Patents
Patents for G02B 17 - Systems with reflecting surfaces, with or without refracting elements (9,842)
12/2010
12/08/2010CN101564947B Laser marking method on plastic
12/08/2010CN101482644B Fourier lens system
12/08/2010CN101044946B Display shelf and display shelf system
12/07/2010US7848016 High-NA projection objective
12/07/2010CA2548398C Optical arrangements for head mounted displays
12/02/2010US20100302785 Led lens and assembly
12/02/2010US20100302783 Led street light lens
12/02/2010DE102009030825B3 Reflecting device for reflection of light projection of e.g. beamer, that projects light in form of images or films in single or multi-color in wall of room, has groove formed at abutting edges, in which mirroring surfaces are attached
12/02/2010DE102009030502A1 Illumination system for microlithography-projection exposure system used during manufacturing of e.g. LCD, has aperture formed for generating preset correction of intensity distribution produced by mirror array in pupil shaping surfaces
12/01/2010EP2255246A1 Ring flash adapter
12/01/2010CN101900872A Two-piece free-form surface head mounted display optical system
11/2010
11/25/2010WO2010134069A1 Light concentrator, redirector and distributor
11/24/2010CN201654316U Low-depression-angle microscope
11/24/2010CN201654313U Optical path steering gear
11/24/2010CN201641974U Multi-angle imaging device
11/24/2010CN201641973U Multi-angle imaging device
11/24/2010CN201641971U Multi-angle imaging device
11/24/2010CN101896851A Ing image display device
11/24/2010CN101896844A Optical guide and ocular vision optical system
11/24/2010CN101893752A Catadioptric cylindrical lens for collimating fast-axis beams of laser diode and manufacturing method thereof
11/24/2010CN101339291B Rear-view mirror
11/23/2010US7839414 Methods and devices for display color compensation
11/18/2010WO2010131003A1 Reflector assembly and beam forming
11/18/2010DE102009008644A1 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einer derartigen abbildenden Optik The imaging optics and projection exposure system for microlithography with such imaging optics
11/17/2010CN201637922U Paraboloidal mirror concentrating system with optical guide
11/17/2010CN201637919U Optics system of catadioptric free-curved-surface binary optical prism
11/17/2010CN201637671U Multi-sample multi-element simultaneously measured tungsten boat atomic absorption analyzer
11/17/2010CN101887210A Projection apparatus and transparent screen for it
11/17/2010CN101520342B Infrared Fourier spectrum detector with ultrahigh spectral resolution
11/17/2010CN101295140B Projection optical system, exposure device and exposure method
11/17/2010CN101216600B Projection optical system, exposure apparatus, and exposure method
11/17/2010CN101216598B Projection optical system, exposure apparatus, and exposure method
11/16/2010US7835073 Projection objective for lithography
11/11/2010WO2010128218A2 Thermoelectric generator system with optical solar collectors
11/11/2010US20100284099 Monolithic Eccentric Mersenne-Cassegrain Telescope
11/11/2010US20100284079 Protection for solar energy reflectors and method of protection for solar energy reflectors
11/11/2010US20100283831 Camera unit and camera system using the same
11/11/2010DE102009019635A1 Optical element for e.g. use as translucent delimitation of e.g. roof, of building, has optically diffuse reflecting segments arranged on light incident and light emission surfaces of optically transparent substrate
11/10/2010EP1714179B1 Method and device for generating retinal images using the stigmatism of the two foci of a substantially elliptical sight
11/10/2010CN201628807U Ultra-wide-angle image displaying device
11/10/2010CN101883193A Quick integral ticket image collecting method with high precision
11/10/2010CN101014894B Laterally-emitting, radiation-generating component, and lens for one such component
11/10/2010CN101004538B Omnibearing vision sensor with no dead angle
11/04/2010US20100277792 Night vision glasses
11/04/2010DE102009029132A1 Illumination system for micro lithographic projection system utilized for microlithography of e.g. electronic component, has optical element arranged in level directly in front of entry surface, and exhibiting refraction power
11/03/2010CN201623656U Sun tracking device
11/03/2010CN101604119B Field imaging test system for aerial camera
10/2010
10/28/2010US20100271691 Imaging optical system and range finder
10/28/2010DE19830710B4 Endoskop Endoscope
10/28/2010DE102009055432A1 Concentrating device for use in photovoltaic array or solar panel for concentrating incident light, particularly sunlight, has statically mounted gutter or trough-shaped mirror body
10/28/2010DE102009017095A1 Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv Mirror for the EUV wavelength range, projection lens for microlithography with such a mirror and projection exposure system for microlithography with such a projection lens
10/27/2010CN101874219A Dual focal length lens system
10/27/2010CN101874218A Dual focal length lens system
10/27/2010CN101873084A Solar energy collecting device
10/27/2010CN101872074A Adjustment method of three pairwise vertical light
10/27/2010CN101872063A Conical concentrating system
10/27/2010CN101872062A Reflection tank adopting multiplexing structure
10/26/2010US7819549 High efficiency light source using solid-state emitter and down-conversion material
10/26/2010CA2402687C High efficiency non-imaging optics
10/21/2010WO2010121185A1 Opto-mechanical optical path retardation multiplier for optical mems applications
10/21/2010US20100265572 Catadioptric projection objective
10/21/2010US20100265481 Imaging optical system and projection exposure installation
10/21/2010DE102009045763A1 Optical focal adjusting component for use in lighting system for projection exposure system of extreme UV microlithography, has reflector devices displaced with adjusting actuator for correcting use area within adjustment region
10/21/2010DE102009017096A1 Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv Mirror for the EUV wavelength range, projection lens for microlithography with such a mirror and projection exposure system for microlithography with such a projection lens
10/20/2010CN201609812U 飞行光路系统 Flight optical system
10/20/2010CN101866046A Super-wide-range image display device
10/19/2010US7817348 Zoom lens and imaging apparatus
10/19/2010US7815853 Lateral flow quantitative assay method and strip and laser-induced fluorescence detection device therefor
10/14/2010WO2010116831A1 Video display device and head-mounted display
10/14/2010WO2010116726A1 Beam-scanning display device
10/14/2010WO2010116705A1 Light-emitting system and imaging device
10/14/2010WO2010115500A1 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
10/14/2010WO2010095068A3 Compact molded led module
10/14/2010US20100259839 Fixed-focus lens
10/14/2010DE202010010376U1 Batteriezusatzteil für ein digitales Fotogerät mit Stativgewinde Anschluss Battery accessory for a digital photo device with Tripod Mount
10/13/2010CN101859021A 光学成像系统 The optical imaging system
10/13/2010CN101216599B Projection optical system, exposure apparatus and exposure method
10/12/2010US7813041 Solar tracking reflector system for structure lighting
10/07/2010WO2010113114A2 Security element comprising basic reflective structures
10/07/2010WO2010113091A1 Optics device for stage lighting
10/07/2010WO2010112637A1 Axisymmetric reflector with faceted structure based on the gold number
10/07/2010WO2010112328A1 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
10/07/2010WO2009110976A8 Optical system for batwing distribution
10/07/2010US20100253999 Catadioptric projection objective
10/07/2010US20100253769 Optical System and Assembly Method
10/07/2010DE102009034028A1 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik The imaging optics and projection exposure system for microlithography with such imaging optics
10/07/2010CA2757110A1 Security element comprising basic reflective structures
10/07/2010CA2757048A1 Optics device for stage lighting
10/06/2010CN201600488U 激光成像仪 Laser Imager
10/06/2010CN101855585A Image-forming optical system and distance measuring device
10/06/2010CN101852974A 投影型图像显示设备和投影光学系统 A projection type image display device and a projection optical system
10/06/2010CN101852337A Light emitting apparatus
10/06/2010CN101091133B Light collimating device
09/2010
09/30/2010WO2010110934A1 Real-time optical compensation of orbit-induced distortion effects in long integration time imagers
09/30/2010WO2010108319A1 Optical imaging system with an anti-shaking optical element
09/30/2010US20100245784 Projection type image display apparatus and projection optical system
09/30/2010DE102010004827A1 Relay lens e.g. catadioptric microscope objectives, for use with pupil relay system for e.g. projection of pupil, has concave and convex mirrors arranged such that rays path is reflectable at concave mirror and at convex mirror
09/29/2010EP2234141A1 Illumination optical system, exposure apparatus, and device manufacturing method
09/29/2010CN101849205A Chromatically corrected catadioptric objective and projection exposure apparatus including the same
09/29/2010CN101634744B Foldback-type bi-spectral gaze imaging system
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