Patents
Patents for B24B 29 - Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents (4,497)
05/2008
05/22/2008US20080119121 Substrate holding apparatus and polishing apparatus
05/22/2008US20080119120 Carrier head with retaining ring and carrier ring
05/22/2008US20080119116 Method and apparatus for chemical mechanical polishing
05/20/2008US7374473 Texturing slurry and texturing method by using same
05/15/2008WO2008058200A2 Method and apparatus for electrochemical mechanical polishing nip substrates
05/15/2008WO2008057626A2 Carrier head for workpiece planarization/polishing
05/15/2008US20080113593 Polishing holder for workpiece end surface
05/15/2008US20080113589 contacting the substrate with a polishing pad and a chemical-mechanical polishing composition comprising a liquid carrier(H2O) and partilce of of an abrassive ( selected from , silica, ceria, germania, titania, zirconia, magnesia, silicon nitride, silicon carbide, organic polymers) present as a colloid
05/14/2008CN101177603A Polishing composition and polishing method
05/14/2008CN101177020A Method of preparing buffing vitrolite ornament
05/14/2008CN101176985A Method for effectively controlling useful time of grinding pad
05/14/2008CN101176984A Method for effectively controlling useful time of grinding pad
05/14/2008CN101176983A Semi-fixing abrasive grain polishing method of brass sheet substrate
05/14/2008CN101176982A High-efficient glazer
05/14/2008CN100387416C Method for processing surface of deformed material
05/08/2008US20080108283 Tire uniformity machine grinding assembly
05/07/2008CN101172332A Polishing pads useful for endpoint detection in chemical mechanical polishing
05/07/2008CN101172275A Device and method for cleaning external surface of wire or tube
05/01/2008US20080102732 Carrier head for workpiece planarization/polishing
04/2008
04/30/2008EP1915235A2 Enhanced end effector arm arrangement for cmp pad conditioning
04/30/2008EP1915233A1 Transparent microporous materials for cmp
04/30/2008CN201052591Y Multilayer continuous organic fertilizer particle polishing finishing device
04/30/2008CN101171094A Rolling tool for spline machining and method of manufacturing the same
04/30/2008CN101168241A Voltage mode current control
04/29/2008US7364497 Polish pad and chemical mechanical polishing apparatus comprising the same
04/29/2008US7364493 Lap grinding and polishing machine
04/24/2008US20080096478 Polishing Tool Comprising a Drive Plate and a Removable Pad for Finishing an Ophthalmic Lens
04/24/2008US20080096474 Method for Producing Semiconductor Wafer and Semiconductor Wafer
04/24/2008US20080096470 Chemical mechanical polishing slurry, its preparation method, and use for the same
04/23/2008CN201049442Y Modified soft rubbing cushion
04/23/2008CN201049434Y Polishing machinery adapted for arris or cambered surface
04/23/2008CN101164735A Hydraulic polishing machine
04/23/2008CN100383209C Chemical and mechanical water-free polishing liquid for lithium-cessium borate crystal and leveling method
04/17/2008US20080090503 Polishing pad and chemical mechanical polishing apparatus comprising the same
04/17/2008US20080090500 Process for reducing dishing and erosion during chemical mechanical planarization
04/17/2008US20080090497 Substrate retaining ring for CMP
04/16/2008CN201046545Y Grinding fluid purifier
04/16/2008CN201046544Y Rinsing apparatus for chemical machinery polisher
04/16/2008CN101161412A Substrate retaining ring for cmp
04/15/2008US7357698 Polishing pad and chemical mechanical polishing apparatus using the same
04/15/2008US7357695 Systems and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces
04/10/2008US20080085662 Polishing tool and polishing method and apparatus using same
04/09/2008CN101157199A Substrate polishing apparatus and method
04/09/2008CN101157198A Semi-sessile abrasive grain of plane stainless steel polishing method
04/09/2008CN101157190A Complex shuttle politure apparatus
04/03/2008US20080081542 Slurry compositions and methods of polishing a layer using the slurry compositions
04/03/2008DE102006044367A1 Verfahren zum Polieren einer Halbleiterscheibe und eine nach dem Verfahren herstellbare polierte Halbleiterscheibe A method of polishing a semiconductor wafer and a manufacturable by the method polished semiconductor wafer
04/02/2008EP1905539A1 Manufacturing an orthopaedic joint prosthesis component
04/01/2008CA2195045C Surface treating process
03/2008
03/27/2008US20080076336 Surface plate protecting device in CMP apparatus
03/27/2008US20080076335 Polishing apparatus and polishing method
03/27/2008US20080076327 for soft magnetic layer on the surface of a perpendicular magnetic recording hard disk; without corroding it excessively and at a high polishing rate at a high level of accuracy; silica abrasive, a polishing accelerator, an anticorrosion agent, a pH conditioner and water;
03/26/2008CN201040356Y Pneumatic loading device for accurate double-face polishing machine
03/26/2008CN201040355Y Accurate double-face polishing machine
03/26/2008CN201040354Y Upper polishing disc transmission mechanism for accurate double-face polishing machine
03/26/2008CN201040352Y Eyeglass manual grinding polishing combination machine
03/26/2008CN101148027A Chemical and mechanical grinding device
03/26/2008CN101148026A Trimming ring type intelligent super precision polishing machine
03/26/2008CN101148025A Method for polishing a semiconductor wafer and polished semiconductor wafer producible according to the method
03/26/2008CN101148024A Method for processing ultrathin crystal frequency multiplier
03/26/2008CN101148016A Method for correcting CMP working technology condition
03/20/2008US20080070488 Polishing method and polishing apparatus
03/20/2008US20080070479 Polishing Apparatus
03/19/2008EP1899110A2 Cmp retaining ring
03/19/2008CN201036846Y Worm polishing machine
03/19/2008CN101143427A Grinding polishing machine
03/13/2008US20080064308 Polishing apparatus and manufacturing method of an electronic apparatus
03/13/2008DE10256783B4 Poliergemisch und -verfahren zum Polieren von Werkstücken Polishing mixture and method for polishing workpieces
03/12/2008CN201033413Y Pressure regulated and controlled numerically controlled fraise machine self-adaption flexible buffing attachment
03/12/2008CN101138838A Grinding pad with hollow fiber and manufacturing method thereof
03/12/2008CN101138833A Group iii nitride substrate and manufacturing method of group iii nitride substrate
03/06/2008US20080057845 Method for manufacturing microporous CMP materials having controlled pore size
03/05/2008CN201030511Y Novel polisher absorbent hood
03/05/2008CN201030510Y Dust-absorbing hood of polishing machine
03/05/2008CN101134303A Polishing pad and method of producing the same
03/05/2008CN101134292A Cmp pad having overlaid constant area spiral grooves
03/05/2008CN101134291A Cmp pad having unevenly spaced grooves
03/05/2008CN101134286A Combined chemistry mechanical grinding method and manufacturing method of the fleet plough groove isolation structure
03/05/2008CN100372648C A polishing machine and method
02/2008
02/28/2008WO2008024721A2 Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head
02/28/2008US20080051011 Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head
02/28/2008US20080051008 Apparatus and method for chemical mechanical polishing with improved uniformity
02/27/2008CN201026589Y Magnetorheological device for grinding and polishing plane surface
02/27/2008CN201026588Y Magnetorheological apparatus for grinding and polishing curved surface
02/27/2008CN101130839A Golf club and method for manufacturing the same by titanium alloy containing bismuth
02/27/2008CN101130229A Two-sided polishing method for gallium phosphide crystal plate
02/21/2008US20080045125 Polishing Pad and Chemical Mechanical Polishing Apparatus
02/20/2008CN201023212Y Chemical machinery polishing grinding head
02/20/2008CN101125419A 抛光垫和化学机械抛光装置 Polishing pad and chemical mechanical polishing apparatus
02/20/2008CN101125416A Polishing method for zinc oxide single crystal substrate level substrate
02/20/2008CN101125415A Chemical and mechanical grinding equipment and anti-splash device used for chemical and mechanical grinding equipment
02/20/2008CN101125414A Polishing pad with built-in photosensor
02/14/2008US20080038994 Method to passivate conductive surfaces during semiconductor processing
02/13/2008CN201020653Y Internal wall surface polishing device for small diameter thin wall metal pipes
02/13/2008CN201020652Y Polishing apparatus
02/13/2008CN201020651Y Polisher burnishing device
02/13/2008CN201020650Y Rotating square box
02/13/2008CN101121866A Pressure-sensitive adhesive sheets for wafer grinding and warp inhibiting
02/13/2008CN101121248A Large-scale curved surface self-grinding-and-polishing working micro-robot
02/13/2008CN101121247A Device for cleaning grinding head
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