Patents for C25F 1 - Electrolytic cleaning, degreasing, pickling, or descaling (1,460)
05/2007
05/16/2007CN1316580C Electrode assembly for the removal of surface oxides by electron attachment
05/16/2007CN1316067C Method for purifying and decontaminating surface of light metal alloy
05/09/2007EP1781842A1 Method and device for descaling metals
05/09/2007EP1088113B9 Electrolytic process for removing a substance from solid compounds
05/02/2007EP1779410A2 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source
05/02/2007CN1313648C Electrochemical machining method and its equipment
04/2007
04/18/2007EP1230431B1 Machine for localised cleaning with electrolytic and/or ultrasound cell, for pickling and/or polishing
04/11/2007EP1772536A1 Electrolytic processing apparatus and method
04/10/2007US7202951 Laser-based cleaning device for film analysis tool
04/05/2007WO2006020080A3 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source
03/2007
03/28/2007CN2883407Y Narrow gap type verticle electrolytic cleaning appts.
03/27/2007US7196342 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
03/22/2007US20070062557 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus
03/22/2007US20070062030 Machine for localised cleaning with an electrolytic cell, for pickling and/or polishing metal surfaces
03/22/2007DE10317329B4 Vorrichtung und Verfahren zum Reinigen eines Halbleiterwafers Device and method for cleaning a semiconductor wafer
03/21/2007EP1644558A4 High purity electrolytic sulfonic acid solutions
03/21/2007CN1931427A Electrochemical in-situ purifying process of carbon base nanometer electrocatalyst material
03/20/2007US7192556 Flow cell, method for separating carrier-free radionuclides, and the radiochemical reaction thereof
03/14/2007EP1761660A1 Method for removing a coating from a component
03/13/2007US7188630 Method to passivate conductive surfaces during semiconductor processing
03/08/2007US20070051699 Methods of removing metal contaminants from a component for a plasma processing apparatus
02/2007
02/28/2007EP1755804A1 Method for making decorated bottle caps with improved mechanical strength and device for implementing said method
02/22/2007US20070039824 In-line method and apparatus to prevent fouling of heat exchangers
02/20/2007US7181306 Enhanced plasma etch process
02/20/2007CA2384465C Selective removal of brazing compound from joined assemblies
02/08/2007WO2007014967A1 Residue-free removable etching agent
02/01/2007US20070023066 Multilayer substrate cleaning method, substrate bonding method, and bonded wafer manufacturing method
02/01/2007DE10025643B4 Verfahren zum Beschichten von Aluminium- und Magnesium-Druckgusskörpern mit einer kataphoretischen Elektrotauchlackierungsschicht und mit diesem Verfahren hergestellte Aluminium- und Magnesium-Druckgusskörper Process for coating aluminum and magnesium die-cast bodies with a cataphoretic electrodeposition coating layer and with this method produced aluminum and magnesium die-cast body
01/2007
01/30/2007US7170190 Apparatus for oscillating a head and methods for implementing the same
01/25/2007WO2006096814A3 Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices
01/25/2007US20070020918 Substrate processing method and substrate processing apparatus
01/24/2007CN1900384A Process for removing part surface oxidized skin using supersonic wave and electrolytic combination
01/24/2007CN1900364A Method for removal of copper oxide film from substrate processing surface
01/24/2007CN1296771C Method of passivating of low dielectric materials in wafer processing
01/18/2007WO2006083693B1 Etchant treatment processes for substrate surfaces and chamber surfaces
01/17/2007CN1896326A Method of removal of substance from solid compound m i x of substance x and metal or semi-metal m i and solid solutions by electrolysis in a fused salt
01/16/2007US7163018 Single wafer cleaning method to reduce particle defects on a wafer surface
01/11/2007WO2007003725A1 Austenitic stainless steel strip having a bright surface finish and excellent mechanical properties
01/10/2007EP1144735A4 Method and apparatus for low energy electron enhanced etching and cleaning of substrates
01/04/2007WO2007001263A2 Electro-decontamination of contaminated surfaces
01/03/2007EP1739200A1 Strip made of stainless austenitic steel with bright surface and excellent mechanical properties
01/03/2007CN1890034A Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
12/2006
12/27/2006CN1884631A Method and device for cleaning organic matter using electrochemical method
12/26/2006US7153411 medical stent of an alloy of a noble metal with stainless steel, cobalt-chromium alloy, or nickel-titanium alloy; laser cutting; electropolishing in acidic bath containing a chelating agent having a sulfur atom available for covalent bonding, a thiourea or a thiouronium; a halide; multiple pulse waveform
12/14/2006US20060279222 Dense fluid delivery apparatus
12/12/2006US7147768 Electrochemical scale inhibition
12/07/2006WO2006129540A1 Nb-Al TYPE SUPERCONDUCTING WIRE HAVING STABILIZING COPPER DEPOSIT TENACIOUSLY ADHERENT THERETO AND PROCESS FOR PRODUCING THE SAME
12/07/2006WO2006083693A3 Etchant treatment processes for substrate surfaces and chamber surfaces
12/07/2006US20060274816 Spread spectrum signal demodulating method and apparatus
12/07/2006US20060272950 High purity electrolytic sulfonic acid solutions
12/05/2006US7144482 Method and apparatus for forming grooves within journals and on flat plates
11/2006
11/30/2006WO2005100643A3 Method and apparatus for local fluorine and nitrogen trifluoride production
11/30/2006US20060272061 Method for manufacturing a one-dimensional nano-structure-based device
11/30/2006US20060270242 Cleaning method and solution for cleaning a wafer in a single wafer process
11/22/2006CN1285769C Electrochemical decomposition method for high-temp. alloy
11/16/2006WO2006120181A2 Method to reduce the amount of dust formation of metal oxides
11/14/2006US7134941 Methods for residue removal and corrosion prevention in a post-metal etch process
11/09/2006US20060249399 Cleaning (de-poisining) PEMFC electrodes from strongly adsorbed species on the catalyst surface
10/2006
10/31/2006US7128821 Immersing the wafer in an electropolishing electrolyte solution and removing defects and particles from the wafer by rotational friction between the wafer and the electrolyte solution in combination with electrolysis
10/25/2006EP1715085A2 Method for producing anodized structure
10/25/2006EP1573095B1 Method for removing at least one surface area of at least two components
10/25/2006CN1281796C Magnesium alloy surface activating process
10/12/2006US20060226027 Electrochemical reduction of metal oxides
10/11/2006CN1279194C Method for producing metal, semimetal, and alloy and raw materials used therein
10/10/2006US7118665 halogen ions implanted into micropores on surface prevents the electrode from generating a passive film, and which enhances the release rate of metal ions from the electrode, so as to extend the lifetime of the electrode
10/05/2006WO2006039090A3 Solutions for cleaning silicon semiconductors or silicon oxides
09/2006
09/28/2006US20060213534 Integrated ashing and implant annealing method using ozone
09/20/2006EP1701806A1 Apparatus and methods for deoxidizing metal surfaces
09/14/2006DE10334434B4 Verfahren und Gerät zum Reinigen eines Halbleitersubstrats Method and apparatus for cleaning a semiconductor substrate
09/13/2006EP1699950A2 Method for cleaning and polishing metallic alloys and articles cleaned or polished thereby
08/2006
08/24/2006DE102005008237A1 Chemical or biochemical functionalizing of metal surfaces by reactive bonding of the metal surface without previous activation, useful in the chemical and biochemical treatment of surfaces involves contacting with specific substances
08/23/2006EP1691938A2 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
08/17/2006US20060180477 Method for producing oxidised graphite
08/16/2006CN1270355C Method and apparatus for removing residual material from substrate of electronic device
08/16/2006CN1269996C Selectively removing braze composition from conneted assembly
08/16/2006CN1269995C Fin stripping system with feedback control of water treatment and acid reusing system
08/15/2006US7089947 Apparatus and method for cleaning a semiconductor wafer
08/10/2006WO2006083693A2 Etchant treatment processes for substrate surfaces and chamber surfaces
08/10/2006US20060174912 Wafer cleaning solution for cobalt electroless application
08/09/2006CN1268791C Method for removal of X and M from solid compound of matter X and metal M
08/03/2006US20060169668 Low temperature etchant for treatment of silicon-containing surfaces
08/02/2006EP1685913A1 Improved cleaning device
07/2006
07/27/2006DE19532278B4 Verfahren zur Herstellung eines kaltgewalzten Bandes in einem Durchlauf A process for producing a cold rolled strip in a single pass
07/12/2006CN1802717A Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor,
07/12/2006CN1802716A Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor,
07/12/2006CN1802458A A process for the recovery of synthetic diamonds
07/06/2006US20060144820 Remote chamber methods for removing surface deposits
07/05/2006CN1796616A Method for oxidizing cultural relics in ironware
07/05/2006CN1262691C An improved process and apparatus for cleaning and/or coating metal surfaces using electro-plasma technology
06/2006
06/29/2006US20060137710 Method for controlling corrosion of a substrate
06/27/2006US7067015 Modified clean chemistry and megasonic nozzle for removing backside CMP slurries
06/27/2006CA2365009C Feedback controlled airfoil stripping system with integrated water management and acid recycling system
06/21/2006EP1051545B1 Method for treating a metal product
06/20/2006CA2208109C Cleaning aluminium workpieces
06/14/2006CN1788112A High purity electrolytic sulfonic acid solutions
06/14/2006CN1786280A Treatment technology of prestressed wire material surface
06/13/2006US7060631 exposing a base surface with exposed copper of a substrate having an opening extending through 2 layers of insulation to a cleaning solution formed from hydrochloric acid, nitric acid and hydrofluoric acid; less than 5 Angstroms of the insulation from sidewalls of the opening are removed
06/07/2006EP1664369A1 Method and apparatus for treating sputtering target to reduce burn-in time
06/07/2006EP1590101B1 Methods and device for removing cross-linked polymers from metal structures
06/07/2006CN1782139A Method for electrochemically removing scale from stainless steel strip and wire
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