Patents
Patents for C08F 32 - Homopolymers or copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system (1,785)
08/2004
08/25/2004EP1448617A1 Method for preparing norbornene based addition polymer containing ester or acetyl functional group
08/25/2004CN1163796C Cross linking agent for photoslushing compound, and photoslushing compound compsns. containing same cross linking agent
08/24/2004US6780563 Polymer, resist composition and patterning process
08/17/2004US6777502 Coupling polyolefin with polysulfonylazide compound
08/10/2004US6774258 Useful as monomer to form polymer which serves as a base resin in chemically amplified resist
08/10/2004US6774195 For use in situ; polymerization catalyst
07/2004
07/27/2004US6767686 Chemically amplifying type positive resist composition
07/15/2004WO2003060979A3 Organic compositions for low dielectric constant materials
07/13/2004US6762265 Ring retention free radical copolymerization of polycyclic, monocylic and aliphatic monomers
07/08/2004US20040132934 Combining cyclic olefin monomer with transition metal alkylidene complex containing a cyclic group of known size, whereby cyclic olefin monomer successively inserts into the cyclic group to increase size thereof in a stepwise manner
07/08/2004US20040132243 Method of forming cavity between multilayered wirings
06/2004
06/30/2004CN1508160A Olefin polymerization process
06/30/2004CN1155623C Method and apparatus for discharging polymerization reactors
06/24/2004WO2004041760A3 Fluorinated polymers
06/22/2004US6753127 Using mixture of norbornene polymer, acid generator and solvent; prebaking, exposure to radiation
06/17/2004WO2004050726A1 Method for polymerizing cycloolefin polymer containing polar functional groups and electronic devices employing the polymerized cycloolefins
06/17/2004WO2004013198A3 Synthesis of macrocyclic polymers by ring insertion polymerization of cyclic olefin monomers
06/15/2004US6750272 Dispensing a reactive cyclic olefin liquid into a mold and the mold comprises fibers and a single-component activator(a ruthenium or osmium complex) on the fibers
06/09/2004EP1426386A1 Catalyst component for polymerization of olefins
05/2004
05/26/2004CN1500099A Polycyclic fluorine-contg. polymers and photoresists for microlithography
05/25/2004US6740358 Reactive coalescents
05/21/2004WO2004041760A2 Fluorinated polymers
05/19/2004CN1496943A Elastic composition and rubber roll using said composition
05/13/2004US20040091813 Norbornene based monomers; transparent at 157 nm; generating positive tone resist image
05/06/2004EP1416528A2 Method of forming cavity between multilayered wirings
04/2004
04/29/2004WO2004035636A2 Polymerized cycloolefins using transition metal catalyst and end products thereof
04/29/2004US20040082725 Mixture of thermoplastic elastomer and reinforcing filler
04/29/2004US20040082724 Novel heterobifunctional monomers and uses therefor
04/28/2004EP1159305B1 Method and apparatus for discharging polymerization reactors
04/20/2004CA2055397C Bulk polymerization using specific metallocene catalysts for the preparation of cycloolefin polymers
04/14/2004EP1060206B1 Modified polycyclic polymers
04/13/2004US6720129 Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same
04/08/2004US20040068124 Capable of forming a polymer which is effectively acid-decomposable and can control the diffusion of the acid generated upon exposure
04/07/2004CN1144820C Process for preparing condensation compound
04/01/2004US20040063885 Photo-imageable compositions that include polymers of acrylate- type monomers and norbornene-type monomers. In some embodiments a catalyst system comprising a cationic or a neutral Pd(II) dimer component having the formula
04/01/2004US20040063873 Polymerizing a cyclic olefin containing a substituted norbornene by addition polymerization in a hydrocarbon solvent, using a catalyst system containing a transition metal compound, a lewis acid and an alkyl alumoxane
03/2004
03/31/2004EP1403295A2 Ester compounds, polymers, resist compositions and patterning process
03/23/2004US6710188 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
03/11/2004US20040048994 Especially a copolymer of norbornene and/or alkylnorbornene and (trialkoxysilylalkyl)norbornene; optical articles such as ophthalmic lenses, wave guides, optical fibers, and optical adhesives
03/09/2004US6703466 Optic also having rubbery bulk and reduced risk of posterior capsule opacification, and with specified refractive index, elongation, bulk and surface glass transition temperatures, and surface elastic modulus
03/03/2004EP0842200B1 High metathesis activity ruthenium and osmium metal carbene complexes
03/03/2004CN1140549C Blends and alloy of polycylic polymers
03/03/2004CN1140541C Polymers based on vinylcyclohexane
02/2004
02/18/2004EP0862589B1 Addition polymers of polycycloolefins containing silyl functional groups
02/18/2004CN1138789C Method of producing network structure of polymer
02/12/2004WO2004013198A2 Synthesis of macrocyclic polymers by ring insertion polymerization of cyclic olefin monomers
02/05/2004US20040023151 Negative resist material and pattern formation method using the same
01/2004
01/28/2004EP1383812A1 Polycyclic fluorine-containing polymers and photoresists for microlithography
01/27/2004US6682797 Made of thermoplastic resins impervious to water, organics and fine dust
01/22/2004WO2004007587A1 Nobonene-ester based addition polymer and method for preparing the same
01/22/2004WO2004007564A1 Method for preparing norbornene based addition polymer containing ester or acetyl functional group
01/13/2004US6677175 Optical waveguides and methods for making the same
01/08/2004WO2004003035A1 Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation
01/08/2004US20040006189 For use in fine patterning of semiconductors
01/07/2004CN1133662C Linear, Isotactic polymers, process for preparing same, and use thereof
01/07/2004CN1133659C Olefin polymerization process
01/02/2004EP1376684A2 Fabrication of a semiconductor device with air gaps for ultra-low capacitance interconnections
01/02/2004EP1375506A1 High metathesis activity ruthenium and osmium metal carbene complexes
12/2003
12/30/2003US6670433 Useful as molding resins
12/25/2003US20030235781 Used in manufacturing a semiconductor device
12/23/2003US6667145 Resist composition comprising as a base resin a polymer having highly adherent, highly rigid units and especially suited as micropatterning material for VLSI fabrication, and (2) a patterning process using the resist
12/18/2003WO2003073169A3 Fluorinated molecules and methods of making and using same
12/18/2003US20030232276 Fluorinated molecules and methods of making and using same
12/16/2003US6664351 Ethylene copolymers, process for the preparation of ethylene-based polymers and catalyst system used therein
12/04/2003US20030224297 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
12/03/2003EP0963603B1 Fabrication of a semiconductor device with air gaps for ultra-low capacitance interconnections
12/03/2003CN1129616C Manufacture of stereoregular polymers
11/2003
11/26/2003EP1364975A1 Processes for producing cycloolefin addition polymer
11/26/2003CN1129166C Photoresist polymer, composition and its preparing method
11/26/2003CN1128816C Catalyst combination and process for preparing linear, isotactic polymer
11/25/2003US6653358 Electronics; integrated circuits; containing benzocyclobutene polymer
11/25/2003US6653048 High silicon content monomers and polymers suitable for 193 nm bilayer resists
11/18/2003US6649707 Blends and alloys of polycyclic polymers
10/2003
10/28/2003US6639084 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
10/14/2003US6632903 Chemical and etching resistance
10/09/2003US20030191259 Novel polymers for photoresist and photoresist compositions using the same
10/07/2003US6630520 Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom
09/2003
09/25/2003US20030181609 High metathesis activity ruthenium and osmium metal carbene complexes
09/25/2003US20030181607 Polymerized cycloolefins using transition metal catalyst and end products thereof
09/18/2003US20030176612 Linear, isotactic polymers, process for preparing same, and use thereof
09/18/2003US20030176583 Polymeric compositions and uses therefor
09/18/2003US20030175460 Rheology modification of polymers prepared using metallocenes
09/10/2003EP1342110A2 Optical waveguides and methods for making the same
09/10/2003EP0964844B1 Fluorinated solid acids as catalysts for the preparation of hydrocarbon resins
09/10/2003EP0828769B1 Blends and alloys of polycyclic polymers
09/04/2003WO2003073169A2 Fluorinated molecules and methods of making and using same
09/04/2003US20030166803 Addition polymer using coordination catalyst
08/2003
08/28/2003US20030162922 For use in situ; polymerization catalyst
08/21/2003WO2003068831A1 Bicyclic conjugated diene polymer and bicyclic conjugated diene copolymer
08/21/2003US20030157430 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same
08/19/2003US6608155 Making petroleum resins using supported metal halides as solid catalyst where all freely-associated water has been removed from the catalyst; reduced acid residue or by-product contamination of product
08/14/2003US20030153706 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by -(CH2)m-m=1 to 8 used as monomer; polymer is sensitive to high energy radiation excellent resolution, and etching resistance
08/12/2003US6605678 Polymer, resist composition and patterning process
08/07/2003US20030148206 Acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic
07/2003
07/30/2003CN1116324C Process for preparing cycloolefin copolymers
07/29/2003US6599677 Forming relief images; transferring image
07/24/2003WO2003060979A2 Organic compositions for low dielectric constant materials
07/22/2003US6596810 Blends of cycloolefin and core/shell polymers
07/22/2003US6596459 Photosensitive polymer and resist composition containing the same
07/17/2003WO2003058347A1 Negative deep ultraviolet photoresist
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