Patents for C23G 1 - Cleaning or pickling metallic material with solutions or molten salts (8,361)
07/2006
07/26/2006CN1807008A Process for manufacturing molybdenum disc by molybdenum blank rolling method
07/26/2006CN1266262C Method for cleaning etcher parts
07/20/2006WO2006060234A3 Wet cleaning of electrostatic chucks
07/20/2006US20060160239 Method of measuring a level of contamination in a chemical solution and systems thereof
07/20/2006US20060157080 Cleaning method for semiconductor wafer
07/19/2006CN1804130A Cleaning agent for pretreatment of cold-rolling galvanization
07/19/2006CN1804129A Method for removing cold welded aluminium on cutter and aluminium chips in cutting channels
07/19/2006CN1804122A Transplantable ultrathin nano-porous gold film and method for preparing the same
07/19/2006CN1804118A Method for chemical plating nickel-boron alloy on magnesium alloy surface
07/19/2006CN1804102A Surface treatment method for improvement of wear-resistance of titanium or titanium alloy
07/19/2006CN1264949C Process for removing contaminant from a surface and composition useful therefor
07/13/2006WO2006072780A1 Cleaning formulation
07/13/2006US20060154838 a chelating agent or a salt such as ethylenediaminetetraethylenephosphonic acid; ethylenediaminetetramethylenephosphonic acid potassium salt etc.; water and a hydroxide selected from NaOH, KOH, and LiOH; for cleaning semiconductor substrate surface
07/13/2006US20060154837 Technique on ozone water for use in cleaning semiconductor substrate
07/13/2006US20060151014 Device and method for wet treating disc-like substrates
07/13/2006US20060151003 Brush for cleaning wafer
07/12/2006CN1802731A Removal of post-etch residues in semiconductor processing
07/12/2006CN1802456A Method for regenerating etching solutions containing iron for the use in etching or pickling copper or copper alloys and an apparatus for carrying out said method
07/11/2006US7074279 Method for removing titanium based coating film or oxide of titanium
07/06/2006US20060144428 Processing-subject cleaning method and apparatus, and device manufacturing method and device
07/06/2006US20060144421 Semiconductor substrate treating method, semiconductor component and electronic appliance
07/06/2006US20060144420 Apparatus and method for manufacturing semiconductor device
07/06/2006US20060144419 Method of degasification in semiconductor cleaning
07/05/2006CN1796605A Treatment technique for acid washing surface of electronic rotor
07/05/2006CN1796044A Method for processing nickel based tubular product made from high temperature alloy
06/2006
06/29/2006WO2006039133A8 Cluster tool process chamber having integrated high pressure and vacuum chambers
06/29/2006US20060142170 Descaling and corrosion inhibiting composition
06/29/2006US20060137724 Method for removing engine deposits from turbie components and composition for use in same
06/29/2006US20060137714 Apparatus for removing edge bead in plating process for fabricating semiconductor device
06/29/2006US20060137713 Apparatus for cleaning wafer and method of pre-cleaning wafer for gate oxide formation
06/29/2006US20060137712 Cleaning apparatus and method for electronic device
06/29/2006US20060137711 Single-wafer cleaning procedure
06/28/2006EP1274883B1 Corrosion inhibitor
06/28/2006CN1795292A Use of quaternary ammonium carbonates and bicarbonates as anticorrosive agents, method for inhibiting corrosion and anticorrosive coatings using these agents
06/28/2006CN1793431A Acid washing purifying plaste special for ordinary pollution area of OCr18Ni9 storage tank
06/28/2006CN1793430A Acid washing purifying plaste special for overheating oxidizing area of OCr18Ni9 storage tank
06/28/2006CN1793429A Acid washing puritying plaste special for welding bead of OCr18Ni9 storage tank
06/28/2006CN1793426A Process for copper coating on surface of magnesium and magnesium alloy
06/28/2006CN1793425A Process for compound surface sheilding of metal magnesium and magnesium alloy
06/28/2006CN1261605C Pure titanium building material and its mfg. method
06/27/2006US7067015 Modified clean chemistry and megasonic nozzle for removing backside CMP slurries
06/22/2006US20060130871 Megasonic cleaner having double cleaning probe and cleaning method
06/22/2006DE112004001487T5 Zusammensetzung und Verfahren zur Oberflächenbehandlung von oxidiertem Metall A composition and method for surface treatment of oxidized metal
06/21/2006EP1670972A1 Method for pickling metallic surfaces by using alkoxylated alkynols
06/20/2006US7064098 Composition for removing scale deposited on titanium materials
06/20/2006US7063800 Methods of cleaning copper surfaces in the manufacture of printed circuit boards
06/15/2006US20060128590 Method for removing contamination from a substrate and for making a cleaning solution
06/15/2006US20060124153 Enhanced wafer cleaning method
06/14/2006EP1667850A2 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system
06/14/2006EP1381663B1 Cleaning compositions
06/14/2006EP1141444B1 Novel composition for selective etching of oxides over metals
06/14/2006CN1786281A Metal surface treatment agent
06/14/2006CN1786280A Treatment technology of prestressed wire material surface
06/14/2006CN1786270A Treatment method of magnosium alloy surface
06/14/2006CN1786260A Continuous gold film cnpable of transplanting nanometer grade thickness its preparation method and application
06/13/2006US7060137 Method for applying cleaning liquid to a bowling lane using a reciprocating dispensing head
06/08/2006WO2006060234A2 Wet cleaning of electrostatic chucks
06/08/2006WO2006058570A1 Metal cleaner containing polyethylenimine
06/08/2006WO2005024095A8 Aqueous compositions and method for cleaning gas turbine compressor blades
06/08/2006CA2588466A1 Use of atazanavir for improving the pharmacokinetics of drugs metabolized by ugt1a1
06/07/2006EP1664385A1 Aqueous compositions and method for cleaning gas turbine compressor blades
06/07/2006CN1782134A Alkaline detergent composition for steel sheet
06/06/2006US7056872 Cleaning solution comprising water and amine compounds such as ammonium hydroxide or triethanolamine; environmentally friendly as water is the solvent
06/06/2006US7056648 Method for isotropic etching of copper
06/01/2006WO2005072338A3 Multi-step pad conditioningh system and method for chemical planarization
06/01/2006US20060112976 Method for removing at least one partial area of a component made of metal or a metallic compound
06/01/2006US20060112971 Method of eliminating galvanic corrosion in copper CMP
06/01/2006US20060112969 Wet cleaning of electrostatic chucks
05/2006
05/31/2006CN1778996A Pickler of copper alloy materials
05/31/2006CN1778995A Multifunctional high-efficient metal anti-rusting liquid for removing oil
05/30/2006US7053031 comprises cocoalkyldimethylamine oxide and alkali metal salt of polyaspartic acid; for use on automobiles, trucks, trains, streetcars, and aircraft; corrosion resistance
05/30/2006US7052557 For food, beverages; contactor filter with cyclic nitroxyl compound, and oxidizer
05/30/2006US7051742 Removing photoresists and etching residues; using solvents; water and chelate compound; heating; controlling temperature
05/30/2006CA2528275A1 Method for surface treatment of aluminum alloy
05/26/2006WO2006053626A1 Cleaning method for removing deposits containing magnetite out of a pressure vessel of a power plant
05/26/2006CA2586556A1 Cleaning process for removing magnetite-containing deposits from a pressure vessel of a power station
05/25/2006US20060108324 Process for removing a residue from a metal structure on a semiconductor substrate
05/25/2006US20060107970 Method and apparatus for cleaning semiconductor substrates
05/24/2006EP1478722B1 Liquid cleaning compositions
05/23/2006US7048803 Method of dissolving scale
05/23/2006US7047985 Removal of blockages from pipework using carbamate and nitric acid treatment steps
05/23/2006US7047984 Device and method for cleaning articles used in the production of semiconductor components
05/18/2006US20060105164 Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them
05/18/2006US20060102204 Method for removing a residue from a substrate using supercritical carbon dioxide processing
05/18/2006US20060102198 Rotational thermophoretic drying
05/17/2006CN1772947A Diamond cone and its making process
05/11/2006US20060096613 Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system
05/11/2006US20060096612 System and method for aligning wafers within wafer processing equipment
05/10/2006CN1769523A Silver and silver alloy fastness method
05/09/2006US7041629 Stripper for special steel
05/04/2006US20060094614 Non-corrosive cleaning composition for removing plasma etching residues
05/04/2006US20060091110 Cleaning solution and method for cleaning semiconductor device by using the same
05/04/2006US20060090774 Methods and apparatus for determining scrubber brush pressure
05/04/2006DE10354563B4 Abwasserreduziertes Phosphatierverfahren durch Aufarbeitung von Entfettungslösung und/oder Spülwasser Reduced waste water by phosphating processing of degreasing and / or rinse water
05/04/2006DE10006990B4 Anlage zur Rückgewinnung von Säuren aus metallhaltigen Lösungen dieser Säuren Plant for recovery of acids from metal-containing solutions of these acids
05/03/2006EP1652970A2 Apparatus for processing alkaline solution
05/03/2006EP1652969A1 Deruster composition and method
05/03/2006EP1652612A1 Method of repairing a brazed joint between two components of an aerospace article; Article repaired using such method
05/02/2006US7037381 Method for removing ceramic coatings from component surfaces
05/02/2006US7037379 comprising:water, 10 to 60 wt % aqueous soluble acid to obtain pH less than 6, thickener, 5 to 25 wt % of thiourea, and 2 to 30 wt % of a transition metal salt comprising a blend of a Group VI and a Group VIII transition metal salt; removes tarnish rapidly and completely and prevents return of tarnish
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