1212399B1 Process for preparing high-bulk density detergent compositions
12/01/2004EP1163322B1 Method for the wet cleaning of objects
12/01/2004EP0991327B1 Microorganism reduction methods and compositions for food cleaning
12/01/2004CN1177933C Chrysosporium cellulase and methods of use
12/01/2004CN1177922C Process for preparing laundry powder detergents
12/01/2004CN1177920C Descaling agent for scales on titanium materials
11/2004
11/30/2004US6825162 Particles comprising a saldimine-type manganese complex and at least 10% by weight of a polymeric dissolution restrainer provide better inhibition of the redeposition of migrating dyes in washing liquors than by pure manganese complex
11/30/2004US6825160 Color safe laundry methods employing cationic formulation components
11/30/2004US6825156 Semiconductor process residue removal composition and process
11/30/2004US6824623 Graffiti remover, paint stripper, degreaser
11/30/2004US6823879 Apparatus for cleaning pipes
11/25/2004WO2004102621A2 Supercritical fluid-based cleaning compositions and methods
11/25/2004WO2004102620A2 Method to passivate conductive surfaces during semiconductor processing
11/25/2004WO2004101181A2 System and method for cleaning of workpieces using supercritical carbon dioxide
11/25/2004US20040235707 Concentrated, preferably biodegradable, quaternary ammonium fabric softener compositions containing cationic polymers and process for preparation
11/25/2004US20040235704 Using solution or suspension containing anionic surfactant and hydrotropic compound
11/25/2004US20040235697 Dishwashing method
11/25/2004US20040235696 Water-soluble sodium sulphate lauryl ether, cetyltrimethyl ammonium chloride, hydrophobic soap, and triethanolamine; for cutlery, surgical tools, and shave blades
11/25/2004US20040235692 Emulsion to preserve keen edge of a blade
11/25/2004US20040235680 Contains oxalkylated alcohol carboxylic acid; for use with liquid beverage containers formed of polyethylene terephthalate/polybutylene terephthalate
11/25/2004US20040235306 Cleaning composition and method of washing a silicon wafer
11/25/2004US20040231705 Cleaning method of ceramic member
11/25/2004US20040231702 Flushing for refrigeration system components
11/25/2004US20040231371 Method for providing non-aqueous laundering capability
11/25/2004US20040231061 Method of stain removal from garments worn on the body
11/25/2004CA2565231A1 Supercritical fluid-based cleaning compositions and methods
11/24/2004EP1480263A1 Method of treating surface, semiconductor device, process for producing semiconductor device, and apparatus for treatment
11/24/2004EP1479756A2 Dishwashing method
11/24/2004EP1478722A1 Liquid cleaning compositions
11/24/2004EP1332203B1 Production of anionic surfactant granules by in situ neutralisation
11/24/2004EP1104450B1 A cleaning solution and method
11/23/2004US6821937 Effective in removing graffiti and paint from surfaces
11/23/2004US6821042 Compositions for treating shoes and methods and articles employing same
11/23/2004US6820335 Washing alkali-washed oxide-coated components with water to provide water-washed components; acid backstripping step is avoided
11/23/2004CA2467528A1 Emulsion to preserve keen edge of a utensil
11/23/2004CA2297648C Improved processes for making alkylbenzenesulfonate surfactants and products thereof
11/18/2004WO2004100245A1 Removal of post-etch residues in semiconductor processing
11/18/2004WO2004099359A1 Process for producing structured materials
11/18/2004WO2004099356A1 Heterogeneous cleaning composition and methods
11/18/2004WO2004099071A1 Coated sodium percarbonate granules with improved storage stability
11/18/2004WO2004098655A1 Supplemental ozone treatment methods for difficult cleaning and sterilizing applications
11/18/2004US20040229981 Release agent for bituminous material and use thereof
11/18/2004US20040229767 Protomicroemulsion, cleaning implement containing same, and method of use therefor
11/18/2004US20040229766 Protomicroemulsion, cleaning implement containing same, and method of use therefor
11/18/2004US20040229762 Removing polymeric material from a magnetoresistive substrate by contacting with one or more cyclic ketones, particularly cyclopentanone or cyclohexanone, and optionally a polyhydric alcohol or glycol ether solvent
11/18/2004US20040229761 Composition for removal of sidewall polymer and etchant residues without a separate solvent rinse step
11/18/2004US20040229329 formed by heating with plasticizer above glass transition point; water-soluble; water dispersible; low-dust; improved impact/shear force resistance; for use in cleaning compositions
11/18/2004US20040226581 Method of removing solid waste from home dry cleaning system
11/18/2004US20040226106 Method of marketing fabric treating materials for use in conjunction with a home dry cleaning system
11/18/2004US20040226105 Biodegradable ether dry cleaning solvent
11/18/2004DE10318522A1 Detergent or cleansing agent particles with improved optical and storage properties have a coating containing hydroxypropylmethyl- or carboxymethyl-cellulose, plasticizer, filler and light-reflecting component
11/18/2004CA2524699A1 Coated sodium percarbonate granules with improved storage stability
11/17/2004EP1477859A1 Composition for removal of sidewall polymer and etchant residues without a separate solvent rinse step
11/17/2004EP1476530A1 Antifouling detergent for hard surfaces
11/17/2004EP1476132A1 Soap bar compositions comprising alpha sulfonated fatty acid alkyl esters and polyhydridic alcohols and process for producing same
11/17/2004EP1358670A4 Process and apparatus for removing residues from the microstructure of an object
11/17/2004EP1346022B1 Improved detergent composition
11/17/2004EP1107830B1 Environmental wipe solvent compositions and processes
11/17/2004CN1176199C Acidic composition containing fluoride for removal of photoresists and etch residues
11/16/2004US6818608 A mixture comprising tetrabutylammonium fluoride, 1,8-diazabicyclo(5.4.0)undec-7-ene or diethylhyroxlyamine, a solvent of n,n-dimethylacetamide or methyl ethyl ketone; antisoilants removing polysiloxanes, acrylic, epoxy resins
11/16/2004US6818606 Mixing detergent with water-soluble or disintegrating-in-water particles; spray drying slurry containing detergent or surfactant; forming into layer; joining substrate on both sides; laundry
11/16/2004US6818212 Antimicrobial composition containing a haloperoxidase, a hydrogen peroxide source, a halide source and an ammonium source
11/16/2004US6818204 Stable foam for use in disposable wipe
11/16/2004US6818021 Domestic fabric article refreshment in integrated cleaning and treatment processes
11/11/2004WO2004097918A1 Etching liquid, remover liquid and etching method
11/11/2004WO2004074419A3 Detergent compositions
11/11/2004US20040224874 Process for producing coated detergent particles
11/11/2004US20040224873 fine-grained detergent comprising a direct spray drying product; produced by atomizing the heated composition into a relaxation space that is not at excess pressure to form a particulate
11/11/2004US20040224866 can remove substances strongly attached to the surface of semiconductor substrates without damaging metal wiring and interlayer insulation films; comprises an oxidizing agent, an acid and a fluorine compound, has a pH adjusted in a range of 3 to 10
11/11/2004US20040224865 Supercritical fluid-based cleaning compositions and methods
11/11/2004US20040224521 Method to passivate conductive surfaces during semiconductor processing
11/11/2004US20040224516 Semiconductor stress buffer coating edge bead removal compositions and method for their use
11/11/2004US20040221873 Processes and compositions for use in garment restoration
11/11/2004US20040221870 Cleaning product for titanium surface, descaling with mixture of nitric acid and hydrofluoric acid with thickeners, surfactants and propellants
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