C11D 11 - Special methods for preparing compositions containing mixtures of detergents

Patents for C11D 11 - Special methods for preparing compositions containing mixtures of detergents (14,845)
06/2002
06/12/2002	EP0882125B1 Process for making a low density detergent composition by agglomeration with an inorganic double salt
06/11/2002	US6403551 Autonomous cleaning apparatus and method
06/11/2002	US6403547 Process of cleaning carpets with a composition comprising peroxygen bleach
06/11/2002	US6403546 Glycol solvent; plasticizer is tributoxyethyl phosphate; nonionic surfactant; an amine
06/11/2002	US6403544 Semiconductor wafers or chips; supercritical co2 gas as a dense phase fluid and modifier selected from the group consisting of propylene carbonate, ethylene carbonate, butylene carbonate, propylene glycol methyl ether acetate
06/11/2002	US6402891 System for cleaning an apparatus
06/11/2002	US6402857 Solvent mixture for use in a vapor degreaser and method of cleaning an article in a vapor degreaser utilizing said solvent
06/11/2002	US6401294 Upright extracton cleaning machine with handle mounting
06/06/2002	WO2002045148A2 Cleaning solution for semiconductor wafers in the back-end-of-line
06/06/2002	WO2002044462A2 Particulate textiles aftertreatment agent
06/06/2002	WO2002044310A2 Granular conditioning product
06/06/2002	WO2002044261A2 Thickened silicone dissolving agent
06/06/2002	WO2002024854A8 Production of anionic surfactant granules by in situ neutralisation
06/06/2002	WO2002016547A3 Subtilase enzymes
06/06/2002	WO2002016535A3 Compositions and methods for odor and fungal control of protective garments
06/06/2002	US20020068685 Post plasma ashing wafer cleaning formulation
06/06/2002	US20020068684 Aliphatic C3-5 dicarboxylic acid corrosion inhibitor; hydrogen fluoride free; pH of at least 8.5
06/06/2002	US20020066465 Cleaning method
06/06/2002	US20020066144 Redeposition or backstain inhibition during stonewashing process
06/06/2002	DE10060373A1 Reaktiv modifizierte, teilchenförmige Polymerisate zur Behandlung der Oberflächen textiler und nicht-textiler Materialien Reactively modified, particulate polymers for treating the surfaces of textile and non-textile materials
06/05/2002	EP1211563A1 Resist stripper
06/05/2002	EP1210475A1 Dry cleaning apparatus and method capable of utilizing a siloxane composition as a solvent
06/05/2002	CN1352703A Methods for wet processing electronic components having copper containing surfaces
06/05/2002	CA2363613A1 Method and composition for cleaning a turbine engine component
06/04/2002	US6399562 Solvent compositions
06/04/2002	US6399555 Low odor, hard surface cleaner with enhanced soil removal
06/04/2002	US6399552 Mixture of fluoride reducing agent, organic acid and water
06/04/2002	US6399551 Mixture containing chelate compound and solvent
06/04/2002	US6399513 For forming integrated circuits
06/04/2002	US6398820 Method for washing clothes, in particular working clothes
05/2002
05/30/2002	WO2002042474A1 Zygomycetes-origin endoglucanase lacking cellulose-binding domain
05/30/2002	WO2002042408A2 Detergent products, methods and manufacture
05/30/2002	WO2002042401A2 Dishwashing method
05/30/2002	WO2002042400A2 Dishwashing method
05/30/2002	WO2002012423A3 Deodorising textile treatment agent
05/30/2002	WO2002006432A8 Granular detergent composition having an improved solubility
05/30/2002	US20020065354 Composition for the care and maintenance of water-resistant surfaces
05/30/2002	US20020065207 Production of anionic surfactant granules by in situ neutralisation
05/30/2002	US20020065205 Detergent composition and method for warewashing
05/30/2002	US20020065204 Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures
05/30/2002	US20020064963 For a surface such as semiconductors or liquid crystal displays to be treated by flowing the cleaner of a surfactant and an organic solvent at high speed; nondamaging
05/30/2002	CA2425641A1 Dishwashing method
05/29/2002	EP1208972A1 Method of lithographic printing with a reusable substrate.
05/29/2002	EP1098859A4 Alkaline water-based solution for cleaning metallized microelectronic workpieces and methods of using same
05/29/2002	DE10055555A1 Behandlung von Oberflächen zur temporären Verbesserung des Schmutzablöseverhaltens Treatment of surfaces for the temporary improvement of the soil release behavior
05/28/2002	US6395699 Method of removing grease, oil or flux from an article
05/28/2002	US6395693 Cleaning solution for semiconductor surfaces following chemical-mechanical polishing
05/28/2002	US6394106 Mixture of water, base, anionic anf nonionic surfactant
05/23/2002	WO2001095381A3 Post chemical-mechanical planarization (cmp) cleaning composition
05/23/2002	US20020061830 Feeding acid precursor, neutralizing agent, and aluminosilicate detergency builder into horizontal thin-film evaporator/drier for production of detergents
05/23/2002	US20020061829 Production of anionic surfactant granules by in situ neutralisation
05/23/2002	US20020059943 Supplying clean air humidified to control a relative humidity within a predetermined range toward a surface level in the cleaning bath downwards vertically, together with exhaust of air of the cleaning draft at a predetermined exhaust rate
05/22/2002	EP1206519A1 Stable formulation components, compositions and laundry methods employing same
05/22/2002	EP1206518A1 Color safe laundry methods employing zwitterionic formulation components
05/22/2002	EP1206517A1 Color safe laundry methods employing cationic formulation components
05/22/2002	EP1206516A1 Stability enhancing formulation components, compositions and laundry methods employing same
05/22/2002	EP1206515A1 Formulation components resistant towards decomposition by aromatization, compositions and laundry methods employing same
05/22/2002	EP1206513A2 Controlled availability of formulation components, compositions and laundry methods employing same
05/22/2002	EP1206512A1 Use of polyoxypropylene/polyoxyethylene terpene compounds as degreasing agents for hard surfaces
05/22/2002	EP0843806B1 Method and cleaning agent composition for cleaning the barrel of a gun
05/22/2002	CN1085247C Secondary alkyl sulfate surfactant with improved solubility by compacting/coating process
05/22/2002	CN1085246C Secondary alkyl sulfate surfactant with improved solubility by kneading extruding process
05/22/2002	CN1085245C Preparation of secondary alkyl sulfate particles with improved solubility
05/21/2002	US6391844 Granular detergent; fluidized beds dryer; process control
05/21/2002	US6391837 Cleaning composition and method comprising a ternary solvent blend
05/21/2002	US6391836 Mixture of surfactant and microorganisms
05/21/2002	US6391122 Segmented process for cleaning-in-place
05/21/2002	US6391061 Cleaning compounds, water, solvent and surfactant
05/21/2002	CA2260008C Process for conditioning of surfactant pastes to form high active surfactant agglomerates
05/16/2002	WO2002038754A1 Cellulase preparation containing nonionic surfactant and method of treating fiber
05/16/2002	WO2002038721A1 Granular surfactant and process for producing the same
05/16/2002	WO2002038719A1 Method for cleaning treatment systems for reactive compounds and cleaning agents suitable therefor
05/16/2002	WO2002038716A1 Treatment of surfaces for temporarily improving their dirt removal behavior
05/16/2002	WO2002038715A2 Cleaning compositions and cleaning methods for mitigating corrosion of applied color designs
05/16/2002	WO2001098450A3 Multi-phase fabric care composition for delivering multiple fabric care benefits
05/16/2002	US20020056468 Dialkyl or diisoalkyl carbonates used for washing of casings in offshore drilling activities.
05/16/2002	US20020056164 Non-aqueous washing apparatus and method
05/16/2002	US20020056163 Wash liquor comprising a substantially non-reactive, non-aqueous, non-oleophilic, apolar working fluid and at least one washing additive
05/16/2002	DE10150163A1 Cleaning semiconductor wafers after mechanical processing comprises cleaning wafers with tenside solution, rinsing with water and drying
05/15/2002	EP1205539A2 Method and apparatus for wet-cleaning a substrate
05/15/2002	EP1204731A1 Metal cleaning composition
05/15/2002	EP1204464A1 Cleaning agent and method for cleaning ultrafiltration membranes in electrophoretic dip coating installations
05/15/2002	EP0692021B1 Microemulsion and emulsion cleaning compositions
05/15/2002	CN1084944C Overcurrnet protection circuit
05/14/2002	US6387866 Antimicrobial multi purpose containing a cationic surfactant
05/14/2002	US6387865 Antimicrobial multi purpose containing a cationic surfactant
05/14/2002	US6387860 High foaming, grease cutting light duty liquid detergent
05/14/2002	US6387859 Method and cleaner composition for stripping copper containing residue layers
05/14/2002	US6387858 Safe transport gel for treating medical instruments
05/14/2002	US6387241 Method of sterilization using ozone
05/14/2002	US6387189 Using an iminodisuccinic acid
05/14/2002	US6386212 A composite surface at which at least two materials having different isoelectric points are exposed is cleaned by an hf dip, followed by dip in low ph surfactant, dip in ammonium hydroxide
05/10/2002	WO2002036728A1 Carrier for liquid ingredients to be used in effervescent products
05/10/2002	WO2002036725A1 Composition for cleaning hard surfaces
05/10/2002	WO2002011185A3 Method of polishing a semiconductor wafer
05/10/2002	WO2001031109A9 Shoe bags for use in laundering processes
05/10/2002	CA2428126A1 Carrier for liquid ingredients to be used in effervescent products
05/08/2002	EP1203071A2 A process for making detergent compositions with additives
05/08/2002	EP1203070A1 Nonaqueous liquid detergent with wash-water soluble low-density filler particles
05/08/2002	EP0886547A4 Cleaning wafer substrates of metal contamination while maintaining wafer smoothness

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