Patents for G03B 27 - Photographic printing apparatus (25,157)
01/2006
01/19/2006US20060012765 Exposure apparatus and device fabrication method
01/19/2006US20060012764 Exposure apparatus and method
01/19/2006US20060012763 Lithographic apparatus and device manufacturing method
01/19/2006US20060012762 Method for cleaning semiconductor device
01/19/2006US20060012761 Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
01/19/2006US20060012760 Lithographic apparatus and device manufacturing method
01/18/2006EP1616220A2 Maintaining immersion fluid under a lithographic projection lens
01/18/2006EP1425175A4 Image printing apparatus including a microcontroller
01/18/2006CN2752814Y Optical fibre conducting LED digital colour enlarger imaging device
01/18/2006CN1723688A Optical conduction unit and image reader using the same
01/18/2006CN1721998A Lithographic apparatus and device manufacturing method
01/18/2006CN1721997A Multi-focus scanning with a tilted mask or wafer
01/18/2006CN1721984A Light intensity modulation element, intensity-modulated-light generating device, laser exposure unit and photograph processing apparatus
01/18/2006CN1721983A Manuscript pressing plate switch
01/18/2006CN1721982A Digital develop optical shift apparatus and shift method thereof
01/18/2006CN1237785C Film scanner
01/18/2006CN1237415C 图像成形装置 An image forming apparatus
01/18/2006CN1237403C Image reading device and imaging equipment
01/17/2006US6987589 Image processing device for carrying out dodging treatment
01/17/2006US6987559 Vibration-attenuation devices having low lateral stiffness, and exposure apparatus comprising same
01/17/2006US6987558 Reaction mass for a stage device
01/17/2006US6987557 Enhanced lithographic displacement measurement system
01/17/2006US6987556 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby
01/17/2006US6987555 Lithographic apparatus, device manufacturing method, and device manufactured thereby
01/17/2006US6987554 Temperature adjusting system and exposure apparatus incorporating the same
01/17/2006US6987278 Gas flushing system with recovery system for use in lithographic apparatus
01/17/2006US6986573 Ink cartridge with motive means
01/12/2006WO2005098537A3 Light source for photolithography
01/12/2006US20060008716 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
01/12/2006US20060008711 Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method
01/12/2006US20060007488 Controller for a modular printer and image capture arrangement
01/12/2006US20060007421 Lithographic apparatus and device manufacturing method
01/12/2006US20060007420 Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device
01/12/2006US20060007419 Lithographic apparatus and device manufacturing method
01/12/2006US20060007418 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
01/12/2006US20060007417 Document lighting unit, image scanning unit, and image forming apparatus
01/12/2006US20060007416 Exposure apparatus
01/12/2006US20060007415 Exposure system and device production process
01/12/2006US20060007414 Lithographic apparatus and a device manufacturing method
01/12/2006US20060007413 Esposure apparatus, cooling method, and device manufacturing method
01/12/2006US20060007265 Modular printing device with peripheral connectors
01/11/2006EP1614001A2 Cleanup method for optics in immersion lithography
01/11/2006CN1720713A Prescanning in image printing/reading apparatus
01/11/2006CN1720482A Card printing system and method
01/11/2006CN1236402C Image processing method, image processing program and recording medium for recording the same program
01/11/2006CN1236357C Line exposing image forming device
01/10/2006US6985280 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
01/10/2006US6985270 adjusting images having pixels by exposing photographic films to form latent images, then developing, scanning and measuring; calibration patches for photofinishing; photography
01/10/2006US6985269 Image reading apparatus
01/10/2006US6985211 photolithography apparatus comprising reflection multilayer stacks of molybdenum, rhodium, palladium, platinum, ruthenium, silicon and/or yttrium, and light sources, used for focussing patterned radiation beams on target substrates
01/10/2006US6985210 Projection system for EUV lithography
01/10/2006US6985209 Position detecting method, position detecting apparatus, exposure method, exposure apparatus, making method thereof, and device and device manufacturing method
01/10/2006US6985208 Apparatus and method for retaining mirror, and mirror exchange method
01/10/2006US6985207 Photographic prints having magnetically recordable media
01/05/2006WO2006001785A1 Lithographic systems and methods with extended depth of focus
01/05/2006US20060003240 Methods for adjusting light intensity for photolithography and related systems
01/05/2006US20060003233 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method
01/05/2006US20060001858 Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer
01/05/2006US20060001857 Apparatus to vary dimensions of a substrate during nano-scale manufacturing
01/05/2006US20060001856 Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus
01/05/2006US20060001855 Lithographic apparatus and device manufacturing method
01/05/2006US20060001854 Optical system having an optical element that can be brought into at least two positions
01/05/2006US20060001853 Exposure apparatus and method of cleaning optical element of the same
01/05/2006US20060001852 Method and apparatus for exposing semiconductor substrates
01/05/2006US20060001851 Immersion photolithography system
01/05/2006US20060001850 Lithographic apparatus and a device manufacturing method
01/05/2006US20060001849 Imaging a violet sensitive printing plate using multiple low power light sources
01/05/2006US20060001848 Apparatus for fabricating semiconductor device
01/05/2006US20060001847 Lithographic apparatus and device manufacturing method
01/05/2006US20060001846 Exposure system and method for manufacturing semiconductor device
01/05/2006US20060001845 Illumination system optimized for throughput and manufacturability
01/05/2006US20060001834 Method of making motion picture release-print film
01/05/2006US20060001194 System for varying dimensions of a substrate during nanoscale manufacturing
01/05/2006DE102004028143A1 Vorrichtung zur Digitalisierung von Filmmaterial Device for digitizing footage
01/04/2006EP1611486A2 Environmental system including a transport region for an immersion lithography apparatus
01/04/2006EP1611485A2 Environmental system including vaccum scavange for an immersion lithography apparatus
01/04/2006EP1611482A2 Run-off path to collect liquid for an immersion lithography apparatus
01/04/2006CN1716112A Manuscript press plate opening and closing device
01/04/2006CN1716101A Image drawing apparatus and image drawing method
01/04/2006CN1716087A Method of reading photographic film and photographic film reading apparatus for implementing the method
01/03/2006US6982816 Film scanner
01/03/2006US6982813 Light quantity correction method for exposing device, and image forming device
01/03/2006US6982809 Photographic printing system
01/03/2006US6982784 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method
01/03/2006US6982783 Chucking system for modulating shapes of substrates
01/03/2006US6982782 Processing apparatus for processing object in vessel
01/03/2006US6982781 Automatic fuser control
01/03/2006US6982135 Pattern compensation for stitching
12/2005
12/29/2005WO2005123402A1 Exposure head and exposure apparatus
12/29/2005WO2005123401A1 Exposure head and exposure apparatus
12/29/2005US20050287446 Method for the photolithographic projection of a pattern onto a semiconductor wafer with an alternating phase mask
12/29/2005US20050286042 Method of calibration, calibration substrate, and method of device manufacture
12/29/2005US20050286041 Lithographic apparatus and patterning device transport
12/29/2005US20050286040 Lithographic apparatus, a device manufacturing method, and a fastener for use in a lithographic apparatus
12/29/2005US20050286039 Lithographic apparatus and device manufacturing method
12/29/2005US20050286038 Layered structure for mosaic tile wave plate
12/29/2005US20050286037 Semiconductor exposure apparatus and method for exposing semiconductor using the same
12/29/2005US20050286036 Lithography apparatus and method for measuring alignment mark
12/29/2005US20050286035 Lithographic apparatus and device manufacturing method
12/29/2005US20050286034 Lithographic apparatus and device manufacturing method