Patents for B24D 3 - Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents (10,364) |
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02/15/2005 | CA2354595C Grinding disc with backup pad |
02/10/2005 | WO2005011914A2 Superabrasive wire saw and associated methods of manufacture |
02/10/2005 | US20050032468 Apparatus and method for forming a spiral wound abrasive article, and the resulting article |
02/09/2005 | CN1188253C Abrasive surface and article and method for making them |
02/09/2005 | CN1188252C Abrasive article for providing transparent clear surface finish on glass |
02/08/2005 | US6852020 Polishing pad for use in chemical—mechanical planarization of semiconductor wafers and method of making same |
02/08/2005 | US6851418 Metal bonded drilling and boring tool |
02/03/2005 | US20050026553 Method of centerless grinding |
02/03/2005 | US20050026552 Porous polyurethane polishing pads |
02/03/2005 | US20050022457 Abrasive particles having coatings with tortuous surface topography |
02/02/2005 | EP1502703A1 Porous polyurethane polishing pads |
02/02/2005 | CN1572451A Wave saw blade |
02/02/2005 | CN1572422A 抛光垫 Polishing pad |
02/01/2005 | US6849542 Method for manufacturing a semiconductor device that includes planarizing with a grindstone that contains fixed abrasives |
02/01/2005 | US6848986 Dual cured abrasive articles |
02/01/2005 | CA2118766C Coated abrasive article incorporating an energy cured hot melt make coat |
01/27/2005 | US20050020190 Flexible abrasive product and method of making and using the same |
01/27/2005 | US20050020189 Flexible abrasive product and method of making and using the same |
01/27/2005 | US20050020188 Polishing pad, method of producing same, and polishing method |
01/27/2005 | US20050020187 Chemical mechanical polishing (CMP); for use on nickel/phosphorus alloys; contains abrasive particles, oxidant, oxidant modifier, and accelerants to sequester removed materials containing phosphonate and ammonium or amine groups |
01/27/2005 | US20050020082 Polishing pads for chemical mechanical planarization |
01/27/2005 | DE10297449T5 Poröses Schleifwerkzeug und Verfahren zur Herstellung hiervon Porous abrasive tool and method for the production thereof |
01/26/2005 | EP1500469A1 Abrasive tool |
01/26/2005 | EP1341645B1 Abrasive product with an embossed backing and method of making the same |
01/26/2005 | EP1276592B1 Method of polishing and cleaning glass |
01/26/2005 | CN2673557Y High self sharping metal bonding agent diamond product |
01/26/2005 | CN1569399A 抛光垫和化学机械抛光方法 Chemical mechanical polishing pad and polishing method |
01/25/2005 | US6846340 Method of manufacturing segment-chip-type grinding wheel having large axial length |
01/25/2005 | US6846233 Interior cylinder core; exterior grinding zones; bonded abrasive grains |
01/25/2005 | US6846232 Sheet with patter with projections, recesses; flexible backing overcoated with abrasive particles |
01/25/2005 | US6846225 Selective chemical-mechanical polishing properties of a cross-linked polymer and specific applications therefor |
01/20/2005 | WO2005005034A2 Method of preparing agglomerated composite materials |
01/20/2005 | US20050014030 Cemented carbide and cutting tool |
01/19/2005 | EP1497079A1 Coated abrasive article |
01/19/2005 | EP1497077A1 Metal-coated abrasives, grinding wheel using metal-coated abrasives and method of producing metal-coated abrasives |
01/19/2005 | EP1497075A1 Abrasive articles with novel structures and methods for grinding |
01/19/2005 | CN1185087C Diamond blade having rim type cutting tip for use in grinding or cutting apparatus |
01/18/2005 | US6843712 Polymer pad material selected from urethane, carbonate, amide, sulfone, vinyl chloride, acrylate, methacrylate, vinyl alcohol, ester and acrylamide; polishing layer is porous, formed without cutting to the polishing surface |
01/13/2005 | WO2005002765A1 Resin bonding type diamond tool and manufacturing method thereof |
01/13/2005 | WO2004101225B1 Abrasive particles having coatings with tortuous surface topography |
01/12/2005 | EP1494834A1 Method of roll grinding |
01/12/2005 | CN1562569A Superhard abrasive grinding wheel of metal binding agent eletrolyzable online, and preparation method |
01/12/2005 | CN1184056C Electroplating abrasion wheel, its mfg. equipment and method |
01/11/2005 | US6841480 Polyelectrolyte dispensing polishing pad, production thereof and method of polishing a substrate |
01/06/2005 | WO2005000527A2 Multi-layer polishing pad material for cmp |
01/06/2005 | WO2005000526A1 Polishing pad with oriented pore structure |
01/06/2005 | US20050004236 Controlling particle size and porosity; adding aluminum phosphate to aqueous dispersion of colloidal silica and adjusting pH; ink receptive coatings, catalyst supports, reinforcing fillers |
01/06/2005 | US20050003749 Polishing pad |
01/06/2005 | US20050000941 Apparatus and method for reducing removal forces for CMP pads |
01/05/2005 | EP1493535A1 Method of forming a supersize coating |
01/05/2005 | EP1492645A1 Porous abrasive articles with agglomerated abrasives and method for making the agglomerated abrasives |
01/05/2005 | EP0921909B9 High permeability grinding wheels |
01/05/2005 | DE10322468B3 Polyurethane for use as or with polishing cloth for polishing silicon wafers, contains special isocyanate-reactive complexing agent to remove copper and other contaminating metals arising from polishing materials |
01/05/2005 | CN2668328Y Polishing piece using rubber-plastic as substrate |
01/04/2005 | US6838169 Comprising a thermoplastic backing film and a pressure sensitive adhesive of silicone and acrylic polymer to couple the backing of a chemical mechanical polishing pad to a platen support; antipeeling agents; durability; semiconductor wafers |
01/04/2005 | US6838149 Abrasive article for the deposition and polishing of a conductive material |
01/04/2005 | US6837781 Dissolving an inert gas in a polyurethane with raw materials; reaction injection molding yields foam with small and uniform cells; semiconductor wafers |
12/30/2004 | DE29624602U1 Alumina-based mixed ceramic for cutting tools - contains titanium and tungsten carbide(s) or carbonitride(s) |
12/29/2004 | EP1075354B1 Coated abrasive article |
12/29/2004 | CN1558876A Method of making amorphous materials and ceramics |
12/29/2004 | CN1181957C Diamond blade having segment type cutting tip for use in cutting, grinding or drilling apparatus |
12/28/2004 | US6835220 Anti-loading treatments |
12/23/2004 | US20040259484 Multi-layer polishing pad material for CMP |
12/23/2004 | US20040259480 [polishing pad and process of chemical mechanical use thereof] |
12/23/2004 | US20040258882 Polishing pad with oriented pore structure |
12/23/2004 | US20040256055 CMP pad with long user life |
12/23/2004 | US20040255521 Polishing pad of CMP equipment for polishing a semiconductor wafer |
12/22/2004 | EP1489652A2 Method of modifying a surface of a semiconductor wafer |
12/22/2004 | EP1487612A1 Coated abrasive article comprising an aromatic polyepoxide |
12/22/2004 | EP1487607A1 Tool insert |
12/21/2004 | US6833014 Curing softened particulate binder to convert temporary shaped structures into separated ones on horizontally deployed flexible backing |
12/21/2004 | US6832947 CMP pad with composite transparent window |
12/15/2004 | EP1485233A1 Impregnated grinding wheel |
12/15/2004 | CN1555390A Binder for abrasive articles, abrasive articles including the same and method of making same |
12/15/2004 | CN1179825C Abrasive pad for chemical mechanical polishing |
12/15/2004 | CN1179824C Abrasive material having abrasive layer of three-dimensional structure |
12/14/2004 | US6830598 Molten braze coated superabrasive particles and associated methods |
12/14/2004 | CA2245562C Radiation curable supersizes |
12/09/2004 | WO2004106001A1 Vitrified grinding wheel and method of manufacturing the same |
12/09/2004 | US20040247852 Polishing sheet and polishing work method |
12/09/2004 | US20040244789 Sawing wire |
12/09/2004 | US20040244299 Composition for polishing pad and polishing pad using the same |
12/09/2004 | DE10297443T5 Funktional abgestufte Überzüge für Schleifteilchen und deren Verwendung in Glasmatrix-Verbundmaterialien Functionally graded coatings for abrasive particles and their use in glass matrix composites |
12/07/2004 | US6827072 Dressing wheel and method of making same |
12/07/2004 | CA2386756C Improved coated abrasive discs |
12/02/2004 | WO2004103641A1 Method of making a tool component |
12/02/2004 | US20040242719 Process for producing polyurethane foam |
12/02/2004 | US20040242138 Wave saw blade |
12/02/2004 | US20040237414 Manufacture of lapping board |
12/02/2004 | US20040237413 An abraisive aqueous dispersion and an immiscible, aqueous composition containing a heterocyclic compound, such as quinolinic or quinaldinic acid; prevention of dishing and corrosion of the wiring portion of semiconductors |
12/01/2004 | EP1481781A1 Wave saw blade |
12/01/2004 | EP1480787A1 Coated diamond abrasive article |
12/01/2004 | EP1480781A1 Cutting tip for diamond tool and diamond tool |
12/01/2004 | CN1551926A Abrasive diamond composite and method of making thereof |
12/01/2004 | CN1550538A Chemical mechanical polishing agent kit and chemical mechanical polishing method using the same |
12/01/2004 | CN1177676C Ultra abrasive grain wheel for mirror finish |
12/01/2004 | CN1177675C Abrasive article bonded using a hybrid bond |
11/30/2004 | US6824578 Abrasive material |
11/30/2004 | US6824452 Polishing pad and process of chemical mechanical use thereof |
11/25/2004 | WO2004101225A1 Abrasive particles having coatings with tortuous surface topography |