Patents for G03B 27 - Photographic printing apparatus (25,157)
05/2006
05/30/2006US7053981 Lithographic apparatus and device manufacturing method
05/30/2006US7053980 Lithographic alignment system
05/30/2006US7053979 Process for amelioration of scanning synchronization error
05/30/2006US7053930 Triangular bidirectional scan method for projection display
05/30/2006US7052809 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same
05/30/2006CA2459142C Picture image outputting method and photograph finishing system using the method
05/25/2006US20060110693 Exposure method and apparatus, exposure mask, and device manufacturing method
05/25/2006US20060110666 Stray light feedback for dose control in semiconductor lithography systems
05/25/2006US20060110665 Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
05/25/2006US20060109509 Effects module for a camera and printer assembly
05/25/2006US20060109449 Reticle-carrying container
05/25/2006US20060109448 Method for bonding a pellicle to a patterning device and patterning device comprising a pellicle
05/25/2006US20060109447 Lithographic apparatus and device manufacturing method
05/25/2006US20060109446 Radially polarized light in lithographic apparatus
05/25/2006US20060109445 Maskless lithography system and method
05/25/2006US20060109444 Exposure apparatus
05/25/2006US20060109443 Optical integrator, illumination optical device, exposure apparatus, and exposure method
05/25/2006US20060109442 Lithographic apparatus and device manufacturing method
05/25/2006US20060109441 Reticle, exposure apparatus, and methods for measuring the alignment state thereof
05/25/2006US20060109440 Lithographic apparatus and device manufacturing method
05/25/2006US20060109439 Clamping device for optical elements, lithographic apparatus with optical elements in a clamping device, and method for manufacturing such apparatus
05/25/2006US20060109438 Method and apparatus for self-referenced dynamic step and scan intra-field lens distortion
05/25/2006US20060109437 Photolithography system including control system to control photolithography apparatus and method of controlling the same
05/25/2006US20060109436 Lithographic apparatus and device manufacturing method
05/25/2006US20060109435 Lithographic apparatus and device manufacturing method
05/24/2006EP1659620A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device production method
05/24/2006DE102004056570A1 GKV-Geometrie-Korrektur-Vorsatz SHI geometry correction intent
05/24/2006CN1776521A Manuscript press board automatic opening-closing device and office equipment with same
05/24/2006CN1257437C Exposure device and method for transfering photomask and workpiece
05/23/2006US7050994 Method of sharing images allowing third party print orders via a web site
05/23/2006US7050156 Method to increase throughput in a dual substrate stage double exposure lithography system
05/23/2006US7050155 Advanced exposure techniques for programmable lithography
05/23/2006US7050154 Illumination optical system in exposure apparatus
05/23/2006US7050153 Exposure apparatus
05/23/2006US7050152 Exposure apparatus
05/23/2006US7050151 Exposure apparatus, exposure method, and device manufacturing method
05/23/2006US7050150 Exposure apparatus
05/23/2006US7050149 Exposure apparatus and exposure method
05/23/2006US7050148 Optical unit, exposure apparatus, and device manufacturing method
05/23/2006US7050146 Lithographic apparatus and device manufacturing method
05/23/2006US7050145 Device for copying both sides of an object in a single pass using an office copier
05/23/2006US7050144 Light exposure; multilayer, radiation transparent substrates, shade with masking patterns; controlling width of apertures
05/23/2006US7050143 Camera system with computer language interpreter
05/23/2006US7050106 Image input device with rotatable image pickup unit
05/23/2006US7049033 direct modulation in complex-valued reflectance of the multilayer; a spatially localized energy source writes a reticle pattern onto the reflective multilayer coating; interdiffusion causes the multilayer period to contract in the exposed region
05/23/2006US7048427 Planar light source device and image reading device
05/18/2006WO2006050614A1 Printable substrate, processes and compositions for preparation thereof
05/18/2006US20060104684 Electricity waste suppressing original document size detection apparatus
05/18/2006US20060104413 Mask repeater and mask manufacturing method
05/18/2006US20060103833 Aligning apparatus and its control method, and exposure apparatus
05/18/2006US20060103832 Wafer table for immersion lithography
05/18/2006US20060103831 Lithographic apparatus and device manufacturing method
05/18/2006US20060103830 Method and apparatus for immersion lithography
05/18/2006US20060103829 Exposure apparatus and exposure method
05/18/2006US20060103828 Adjustable illumination blade assembly for photolithography scanners
05/18/2006US20060103827 Lithographic apparatus and device manufacturing method
05/18/2006US20060103826 Lithographic apparatus, method of determining properties thereof and computer program
05/18/2006US20060103825 Focus test mask, focus measurement method and exposure apparatus
05/18/2006US20060103824 Auto focus system, auto focus method, and exposure apparatus using the same
05/18/2006US20060103823 Focus monitoring method
05/18/2006US20060103822 Alignment strategy optimization method
05/18/2006US20060103821 Lithographic apparatus and device manufacturing method
05/18/2006US20060103820 Lithographic apparatus and device manufacturing method
05/18/2006US20060103819 Measurement method, device manufacturing method and lithographic apparatus
05/18/2006US20060103818 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system
05/18/2006US20060103817 Lithographic apparatus and device manufacturing method
05/18/2006US20060103816 Lithographic apparatus and device manufacturing method
05/18/2006DE102005053252A1 Kopiervorrichtung zum Umwandeln eines originalen Bildes in M Kopien in N Formaten Copying apparatus for converting an original image into M replicas in N formats
05/17/2006EP1656587A2 Reduction smith-talbot interferometer prism for micropatterning
05/17/2006CN1774668A Environmental system including a transport region for an immersion lithography apparatus
05/17/2006CN1774667A Optical arrangement of autofocus elements for use with immersion lithography
05/16/2006US7046413 System and method for dose control in a lithographic system
05/16/2006US7046343 Method and apparatus for recognizing regions corresponding to image storage sheets
05/16/2006US7046342 Apparatus for characterization of photoresist resolution, and method of use
05/16/2006US7046341 Method and apparatus for forming pattern on thin substrate or the like
05/16/2006US7046340 Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates
05/16/2006US7046339 Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
05/16/2006US7046338 EUV condenser with non-imaging optics
05/16/2006US7046337 Exposure apparatus and method
05/16/2006US7046336 Scanning exposure apparatus
05/16/2006US7046335 Exposure apparatus and device fabrication method
05/16/2006US7046334 Displacement correction apparatus, exposure system, exposure method and a computer program product
05/16/2006US7046333 Exposure method
05/16/2006US7046332 Exposure system and method with group compensation
05/16/2006US7046331 Lithographic apparatus, device manufacturing method, and device manufactured thereby
05/16/2006US7046330 Exposure apparatus
05/16/2006US7046294 Electronic still camera with printer
05/11/2006WO2006050029A2 Apochromatic unit-magnification projection optical system
05/11/2006WO2006049206A1 Illuminator and image reader employing it
05/11/2006US20060098185 Mask holder for irradiating UV-rays
05/11/2006US20060098184 Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method
05/11/2006US20060098183 Exposure system, test mask for monitoring polarization, and method for monitoring polarization
05/11/2006US20060098182 Radially polarized light in lithographic apparatus
05/11/2006US20060098181 Advanced exposure techniques for programmable lithography
05/11/2006US20060098180 Lithographic apparatus and device manufacturing method
05/11/2006US20060098179 Exposure method, exposure apparatus, and method for producing device
05/11/2006US20060098178 Exposure apparatus, exposure method, and method for producing device
05/11/2006US20060098177 Exposure method, exposure apparatus, and exposure method for producing device
05/11/2006US20060098176 Lithographic apparatus, device manufacturing method, and substrate table
05/11/2006US20060098175 Lithographic apparatus and device manufacturing method