Patents
Patents for B24D 3 - Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents (10,364)
06/2005
06/16/2005WO2003074227A3 Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same
06/16/2005US20050130569 Nonwoven abrasive material
06/16/2005US20050130568 Providing a dry flowable particle mixture containing abrasive particles and particulate curable binder, depositing particle mixture on the at least partially cured primer coating of the first surface of the backing to form a sheet; softening particulate curable binder material, patterning and curing
06/16/2005US20050129975 Improved retention force in resinoid; formed by electroplating or electroless plating
06/16/2005US20050126080 Semiconductor polishing compound, process for its production and polishing method
06/16/2005DE10392532T5 Poröse Schleifgegenstände mit Schleifagglomeraten und Verfahren zum Herstellen der Schleifagglomerate Porous abrasive articles with abrasive agglomerates and methods of making the abrasive agglomerates
06/15/2005EP1542266A1 Semiconductor abrasive, process for producing the same and method of polishing
06/15/2005EP1541288A1 Preparation of coated abrasive disk
06/15/2005EP1539425A2 Abrasive tool having a unitary arbor
06/15/2005EP1539423A1 A polishing pad support that improves polishing performance and longevity
06/15/2005EP1373409B1 Abrasive-filled thermoset composition and its preparation, and abrasive-filled articles and their preparation
06/15/2005CN1626599A 抛光组合物和抛光方法 Polishing composition and polishing method
06/15/2005CN1626314A Preparation of coated abrasive disk
06/15/2005CN1206628C Method for prodn. of glass substrate used as magnetic recording medium
06/14/2005US6905526 Fabrication of an ion exchange polish pad
06/09/2005WO2005052366A2 Portable hand pump for evacuation of fluids
06/09/2005WO2005035193A3 Method of making a coated abrasive
06/09/2005US20050124274 Abrasive product
06/09/2005US20050123366 Tool insert
06/09/2005US20050123365 Tool insert
06/09/2005US20050120636 Improved dimensional stability and high breaking strength, by combining a supporting substrate and a coated abrasive bodyof a backsheet and a layer of a coated abrasive material thereon
06/09/2005DE10392508T5 Schleifartikel mit neuen Strukturen und Verfahren zum Schleifen Abrasive article having new structures and method for grinding
06/09/2005CA2546434A1 Portable hand pump for evacuation of fluids
06/09/2005CA2457249A1 Preparation of coated abrasive disk
06/08/2005CN1625640A Composite abrasive compact
06/08/2005CN1623731A Whisker-shaped abrasive emery cutter
06/08/2005CN1623730A Rotary grinding machine
06/07/2005US6903021 Method of polishing a semiconductor device
06/02/2005WO2005000527A3 Multi-layer polishing pad material for cmp
06/02/2005US20050118820 CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate
06/02/2005US20050115156 Process for producing polyurethane grinding tool
06/01/2005EP1535978A1 Polishing cloth and method of manufacturing semiconductor device
06/01/2005EP1535701A1 Process for producing polyuerthane grinding tool
06/01/2005EP1535699A1 Polishing pad with high optical transmission window
06/01/2005EP1534469A1 Abrasive holder
06/01/2005EP1534468A1 Abrasive articles with resin control additives
06/01/2005EP1268127B1 Method and apparatus for shaping edges
06/01/2005CN1622290A Polishing cloth and method of manufacturing semiconductor device
06/01/2005CN1622289A Polishing pad with high optical transmission window
06/01/2005CN1621472A Double faced adhesive tape for grinding cloth and grinding sheet with the adhesive tape for roller winding
06/01/2005CN1621202A Process for producing polyurethane grinding tool
05/2005
05/31/2005US6899920 Abrasive particles embedded in metal matrix
05/31/2005US6899611 Polishing pad for a semiconductor device having a dissolvable substance
05/31/2005US6899602 Porous polyurethane polishing pads
05/31/2005US6899598 For chemical-mechanical polishing; combining a polymer resin with a supercritical gas to produce a single phase solution and forming a pad from the solution; gas is generated by subjecting a gas to an elevated temperature and pressure.
05/26/2005WO2005005034A3 Method of preparing agglomerated composite materials
05/26/2005US20050113008 Polishing pad with high optical transmission window
05/26/2005US20050113005 Method of abrading a workpiece
05/26/2005US20050112354 Polishing sheet and manufacturing method of elastic plastic foam sheet
05/26/2005US20050108948 Molten braze-coated superabrasive particles and associated methods
05/25/2005EP1458523B1 Abrasive product and method of making the same
05/25/2005EP1372910B1 Dual cured abrasive articles
05/25/2005EP0917931B1 Combined cutting and grinding tool
05/25/2005DE10392537T5 Anti-Zusetz-Behandlungen Anti-Zusetz treatments
05/25/2005CN1620491A Coated diamond particles
05/24/2005US6896710 Abrasives for CMP applications
05/24/2005US6896593 Microporous polishing pads
05/19/2005WO2002090054A3 Contactor cleaning sheet, contactor cleaning sheet manufacturing method, and contactor cleaning method
05/19/2005US20050107018 Polishing product element, particularly for finishing optical lenses
05/19/2005US20050107017 Working system using brush tool
05/19/2005US20050107011 Abrasive product, method of making and using the same, and apparatus for making the same
05/19/2005US20050107007 Polishing pad process for producing the same and method of polishing
05/19/2005US20050103534 Cutting tip for diamond tool and diamond tool
05/18/2005CN1617787A Method for making resin bonded abrasive tools
05/18/2005CN1616581A Friction glass fiber composite material skeleton asbestos and its preparing method
05/18/2005CN1202197C Cerium based abrasive material and method for evaluating cerium based abrasive material
05/17/2005US6893476 Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal
05/17/2005US6893337 Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
05/17/2005US6893325 Configuring pad with predetermined duty cycle; removing one dielectric in presence of another
05/12/2005US20050101237 Additive impregnated abrasive; porous structure; dissoication of additive, depositing into pores
05/12/2005US20050101225 Porous abrasive articles with agglomerated abrasives and method for making the agglomerated abrasives
05/12/2005US20050098540 for use in chemical mechanical polishing; abrasion
05/12/2005US20050097824 Backing and abrasive product made with the backing and method of making and using the backing and abrasive product
05/11/2005EP1320443B1 Polishing pad having an advantageous micro-texture
05/11/2005CN1615373A Method of making a tool component
05/11/2005CN1615348A 抛光垫 Polishing pad
05/11/2005CN1613951A Process for producing grinding media
05/11/2005CN1613610A Blowing method for producing grind particles
05/11/2005CN1613609A Sintering formula and process for sand wheel
05/10/2005US6890591 Multilayer polishing pad for microelectronics
05/10/2005US6890250 Diamond blade having rim type cutting tip for use in grinding or cutting apparatus
05/06/2005WO2005039828A1 Abrasive tools made with a self-avoiding abrasive grain array
05/06/2005WO2005039827A1 Antiloading compositions and methods of selecting same
05/06/2005CA2540733A1 Abrasive tools made with a self-avoiding abrasive grain array
05/05/2005US20050095959 Contoured CMP pad dresser and associated methods
05/05/2005US20050095865 Selective chemical-mechanical polishing properties of a cross-linked polymer and specific applications therefor
05/05/2005US20050093162 Adhesion layer of 11-trichlorosilylundecyl thioacetate coupled to a copper layer formed over a dielectric layer via the thioacetate group and a silicon dioxide layer via the trichlorosilyl group
05/05/2005US20050092134 Handsaw capable of cutting glass bottle, method for manufacturing the same, and method for re-using empty wine bottle
05/05/2005US20050091931 Method to increase electromigration resistance of copper using self-assembled organic thiolate monolayers
05/04/2005EP1526949A1 Abrasive product, method of making and using the same, and apparatus for making the same
05/04/2005EP1094918B1 Abrasive article and method for grinding glass
05/03/2005US6887288 (Carbonized) rice bran ceramic fine grain abrasives; wear resistance, hardness
05/03/2005US6887287 Mixing zinc oxide and alkali metal oxides, filler and abrasive particles; pressing, firing; bonding vitreous frit
04/2005
04/28/2005US20050090103 Method to increase electromigration resistance of copper using self-assembled organic thiolate monolayers
04/27/2005CN1610963A Polishing fluid and polishing method
04/27/2005CN1610962A Polishing pad, process for producing the same, and method of polishing
04/26/2005US6884156 Multi-layer polishing pad material for CMP
04/26/2005US6884155 Diamond grid CMP pad dresser
04/21/2005WO2005035198A1 Abrasive article and methods of making the same
04/21/2005WO2005035196A1 Compositions for abrasive articles
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