Patents
Sitemap › B24 - Grinding; Polishing › B24B - Machines, devices, or processes for grinding or polishing; Dressing or conditioning of abrading surfaces; Feeding of grinding, polishing, or lapping agents › B24B 1 - Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
Patents for B24B 1 - Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes (7,565)
11/2008
11/20/2008WO2008118588A3 Slurry composition and method for polishing organic polymer-based ophthalmic substrates
11/20/2008WO2008002812A3 Electrolyte retaining on a rotating platen by directional air flow
11/20/2008US20080287038 Polishing composition for semiconductor wafer, method for production thereof and polishing method
11/20/2008US20080282618 Impregnated material with variable erosion properties for rock drilling and the method to manufacture
11/18/2008US7454264 Method of beveling an ophthalmic lens blank, machine programmed therefor, and computer program
11/18/2008US7452263 Grinding method
11/13/2008WO2008135847A1 Abrading device
11/13/2008US20080280541 Abrasive filament and brush
11/13/2008US20080280540 Method for biopsy device needle tip
11/13/2008US20080280539 Optical component fabrication using amorphous oxide coated substrates
11/13/2008US20080280538 Polishing composition
11/13/2008US20080280537 Sweetening and cleaning system for lapping machines
11/13/2008US20080280536 Surface treatment method
11/13/2008CA2685817A1 Abrading device
11/12/2008CN100433268C Sapphire supporting base grinding method
11/12/2008CN100431787C High precision polishing method and device for arc discharge fiber cross section
11/11/2008US7449413 Method for effectively removing polysilicon nodule defects
11/11/2008US7448942 Grinding method
11/11/2008US7448940 Polishing apparatus and polishing method
11/11/2008US7448938 Method for supplying spectacle lens
11/06/2008WO2008051779A3 Method and apparatus for finishing the surface of rubber covered rollers
11/06/2008US20080274677 Abrasive slotted disc with controlled axial displacement of a workpiece
11/06/2008US20080274674 Stacked polishing pad for high temperature applications
11/06/2008US20080274673 Wafer polishing apparatus, wafer polishing system and wafer polishing method
11/06/2008US20080274672 Ophthalmic blocking pad
10/2008
10/30/2008WO2008130900A1 Precision sharpener for hunting and asian knives
10/30/2008US20080268753 Non-contact wet wafer holder
10/29/2008EP1984145A1 Method of grinding bar-shaped workpieces, grinding machine for carrying out the method, and grinding cell in twin arrangement
10/29/2008EP1145296B1 Semiconductor wafer manufacturing method
10/29/2008CN201140345Y Temperature feedback type dry freeze grinding device
10/28/2008US7442114 Methods for silicon electrode assembly etch rate and etch uniformity recovery
10/28/2008US7442112 Nozzle for spraying sublimable solid particles entrained in gas for cleaning surface
10/23/2008US20080261493 Apparatus for Removing Material, Use of Gas Inclusions in an Abrasive Liquid and Process for Grinding and/or Polishing Surfaces
10/23/2008US20080261401 Chemical-Mechanical Polishing of Sic Surfaces Using Hydrogen Peroxide or Ozonated Water Solutions in Combination with Colloidal Abrasive
10/23/2008US20080257121 Surface grinding process and positioning member for securing movable jaw of adjustable wrench during surface grinding process
10/22/2008CN201136108Y Double-eccentric wheel post rod vibration mechanism
10/22/2008CN100427266C Method and structure for aluminium chemical mechanical polishing and protective layer
10/21/2008US7440814 Method for auto-calibration of a tool in a single point turning machine used for manufacturing in particular ophthalmic lenses
10/21/2008US7438795 Electrochemical-mechanical polishing system
10/21/2008US7438631 Surface-protecting sheet and semiconductor wafer lapping method
10/21/2008US7438630 Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium
10/21/2008US7438629 In-line sander
10/21/2008US7438627 Polishing state monitoring method
10/21/2008CA2369617C Abrasive article suitable for abrading glass and glass ceramic workpieces
10/16/2008WO2008033227A3 Optically clear nanoparticle colloidal suspensions and method of making thereof
10/16/2008US20080254719 Substrate processing method
10/16/2008US20080254713 Pad assemblies for electrochemically assisted planarization
10/16/2008US20080254469 Method for Regenerating Hydrophilic and Osteophilic Surface of an Implant
10/15/2008EP1633527B1 Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk
10/15/2008EP1568074B1 Carrier head for chemical mechanical polishing apparatus
10/15/2008CN101285188A Process for preventing diamond scratch in process of CMP
10/15/2008CN101284341A Integrated device of ultrasound auxiliary electric spark deposition and repair and ultrasound polish and method thereof
10/15/2008CN100426470C Multipurpose slurry delivery arm for chemical mechanical polishing
10/14/2008US7435165 Transparent microporous materials for CMP
10/14/2008US7435163 Grinding sheet and grinding method
10/14/2008US7435162 Water; an oxidizing agent; a complexing agent of monofunctional acids and difunctional acids; metal ions; free of abrasive particles.
10/14/2008US7435161 Multi-layer polishing pad material for CMP
10/09/2008WO2008058200A3 Method and apparatus for electrochemical mechanical polishing nip substrates
10/09/2008US20080248730 Wafer processing method
10/09/2008US20080248729 Method and Apparatus for Manufacturing Optical Elements
10/09/2008US20080248728 Method for manufacturing polishing pad, polishing pad, and method for polishing wafer
10/09/2008US20080248727 Polishing Slurry
10/09/2008US20080248726 Polishing Method and Polishing Film Used in Such Polishing Method
10/09/2008US20080248725 Floor Grinding Machine
10/09/2008US20080247899 Solid polycrystalline superabrasive material mixted with sintering binder and bonding material; molding in mold with shaped openings; heating; pressurization; heat resistant
10/08/2008CN100423899C Method for on-line manufacturing micro-electrode based on micro-electrolyze grinding of cutting-edge electrode
10/07/2008US7431635 Internal gear grinding method
10/07/2008US7431028 Apparatus and method for slicing an ingot
10/07/2008CA2301986C Device for treating surfaces by impact
10/02/2008WO2008118479A1 Vibration assisted machining system with stacked actuators
10/02/2008WO2008118158A1 Vibration assisted machining system with stacked actuators
10/02/2008WO2008011535A3 Polishing pad having micro-grooves on the pad surface
10/02/2008WO2007120982A3 Polishing pad, a polishing apparatus, and a process for using the polishing pad
10/02/2008US20080242203 Apparatus and method for lapping slider using floating lapping head
10/02/2008US20080242081 Polishing method, polishing apparatus, and method for manufacturing semiconductor device
10/01/2008EP1283761B1 Method for grinding metallic workpieces containing, in particular, nickel
10/01/2008CN101274379A Method of grinding and processing gear wheel
09/2008
09/30/2008US7429367 Chemical mechanical polishing; heat treatment
09/30/2008US7429209 Method of polishing a glass substrate for use as an information recording medium
09/30/2008US7429207 System for endpoint detection with polishing pad
09/25/2008US20080233845 Abrasive articles, rotationally reciprocating tools, and methods
09/25/2008US20080233840 Method For The Simultaneous Grinding Of A Plurality Of Semiconductor Wafers
09/25/2008US20080233836 Polishing composition and polishing method
09/25/2008US20080232744 Multifiber ferrule with precision bumpers and methods for making the same
09/25/2008US20080229672 Multulayer; porous abrasive member, nonwoven filter, porous attaching fabric
09/24/2008EP1971470A2 Portable bimodal tile saw
09/24/2008EP1485440B1 Free radical-forming activator attached to solid and used to enhance cmp formulations
09/23/2008US7427305 Free radical-forming activator attached to solid and used to enhance CMP formulations
09/18/2008WO2008070295A3 System and method for the sonic-assisted cleaning of substrates utilizing a sonic-treated liquid
09/18/2008US20080227370 Substrate for magnetic disk
09/16/2008US7425172 Customized polish pads for chemical mechanical planarization
09/12/2008WO2008108463A1 Polishing tool and polishing device
09/11/2008US20080220696 Honing feed system having full control of feed force, rate, and position and method of operation of the same
09/11/2008US20080216414 Laser propagation to cut coating; prevent ridges around opening
09/11/2008US20080216413 Abrasive article with supersize coating, and methods
09/10/2008CN101259595A Method for grinding end surface of multi-core optical connector
09/10/2008CN101259465A Bending mode conversion type ultrasound wave torsional vibration energy converter
09/09/2008US7422513 Porous abrasive articles with agglomerated abrasives
09/09/2008US7422512 Method and apparatus for surface treatment of a long piece of material
09/04/2008US20080214093 cerium oxide particles, a dispersing agent (lauryl betaine), a water-soluble polymer containing N-mono-substituted product and an N,N-di-substituted product of any one selected from acrylamide, methacrylamide and alpha -substituted product; polishing a silicon dioxide film
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