| Patents for C11D 7 - Compositions of detergents based essentially on non-surface-active compounds (16,781) |
|---|
| 07/24/2001 | US6265363 Skin cleansing composition for removing ink |
| 07/24/2001 | US6265309 (a) a fluorine-containing compound, (b) a salt of boric acid, (c) a water-soluble organic solvent, and optionally, (d) a quaternary ammonium salt, a ammonium salt of an organic carboxylic acid or amine salt of a carboxylic acid. |
| 07/24/2001 | CA2211329C Detergent compositions comprising multiperacid-forming bleach activators |
| 07/24/2001 | CA2049594C Environmentally safe cleaning process and cleaning composition useful therin |
| 07/19/2001 | WO2001051159A1 Method for cleaning stripping columns |
| 07/19/2001 | WO2001051096A2 Pathogen-reducing systems, compositions, articles and methods employing ozone |
| 07/19/2001 | US20010008105 Method of lithographic printing with a reusable substrate |
| 07/19/2001 | US20010008104 Method of offset printing with a reusable substrate |
| 07/19/2001 | DE10000854A1 Cleaning separating column, used for removing volatiles from aqueous polymer dispersions or suspensions after polymerization, involves contacting inside surface with aqueous solution of basic compound |
| 07/18/2001 | EP1116787A1 Use of N,N-dimethylformamide as solvent agent of an adhesive and use of N,N-dimethylformamide for cleaning, especially for degreasing a polymethylmethacrylate surface |
| 07/18/2001 | EP1116786A1 Use of N-methyl-2-pyrrolidone as solvent agent of an adhesive and use of N-methyl-2-pyrrolidon for cleaning, especially for degreasing a polymethylmethacrylate surface |
| 07/18/2001 | CN1304439A Method and apparatus for cleaning semiconductor substrates after polishing of copper film |
| 07/18/2001 | CN1304339A Vitreous surface and coating process therefor |
| 07/18/2001 | CN1303918A Preparation method of neutral cleaning agent |
| 07/17/2001 | US6262013 Sanitizing laundry sour |
| 07/17/2001 | US6262006 De-oiling composition of perfluoropolyethers and hydrofluoropolyethreal surfactants |
| 07/17/2001 | US6261828 One step process by treating with amylolytic enzyme, abrading monocomponent endoglucanse, and streak-reducing monocomponent endoglucase; reduces problem of streaks and creases on finished garments |
| 07/17/2001 | US6261745 Comprises salt of hydrofluoric acid with base free from metal, organic solvent, water, and acetylene alcohol/alkylene oxide adduct; used in removing photoresist residues via dry-etched, ashed substrates without damaging spin on glass layer |
| 07/17/2001 | US6261381 Composition and process for cleaning inks from various substrates including printing plates |
| 07/17/2001 | CA2026335C Furfuryl alcohol mixtures for use as cleaning agents |
| 07/12/2001 | US20010007258 Nonaqueous solution |
| 07/12/2001 | DE19964119A1 Agent for cleaning objects with textile surfaces, e.g., carpets, which is non-toxic, is easy to prepare and acts rapidly, includes mixture of orange oil terpenes and sawdust |
| 07/11/2001 | EP1114585A2 Sterilization composition and method of using the same |
| 07/11/2001 | EP1113778A2 Non-irritating cleansing composition |
| 07/10/2001 | US6258770 Compositions for surface cleaning in aerosol applications |
| 07/05/2001 | WO2001048803A1 Etching solution, etching method, and semiconductor silicon wafer |
| 07/05/2001 | WO2001047858A1 Ester-containing fluid compositions |
| 07/05/2001 | US20010006936 Removing photoresist residue; does not corrode or attack titanium or other metallurgy, oxide or nitride layers on the substrate |
| 07/05/2001 | DE19961983A1 Verfahren zur Lackierung von Kunststoffsubstraten Process for coating plastic substrates |
| 07/05/2001 | CA2395973A1 Ester-containing fluid compositions |
| 07/04/2001 | EP1113070A2 Automatic dishwashing compositions comprising MGDA having low alkalinity |
| 07/04/2001 | EP1113040A2 Process for lacquering plastic surfaces |
| 07/04/2001 | EP1112341A1 Compositions for surface cleaning in aerosol applications |
| 07/04/2001 | EP1112328A1 Low aromatics composition |
| 07/04/2001 | EP1112054A1 Rheology modified compositions and processes thereof |
| 07/04/2001 | CN1302327A Acidic composition containing fluoride for removal of photoresists and etch residues |
| 07/04/2001 | CN1301809A Household descaling agent |
| 07/04/2001 | CN1068040C Natural plant washing powder having environment protection and energy saving functions |
| 07/03/2001 | US6255273 Mixtures |
| 07/03/2001 | US6255272 Bleaching agent |
| 07/03/2001 | US6255042 Developing system for alkaline-developable lithographic printing plates with different interlayers |
| 07/03/2001 | CA2068059C Procedure for disinfecting and cleaning contact lenses |
| 06/28/2001 | WO2001046378A1 Scouring composition |
| 06/28/2001 | CA2392604A1 Scouring composition |
| 06/27/2001 | EP1111038A1 Scouring composition |
| 06/27/2001 | EP1109885A1 Foaming drain cleaner |
| 06/27/2001 | CN1301132A Blooming type germicidal hard-surface cleaners |
| 06/27/2001 | CN1067716C Low-molecular inorganic-salt detergent |
| 06/27/2001 | CN1067715C Method for cleaning still for producing polyester or polyester elastomer |
| 06/21/2001 | WO2001044561A1 Process and composition for laundering of textile fabrics |
| 06/21/2001 | WO2001044560A1 Dry-cleaning article, composition and methods |
| 06/21/2001 | WO2001044431A1 Process and composition for laundering of textile fabrics |
| 06/21/2001 | WO2001044430A1 Antimicrobial solutions |
| 06/21/2001 | WO2001044256A1 Process for stabilization of siloxanes by contacting them with water |
| 06/21/2001 | US20010004633 Post chemical-mechanical planarization (CMP) cleaning composition |
| 06/20/2001 | EP1107945A1 Stable free-flowing solid chelants |
| 06/20/2001 | EP1107830A1 Environmental wipe solvent compositions and processes |
| 06/19/2001 | US6248792 Use of carboxylate alkyl polyglycoside surfactant to increase the foam of other anionic surfactants |
| 06/19/2001 | US6248704 Compositions for cleaning organic and plasma etched residues for semiconductors devices |
| 06/19/2001 | US6248403 Deoxidizing substrate surface, wiping with solvent consisting of environmentally-acceptable volatile organic solvent and 3-glycidyloxypropyltrimethoxysilane polyfunctional coupling agent, applying and curing paint primer coating |
| 06/19/2001 | US6248178 Method for removing pad nodules |
| 06/14/2001 | WO2001042376A1 Thickened paint and coating remover |
| 06/13/2001 | EP1106675A2 Use of partial glyceride polyglycol ethers |
| 06/13/2001 | EP1105778A1 Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| 06/13/2001 | EP1105454A1 Manganese complexes as catalysts for peroxygenated compounds to clean hard surfaces, especially dishes |
| 06/13/2001 | EP1105450A1 Multifunctional detergent materials |
| 06/13/2001 | EP1105223A1 Cleaning of flat-panel display with fluid typically at high pressure |
| 06/13/2001 | DE19958398A1 Verwendung von Partialgyceridpolyglycolethern Use of Partialgyceridpolyglycolethern |
| 06/12/2001 | US6245157 As dispersants, sodium bicarbonate. |
| 06/12/2001 | US6245155 Method for removing photoresist and plasma etch residues |
| 06/12/2001 | CA2222074C Dry cleaning composition on improved carrier |
| 06/12/2001 | CA2166835C Stabilized methyline chloride based composition for metal degreasing |
| 06/12/2001 | CA2032236C Ph-controlled protein removing cleaner |
| 06/07/2001 | WO2001041518A1 Low species buffered rinsing fluids and methods |
| 06/07/2001 | WO2001040428A1 Process for making a detergent composition |
| 06/07/2001 | WO2001040425A2 Post chemical-mechanical planarization (cmp) cleaning composition |
| 06/07/2001 | DE10056541A1 Verfahren zum Reinigen von Quarzsubstraten unter Verwendung von leitenden Lösungen A method for purifying quartz substrates using conductive solutions |
| 06/06/2001 | EP1104450A1 A cleaning solution and method |
| 06/05/2001 | US6242400 Method of stripping resists from substrates using hydroxylamine and alkanolamine |
| 05/31/2001 | WO2001038626A1 Process and product for the treatment of textile fabrics |
| 05/31/2001 | WO2001038472A1 Cleaning-in-place composition and method for using the same |
| 05/31/2001 | WO2001038218A1 Segmented process for cleaning-in-place |
| 05/30/2001 | EP1103859A1 Developing composition for alkaline-developable lithographic printing plates with different interlayers |
| 05/30/2001 | EP1102835A1 Method of reducing fines in a powdered product and fabric cleaner produced therefrom |
| 05/30/2001 | EP1102602A1 Contact lens and ophthalmic solutions |
| 05/30/2001 | EP1102555A1 Stacked wet wipes having anti evaporation layers |
| 05/30/2001 | EP1102550A2 Method for producing a biological substance, biological substance and the use thereof |
| 05/30/2001 | EP0934394B1 Cleaning re-usable plastics containers or re-usable plastics-coated glass containers |
| 05/29/2001 | US6239098 Water-repellent detergent |
| 05/29/2001 | US6239097 Cleaning formulation |
| 05/29/2001 | US6239090 Thickened paint and coating remover |
| 05/29/2001 | US6239088 Nonirritating cleansing composition |
| 05/25/2001 | WO2001036578A1 Non-corrosive cleaning composition for removing plasma etching residues |
| 05/25/2001 | WO2001036356A2 C13 alcohol mixture and functionalised c13 alcohol mixture |
| 05/24/2001 | US20010001789 A contact lens care solution comprising galactomannan(s) and a borate compound in the form of concentrates effective to create a gel or partial gel when the concentrate is coated on a contact lens and the lens is inserted in an eye |
| 05/24/2001 | US20010001786 Anhydrous compositions comprising a peracid |
| 05/24/2001 | US20010001785 A cleaning composition for removing plasma etch residues formed on a substrate which comprises water, atleast one hydroxylammonium inorganic or organic compound, a basic compound and an organic carboxyllic acid |
| 05/24/2001 | US20010001784 A non-aqueous stripping solution for removal of polyimide, cured polyimide, epoxy resin, photoreists and hardened photoresists consists of an alkanolamine, and a solvent |
| 05/24/2001 | US20010001736 Cleaning semiconductor wafer by spraying a first heated solvent such as N-methylpyrrolidine, discontinuing spraying, then spraying a second solvent at around room temperature, discontinuing spraying; high throughput cleaning |
| 05/23/2001 | DE19955593A1 C13-Alkoholgemisch und funktionalisiertes C13-Alkoholgemisch C13-alcohol mixture and functionalized C13-alcohol mixture |