Patents
Patents for F27B 5 - Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated (2,607)
11/2006
11/22/2006CN1285752C Intermediate frequency inductive carburizing furnace
11/21/2006US7138608 Sealed line structure for use in process chamber
11/21/2006US7138607 Determining method of thermal processing condition
11/21/2006US7138606 Wafer processing method
11/16/2006WO2006009787A3 Device for cooling and humidifying reformate
11/16/2006DE102004012232B4 Verfahren zum Herstellen von Plattenstapeln, insbesondere zum Herstellen von aus wenigstens einem Plattenstapel bestehenden Kühlern A method for producing stacks of plates, especially for producing a plate stack consisting of at least coolers
11/15/2006CN2837309Y Takeout-free vertical magnesium reducing furnace
11/14/2006US7135656 Apparatus and method for reducing stray light in substrate processing chambers
11/09/2006US20060249502 Distance estimation apparatus, abnormality detection apparatus, temperature regulator, and thermal treatment apparatus
11/09/2006US20060249501 Oven for controlled heating of compounds at varying temperatures
11/08/2006EP1718909A1 Backside rapid thermal processing of patterned wafers
11/02/2006DE112004001923T5 Hochdruck-Wärmebehandlungsofen High-pressure heat treatment furnace
10/2006
10/26/2006WO2006111252A1 Heat treatment of metal work pieces
10/26/2006CA2605124A1 Heat treatment of metal work pieces
10/24/2006US7126087 Method of effecting heating and cooling in reduced pressure atmosphere
10/19/2006US20060234178 Apparatus and method for heating substrate and coating and developing system
10/18/2006CN2828697Y Ceramic pushed bat kiln of coal and gas mixing burning
10/11/2006CN1279189C Indirectly-heating equipment for running product, specially for plate material by means of fossil fuel
10/10/2006US7118085 Retort system
10/05/2006WO2006103697A1 Rapid and homogenous heat treatment of large metallic sample using high power microwaves
10/05/2006US20060219692 Pointer for interactive display system
10/03/2006US7115837 Selective reflectivity process chamber with customized wavelength response and method
09/2006
09/27/2006EP1704265A2 Melting and vaporizing apparatus and method
09/20/2006CN1276550C Positive locking element lead retainer/insulator
09/20/2006CN1276481C Producing method for ceramic membrane and pressurized heat treatment apparatus therefor
09/19/2006US7109443 Multi-zone reflecting device for use in flash lamp processes
09/14/2006US20060201927 Heating device for heating semiconductor wafers in thermal processing chambers
09/13/2006EP1701121A2 Thermal treatment furnace
09/13/2006CN1831457A Continuous fritting furnace for non-oxide ceramic fritting and using method
09/12/2006US7105049 Method of manufacturing single crystal calcium fluoride
09/05/2006US7103271 plane-shaped heating component faces one surface of a workpiece, irradiating light to raise the temperature of a semiconductor wafer; distortion-free; relieving stress by giving a distribution to a light irradiation intensity of an open loop control, reducing temperature variation
09/05/2006US7102104 Thermal processing unit; a tubular processing container for holding semiconductor wafers in a tier-like manner for film-forming process, an etching process, an oxidation process producting semiconductor integrated circuits
08/2006
08/30/2006CN1825041A Vacuum-hot pressing sintering furnace
08/24/2006US20060188687 One piece shim
08/23/2006EP1240807B1 Improved infrared heating oven for the conditioning of plastic preforms
08/17/2006WO2006086217A2 Vacuum muffle quench furnace
08/17/2006US20060180085 One piece shim
08/16/2006CN2807171Y Microwave sintering furnace for powder material
08/15/2006US7091453 Heat treatment apparatus by means of light irradiation
08/10/2006US20060175316 Vacuum muffle quench furnace
08/08/2006US7087097 Facility for the gasification of carbon-containing feed materials
08/08/2006US7086396 Heating apparatus
08/02/2006CN2802405Y Vertical continuous fritting furnace with multiple temp zone pipes
08/02/2006CN1813163A Gas cooling type vacuum heat treating furnace and cooling gas direction switching device
08/02/2006CN1267528C Double-fired horizontal tube heater
08/01/2006US7083658 exothermic oxidizer reactor with a CaS inlet, a hot air inlet and a CaSO4/waste gas outlet and an endothermic reducer reactor with a CaSO4 inlet circulating to the oxidizer reactor CaSO4/waste gas outlet, a CaS/syngas outlet circulating to the oxidizer reactor CaS inlet
07/2006
07/26/2006CN2800200Y Carbon tube type high temperature sintering furnace
07/19/2006CN2798007Y Non water cooled electrode
07/13/2006US20060151462 Semiconductor wafer baking apparatus
07/13/2006DE102004049888B4 Furnace for dental parts has between the heating element and burner chamber a heat-permeable cover element supported on furnace hood
07/12/2006CN2796093Y Semiconductor module producing system
07/12/2006CN2795765Y High efficiency anti-slip wear-resistance mixing machine lining plate
07/12/2006CN1800763A Three-chamber type intelligent periodically controllable atmosphere furnace
07/11/2006US7075037 Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer
07/06/2006DE202006006993U1 Workpiece holder for thermal treatment of exhaust gas catalysers has support surface with contour corresponding to bearing face of catalyser and support surface forms form centering surface for catalyser
06/2006
06/29/2006DE112004001402T5 System zum Prozessieren eines Behandlungsobjekts System for processing a treatment object
06/28/2006CN2791569Y Flyash ceramsite sintering machine
06/28/2006CN2791568Y Low temperature rapid-cooling vacuum, sintering equipment
06/28/2006CN1261732C Air inlet set with variable sectional area of hydrogen reduction furnace for polysilicon
06/27/2006US7068926 flash lamps are turned on to cause momentary expansion and contraction of the gas in a chamber, thereby scattering particles deposited on a bottom plate, etc.; scattered particles are removed by the nitrogen gas passing through a bottom portion of the chamber and discharged through the outlet passage
06/27/2006US7067770 vacuum-compatible system includes a tube that is permeable to IR radiation, extends into the treatment chamber and penetrates the wall of the chamber; a source of infrared radiation is inside the tube which is isolated from the atmosphere inside the treatment chamber.
06/27/2006US7067006 OH and H resistant silicon material
06/15/2006US20060127067 Fast heating and cooling wafer handling assembly and method of manufacturing thereof
06/13/2006US7060939 Substrate heating method, substrate heating system, and applying developing system
06/13/2006US7060134 One piece shim
06/13/2006US7059848 Method of and auxiliary cleaner for use in cleaning a diffusion furnace of semiconductor manufacturing equipment
05/2006
05/31/2006EP1662219A1 Firing kiln and process for producing porous ceramic member therewith
05/26/2006WO2006055772A1 Kilns for processing ceramics and methods for using such kilns
05/26/2006CA2626002A1 Kilns for processing ceramics and methods for using such kilns
05/24/2006DE202006003855U1 Refractory lining for vacuum and protective gas furnaces used for heat treatment and sintering processes comprises graphite and/or carbon fibers with a metallic and/or ceramic coating in the form of a coating adhering to a substrate
05/24/2006CN2783233Y Base type hent mine material feeder
05/24/2006CN1777974A Critical dimension variation compensation across a wafer by means of local wafer temperature control
05/23/2006US7049549 Covering a substrates with various heating properties ; uniform temperature profile and uniform film deposition
05/18/2006US20060102612 Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer
05/17/2006EP1657511A1 Firing kiln and process for producing ceramic member therewith
05/17/2006CN2781304Y Multifunction three-chamber fritting furnace for Nd-Fe-B permanent magnet
05/17/2006CN1774607A Vertical-type heat treating apparatus and workpiece transfer method
05/16/2006US7045746 Shadow-free shutter arrangement and method
05/16/2006US7044731 Heat treatment apparatus
05/10/2006EP1135659B1 Apparatus and method for thermal processing of semiconductor substrates
05/09/2006US7041939 Thermal processing apparatus and thermal processing method
05/09/2006US7041931 Stepped reflector plate
05/03/2006EP1125089B1 Indirect-fired, all ceramic pyrochemical reactor
05/02/2006US7038174 Heating device for heating semiconductor wafers in thermal processing chambers
05/02/2006US7038173 Heat substrates; positioning lamps perpendicular with reflector; efficient radiation; ring of reflective light; uniform temperature
04/2006
04/27/2006DE19741837B4 Hochtemperatur-Ofenanlage und Verfahren zur Wärmebehandlung von Materialien High-temperature furnace system and method for heat treatment of materials
04/26/2006CN1763465A Push plate of nitrogen kiln for sintering soft magnetic ferrite
04/25/2006US7034255 Light irradiation type thermal processing apparatus
04/20/2006US20060084023 Method of and auxiliary cleaner for use in cleaning a diffusion furnace of semiconductor manufacturing equipment
04/20/2006US20060083495 Variable heater element for low to high temperature ranges
04/20/2006DE102004049888A1 Furnace for dental parts has between the heating element and burner chamber a heat-permeable cover element supported on furnace hood
04/18/2006US7029505 Sheet type heat treating apparatus and method for processing semiconductors
04/13/2006US20060076324 Melting and vaporizing apparatus and method
04/12/2006CN1758005A Electric calcining furnace of using volatile and electric calcining method
04/12/2006CN1250477C Burning furnace, burnt body producing method, and burnt body
04/11/2006US7026581 relates to field of semiconductor thermal processing systems, specifically to a vertical rapid thermal processing unit that includes an elevator assembly for positioning a wafer within the processing unit; accurately controls position of wafer within processing chamber
04/11/2006US7026580 apparatus for adjusting exhaust flow to a high level that cleans hot plate apparatus; use in photolithography section of semiconductor manufacturing process for numerous heat treating operations, for example, a post expose bake operation
04/11/2006US7024916 Vacuum heat treatment furnace and method of and apparatus for measuring carbon concentration in atmosphere having reduced pressure.
04/05/2006EP1643199A1 Gas cooling type vacuum heat treating furnace and cooling gas direction switching device
04/05/2006EP1522090A4 Thermal processing system and configurable vertical chamber
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