Patents
Patents for B24B 29 - Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents (4,497)
02/2011
02/16/2011CN101972972A Inner polishing machine for stainless steel tube
02/16/2011CN101972971A 螺杆抛光装置 Screw polishing device
02/16/2011CN101972970A Precision control system for double-sided polishing machine
02/16/2011CN101362312B Glazing machine
02/15/2011US7887396 Method and apparatus for controlled slurry distribution
02/10/2011DE202010015369U1 Einrichtung zum Polieren der flachen Oberfläche eines Musters Means for polishing the flat surface of a pattern
02/09/2011CN201736104U Internal polishing machine of stainless steel pipe
02/09/2011CN101966682A Process for polishing metal pot
02/09/2011CN101966681A Linear universal burnishing machine
02/09/2011CN101239457B Elastomer-modified chemical mechanical polishing pad
02/09/2011CN101224553B Diamond film super speed polishing method assisted by rare earths metal
02/08/2011US7885802 Method of simulating a complex system including scheduler hierarchy, and corresponding storage means and computer program product
02/03/2011US20110028073 Cmp polishing slurry and polishing method
02/02/2011CN201728577U Production facility for ceramic polished tiles
02/02/2011CN101700644B Automatic polishing equipment of stainless steel chopsticks and method for manufacturing railroad shoe used by same
02/02/2011CN101508090B Control method of beam, light lump, light line, curve surface pattern ceramic brick polisher
02/02/2011CN101224552B Grinding method of a disk-shaped substrate and grinding apparatus
01/2011
01/27/2011DE102009033206A1 Polierverfahren und Poliervorrichtung zur Korrektur von geometrischen Abweichungsfehlern auf Präzisionsoberflächen A polishing method and the polishing apparatus for the correction of deviation errors on the geometric precision surfaces
01/27/2011DE102007021411B4 Poliermaschine Polisher
01/26/2011CN201720759U Printing cylinder grinder
01/26/2011CN101957186A Method for detecting surface evenness of wafer and chemically mechanical polishing method
01/26/2011CN101954775A Method for preparing metal plate base for ink-jet printing computer to plate
01/26/2011CN101954617A Method for performing chemical mechanical polishing on lithium aluminate wafer
01/26/2011CN101554710B Integrated outer rotor type direct drive polishing machine turntable
01/26/2011CN101386149B Cleaning device for chemical mechanical polishing device
01/20/2011DE202010012970U1 Rotationsbürste sowie Rotationsbürstenmaschine mit einer solchen Rotationsbürste Rotary brush and rotating brush machine with such a rotary brush
01/19/2011CN201711852U Clamp for polishing sleeves
01/19/2011CN201711851U Silicon chip polishing device
01/19/2011CN201711850U Large-diameter silicon wafer polishing device
01/19/2011CN201711849U Transmission system of polishing machine bench
01/19/2011CN201711846U Ground treatment device
01/19/2011CN101565783B Gold alloy with 18k span effect and preparation method thereof
01/19/2011CN101066583B Method of processing a surface of group III nitride crystal and group III nitride crystal substrate
01/12/2011CN201702666U Silicon ingot polishing system and polishing plate
01/12/2011CN201702665U Polishing jig
01/12/2011CN101240159B Polishing liquid composition
01/05/2011CN201693442U Compressing device of non-central polisher
01/05/2011CN201693441U Tansmission device for polycrystalline diamond (PCD) mirror surface polisher
01/05/2011CN201693440U Hydraulic power polishing machine
01/05/2011CN101934493A Polishing process of ultrathin zone-melting silicon polished wafer
01/05/2011CN101934492A Polishing process of high-smoothness float-zone silicon polished wafer
01/05/2011CN101934491A Polishing apparatus
01/05/2011CN101934490A Polishing process for ultrahigh-resistivity silicon polished wafer
01/05/2011CN101497176B Surface polishing and waxing method for bamboo strip and bamboo thread as well as special-purpose equipment thereof
01/05/2011CN101244545B Polishing pad, use thereof and method for manufacturing the same
12/2010
12/29/2010CN201685174U Chopstick polishing machine
12/29/2010CN201685173U Sun wheel type full automatic polishing machine
12/29/2010CN201685172U Pneumatic grinder with detachable counterweight part
12/29/2010CN201685171U Numerical control polishing machine tool
12/29/2010CN101927449A Support tube device of balanced type circular tube polishing machine
12/29/2010CN101927448A Method for the local polishing of a semiconductor wafer
12/29/2010CN101927447A Method of the double sided polishing of a semiconductor wafer
12/29/2010CN101927446A Centerless grinding machine
12/29/2010CN101927442A Brake pad polishing machine
12/29/2010CN101462250B Series parallel movement polisher with six freedom degrees
12/29/2010CN101316683B Method for manufacturing microporous cmp materials having controlled pore size
12/29/2010CN101219534B Polishing pad and method of producing the same
12/29/2010CN101028700B Processing device with rotary table
12/28/2010US7857683 CMP retaining ring
12/22/2010CN201677228U Polisher for exterior wall heat insulation boards
12/22/2010CN201677227U Abrasive finishing machine
12/22/2010CN101920478A Multi-faceted diamond and associated method
12/22/2010CN101920477A Methods for producing and processing semiconductor wafers
12/22/2010CN101920476A Chemical mechanical polishing equipment and conveying method of grinding fluid thereof
12/19/2010CA2669870A1 Rotor polishing system
12/16/2010DE102007035405B4 Poliermaschine Polisher
12/15/2010EP1679702B1 Optical disk restoration apparatus
12/15/2010CN201669766U Light heat-insulation wall plate forming equipment
12/15/2010CN201669610U Axial moving device for polishing wheel of synthetic leather polishing machine
12/09/2010WO2010140595A1 Method for grinding plate-like body
12/09/2010US20100311312 Double-side polishing apparatus and method for polishing both sides of wafer
12/08/2010CN201664877U Full-automatic iron plate polishing machine
12/08/2010CN201664872U Annular automatic lapping machine
12/08/2010CN201664866U Abrasive finishing machine
12/08/2010CN101905444A Dressing apparatus, dressing method, and polishing apparatus
12/08/2010CN101905439A Polishing pad with internal in-situ generated gap and gap generating method
12/08/2010CN101314211B Compound semiconductor substrate, method of polishing the same, epitaxial substrate andmethod for manufacturing compound semiconductor
12/08/2010CN101269476B Method for the simultaneous grinding of a plurality of semiconductor wafers
12/08/2010CN101015906B Dust-absorbing hood of novel polishing machine
12/01/2010CN201659488U Polishing device
12/01/2010CN201659487U Gas bag polishing tool capable of actively distributing abrasive particles
12/01/2010CN201659486U Main-auxiliary compound ballonet polishing tool
12/01/2010CN101898327A System and method for conditioning chemical mechanical polishing apparatus using multiple conditioning disks
12/01/2010CN101355032B Method for polishing a substrate composed of semiconductor material
12/01/2010CN101342680B Special-shaped frame sanding method
12/01/2010CN101117173B Transmission conveying appliance for flat-plate ceramic building materials and stone processing
11/2010
11/30/2010US7842158 Multiple zone carrier head with flexible membrane
11/24/2010CN201645310U Polishing machine for inner wall of steel pipe
11/24/2010CN201645309U Adjustable steel pipe bracket
11/24/2010CN201645308U Polishing machine for outer wall of steel pipe
11/24/2010CN201645307U Over-length and overlarge-diameter hydraulic cylinder piston rod polisher
11/24/2010CN201645306U Motor tensioning device for ball section separator
11/24/2010CN201645305U Three-wheeled polisher
11/24/2010CN201645304U Automatic polishing machine
11/24/2010CN201645281U Polishing machine
11/24/2010CN101894739A Method for controlling interlayer dielectric layer thickness
11/24/2010CN101890673A Three-head grinding machine
11/24/2010CN101890667A Four-head planet dual-operation grinding machine
11/24/2010CN101890666A Eight-head crossed grinding head
11/23/2010US7837888 contacting the substrate with a polishing pad and a chemical-mechanical polishing composition comprising a liquid carrier(H2O) and partilce of of an abrassive ( selected from , silica, ceria, germania, titania, zirconia, magnesia, silicon nitride, silicon carbide, organic polymers) present as a colloid
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