| Patents for B82Y 10 - Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic (1,512) |
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| 04/08/2009 | EP2045307A1 Polishing composition |
| 04/08/2009 | CN101403854A Nano-patterning method and method of manufacturing master plate and discrete track magnetic recording media |
| 04/08/2009 | CN100477134C Fine particles depositing device and method, and preparing method for light emitting element |
| 04/02/2009 | US20090087793 Method of nano-patterning using surface plasmon effect and method of manufacturing nano-imprint master and discrete track magnetic recording media using the nano-patterning method |
| 03/25/2009 | EP2038919A2 Method of manufacturing a semiconductor device, and semiconductor device obtained by such a method |
| 03/12/2009 | US20090068840 Polishing liquid and method for manufacturing semiconductor device |
| 03/04/2009 | EP2031602A2 Conductive polyolefins with good mechanical properties |
| 03/04/2009 | CN100466172C Method for forming group-III nitride semiconductor layer and semiconductor device |
| 01/27/2009 | US7481950 Polishing composition and polishing method using the same |
| 01/21/2009 | EP2017318A2 Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method |
| 01/21/2009 | EP2016613A2 Template having a varying thickness |
| 01/14/2009 | EP2013708A2 Optical-based, self-authenticating quantum random number generators |
| 01/08/2009 | US20090008659 Nitride semiconductor stacked structure and semiconductor optical device, and methods for manufacturing the same |
| 01/07/2009 | CN101340058A Nitride semiconductor stacked structure and semiconductor optical device, and methods for manufacturing the same |
| 01/06/2009 | US7473518 Method of manufacturing a device using a near-field photomask and near-field light |
| 12/31/2008 | EP2007566A2 Chucking system comprising an array of fluid chambers |
| 12/25/2008 | US20080318427 Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method |
| 12/25/2008 | US20080318049 Single-Walled Carbon Nanotube and Aligned Single-Walled Carbon Nanotube Bulk Structure, and Their Production Process, Production Apparatus and Application Use |
| 12/25/2008 | US20080315746 Method of Manufacturing Fine Structure, Fine Structure, Display Unit, Method of Manufacturing Recoding Device, and Recoding Device |
| 12/24/2008 | CN101328399A Reagent kit for preparing chemical mechanical polishing aqueous dispersion, and use thereof |
| 12/18/2008 | US20080311750 Polishing composition for semiconductor wafer and polishing method |
| 12/11/2008 | WO2008150012A1 Polishing composition |
| 11/27/2008 | US20080289365 Method for manufacturing glass-ceramics |
| 11/12/2008 | EP1990845A1 Ambipolar, light-emitting field-effect transistors |
| 10/21/2008 | US7439546 Semiconductor light emitting device, its manufacturing method, semiconductor device and its manufacturing method |
| 10/02/2008 | US20080237535 Fumed silica particles produced by wet grinding having a specific surface area of 50 to 200 m2/g, an average particle diameter of 10 to 50 nm, and an average ratio A/B of the major axis A to the minor axis B of the fumed silica particles of 1.2 to 2.0 |
| 10/01/2008 | EP1976351A2 Wiring structure and method of forming the same |
| 10/01/2008 | EP1975121A1 Method for forming nano-dimensional clusters and setting ordered structures therefrom |
| 09/25/2008 | WO2008114563A1 Aqueous dispersion for chemical mechanical polishing and method of chemical mechanical polishing of semiconductor device |
| 09/24/2008 | EP1973001A1 Photoreceptor device having a self-assembled patterned binder layer |
| 09/24/2008 | EP1972464A2 Security elements with luminescent characteristics |
| 09/17/2008 | CN101266408A Laminating body, grafting film forming method using the same and forming method for grafting pattern |
| 09/03/2008 | CN101258106A Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry |
| 09/02/2008 | US7419910 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
| 08/27/2008 | EP1960836A1 Method for making a reflection lithographic mask and mask obtained by said method |
| 08/27/2008 | EP1960835A1 Reflection lithography mask and method for making same |
| 08/20/2008 | EP1958205A1 Nanostructured device |
| 08/06/2008 | EP1951202A2 Isolated and fixed micro and nano structures and methods thereof |
| 08/05/2008 | CA2407800C Polishing composition |
| 07/09/2008 | EP1942374A1 Imprint process for producing structure |
| 06/18/2008 | EP1931597A1 Cerium oxide powder for one-component cmp slurry, preparation method thereof, one-component cmp slurry composition comprising the same, and method of shallow trench isolation using the slurry |
| 06/12/2008 | US20080139089 Method of polishing hard crystal substrate and polishing oil slurry therefor |
| 05/20/2008 | US7374473 Texturing slurry and texturing method by using same |
| 05/08/2008 | US20080108160 Semiconductor Light Emitting Device, Its Manufacturing Method, Semiconductor Device and Its Manufacturing Method |
| 05/07/2008 | EP1918776A1 Etching of nano-imprint templates using an etch reactor |
| 04/16/2008 | EP1287088A4 Polishing composition |
| 04/02/2008 | EP1904932A2 Nanoparticle fabrication methods, systems, and materials |
| 03/26/2008 | EP1756244A4 Cerium oxide abrasive and slurry containing the same |
| 03/19/2008 | CN101144977A Mold for nano-imprinting and method of manufacturing the same |
| 03/13/2008 | US20080061214 Mold for nano-imprinting and method of manufacturing the same |
| 03/04/2008 | US7339195 Semiconductor light emitting device, its manufacturing method, semiconductor device and its manufacturing method |
| 02/28/2008 | US20080050659 Method of Patterning Self-Organizing Material, Patterned Substrate of Self-Organizing Material and Method of Producing the Same, and Photomask Using Patterned Substrate of Self-Organizing Material |
| 02/27/2008 | EP1892285A2 Cleaning composition, cleaning method, and manufacturing method of semiconductor device |
| 02/21/2008 | US20080045016 Cleaning composition, cleaning method, and manufacturing method of semiconductor device |
| 02/21/2008 | US20080042120 Integrated circuit device, manufacturing method thereof, and display device |
| 02/20/2008 | EP1888510A2 Nitric oxide-releasing particles for nitric oxide therapeutics and biomedical applications |
| 02/20/2008 | CN100370561C Carbon material, dual layer capacitor polarizable electrode |
| 02/19/2008 | US7332104 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
| 01/23/2008 | EP1881368A2 Method for applying membrane lipids to a substrate |
| 01/10/2008 | US20080006057 Polishing composition for glass substrate |
| 01/09/2008 | CN101100595A Lapping liquid composition for glass substrate |
| 01/02/2008 | EP1872370A1 Multiplexer interface to a nanoscale-crossbar |
| 01/02/2008 | EP1871162A2 Nanowire dispersion compositions and uses thereof |
| 12/20/2007 | US20070293049 Slurry for CMP of Cu film, polishing method and method for manufacturing semiconductor device |
| 11/14/2007 | EP1854553A1 Electronic device substrate, method for manufacturing substrate, compound used for substrate, method for manufacturing compound and polymerization initiator including compound |
| 11/07/2007 | CN101069275A Fine particles depositing device and method, and preparing method for light emitting element |
| 10/30/2007 | US7288783 Optical semiconductor device and method for fabricating the same |
| 10/25/2007 | US20070248917 Exposing a photoresist to near-field light through photomask using polarized exposure light having an electrical field component parallel to the first direction to form a latent image in the photoresist only in discrete regions at which the second slit opening crosses the light the light shield portion |
| 10/16/2007 | US7282742 Organic semiconductor material and organic semiconductor element employing the same including carbon nanotubes |
| 10/04/2007 | US20070232068 Slurry for touch-up CMP and method of manufacturing semiconductor device |
| 10/03/2007 | EP1838424A2 Method and composition providing desirable characteristics between a mold and a polymerizable composition |
| 08/30/2007 | US20070202703 Polishing composition and polishing method |
| 08/29/2007 | EP1825502A2 Methods of exposure for the purpose of thermal management for imprint lithography processes |
| 08/28/2007 | US7262828 Near-field photomask and near-field exposure apparatus including the photomask |
| 08/22/2007 | EP1820210A2 Contact doping and annealing systems and processes for nanowire thin films |
| 08/16/2007 | US20070190770 Post-cmp treating liquid and manufacturing method of semiconductor device using the same |
| 08/01/2007 | CN101010260A Single-layer carbon nanotube and aligned single-layer carbon nanotube bulk structure, and their production process, production apparatus and use |
| 07/25/2007 | EP1811553A1 Apparatus and method for depositing fine particles |
| 07/25/2007 | CN101006153A Cerium oxide abrasive and slurry containing the same |
| 07/18/2007 | EP1808407A1 Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and phosomask using patterned substrate of self-organizing material |
| 06/27/2007 | EP1800360A2 Electrical circuit with a nanostructure and method for contacting a nanostructure |
| 06/20/2007 | EP1797584A2 Methods and devices for forming nanostructure monolayers and devices including such monolayers |
| 05/31/2007 | US20070123153 Texturing slurry and texturing method by using same |
| 05/30/2007 | EP1791135A2 X-ray optical element |
| 05/30/2007 | EP1789853A1 A method of aligning a first article relative to a second article and an apparatus for aligning a first article relative to a second article. |
| 05/23/2007 | EP1787955A1 Single-layer carbon nanotube and alinged single-layer carbon nanotube bulk structure, and their production process, production apparatus and use |
| 05/09/2007 | EP1570512A4 Slurry composition for secondary polishing of silicon wafer |
| 05/02/2007 | EP1780182A1 Glass ceramics and a method for manufacturing the same |
| 05/02/2007 | EP1778651A2 Multivalent chelators for modifying and organizing of target molecules |
| 05/02/2007 | CN1955131A Glass-ceramics and a method for manufacturing the same |
| 04/26/2007 | US20070093375 Glass ceramics and a method for manufacturing the same |
| 04/12/2007 | US20070081931 abrasive material for polishing silicon oxide layer or silicon nitride layer on silicon substrate; forming a shallow trench isolation; chemical mechanical polishing; obtained via a low-temperature calcination, pulverization, and a high-temperature calcination; high pore fraction and low strength |
| 04/11/2007 | EP1771871A1 High resolution cathode structure |
| 04/05/2007 | US20070074457 Polishing composition and polishing method |
| 04/04/2007 | EP1770136A2 Polishing composition and polishing method |
| 04/04/2007 | EP1769500A2 Semiconductor storage device |
| 04/04/2007 | CN1939991A Polishing composition and polishing method |
| 03/22/2007 | US20070065734 Exposure method, exposure mask, and exposure apparatus |
| 03/14/2007 | EP1762893A1 Mold, imprint apparatus, and process for producing structure |
| 03/08/2007 | WO2007027068A1 Cerium oxide powder for one-component cmp slurry, preparation method thereof, one-component cmp slurry composition comprising the same, and method of shallow trench isolation using the slurry |