Patents for B24B 1 - Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes (7,565)
06/2009
06/04/2009WO2009069509A1 Working object grinding method
06/04/2009WO2009067978A1 Method and device for hardening the surface of a metal-composite component
06/04/2009US20090143894 Bevel/backside polymer removing method and device, substrate processing apparatus and storage medium
06/04/2009US20090143749 Method of manufacturing microneedle
06/04/2009US20090142996 Polishing apparatus and method
06/04/2009US20090142995 Slurry supply system
06/04/2009US20090142992 Polishing apparatus and polishing method
06/04/2009US20090142991 Silicon Wafer Grinding Apparatus, Retaining Assembly Used for the Same and Silicon Wafer Flatness Correcting Method
06/04/2009DE102007047891A1 Verfahren und Vorrichtung zum Herstellen einer Zahnstange, insbesondere für ein Lenksystem in einem Fahrzeug Method and apparatus for producing a rack, in particular for a steering system in a vehicle
05/2009
05/28/2009WO2009033485A3 Polishing device, and method for polishing a workpiece surface
05/28/2009US20090137191 Copper cmp polishing pad cleaning composition comprising of amidoxime compounds
05/28/2009US20090137187 Diagnostic Methods During CMP Pad Dressing and Associated Systems
05/28/2009US20090135371 Process for the manufacture of spectacle lenses
05/28/2009DE102008023081A1 Sharpening device for workpiece i.e. cutter of lawn mower or chopper, has stationary sharpening wheel, swiveling device swivelably supported on base frame around vertical axle, and bolt swivelably supported on bearing block
05/27/2009CN201244751Y Deburring ultrasonic wave pure water apparatus for sheet metal parts
05/27/2009CN100491067C High-precision mechanical sharpening method for diamond cutter
05/26/2009US7537512 Multiple fluid supplying apparatus for carrier of semiconductor wafer polishing system
05/21/2009US20090130960 Method For Producing A Semiconductor Wafer With A Polished Edge
05/21/2009US20090130958 Fixed Abrasive Pad Having Different Real Contact Areas and Fabrication Method Thereof
05/21/2009US20090130957 System, method and apparatus for lapping workpieces with soluble abrasives
05/21/2009US20090129210 Display Plate for Solar Cell Apparatus and Method of Producing Display Plate for Solar Cell Apparatus
05/20/2009CN100488725C Method for effectively controlling useful time of grinding pad
05/20/2009CN100488724C Method for effectively controlling useful time of grinding pad
05/20/2009CN100488716C Large mould hand repairing method for small plane optical parts
05/19/2009US7534163 Polishing pad
05/19/2009US7534162 Grooved platen with channels or pathway to ambient air
05/19/2009US7534161 Method for manufacturing cell structure
05/19/2009US7534159 Processing method and apparatus
05/14/2009WO2009060913A1 Method for manufacturing epitaxial wafer
05/14/2009US20090124177 Vacuum-assisted sanding block
05/14/2009US20090124176 Removable polishing pad for chemical mechanical polishing
05/14/2009US20090124175 Double-Side Polishing Method for Wafer
05/14/2009US20090124174 Substrate treating method and substrate treating apparatus
05/14/2009US20090124172 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, kit for chemical mechanical polishing, and kit for preparing aqueous dispersion for chemical mechanical polishing
05/14/2009US20090120731 Elevator load bearing member having a jacket with at least one rough exterior surface
05/13/2009EP1711310A4 Granite slabs cut with frame saw employing blades with diamond-containing segments and method of cutting thereof
05/13/2009CN100486765C Grinding polishing method based on magnetic rheology effect and its polishing device
05/12/2009US7530884 System and method for duplicating keys
05/07/2009US20090117832 Wafer polishing method
05/07/2009US20090117831 Method Of Manufacturing Treatment Device And Treatment Device
05/07/2009US20090117829 Polishing slurry for metal, and polishing method
05/07/2009US20090117828 Polishing apparatus and substrate processing apparatus
05/06/2009CN100485879C Method of producing group III nitride substrate wafers and group III nitride substrate wafers
05/06/2009CN100484713C Method and equipment for profiling machining optical secondary aspherical concave parts
05/06/2009CN100484709C Bidimensional fluid vibration ultra smooth surface polishing equipment and its polishing method
05/05/2009US7527548 System and method for precision machining of high hardness gear teeth and splines
05/05/2009US7527547 Wafer processing method
05/05/2009US7527546 Viscoelastic polisher and polishing method using the same
04/2009
04/30/2009WO2009007301A3 Method for the support of a rotating workpiece during grinding and a hydrodynamic steady rest
04/30/2009WO2007064644A3 Polishing pad with surface roughness
04/30/2009US20090111361 Method of supplying polishing liquid
04/30/2009US20090111359 Polishing composition for hard disk substrate
04/29/2009EP2052814A1 Method for deciding a bevel curve, method for deciding a locus of a bevel, method for processing a lens and apparatus for processing a lens
04/29/2009CN201227757Y Straight thread and taper composite locating rotary ultrasound spindle
04/29/2009CN101417401A Complicated surface optical finishing processing device and technique
04/29/2009CN100482410C Milling mechanism and milling method
04/29/2009CN100482408C Attitude control device and precision machining apparatus comprising same
04/28/2009US7524475 abrasive material for polishing silicon oxide layer or silicon nitride layer on silicon substrate; forming a shallow trench isolation; chemical mechanical polishing; obtained via a low-temperature calcination, pulverization, and a high-temperature calcination; high pore fraction and low strength
04/28/2009US7524347 CMP composition comprising surfactant
04/28/2009US7524235 Method of eliminating surface stress of silicon wafer
04/23/2009WO2007081394A3 Optical disc destruction device
04/23/2009US20090104856 abrasion resistant; excellent in removal rate and in-plane uniformity; stable removal rate even when polishing a number of objects; irradiating sheet-shaped polymer molded article with an electron beam within an irradiation dose of 10 to 400 kGy; less processing time; 1,2-polybutadiene; cyclodextrin
04/23/2009US20090104855 Method and apparatus for finishing a workpiece
04/23/2009US20090104852 Carrier, Method For Coating A Carrier, and Method For The Simultaneous Double-Side Material-Removing Machining Of Semiconductor Wafers
04/23/2009US20090104851 Polishing of sapphire with composite slurries
04/23/2009US20090104850 Polishing pad
04/23/2009US20090104849 Polishing pad and polishing method
04/23/2009US20090103993 Method of Polishing a Tungsten Carbide Surface
04/23/2009DE102007050482A1 Workpiece finishing device, has processing spindle attached to frame, and electronic gradometer arranged at processing spindle for determining adjustment of spindle axis relative to vertical axis
04/22/2009EP2050536A1 Method and apparatus for finishing a workpiece
04/22/2009CN201224011Y Ultrasonic auxiliary electric spark deposition repair and ultrasonic polish integrated apparatus
04/22/2009CN100481340C Apparatus and method for polishing a substrate
04/22/2009CN100479992C Polishing seat with concave structure for improving mixed tail trace
04/22/2009CN100479989C Component for forming fixed channels through gas turbine disc dovetail grooves
04/21/2009US7520798 Polishing pad with grooves to reduce slurry consumption
04/21/2009US7520797 Platen endpoint window with pressure relief
04/21/2009US7520796 Polishing pad with grooves to reduce slurry consumption
04/21/2009US7520795 Grooved retaining ring
04/16/2009WO2007032946A3 Methods of bonding superabrasive particles in an organic matrix
04/16/2009WO2006110224A3 Slurry composition and method for polishing organic polymer-based ophthalmic substrates
04/16/2009US20090098814 Polymeric Fiber CMP Pad and Associated Methods
04/16/2009US20090098808 Grinding method for wafer
04/16/2009US20090098806 Compositions And Methods For Removing Scratches From Plastic Surfaces
04/16/2009US20090098805 Melamine methylol for abrasive products
04/15/2009EP2048208A2 Free radical-forming activator attached to solid and used to enhanced CMP formulations
04/15/2009CN100478740C Ophthalmic lens which is coated with an electrostatic film and method of edging one such lens
04/09/2009WO2006058175A3 System and method for removing film from planar substrate peripheries
04/09/2009US20090093201 Polishing pad
04/09/2009US20090093193 Chemical mechanical polishing apparatus
04/09/2009US20090090066 Grinding tool and manufacturing method thereof
04/07/2009US7514016 Methodology of chemical mechanical nanogrinding for ultra precision finishing of workpieces
04/07/2009US7513820 Method and apparatus for producing micro-texture on a slider substrate using chemical and mechanical polishing techniques
04/02/2009WO2006115581A3 Composition and method for polishing a sapphire surface
04/02/2009WO2005036605A3 Improved retaining ring for wafer carriers
04/01/2009CN101400479A Polishing pad, a polishing apparatus, and a process for using the polishing pad
04/01/2009CN101399164A Semi-insulation gallium arsenide wafer double face finishing method
03/2009
03/31/2009US7510463 Extended life conditioning disk
03/31/2009US7510462 Multi-diamond cutting tool assembly for creating microreplication tools
03/31/2009US7510461 Grinding jig set and grinding method
03/26/2009US20090081929 Smoothing and/or lapping tool particularly for finishing stone materials
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