Patents for B82Y 10 - Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic (1,512) |
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03/07/2007 | EP1759012A2 Recombinase polymerase amplification |
02/28/2007 | EP1756244A1 Cerium oxide abrasive and slurry containing the same |
02/14/2007 | EP1753010A1 Particle-optical system |
02/14/2007 | CN1300254C Organic semiconductor material and organic semiconductor element employing the same |
02/13/2007 | US7176479 Nitride compound semiconductor element |
12/27/2006 | EP1735810A1 A large-area shower electron beam irradiator with field emitters as an electron source |
12/27/2006 | CN1292460C Slurry for CMP, polishing method and method of manufacturing semiconductor device |
12/14/2006 | WO2006080796A8 Cerium oxide abrasive and slurry containing the same |
12/14/2006 | US20060279004 Mold, pattern forming method, and pattern forming apparatus |
12/13/2006 | EP1731965A2 Imprint stamp comprising cyclic olefin copolymer |
12/13/2006 | EP1731963A2 Mold, pattern forming method, and pattern forming apparatus |
12/07/2006 | US20060273326 Semiconductor Light Emitting Device, its Manufacturing Method, Semiconductor Device and Its Manufacturing Method |
12/05/2006 | US7144682 non-polarized exposure light from a light source is projected onto an exposure mask having a light blocking film and a plurality of rectangular openings formed in the light blocking film; small-opening pattern |
11/29/2006 | CN1870221A Method for forming group-III nitride semiconductor layer and semiconductor device |
11/16/2006 | US20060254348 Scanning probe device and processing method of scanning probe |
11/16/2006 | US20060254347 Scanning probe device and processing method by scanning probe |
11/02/2006 | US20060243702 chemical mechanical polishing (CMP) copper films via slurry of polyvinylpyrrolidone, oxidizing agent, protective film-forming agent containing complexing agent (containing quinaldinic acid, quinolinic acid, and alkylbenzene sulfonate) for forming water-insoluble complex, and colloidal sol |
11/02/2006 | US20060242912 Slurry composition for secondary polishing of silicon wafer |
11/02/2006 | EP1717609A1 Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method |
11/02/2006 | EP1716588A1 Imprinting apparatus with independently actuating separable modules |
11/01/2006 | CN1854225A Cmp slurry for metal film, polishing method and method for manufacturing semiconductor |
10/25/2006 | EP1715530A1 Functional molecular element |
10/25/2006 | EP1715085A2 Method for producing anodized structure |
10/25/2006 | CN1282257C Device with nitrides system heterogenous structure and its manufacturing method |
10/19/2006 | US20060231525 Forming microphase-separated structure in film of graft or block copolymer with a chain of polyacrylonitrile, polycyclohexadiene derivative, polybutadiene, polysilane, polysiloxane, polyamic acid or polyaniline and thermally decomposable polymer chain; heating to decompose the decomposable phase; etching |
10/11/2006 | EP1709213A2 Systems and methods for synthesis of extended length nanostructures |
10/11/2006 | CN1845872A Fine structure body-producing method, fine structure body, display device, recording device-producing method, and recording device |
10/04/2006 | EP1706906A1 Semi-conductor circuit and suitable production method therefor |
09/19/2006 | US7107826 Scanning probe device and processing method by scanning probe |
09/07/2006 | US20060197055 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
08/30/2006 | EP1696053A1 Nano-array electrode manufacturing method and photoelectric converter using same |
08/29/2006 | US7097781 Method for manufacturing porous structure and method for forming pattern |
08/15/2006 | US7090784 Method for manufacturing porous structure and method for forming pattern |
08/03/2006 | WO2006080796A1 Cerium oxide abrasive and slurry containing the same |
08/02/2006 | CN1268046C Method for forming third main group nitride semiconductor layer and semiconductor device |
07/27/2006 | US20060162260 Cerium oxide abrasive and slurry containing the same |
07/26/2006 | EP1682445A1 Device and method for patterning structures on a substrate |
07/12/2006 | CN1264261C Semiconductor laser device and optical disk regenerating and recording apparatus |
06/29/2006 | CA2853583A1 Analog processor comprising quantum devices |
06/14/2006 | EP1668662A2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
06/13/2006 | US7060621 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
06/07/2006 | EP1667215A1 Dry etching process and method for manufacturing magnetic memory device |
05/31/2006 | EP1661851A1 Fine structure body-producing method, fine structure body, display device, recording device-producing method, and recording device |
05/03/2006 | EP1652817A1 Zeolite, method for production thereof, adsorbent comprising said zeolite, heat utilization system, adsorption heat pump, heating and cooling storage system and humidity controlling air-conditioning apparatus |
04/27/2006 | WO2006043656A1 Apparatus and method for depositing fine particles |
04/06/2006 | WO2006035859A1 Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and phosomask using patterned substrate of self-organizing material |
04/05/2006 | EP1643663A1 A addressing method of quanta network and quanta network router |
03/15/2006 | CN1748323A High density and high programming efficiency mram design |
03/01/2006 | EP1630882A1 Nanometric structure and corresponding manufacturing method |
02/15/2006 | EP1626393A2 Method and apparatus for manufacturing magnetoresistive element |
02/07/2006 | US6995090 Polishing slurry for use in CMP of SiC series compound, polishing method, and method of manufacturing semiconductor device |
02/02/2006 | WO2006011655A1 Single-layer carbon nanotube and alinged single-layer carbon nanotube bulk structure, and their production process, production apparatus and use |
01/19/2006 | US20060014329 Nanodots formed on silicon oxide and method of manufacturing the same |
01/18/2006 | CN1722382A Nanodots formed on silicon oxide and method of manufacturing the same |
01/11/2006 | EP1613549A1 Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them |
01/10/2006 | US6984840 Optical semiconductor device having an epitaxial layer of III-V compound semiconductor material containing N as a group V element |
01/04/2006 | EP1611607A1 Method of fabricating semiconductor probe with resistive tip |
12/28/2005 | EP1609796A1 N-glycoside type glycolipids and hollow fiber type organic nanotubes made of the same |
12/28/2005 | CN1714432A Slurry composition for secondary polishing of silicon wafer |
10/26/2005 | EP1589594A1 Cpp-type giant manetoresistance effect element and magnetic component and magnetic device using it |
10/13/2005 | US20050223785 Scanning probe device and processing method by scanning probe |
10/05/2005 | EP1582924A2 Processing apparatus |
09/07/2005 | EP1570512A1 Slurry composition for secondary polishing of silicon wafer |
09/07/2005 | EP1570249A2 Method and system for determining characteristics of substrates employing fluid geometries |
09/07/2005 | EP1569866A2 Process for obtaining spatially-organised nanostructures on thin films |
08/24/2005 | EP1565566A2 Protein synthesis monitoring (psm) |
08/17/2005 | EP1562708A1 Microfluidic device and methods for construction and application |
08/10/2005 | EP1560792A1 Carbon nanotube device fabrication |
08/04/2005 | US20050170657 Method of forming nanostructure |
08/02/2005 | US6924023 Method of manufacturing a structure having pores |
07/27/2005 | EP1556881A2 Electron beam exposure system |
06/29/2005 | EP1546804A1 Device for transferring a pattern to an object |
06/15/2005 | CN1626600A Slurry for CMP, polishing method and method of manufacturing semiconductor device |
06/02/2005 | US20050118821 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
06/01/2005 | EP1535113A2 Exposure method, exposure mask, and exposure apparatus |
05/04/2005 | CN1200066C Polishing composition |
04/20/2005 | CN1607191A Ultra low thermal expansion transparent glass ceramics |
04/07/2005 | US20050072986 Group-III nitride semiconductor device |
03/30/2005 | EP1518271A1 Method and apparatus using nanotubes for cooling and grounding die |
03/23/2005 | EP1516863A1 Ultra low thermal expansion transparent glass-ceramics |
03/17/2005 | WO2005023705A1 Fine structure body-producing method, fine structure body, display device, recording device-producing method, and recording device |
02/15/2005 | US6856005 Semiconductor device having a nitride-based hetero-structure and method of manufacturing the same |
02/02/2005 | CN1574238A Slurry for CMP, polishing method and method of manufacturing semiconductor device |
01/11/2005 | US6841410 Method for forming group-III nitride semiconductor layer and group-III nitride semiconductor device |
12/30/2004 | US20040261323 Abrasive grains which are sufficiently small relative to the line width of wirings so as to make it possible to perform fine and delicate polishing |
12/29/2004 | CN1558932A Organic semiconductor material and organic semiconductor element employing the same |
12/22/2004 | EP1488193A1 Device and method for maskless afm microlithography |
12/15/2004 | EP1485958A2 Self-aligned nanotube field effect transistor and method of fabricating same |
12/15/2004 | EP1485944A1 Laser assisted direct imprint lithography |
12/02/2004 | US20040241900 Organic semiconductor material and organic semiconductor element employing the same |
12/02/2004 | US20040241592 Irradiating light onto a member having a modulation profile smaller than the wavelength of irradiated light and forming a distribution of optical near-field corresponding to surface of said member; introducing material gas to be used for a photochemical reaction; causing photochemical reaction |
11/17/2004 | EP1477847A1 Resist material and microfabrication method |
11/03/2004 | EP1473767A2 Method of forming conductive line for semiconductor device using carbon nanotube and semiconductor device manufactured using the method |
11/02/2004 | US6813299 Semiconductor laser device and optical disk reproducing and recording apparatus |
10/14/2004 | WO2004023211A3 Exposure method, exposure mask, and exposure apparatus |
10/06/2004 | EP1463685A1 Carbon nanotube particulates, compositions and use thereof |
09/29/2004 | EP1463110A2 Semiconductor memory device comprising magneto resistive element and its manufacturing method |
09/29/2004 | CN1169268C Method of manufacturing optical semiconductor device |
09/16/2004 | US20040180157 for electronic devices, battery parts, catalysts and magnetic materials; organic/inorganic hybrid with a catalyst component bound to the organic material molecules as the carbon source; nano-tubes in a high yield and a uniform film |
08/25/2004 | EP1449887A1 Organic semiconductor material and organic semiconductor element employing the same |