Patents
Patents for C08F 32 - Homopolymers or copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system (1,785)
07/2002
07/23/2002US6423780 Heterobifunctional monomers and uses therefor
07/23/2002US6423659 π-complex compounds
07/17/2002EP1105398B1 Activator composition comprising aluminum compound mixture
07/17/2002EP0971963B1 Pi-complex compounds
07/16/2002US6420503 Polycarbons/other/
07/11/2002WO2002010231A3 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
07/11/2002US20020091216 5-norbornene-2-carboxylic acid-3-hydroxyethyl carboxylate for example; far ultraviolet photolithography
07/11/2002US20020091199 Process of rheology modification of polymers
07/03/2002EP1070087B1 A catalyst combination and a process for preparing linear, isotactic polymers
06/2002
06/26/2002CN1355816A Method for producing condensation compounds
06/25/2002US6410670 Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
06/19/2002CN1354392A 化学放大型正光刻胶组合物 Chemical amplification type positive resist composition
06/19/2002CN1086395C Amine-thiol chain transfer agents
06/18/2002US6407190 Ruthenium and osmium carbene catalysts
06/18/2002US6406828 N-heterocycle polymers
06/13/2002US20020072579 Novel tertiary alcohol compounds having alicyclic structure
06/11/2002US6403823 Ester compounds having alicyclic structure and method for preparing same
06/11/2002US6403822 Nucleophilic addition of alicyclic carbonyl and metal enolate of acetate; polycarbon monomers for photoresists; high reactivity and substrate affinity
06/04/2002US6399792 Photoresist cross-linker and photoresist composition comprising the same
06/04/2002US6399274 Resist composition and patterning process
05/2002
05/30/2002US20020064896 Curing a cladding layer to form a core/cladding combination and removing the core/cladding to expose a portion of the core that has refractive index .05% higher than the cured cladding composition
05/23/2002US20020061465 Polymer, resist composition and patterning process
05/22/2002EP1207423A1 Chemically amplifying type positive resist composition
05/21/2002US6391518 Copolymer of 5-norbornene-2,3-dicarboxylic acid and 5-norbornene-2-carboxylate derivatives; semiconductors, photolithography
05/16/2002US20020058204 Planarizing underlayers for multilayer lithography are characterized by the presence of a polymer containing a cyclic ether monomer, a saturated polycyclic monomer, and aromatic monomer, and an acid generator
05/14/2002US6387838 Activator composition comprising aluminum compound mixture
05/10/2002WO2002036646A1 High-molecular compounds for photoresists, monomeric compounds, photosensitive resin compositions, method for forming patterns with the compositions, and process for production of electronic components
05/08/2002CN1084340C Process for producing polydicyclopentadiene
05/02/2002US20020052454 Contacting polycycloolefin monomer with a high activity Group 10 transition metal catalyst complex to obtain polymer product
04/2002
04/25/2002US20020049287 Novel polymers for photoresist and photoresist compositions using the same
04/23/2002US6376632 Norbornene compound containing carboxy groups
04/23/2002US6376623 Heating; coupling with polysulfonyl azide
04/11/2002US20020042531 Polymers derived from an unsaturated fused cyclic hydrocarbon (such as perhydro-2,3-didehydro-1,4:5,8-dimethanonaphthalene) joined by a linker to an ester group having one or two protected hydroxyls; use as photoresist
04/10/2002EP0912585B1 Metallocene compounds
04/09/2002US6368773 Photoresist cross-linker and photoresist composition comprising the same
04/09/2002US6368770 Photoresist monomers, polymers thereof, and photoresist compositions containing the same
04/04/2002US20020040115 Hardness and adhesive properties, high-temperature stability
04/04/2002US20020039963 Zirconium, hafnium or titanium metallocene; storage stability and high catalyst activity
04/03/2002EP1192191A1 Method for producing condensation compounds
03/2002
03/21/2002US20020035279 Novel ester compounds having alicyclic and oxirane structures and method for preparing the same
03/20/2002EP1187866A1 Microstructured components
03/19/2002US6359153 Photoresist monomers and preparation thereof
03/19/2002US6359073 Process of rheology modification of polymers
03/13/2002EP1185541A1 Catalyst system on the basis of fulven compounds
03/13/2002CN1340066A Polymers based on vinylcyclohexane
02/2002
02/26/2002US6350832 Mold addition polymerization of norbornene-type monomers using group 10 metal complexes
02/26/2002US6350831 Process for the polymerization of olefins using a catalyst containing a novel catalyst component
02/14/2002US20020019560 Novel photoresist cross-linker and photoresist composition comprising the same
02/14/2002US20020018960 High etching resistance, heat resistance and adhesiveness; low ultraviolet light absorbance; can be developed in aqueous tetramethylammonium hydroxide solution; for fabricating circuits for high integration semiconductors
02/13/2002CN1335325A Neutral catalyst for polymerization of pyrroimino nickel cycloolefine
02/07/2002WO2002010810A2 Optical waveguides and methods for making the same
02/07/2002WO2002010231A2 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
02/07/2002US20020016477 Novel lactone compounds having alicyclic structure and their manufacturing method
02/06/2002EP1178057A2 A catalyst composition and a process for preparing linear, isotactic polymers
02/06/2002EP1177096A1 Multilayer containers exhibiting an improved adherence between polymer layers as well as excellent barrier characteristics
01/2002
01/31/2002US20020013448 Novel monomers, polymers, methods of synthesis thereof and photoresist compositions
01/30/2002CN1333788A In mold addition polymerization of norbornene-type monomers using group 10 metal complexes
01/30/2002CN1333787A Method and apparatus for discharging polymerization reactors
01/23/2002CN1332752A Method of producing derivatized polymers
01/17/2002US20020007026 Paraphenylene polymer produced by removing the substitiuents from the cyclohexadiene ring; nickel based catalyst; electroconductivity
01/16/2002EP1172694A1 Polymeric compound for photoresist and resin composition for photoresist
01/16/2002EP1005476B1 Method for producing ruthenium complexes
01/10/2002US20020004570 Polymer and photoresist compositions
12/2001
12/26/2001CN1328589A Composition containing cross-linkable matrix precursor and poragen, and porous matrix prepared therefrom
12/20/2001US20010053834 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
12/19/2001EP1163275A1 Polymers based on vinylcyclohexane
12/19/2001EP0711270B1 Polymers comprising 4-substituted cyclohexane units
12/18/2001US6331602 Monomer and a polymer obtained therefrom
12/13/2001US20010051742 Norbornene ester such as 1-ethylcyclopentyl 3-acetoxy-3-(5-norbornen-2-yl)propionate for use as monomer in photoresist resin having good reactivity and radiation transparency using excimer laser as light source
12/13/2001US20010051741 Novel ester compounds having alicyclic structure and method for preparing same
12/05/2001EP1159305A1 Method and apparatus for discharging polymerization reactors
12/05/2001CN1325410A Polymerization of olefins
11/2001
11/28/2001EP1157058A1 Method of preparing norbornene sulfonamide polymers
11/27/2001US6323149 Alcohol or mercaptan substituted transition metal metallocene; organic aluminum oxy compound or cation generator; generates no hydrogen halide by hydrolysis and easily handled, and has a high storage stability
11/21/2001EP1155057A1 In mold addition polymerization of norbornene-type monomers using group 10 metal complexes
11/21/2001CN1323322A Polymerization of olefins
11/20/2001CA2207080C Method for feeding a liquid catalyst to a fluidized bed polymerization reactor
11/14/2001EP0988327B1 Polymerization of olefins
11/08/2001US20010039360 High metathesis activity ruthenium and osmium metal carbene complexes
11/06/2001US6313250 Polyfunctionally reactive polymer substances
11/06/2001US6312868 Photoresist cross-linker and photoresist composition comprising the same
11/06/2001US6312865 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
10/2001
10/31/2001EP1149826A2 Ester compounds having alicyclic structure, and methods for preparing the same
10/31/2001EP0904304B1 Manufacture of stereoregular polymers
10/30/2001US6310160 Norbornene polymer and process for preparing the same
10/30/2001US6310154 Polymerization of pentene in presence of acid catalyst on support
10/25/2001WO2001021588A3 Cycloalkyl bicycloheptene dicarboximides
10/25/2001US20010033989 Fluoropolymer
10/23/2001US6306986 Polymerization of olefins
10/18/2001WO2001077192A1 Aromatic oligomer, phenolic resin composition containing the same, and epoxy resin composition and cured object obtained therefrom
10/18/2001US20010031845 Using coordination catalyst
10/18/2001US20010031424 Polymers having fused rings with polar and acid labile groups tetracyclo(4.4.0.1(2,5).1(7,10))dodec-3-ene-8-carboxylic acid, tert-butyl ester for example; resists with improved etch resistance, resolution and sensitivity
10/16/2001US6303725 Cyclic dione polymer
10/10/2001EP1141128A1 A composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom
10/10/2001EP1141038A1 Method of producing a polymer network
10/10/2001EP0683798B1 Process for producing cyclo-olefin copolymers with high tenacity and low optical attenuation
10/04/2001EP1137676A1 Polymerization of olefins
09/2001
09/25/2001US6294616 Blends and alloys of polycyclic polymers
09/20/2001WO2001068728A1 Poly(alicyclic olefin) and process for producing the same
09/05/2001EP1130468A2 Polymer and photoresist compositions
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