Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23G - Cleaning or de-greasing of metallic material by chemical methods other than electrolysis › C23G 1 - Cleaning or pickling metallic material with solutions or molten salts
Patents for C23G 1 - Cleaning or pickling metallic material with solutions or molten salts (8,361)
11/2003
11/05/2003EP0781258B1 Stainless steel alkali treatment
11/04/2003USH2089 Compositions useful for degreasing metal surfaces
11/04/2003USH2087 Pickling of refractory metals
10/2003
10/30/2003WO2003000464A3 Improved scale conditioning agents
10/29/2003CN1451460A Solvent separating device and cleaning system with said device
10/23/2003WO2003088268A2 Removal of blockages from pipework
10/22/2003EP1354977A2 Method for repairing turbine engine components
10/22/2003EP1354074A2 Method of removing ceramic coatings
10/22/2003EP0835333B9 Pickling solution used for removing scales on iron-based alloys
10/16/2003WO2002008370A3 Cleaning composition
10/16/2003US20030194949 Method for defect reduction
10/15/2003EP1351782A2 Biological cleaning system
10/15/2003CN1449437A Composition for cleaning chemical mechanical planarization apparatus
10/14/2003US6632288 Alkaline solutions are used with a nitrogen environment to clean a semiconductor device's copper surface of residues following chemical mechanical polishing and plasma etching steps; reduces alkaline etch rate of copper surface
10/09/2003WO2003083582A1 Ph buffered compositions for cleaning semiconductor substrates
10/08/2003EP1351280A2 Method and apparatus for cleaning and drying semiconductor wafers
09/2003
09/30/2003US6627587 Mixture of alkanolamine, tetraalktlammonium hydroxide, fluoride compound and corrosion inhbitor
09/30/2003US6627546 Process for removing contaminant from a surface and composition useful therefor
09/25/2003WO2003078691A2 Alkaline sensitive metal cleaning composition, method for cleaning an alkaline sensitive metal surface, and washing facility
09/25/2003WO2003078684A1 Method for the phosphating of metal surfaces with improved recovery of valuable substances
09/25/2003US20030181342 A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation comprising a buffering system a polar organic
09/25/2003US20030178112 Titanium material less suceptible to discoloration and method for production thereof
09/25/2003US20030178045 Method and device for pickling hot-rolled special steel strips
09/18/2003WO2003029393A3 Alkaline metal cleaner
09/18/2003US20030176305 Alkaline sensitive metal cleaning composition, method for cleaning an alkaline sensitive metal surface, and washing facility
09/18/2003US20030176288 Halogen acid corrosion inhibitor base
09/18/2003US20030172959 Treatment with a wetting agent and an active agent that is a complex N-abietyl-, hydroabietyl-, or dehydroabietyl ketomethyl amine
09/17/2003EP1344228A2 Method for dissolving solids formed in a nuclear installation
09/12/2003WO2003074764A1 Method for removing titanium based coating film or oxide of titanium
09/11/2003US20030168352 Providing aqueous liquid analyte containing dissolved iron compound and dissolved peroxide, bringing analyte into contact with electrode; causing electrical current to flow; continuing current flow until concentration of peroxide is reduced
09/11/2003US20030168197 Cylinder block production method
09/11/2003US20030167636 Method for repairing turbine engine components
09/10/2003EP1342777A1 Substrate cleaning liquid media and cleaning method
09/10/2003EP1341883A1 Method for cleaning etcher parts
09/10/2003CN1441466A Method and device for cleaning and drying semiconductor crystal
09/04/2003WO2003072689A1 Liquid cleaning compositions
09/04/2003CA2472183A1 Liquid cleaning compositions
08/2003
08/28/2003WO2002100501A3 De-sludging device and method for de-sludging a liquid
08/28/2003US20030162677 Mixture of hydroxycarboxylic acid, sulfamic acid and ammoniumsulfate
08/28/2003US20030159713 Method and apparatus for cleaning and drying semiconductor wafer
08/28/2003US20030159712 Supplying fluid flow; then gas flow; ionization; extraction
08/27/2003CN1439063A Method and device for pickling hot-rolled special steel strips
08/21/2003WO2003069636A1 Etching solution for forming an embedded resistor
08/21/2003WO2002046498A3 Method of removing ceramic coatings
08/21/2003US20030158063 Applying a corrosive removal substance for removing corrosion or rust from metallic surface
08/21/2003US20030158059 Detergent composition
08/21/2003US20030156971 Process and product for application for preserving metallic products from corrosion
08/20/2003EP0892840B1 A composition for cleaning and etching electronic display and substrate
08/20/2003CN2567235Y Furnace loosen device
08/20/2003CN1436740A Corrosion inhibiting method for cooling water system of production equipment in shutdown period
08/19/2003US6607605 Cleaning of semiconductor process equipment chamber parts using organic solvents
08/14/2003WO2003066795A1 Cleaning agent and method for cleaning heater tubes
08/14/2003US20030150840 For etching a nickel-chromium alloy, comprising: hydrochloric acid and thiourea.
08/13/2003EP1334408A1 Photoresist stripper/cleaner compositions containing aromatic acid inhibitors
08/13/2003EP1334213A2 Process for regeneration of spent acid halide leach solutions
08/12/2003US6605258 Evaluating activity of stripper or cleaning solution on turbine engine; obtain turbine, incubate with stripper or screening agent , evaluate performan ce of stripper or cleaner
08/12/2003US6605155 Remover for scale deposited on titanium material
08/07/2003WO2003064581A1 Methods and compositions for chemically treating a substrate using foam technology
08/06/2003EP1331996A1 Method and apparatus for gradient generation
08/06/2003CN2564587Y Jet nozzle changing-over device
07/2003
07/31/2003WO2003062492A1 Magnesium-zirconium alloying
07/31/2003WO2003062150A1 Advanced electrodeionization for fluid recycling
07/31/2003WO2003061818A1 Method for making contaminant library, screening method and array plate
07/31/2003US20030144163 For use in semiconductor devices, display devices; for efficiently removing contaminant particles (fine particles) present on a substrate
07/30/2003CN1116497C Acid for erosion of sandstone
07/29/2003US6599371 Hydrogen peroxide pickling scheme for silicon-containing electrical steel grades
07/29/2003US6599370 For stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants
07/29/2003CA2135148C Aqueous alkaline composition
07/24/2003US20030136424 Industrial parts washer system comprising washing fluid, assembly operable to apply fluid to part, turbidity sensor control unit; automotive powertrains
07/23/2003CN1432073A Surface treatment to improve corrosion resistance of austenitic stainless steels
07/22/2003US6596175 Method for treating stator cooling water to prevent clogging of strainer in the cooling system of an industrial electrical generator
07/17/2003WO2003057812A1 Cleaning agents for the outer surfaces of means of transport
07/17/2003US20030133827 Method to remove iron sulfide deposits from pipe lines
07/17/2003US20030132416 Stripping tin or tin alloys with organic sulfonic acids, nitro-substituted organic compounds and sulfuric acid or a nonionic surfactant with a cloud point of 50-80 degrees c
07/17/2003CA2473037A1 Cleaning agents for the outer surfaces of means of transport
07/16/2003EP1326951A1 Stabilized alkaline compositions for cleaning microelectronic substrates
07/16/2003CN1430667A Cleaning surfaces
07/16/2003CN1114717C Method of treating waste liquid of acid washing steel plate by hydrochloric acid
07/15/2003US6593282 Cleaning solutions for semiconductor substrates after polishing of copper film
07/15/2003US6592433 Method for defect reduction
07/10/2003WO2003056063A1 Method of surface-finishing stainless steel after descaling
07/10/2003WO2002081609B1 Removing adherent organic material
07/09/2003EP0909311B1 Post clean treatment
07/08/2003US6589439 Hydroxylammonium salt
07/08/2003US6589358 Method and apparatus for cleaning an article
07/08/2003US6589356 Method for cleaning a silicon-based substrate without NH4OH vapor damage
07/02/2003EP1323817A1 Cationic composition for hard surface cleaning
07/02/2003CN1427091A Detergent for aluminium for aluminium alloy and washing method
07/01/2003US6585825 Metal ion free solution containing base, silicate, stabilizer and water; removing photoresist residues and other metallic and organic contaminates from semiconductor wafers without damaging
06/2003
06/26/2003WO2003052172A1 Use of a borate-free cleaning solution for cleaning anodizable metals before anodic oxidation
06/26/2003WO2003052165A1 Process and plant for descaling, pickling and finishing/passivating stainless steel strips, and strips so obtainable
06/26/2003US20030119691 Cleaning composition and methods for manufacturing and using
06/26/2003US20030116534 Method of metal etching post cleaning
06/25/2003CN2557534Y Hydrochloric spent pickle liquor treatment device
06/25/2003CN1426493A Method and device for treating surfaces of metallic strip, especially for pickling rolled material
06/25/2003CN1425802A Method for wet cleaning metal copper back
06/19/2003US20030114328 Phosphoric acid, sodium pyrophosphate, hard water softener, zeolite, xanthan, surfactant, stearic acid, methyl alcohol, defoamer in water; environmentally harmless
06/18/2003CN1424986A Descaling agent for scales on titanium materials
06/12/2003WO2003048418A2 Method for pickling martensitic or ferritic high-grade steel
06/12/2003US20030109394 Alkaline metal cleaner
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