Patents
Patents for B24D 3 - Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents (10,364)
04/2005
04/21/2005WO2005035195A1 Structured abrasive with parabolic sides
04/21/2005WO2005035193A2 Method of making a coated abrasive
04/21/2005US20050085169 Polishing pad for use in chemical - mechanical palanarization of semiconductor wafers and method of making same
04/21/2005US20050085167 Antiloading compositions and methods of selecting same
04/21/2005US20050081456 Cubic boron nitride abrasive grain, production method therefor, and grinding wheel and coated abrasive using the same
04/21/2005US20050081455 Abrasive product, method of making and using the same, and apparatus for making the same
04/21/2005US20050081454 Having a metal intruding (embedding) into a groove on the surface of the cubic boron nitride abrasive grain;, the groove has a portion in which the ratio of width to depth is <1; electro- or electroless deposited nickel and/or cobalt; increased retension of grain particles; durability; tools
04/21/2005DE10197149B4 Beschichtetes Schleifmittel und Verfahren zur Herstellung Coated abrasives and methods for preparing
04/20/2005EP1524078A2 Working system using brush tool
04/20/2005EP1347862B1 Flexible abrasive product and method of making and using the same
04/20/2005EP1318891B1 Polishing pad comprising particulate polymer and crosslinked polymer binder
04/20/2005EP1309732B1 Method of producing an abrasive product containing diamond
04/20/2005CN1608036A Method of making amorphous materials and ceramics
04/20/2005CN1607997A Backing and abrasive product made with the backing and method of making and using the backing and abrasive product
04/20/2005CN1607082A Working system using brush tool
04/20/2005CN1607071A Composition of vitreous brick buffing wheel
04/19/2005US6881483 Ceramic aggregate particles
04/19/2005CA2310285C Foam buffing pad of individual string-like members and method of manufacture thereof
04/14/2005US20050079806 Polishing pad
04/14/2005US20050079805 Fiber embedded polishing pad
04/14/2005US20050076577 Abrasive tools made with a self-avoiding abrasive grain array
04/14/2005DE10392510T5 Verfahren zum Schleifen von Walzen A method for grinding rolls
04/13/2005EP1522386A1 Abrasive product
04/13/2005EP1522385A2 Polishing Pad
04/13/2005CN1605434A Abrasive product
04/06/2005CN1604834A Abrasive article for the deposition and polishing of a conductive material
04/05/2005US6875099 Polishing tool and a composition for producing said tool
04/05/2005US6875098 Wheel having abrasive grain layer parts for grinding in which plural abrasive grains are fixed with metal bonding phase, and grain layer part has high abrasive grain concentration at center part and low grain concentration at surrounding part
04/05/2005US6875097 Fixed abrasive CMP pad with built-in additives
04/05/2005US6875088 Polishing member and method of manufacturing semiconductor device
04/05/2005US6875077 Forming area through porous fibrous matrix of pad from working polishing surface to back, non-working surface, filling region with material transparent to light beams emanating from chemical mechanical polishing end-point detection device
03/2005
03/31/2005WO2005028157A1 A polishing pad for chemical mechanical polishing
03/31/2005WO2004065064A3 Multi-resinous molded articles having diffused and graded interfaces
03/30/2005EP1518647A2 Ophthalmic rough-cut and polishing wheel
03/30/2005CN1602321A Process for producing polyurethane foam, polyurethane foam, and abrasive sheet
03/30/2005CN1602238A Method for gasket removal
03/30/2005CN1600501A Method for quick fabricating barrel finishing grinding tools
03/29/2005US6872133 Wave saw blade
03/29/2005CA2379950C Method for making microabrasive tools
03/29/2005CA2170990C Abrasive articles and methods of making and using same
03/24/2005WO2005027206A1 Polishing plate, stage unit, and exposure apparatus
03/24/2005US20050064799 Ophthalmic roughing wheel
03/24/2005US20050064709 Grinding pad and method of producing the same
03/24/2005US20050060947 Structured abrasives with high, sustained cut rates suitable for grinding applications; backing and ceramic abrasive particles in a cured binder
03/24/2005US20050060946 Cross-sectional area of the body varies linearly with the height of the body from the base; high rate of cut and a relatively fine surface finish; durability
03/24/2005US20050060944 Method of making a coated abrasive
03/24/2005US20050060941 Abrasive article and methods of making the same
03/24/2005DE4029600B4 Spanabhebendes Endbearbeitungswerkzeug und Verfahren zum Herstellen desselben The same chip-removing finishing tool and method for producing
03/23/2005EP1284841B1 Grooved polishing pads for chemical mechanical planarization
03/23/2005CN1597259A Preparation method of diamond grinding polishing sheet
03/23/2005CN1597258A Antigrinding cutting grinding sheet and its manufacturing method
03/23/2005CN1597257A Cutting grinding sheet and its manufacturing method
03/23/2005CN1597255A Preparation method of single layer soldering diamond tool
03/23/2005CN1597254A Grinding pad and method of grinding crystal wafer
03/23/2005CN1193863C Conditioner for polishing pad and method for manufacturing the same
03/22/2005US6869350 Forming the polishing surface without cutting or skiving parallel to the polishing surface
03/22/2005US6869340 Polishing cloth for and method of texturing a surface
03/22/2005US6868755 Manufacturing method of diamond cutter
03/22/2005CA2317745C High speed grinding wheel
03/17/2005WO2004094555A3 Abrasive particles, abrasive articles, and methods of making and using the same
03/17/2005WO2004071975A3 Methods of making glass- ceramic particles
03/17/2005US20050055885 Polishing pad for chemical mechanical polishing
03/17/2005DE10337841A1 Tool for machine tool with cutting disk has cutting disk fixed to base body at least in places by locally applied heating process
03/16/2005EP1204712B1 Abrasive grain with improved projectability
03/15/2005US6866565 Thermoplastic resin with phases of high and low glass transition temperatures; semiconductor wafers, mirrors
03/10/2005US20050054280 Grinding or polishing device for comprising a support with renewable adherence surface
03/10/2005US20050054275 Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
03/10/2005US20050050803 Polishing fluid and polishing method
03/10/2005US20050050802 Abrasive grain with an abrasive coating
03/09/2005EP1511892A1 Consumer scrubbing wipe article and method of making same
03/09/2005CN1590056A Jigsaw
03/08/2005US6863774 Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same
03/08/2005US6863196 Apparatus for hanging hats
03/03/2005WO2005019371A2 Cubic boron intride, method for producing cubic boron nitride, grinding wheeel with cubic boron nitride, and sintered cubic boron nitride compact
03/03/2005US20050044803 Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal
03/03/2005US20050044802 Hermetically sealable housing and enclosed getter material; protecting laser from ultraviolet radiation pitting damage
03/03/2005US20050044801 For enhanced wettability/dispersability/bonding; comprises metal oxide layer; chemical mechanical polishing (CMP)
03/02/2005EP1509364A1 Microporous polishing pad
03/02/2005CN1589305A Functionally graded coatings for abrasive particles and use thereof in vitreous matrix composites
03/02/2005CN1589189A Porous abrasive tool and method for making the same
03/01/2005US6860959 Nonwoven abrasive material
03/01/2005US6860914 Abrasive product
03/01/2005US6860912 Abrasive filament, abrasive articles incorporating abrasive filament and method of making abrasive filaments and abrasive articles
03/01/2005US6860803 Polishing plate
03/01/2005US6860802 Polishing pads for chemical mechanical planarization
02/2005
02/24/2005WO2005016599A1 Methods and materials for making a monolithic porous pad cast onto a rotatable base
02/24/2005WO2003087256A8 Anti-loading treatments
02/24/2005US20050042976 Low friction planarizing/polishing pads and use thereof
02/24/2005US20050039408 Method of making a tool component
02/24/2005DE10297646T5 Verfahren zur Herstellung harzgebundener Schleifwerkzeuge A process for producing resin bonded abrasive tools
02/23/2005EP1507631A1 Nonwoven composite cleaning pad
02/23/2005EP0789641B1 Improved abrasive articles and method for preparing them
02/23/2005CN1586002A Grinding pad and method of producing the same
02/23/2005CN1583842A Porous polyurethane polishing pads
02/22/2005US6858527 Method to increase electromigration resistance of copper using self-assembled organic thiolate monolayers
02/22/2005US6858292 For polishing the exposed ends of a fiber optic connector
02/16/2005CN1582262A Glass-ceramics
02/16/2005CN1579709A High strength grinding wheel and its preparation method
02/16/2005CN1189290C Sintered grinding block for grinding ceramic plate
02/15/2005US6855034 Polishing pad for semiconductor wafer and laminated body for polishing of semiconductor wafer equipped with the same as well as method for polishing of semiconductor wafer
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