Patents
Sitemap › C11 - Animal or vegetable oils, fats, fatty substances or waxes; Fatty acids therefrom; Detergents; Candles › C11D - Detergent compositions; Use of single substances as detergents; Soap or soap-making; Resin soaps; Recovery of glycerol › C11D 7 - Compositions of detergents based essentially on non-surface-active compounds
Patents for C11D 7 - Compositions of detergents based essentially on non-surface-active compounds (16,781)
04/2010
04/27/2010US7704936 10 g/l to 100 g/l of alkaline component in terms of hydroxide ion concentration, 2 g/l to 20 g/l of bivalent zinc ion, 0.1 g/l to 1 g/l of ferric ion, a chelating agent in a concentration sufficient to prevent formation of iron hydroxide, and 0.3 g/l to 3 g/l of nitrate ion; film removal from aluminum
04/27/2010US7704532 Chemically or physically alterating a protein to mitigates an allergic reaction to the protein in an animal or human, by directly contacting the protein with a buffered acidic aqueous solution of aluminum sulfate; dermatophagoides; cockroach body dust; saliva; mold spores; airborne pollen
04/27/2010CA2354566C Compositions comprising 1,1,1,3,3-pentafluorobutane and use of said compositions
04/22/2010WO2010044834A2 A fragrance-delivery composition comprising boron and persulfate ion-crosslinked polyvinyl alcohol microcapsules and method of use thereof
04/22/2010WO2010044194A1 Alkaline cleaning water
04/22/2010WO2010043796A1 Cleaning composition
04/22/2010US20100099595 Manufacturing and cleansing of thin film transistor panels
04/22/2010CA2732968A1 A fragrance-delivery composition comprising boron and persulfate ion-crosslinked polyvinyl alcohol microcapsules and method of use thereof
04/21/2010EP2176391A1 Hard surface cleaner containing polysulfonic acid
04/21/2010EP2175975A1 Process for producing a free-flowing and storage-stable solid comprising essentially alpha-alanine-n,n-diacetic acid and/or one or more derivatives of alpha-alanine-n,n-diacetic acid
04/21/2010EP1812543B1 Stabilized propyl bromide compositions
04/20/2010US7700537 Cleaning solvent for silicone caulk
04/20/2010US7700534 Process for removing contaminant from a surface and composition useful therefor description
04/20/2010US7700533 salt selected from a guanidinium salt, an acetamidinium salt, a formamidinium salt, a water soluble solvent selected from dimthylacetamide, N-methyl pyrrolidinone, dimethylsulfoxide, dimethylformamide, glycol ether, glycerol etc. free of an oxidizer and free of abrasive particles; removal of photoresist
04/20/2010US7700532 Cleaning composition and method of cleaning therewith
04/20/2010US7700531 mixture contains a lactone, cyclic carbonate and solvents of a glycol ether, for cleaning silicon wafer, an organic electroluminescence material, photosensitive resin, liquid crystal or wax
04/20/2010US7700004 for cleaning, degreasing, defluxing, dewaterig, and depositing fluorolubricant; propellants; semiconductors
04/20/2010US7699940 Flushing solutions for coatings removal
04/20/2010US7699936 Composition and method for surface treatment of oxidized metal
04/20/2010CA2489616C Method for cleaning chamber of deposition apparatus for organic el device production
04/15/2010WO2010042457A1 Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition
04/15/2010WO2010040917A1 Method for cleaning surfaces using a protic ionic liquid
04/15/2010CA2740027A1 Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition
04/14/2010EP2173846A1 Solid cleaning composition and method of use
04/14/2010CN101693240A Process for degumming and pre-cleaning silicon slices
04/13/2010US7696145 Natural cleaning compositions
04/13/2010US7695635 Mixture with (hydro)fluorocarbon such as 1,1,1,3,3-pentafluoropropane, 1,1,1,3,3-pentafluorobutane, and/or 1,1,1,3-tetrafluoropropene; low ozone depletion potential, global warming; replaces methyl bromide; applied to wood, soil, buildings
04/08/2010WO2010039575A1 Granular composition
04/08/2010WO2010037560A1 Detergent additive based on clay minerals, use thereof, and method for the production thereof
04/07/2010EP2171030A2 Solidification matrix including a salt of a straight chain saturated mono-, di-, or tri- carboxylic acid
04/07/2010EP2170771A1 Diaphragm analysis method and use of products obtained using the method
04/07/2010CN1918698B Cleaning liquid for substrate for semiconductor device and cleaning method
04/07/2010CN101691650A Degreasing agent for vacuum plating
04/07/2010CN101691529A Chemical cleaning agent for alumina production pipeline scale
04/07/2010CN101691528A Waterless urinal sealing liquid
04/07/2010CN101691527A Cleaning solution
04/06/2010US7691800 Self-cleaning water-based paint spray gun comprising means for pumping paint, water, and cleaning agent through spray gun, cleaning agent comprising polar protic solvents, triethanolamine as an emulsifier, ethoxylated nonylphenol as a surfactant, surfynol 104 as a foam suppresssant, water; automatic
04/01/2010WO2009143376A3 Ionic liquids and methods for using the same
04/01/2010US20100081602 Compositions for lipophilic fluid systems
03/2010
03/31/2010CN101686906A Skin cleansing agent
03/31/2010CN101684614A Nano diatomite treating agent and preparation method thereof
03/31/2010CN101684441A Aerosol oil stain dry cleaner research and development
03/31/2010CN101684440A Detergent for carburetor
03/31/2010CN101684439A Method for removing pesticide residue on picked melon and fruit and used cleaning agent
03/31/2010CN101684438A Low viscosity engine non-disassembly lubrication system dynamic detergent
03/31/2010CN101684437A Solvent-based environmentally friendly cleaning agent
03/31/2010CN101684436A Scavenger for PVC processing device
03/30/2010US7687450 Method of removing contaminants from carpet with aqueous cleaning composition
03/30/2010US7687449 Composition for removing engine deposits from turbine components
03/30/2010US7687448 Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition
03/30/2010US7687447 Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid
03/30/2010US7687393 Polishing composition and rinse composition
03/25/2010WO2010033441A1 Alcohol fuel soluble additive for removing deposits in fueling systems
03/25/2010WO2010031867A1 Product containing diamides, method for making same and uses thereof
03/25/2010WO2010031607A1 Bleach-containing cleaning agent
03/25/2010WO2009133465A3 Descaling agent composition for food industry and method for using same
03/25/2010US20100074849 Organic acid free effervescent formulation
03/24/2010EP2166074A1 Cleaning agent
03/24/2010EP2164944A1 Stabilized concentrated cleaning solutions and methods of preparing the same
03/24/2010EP1287550B1 Post chemical-mechanical planarization (cmp) cleaning composition
03/24/2010CN101679965A Endoglucanase ppce and cellulase preparation containing the same
03/24/2010CN101679925A Purging agent and process for purging a resin molding machine with the same
03/24/2010CN101679923A Solvent for cleaning of organic thin film
03/24/2010CN101679922A Cleaning solvent and cleaning method
03/24/2010CN101679921A Stabilized concentrated cleaning solutions and methods of preparing the same
03/24/2010CN101679841A azeotropic and azeotrope-like compositions of e-1,1,1,4,4,4-hexafluoro-2-butene
03/23/2010US7682458 for ashed photoresists; lithography; corrosion resistance; solvent-free
03/23/2010CA2390106C Improving the crease recovery of fabrics
03/17/2010EP2163592A2 Compositions containing fluorine substituted olefins
03/17/2010EP2163591A2 Compositions containing flourine substituted olefins
03/17/2010CN101671610A Detergent composition for removing liquid crystal and cleaning method of liquid crystal panel
03/17/2010CN101671609A Washing powder added with traditional Chinese medicine with effects of insect killing, disinfection, skin protection and health care
03/17/2010CN101671608A Scale remover for sulfur scale in sulfur melting kettle
03/17/2010CN101671607A Wallpaper cleaning agent
03/17/2010CN101671529A Decontamination glazing agent
03/16/2010US7678753 Liquid detergent composition
03/16/2010US7678751 Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same
03/16/2010US7678381 Stabilized body care products, household products, textiles and fabrics
03/16/2010US7678200 Technique on ozone water for use in cleaning semiconductor substrate
03/11/2010WO2010028186A1 Cleaning solution formulations for substrates
03/11/2010WO2010009305A3 Method of cleaning food and beverage manufacturing and handling equipmemt
03/11/2010WO2010007506A3 Detergents and disinfectant products using natural innocuous materials based on sugar
03/10/2010EP2160456A1 Non-flammable solvents for semiconductor applications
03/10/2010EP1716216B9 Compositions containing fluorine substituted olefins
03/10/2010CN101665748A Protection solution for semi-conductor wafer metal substrate and using method thereof
03/09/2010US7674761 Water soluble sachet with a dishwashing enhancing particle
03/09/2010US7674756 Solvent compositions containing chlorofluoroolefins or fluoroolefins
03/09/2010US7674755 Formulation for removal of photoresist, etch residue and BARC
03/04/2010WO2010024141A1 Cleaning composition for removing lead-free solder flux and system for removing lead-free solder flux
03/04/2010WO2010023490A1 Compositions and methods for the removal of chewing gum residues from substrates
03/04/2010US20100056413 high-temperature cleaning system, associated substrates, and associated methods
03/04/2010US20100056412 tetradecafluorooct-4-ene/1,1,1,2,2,3,3,6,6,7,7,8,8,8-/ and trans-1,2-dichloroethylene; cleaning the surface of integrated circuit device; degreasing agent
03/04/2010US20100056409 Compositions for processing of semiconductor substrates
03/04/2010US20100055897 Wet cleaning stripping of etch residue after trench and via opening formation in dual damascene process
03/04/2010US20100055768 Cleaning and/or treatment compositions
03/04/2010US20100051582 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith
03/04/2010US20100051066 Composition for removing residue from wiring board and cleaning method
03/04/2010CA2735230A1 Hydrolases, nucleic acids encoding them and methods for making and using them
03/03/2010EP1373455B1 Methods and compositions for cleaning, rinsing, and antimicrobial treatment of medical equipment
03/03/2010CN101659909A Natural washing particle and preparation method thereof
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