Patents
Patents for B82Y 10 - Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic (1,512)
03/2007
03/07/2007EP1759012A2 Recombinase polymerase amplification
02/2007
02/28/2007EP1756244A1 Cerium oxide abrasive and slurry containing the same
02/14/2007EP1753010A1 Particle-optical system
02/14/2007CN1300254C Organic semiconductor material and organic semiconductor element employing the same
02/13/2007US7176479 Nitride compound semiconductor element
12/2006
12/27/2006EP1735810A1 A large-area shower electron beam irradiator with field emitters as an electron source
12/27/2006CN1292460C Slurry for CMP, polishing method and method of manufacturing semiconductor device
12/14/2006WO2006080796A8 Cerium oxide abrasive and slurry containing the same
12/14/2006US20060279004 Mold, pattern forming method, and pattern forming apparatus
12/13/2006EP1731965A2 Imprint stamp comprising cyclic olefin copolymer
12/13/2006EP1731963A2 Mold, pattern forming method, and pattern forming apparatus
12/07/2006US20060273326 Semiconductor Light Emitting Device, its Manufacturing Method, Semiconductor Device and Its Manufacturing Method
12/05/2006US7144682 non-polarized exposure light from a light source is projected onto an exposure mask having a light blocking film and a plurality of rectangular openings formed in the light blocking film; small-opening pattern
11/2006
11/29/2006CN1870221A Method for forming group-III nitride semiconductor layer and semiconductor device
11/16/2006US20060254348 Scanning probe device and processing method of scanning probe
11/16/2006US20060254347 Scanning probe device and processing method by scanning probe
11/02/2006US20060243702 chemical mechanical polishing (CMP) copper films via slurry of polyvinylpyrrolidone, oxidizing agent, protective film-forming agent containing complexing agent (containing quinaldinic acid, quinolinic acid, and alkylbenzene sulfonate) for forming water-insoluble complex, and colloidal sol
11/02/2006US20060242912 Slurry composition for secondary polishing of silicon wafer
11/02/2006EP1717609A1 Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
11/02/2006EP1716588A1 Imprinting apparatus with independently actuating separable modules
11/01/2006CN1854225A Cmp slurry for metal film, polishing method and method for manufacturing semiconductor
10/2006
10/25/2006EP1715530A1 Functional molecular element
10/25/2006EP1715085A2 Method for producing anodized structure
10/25/2006CN1282257C Device with nitrides system heterogenous structure and its manufacturing method
10/19/2006US20060231525 Forming microphase-separated structure in film of graft or block copolymer with a chain of polyacrylonitrile, polycyclohexadiene derivative, polybutadiene, polysilane, polysiloxane, polyamic acid or polyaniline and thermally decomposable polymer chain; heating to decompose the decomposable phase; etching
10/11/2006EP1709213A2 Systems and methods for synthesis of extended length nanostructures
10/11/2006CN1845872A Fine structure body-producing method, fine structure body, display device, recording device-producing method, and recording device
10/04/2006EP1706906A1 Semi-conductor circuit and suitable production method therefor
09/2006
09/19/2006US7107826 Scanning probe device and processing method by scanning probe
09/07/2006US20060197055 Slurry for CMP, polishing method and method of manufacturing semiconductor device
08/2006
08/30/2006EP1696053A1 Nano-array electrode manufacturing method and photoelectric converter using same
08/29/2006US7097781 Method for manufacturing porous structure and method for forming pattern
08/15/2006US7090784 Method for manufacturing porous structure and method for forming pattern
08/03/2006WO2006080796A1 Cerium oxide abrasive and slurry containing the same
08/02/2006CN1268046C Method for forming third main group nitride semiconductor layer and semiconductor device
07/2006
07/27/2006US20060162260 Cerium oxide abrasive and slurry containing the same
07/26/2006EP1682445A1 Device and method for patterning structures on a substrate
07/12/2006CN1264261C Semiconductor laser device and optical disk regenerating and recording apparatus
06/2006
06/29/2006CA2853583A1 Analog processor comprising quantum devices
06/14/2006EP1668662A2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
06/13/2006US7060621 Slurry for CMP, polishing method and method of manufacturing semiconductor device
06/07/2006EP1667215A1 Dry etching process and method for manufacturing magnetic memory device
05/2006
05/31/2006EP1661851A1 Fine structure body-producing method, fine structure body, display device, recording device-producing method, and recording device
05/03/2006EP1652817A1 Zeolite, method for production thereof, adsorbent comprising said zeolite, heat utilization system, adsorption heat pump, heating and cooling storage system and humidity controlling air-conditioning apparatus
04/2006
04/27/2006WO2006043656A1 Apparatus and method for depositing fine particles
04/06/2006WO2006035859A1 Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and phosomask using patterned substrate of self-organizing material
04/05/2006EP1643663A1 A addressing method of quanta network and quanta network router
03/2006
03/15/2006CN1748323A High density and high programming efficiency mram design
03/01/2006EP1630882A1 Nanometric structure and corresponding manufacturing method
02/2006
02/15/2006EP1626393A2 Method and apparatus for manufacturing magnetoresistive element
02/07/2006US6995090 Polishing slurry for use in CMP of SiC series compound, polishing method, and method of manufacturing semiconductor device
02/02/2006WO2006011655A1 Single-layer carbon nanotube and alinged single-layer carbon nanotube bulk structure, and their production process, production apparatus and use
01/2006
01/19/2006US20060014329 Nanodots formed on silicon oxide and method of manufacturing the same
01/18/2006CN1722382A Nanodots formed on silicon oxide and method of manufacturing the same
01/11/2006EP1613549A1 Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them
01/10/2006US6984840 Optical semiconductor device having an epitaxial layer of III-V compound semiconductor material containing N as a group V element
01/04/2006EP1611607A1 Method of fabricating semiconductor probe with resistive tip
12/2005
12/28/2005EP1609796A1 N-glycoside type glycolipids and hollow fiber type organic nanotubes made of the same
12/28/2005CN1714432A Slurry composition for secondary polishing of silicon wafer
10/2005
10/26/2005EP1589594A1 Cpp-type giant manetoresistance effect element and magnetic component and magnetic device using it
10/13/2005US20050223785 Scanning probe device and processing method by scanning probe
10/05/2005EP1582924A2 Processing apparatus
09/2005
09/07/2005EP1570512A1 Slurry composition for secondary polishing of silicon wafer
09/07/2005EP1570249A2 Method and system for determining characteristics of substrates employing fluid geometries
09/07/2005EP1569866A2 Process for obtaining spatially-organised nanostructures on thin films
08/2005
08/24/2005EP1565566A2 Protein synthesis monitoring (psm)
08/17/2005EP1562708A1 Microfluidic device and methods for construction and application
08/10/2005EP1560792A1 Carbon nanotube device fabrication
08/04/2005US20050170657 Method of forming nanostructure
08/02/2005US6924023 Method of manufacturing a structure having pores
07/2005
07/27/2005EP1556881A2 Electron beam exposure system
06/2005
06/29/2005EP1546804A1 Device for transferring a pattern to an object
06/15/2005CN1626600A Slurry for CMP, polishing method and method of manufacturing semiconductor device
06/02/2005US20050118821 Slurry for CMP, polishing method and method of manufacturing semiconductor device
06/01/2005EP1535113A2 Exposure method, exposure mask, and exposure apparatus
05/2005
05/04/2005CN1200066C Polishing composition
04/2005
04/20/2005CN1607191A Ultra low thermal expansion transparent glass ceramics
04/07/2005US20050072986 Group-III nitride semiconductor device
03/2005
03/30/2005EP1518271A1 Method and apparatus using nanotubes for cooling and grounding die
03/23/2005EP1516863A1 Ultra low thermal expansion transparent glass-ceramics
03/17/2005WO2005023705A1 Fine structure body-producing method, fine structure body, display device, recording device-producing method, and recording device
02/2005
02/15/2005US6856005 Semiconductor device having a nitride-based hetero-structure and method of manufacturing the same
02/02/2005CN1574238A Slurry for CMP, polishing method and method of manufacturing semiconductor device
01/2005
01/11/2005US6841410 Method for forming group-III nitride semiconductor layer and group-III nitride semiconductor device
12/2004
12/30/2004US20040261323 Abrasive grains which are sufficiently small relative to the line width of wirings so as to make it possible to perform fine and delicate polishing
12/29/2004CN1558932A Organic semiconductor material and organic semiconductor element employing the same
12/22/2004EP1488193A1 Device and method for maskless afm microlithography
12/15/2004EP1485958A2 Self-aligned nanotube field effect transistor and method of fabricating same
12/15/2004EP1485944A1 Laser assisted direct imprint lithography
12/02/2004US20040241900 Organic semiconductor material and organic semiconductor element employing the same
12/02/2004US20040241592 Irradiating light onto a member having a modulation profile smaller than the wavelength of irradiated light and forming a distribution of optical near-field corresponding to surface of said member; introducing material gas to be used for a photochemical reaction; causing photochemical reaction
11/2004
11/17/2004EP1477847A1 Resist material and microfabrication method
11/03/2004EP1473767A2 Method of forming conductive line for semiconductor device using carbon nanotube and semiconductor device manufactured using the method
11/02/2004US6813299 Semiconductor laser device and optical disk reproducing and recording apparatus
10/2004
10/14/2004WO2004023211A3 Exposure method, exposure mask, and exposure apparatus
10/06/2004EP1463685A1 Carbon nanotube particulates, compositions and use thereof
09/2004
09/29/2004EP1463110A2 Semiconductor memory device comprising magneto resistive element and its manufacturing method
09/29/2004CN1169268C Method of manufacturing optical semiconductor device
09/16/2004US20040180157 for electronic devices, battery parts, catalysts and magnetic materials; organic/inorganic hybrid with a catalyst component bound to the organic material molecules as the carbon source; nano-tubes in a high yield and a uniform film
08/2004
08/25/2004EP1449887A1 Organic semiconductor material and organic semiconductor element employing the same
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