| Patents for C08F 32 - Homopolymers or copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system (1,785) |
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| 07/15/2003 | US6593440 Hardness and adhesive properties, high-temperature stability |
| 07/10/2003 | US20030129527 Negative deep ultraviolet photoresist |
| 07/09/2003 | EP0871678B1 Polyfunctionally reactive polymer substances |
| 07/01/2003 | US6586619 5-norbornene-2-carboxylic acid-3-hydroxyethyl carboxylate for example; far ultraviolet photolithography |
| 06/26/2003 | WO2002010810A3 Optical waveguides and methods for making the same |
| 06/26/2003 | US20030120009 Polymer, resist composition and patterning process |
| 06/26/2003 | US20030120006 In mold addition polymerization of norbornene-type monomers using group 10 metal complexes |
| 06/26/2003 | US20030118933 Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same |
| 06/25/2003 | EP1157058B1 Method of preparing norbornene sulfonamide polymers |
| 06/19/2003 | WO2003050158A1 Polymeric compositions and uses therefor |
| 06/10/2003 | US6576767 Method for producing condensation compounds |
| 06/10/2003 | US6576726 Titanium, zirconium, hafnium, vanadium, niobium, or tantalum metal cyclopentylindenyl complex and alumoxane activator |
| 06/04/2003 | EP0963365B1 Solid acids as catalysts for the preparation of hydrocarbon resins |
| 06/03/2003 | CA2070654C Process for producing cyclic olefin based polymers, cyclic olefin copolymers, compositions and molded articles comprising the copolymers |
| 05/27/2003 | US6569971 Polymers for photoresist and photoresist compositions using the same |
| 05/27/2003 | US6569800 Catalyst component for polymerization of olefins, polymerization catalyst and process of polymerization of olefins by using the same |
| 05/22/2003 | US20030097008 Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer |
| 05/21/2003 | EP0837885A4 Peroxide crosslinking of romp polymers |
| 05/20/2003 | US6566570 Process for preparing cyclic monomers |
| 05/15/2003 | US20030092785 Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom |
| 05/07/2003 | EP1307493A2 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 05/02/2003 | EP1007583B1 Process of rheology modification of polymers |
| 05/01/2003 | US20030083392 Lower dielectric constant than corresponding non-porous matrix material, making porous matrix material particularly attractive for electronic applications including integrated circuits, multichip modules, and flat panel displays |
| 04/29/2003 | US6555643 Linear, isotactic polymers, process for preparing same, and use thereof |
| 04/22/2003 | US6552143 Polymeric compound and resin composition for photoresist |
| 04/22/2003 | US6552129 Reacting a poly(sulfonyl azide) (PSA) compound with a polymer by forming a first concentrate of the polymer in a diluent and PSA, then mixing that with a second polymer, heating to decompose PSA and couple polymer chains; no black specks |
| 04/16/2003 | EP1302484A2 Linear, isotactic polymers, process for preparing same, and use thereof |
| 04/16/2003 | CN1410458A Technology of preparing comb shaped polymer by combining atomic transfer free radical and ring opening disproportionation polymerization |
| 04/10/2003 | US20030069357 Aromatic oligomer, phenolic resin composition containing the same, and epoxy resin composition and cured product obtained therefrom |
| 04/09/2003 | EP1300727A2 Positive photosensitive composition |
| 04/09/2003 | CN1105118C Method for producing high melting-point polyolefines |
| 03/25/2003 | US6538087 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 03/20/2003 | US20030055186 Useful as molding resins |
| 03/19/2003 | EP1070089B1 Linear, isotactic polymers, process for preparing same, and use thereof |
| 03/12/2003 | CN1102935C Process for production of cycloolefin random copolymer |
| 03/11/2003 | US6531562 Such as 2-(1-tert- butoxycarbonylpiperidin-2-yl)ethyl 5-norbornene-2-carboxylate; photolithography; etching/heat resistance; semiconductors |
| 03/04/2003 | US6528136 Rheology modification of polymers prepared using metallocenes |
| 02/19/2003 | EP1192191B1 Method for producing condensation compounds |
| 02/18/2003 | US6521306 Coupling amount of at least one poly(sulfonyl azide) |
| 02/05/2003 | CN1100799C Method for proudcing cycloolefin or (co) polymers for industrial applications |
| 02/04/2003 | US6515149 Acetal compound, polymer, resist composition and patterning response |
| 02/04/2003 | US6515084 Used to catalyze ring opening polymerization, depolymerization of unsaturated polymers, systhesis of telechelic polymers, synthesizing olefins and cross metathesis of 2 acyclic olefins |
| 01/30/2003 | US20030023013 Contacting cycloolefin monomer with a high activity transition metal catalyst complex to obtain polycycloolefin |
| 01/28/2003 | US6512067 Polymer, resist composition and patterning process |
| 01/23/2003 | US20030018153 Photolithography |
| 01/21/2003 | US6509481 Tetrahydrofuran compounds having alicyclic structure |
| 01/21/2003 | US6509135 Polymer, resist composition and patterning process |
| 01/15/2003 | EP1185541B1 Catalyst system on the basis of fulvene compounds |
| 01/14/2003 | US6506920 Polymerization of olefins |
| 01/14/2003 | US6506848 Heating an elastomer of ethylene and alpha-olefin and/or diene comonomer(s) and a coupler of poly(sulfonyl azide) to its decomposition temperature for a period of time; gel content of </= 2% wt |
| 01/02/2003 | US20030003379 Photoresist monomers, polymers thereof and photoresist compositons containing the same |
| 12/31/2002 | US6500971 Ester compounds having alicyclic and oxirane structures and method for preparing the same |
| 12/26/2002 | US20020198356 For producing electronic components, such as, for example, printed circuit boards; hydrophobicity, low dielectric constant |
| 12/26/2002 | US20020198342 Catalyzed reinforced polymer composites |
| 12/26/2002 | US20020197407 Reactive coalescents |
| 12/25/2002 | CN1097060C Method for producing elastomers |
| 12/25/2002 | CN1097059C Method for producing thermoplastic elastomers |
| 12/18/2002 | CN1096480C Polymersible compound and polymerisation method |
| 12/10/2002 | US6492089 Polymer, resist composition and patterning process |
| 12/05/2002 | US20020183529 Novel tetrahydrofuran compounds having alicyclic structure |
| 12/05/2002 | US20020183465 Making petroleum resins using supported metal halides as solid catalyst where all freely-associated water has been removed from the catalyst; reduced acid residue or by-product contamination of product |
| 12/03/2002 | US6489033 Electrets |
| 11/21/2002 | US20020173680 Polymer containing spirocyclic olefin monomers, such as 2,5-dioxo-5',6'-didehydro-spiro(tetrahydrofuran-3,2'-norbornane); forming relief images |
| 11/20/2002 | EP0993465B1 Ruthenium and osmium carbene catalysts |
| 11/20/2002 | CN1094488C Polymerizable urea/ureido functional monomers |
| 11/14/2002 | US20020169266 Polymeric compound and resin composition for photoresist |
| 11/07/2002 | US20020164541 Photoresist comprising fluoroalkylated units of phthalimide and norbornene-based esters such as 2-methoxybutyl-2-adamantanyl 5-norbornene-2-carboxylate; etch resistance, heat resistance and adhesiveness |
| 11/06/2002 | EP0988329B1 Electrets |
| 11/05/2002 | US6476240 Polymers derived from an unsaturated fused cyclic hydrocarbon (such as perhydro-2,3-didehydro-1,4:5,8-dimethanonaphthalene) joined by a linker to an ester group having one or two protected hydroxyls; use as photoresist |
| 10/31/2002 | US20020160302 Forming relief images |
| 10/30/2002 | EP1253156A2 High activity ruthenium or osmium metal carbene complexes for olefin metathesis reactions and synthesis and application thereof |
| 10/29/2002 | US6472543 Lactone compounds having alicyclic structure and their manufacturing method |
| 10/24/2002 | US20020155380 Forming relief images; transferring image |
| 10/23/2002 | EP1251135A2 High activity ruthenium or osmium metal carbene complexes for olefin metathesis reactions and synthesis thereof |
| 10/23/2002 | CN1093132C Metallocene compounds |
| 10/17/2002 | US20020151666 Such as 2-(1-tert- butoxycarbonylpiperidin-2-yl)ethyl 5-norbornene-2-carboxylate; photolithography; etching/heat resistance; semiconductors |
| 10/16/2002 | CN1092672C Ethylene copolymer, process for producing vinyl polymer and catalyst system used therein |
| 10/10/2002 | WO2002079287A1 Polycyclic fluorine-containing polymers and photoresists for microlithography |
| 10/10/2002 | US20020146641 Chemically amplifying type positive resist composition |
| 09/26/2002 | US20020137863 Cycloolefin copolymers and a process for their preparation |
| 09/26/2002 | US20020136982 Photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups such as norbornenecarboxylic acid, tert-butyl ester copolymer with the corresponding linear alkyl ester |
| 09/24/2002 | US6455650 Catalyst and methods for polymerizing cycloolefins |
| 09/24/2002 | US6455225 Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same |
| 09/19/2002 | US20020132970 Exposure to high energy radiation |
| 09/17/2002 | US6451945 Containing pendant acid labile functional group and a functional group containing a methyl carbonyl or silyl protected hydroxyl moiety |
| 09/17/2002 | US6451499 Polycyclic resist compositions with increased etch resistance |
| 09/17/2002 | US6451380 Improved stability with inhibitor selected from 4-methoxyphenol, 4-hydroxy-2,2,6,6-tetramethyl-1-piperidinyloxy, 4-oxo-2,2,6,6-tetramethyl- 1-piperidinyloxy, and di-tertiary butyl nitroxyl; emulsion polymer; coatings |
| 09/12/2002 | US20020127490 Radiation sensitive bilayer resists which are used in manufacture of integrated circuits |
| 09/10/2002 | US6448352 Photoresist monomer, polymer thereof and photoresist composition containing it |
| 09/10/2002 | US6447868 Injection molding material comprising a cyclic polyolefin resin having a glass transition temperature of 120 c to 170 c; polyalkenamers |
| 09/05/2002 | US20020123573 Heating an elastomer of ethylene and alpha-olefin and/or diene comonomer(s) and a coupler of poly(sulfonyl azide) to its decomposition temperature for a period of time; gel content of </= 2% wt |
| 09/03/2002 | US6444408 Polymerizable monomers having silicon containing groups that are transparent; and ethylenically unsaturated group are provided. and images |
| 09/03/2002 | US6444396 Ester compounds, polymers, resist composition and patterning process |
| 08/29/2002 | US20020119391 Using cyclic olefin polymer; forming relief images |
| 08/28/2002 | CN1089771C Process for preparation of cyclenes copolymer |
| 08/22/2002 | US20020115807 Polymer, resist composition and patterning process |
| 08/15/2002 | WO2002062757A1 Norbornene-based heterobifunctional monomers and uses therefor |
| 08/01/2002 | WO2002059168A1 Processes for producing cycloolefin addition polymer |
| 08/01/2002 | US20020103317 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 07/30/2002 | US6426396 Paraphenylene polymer produced by removing the substitiuents from the cyclohexadiene ring; nickel based catalyst; electroconductivity |