| Patents for C11D 11 - Special methods for preparing compositions containing mixtures of detergents (14,845) |
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| 08/22/2006 | US7094744 Method for producing sheetlike detergent |
| 08/22/2006 | US7094741 cleaning kit containing sulfobetaine, ampho glycinate, ampho propionate, betaine, poly alkyl glycoside, and/or sucrose ester low-residue surfactant; aliphatic alkyl ethoxylate surfactant; polymeric biguanide; and tartaric acid, lactic acid, and/or citric acid |
| 08/22/2006 | US7094588 Variant EGIII-like cellulase compositions |
| 08/17/2006 | WO2006086198A1 Detergent particles |
| 08/17/2006 | US20060183654 Semiconductor cleaning using ionic liquids |
| 08/17/2006 | US20060183248 Semiconductor cleaning using superacids |
| 08/17/2006 | US20060180180 System and method for cleaning semiconductor fabrication equipment parts |
| 08/17/2006 | US20060179582 Natural aqueous composition and machine for dry-cleaning textiles and leathers |
| 08/17/2006 | DE102005005499A1 Verfahren zur Herstellung von Wasch- oder Reinigungsmitteln A process for the production of laundry detergents or cleaning compositions |
| 08/17/2006 | CA2593654A1 Detergent particles |
| 08/16/2006 | EP1690961A1 Alkali cleaning fluid for aluminum or aluminum alloys and method of cleaning |
| 08/16/2006 | EP1690923A1 Method of producing non-phosphate detergents based on powdered sodium sesquicarbonate |
| 08/16/2006 | EP1690135A2 Resist, barc and gap fill material stripping chemical and method |
| 08/16/2006 | EP1689844A1 Method, articles and compositions for cleaning bathroom surfaces |
| 08/16/2006 | EP1689841A1 Cleaning agent composition |
| 08/16/2006 | EP1163989B1 Detergent composition |
| 08/16/2006 | EP1105455B1 High density detergent-making process involving a moderate speed mixer/densifier |
| 08/15/2006 | US7091304 Treating surfaces of a reaction vessel and/or pipe in the production plant which have been wetted with residue from production of a polyester polyol with cleaning polyolm, heating, pressurization, collecting cleaning polyol |
| 08/15/2006 | US7091172 A process for the treatment of non-keratinaceous textiles, preferably cellulosic fibers, which comprises the step of treating the textiles with a composition which comprises: a self-crosslinking polymer and a nucleophilic species(polymer |
| 08/15/2006 | US7091171 Laundry system having unitized dosing |
| 08/15/2006 | US7091166 Acidic, phosphate-free plastic cleaner composition with reduced mild steel equipment etch for cleaning plastic parts |
| 08/15/2006 | US7091165 Composition and method for removing copper-compatible resist |
| 08/10/2006 | WO2006081960A1 Methods for the production of detergents or cleansers |
| 08/10/2006 | WO2006069118A3 Continuous process for the neutralization of surfactant acid precursors |
| 08/10/2006 | WO2006052578A3 Method of cleaning containers for recycling |
| 08/10/2006 | WO2005104214A3 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers |
| 08/10/2006 | WO2005004199A3 Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers |
| 08/10/2006 | US20060178282 Process for production of etching or cleaning fluids |
| 08/09/2006 | EP1688477A1 Cleaning agent |
| 08/09/2006 | EP1687339A2 Fusion proteins and detergent compositions comprising them |
| 08/09/2006 | EP1252370B1 Chemical cleaning solution for gas turbine blades |
| 08/09/2006 | CN1268728C Granular detergent composition having improved solubility |
| 08/08/2006 | US7087662 Coating dishes by spraying with mixtures of nanostructure laponite particles, dispersants, surfactants, buffers and wetting agents, then drying to form clear coats; durability; antisoilants |
| 08/08/2006 | US7087568 Process for making a detergent product |
| 08/08/2006 | US7087564 For semiconductor wafer; polishing; protective coatings; oxidation and corrosion resistance; chelate compounds; mixture of ammonium citrate and ascorbic acid with cysteine |
| 08/08/2006 | US7087562 Post-CMP washing liquid composition |
| 08/08/2006 | US7087561 Comprises water, phosphoric acid, and ascorbic acid (or citric acid); does not require hazardous waste disposal |
| 08/03/2006 | WO2006081470A1 Method and composition for polishing a substrate |
| 08/03/2006 | US20060172911 Method of using a composition for disinfection and/or sterilization |
| 08/03/2006 | US20060169305 Heat exchanger cleaning process |
| 08/02/2006 | EP1187901B1 Processes for making granular detergent in a fluidized bed granulator having recycling of improperly sized particles |
| 08/02/2006 | EP0942678B2 A cleaning implement having controlled fluid absorbency |
| 08/02/2006 | CN1813096A Fabric care composition and method of using same |
| 08/02/2006 | CN1813095A Fabric care compositions for lipophilic fluid systems containing an antimicrobial agent |
| 08/02/2006 | CN1813054A Fabric article treatment composition for use in a lipophilic fluid system |
| 08/02/2006 | CN1267972C Semiconductor wafer cleaning agent and cleaning method |
| 08/01/2006 | US7084098 Using mixture of hydroxylamine, hydroxide, antifoam agents,cleaner, precipitation inhibitor and water; printed circuits |
| 08/01/2006 | US7084097 Cleaning solution for substrates of electronic materials |
| 08/01/2006 | US7082951 Aqueous compositions for treating a surface |
| 07/27/2006 | US20060167308 Process for the preparation of alkylarylsulfonates |
| 07/27/2006 | US20060166846 Remover solution |
| 07/26/2006 | EP1684337A1 Cleaning composition for semiconductor containing unsaturated dicarboxylic acid and ethylene urea and cleaning method |
| 07/26/2006 | EP1682944A2 Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials |
| 07/26/2006 | EP1565545B1 Aqueous compositions comprising homo- and/ or copolymers |
| 07/26/2006 | EP1387880B1 Granular composition |
| 07/26/2006 | EP1355992B1 System and method for cleaning and/or treating vehicle surfaces |
| 07/26/2006 | CN1807568A Granules for carrying surfactant and method for producing the same |
| 07/26/2006 | CN1266262C Method for cleaning etcher parts |
| 07/25/2006 | US7081441 Comprising a nanoparticle selected from the group consisting of metal oxyhydroxides, metal oxyhydroxides modified by an acid and mixtures and a buffer/modifying agent, an aqueous solution having an acid pH; spot-free, durable, bright finish |
| 07/20/2006 | US20060160717 Sulfonating fatty acid alkylester with sulfonating gas, esterifying with lower alcohol, neutralizing and bleaching to give paste containing alpha-sulfo fatty acid alkylester salt, aging paste, then flaking/granulating; white powder with reduced odor and improved storage stability |
| 07/19/2006 | EP1681343A1 Anionic surfactant powder granules |
| 07/19/2006 | EP1680806A2 Cleaning solutions and etchants and methods for using same |
| 07/19/2006 | EP1680492A2 Carrier foam to enhance liquid functional performance |
| 07/19/2006 | EP1066422B1 Treatment of denim fabric with a pectolytic enzyme |
| 07/19/2006 | CN1806039A Detergent composition |
| 07/19/2006 | CN1264961C Treatment for substrates |
| 07/19/2006 | CN1264949C Process for removing contaminant from a surface and composition useful therefor |
| 07/18/2006 | US7078462 A pouch film material for a cleaning compoud with an outer layer of polyvinyl-alcohol film and an inner layer of a film of polymer which is water insoluble above about 40 degrees C., and water soluble at below about 40 degrees is selected from polylisopropylacrylamide, hydroxyalkylalkylalkyl cellulose |
| 07/18/2006 | US7078374 Aqueous dispersion; mixture of cationic and nonionic surfactant |
| 07/18/2006 | US7078371 For cleaning a substrate of semiconductor integrated circuits or liquid crystal display devices |
| 07/18/2006 | US7078358 Low VOC cleanroom cleaning wipe |
| 07/13/2006 | WO2006072780A1 Cleaning formulation |
| 07/13/2006 | US20060154839 Stripping and cleaning compositions for microelectronics |
| 07/13/2006 | US20060154838 a chelating agent or a salt such as ethylenediaminetetraethylenephosphonic acid; ethylenediaminetetramethylenephosphonic acid potassium salt etc.; water and a hydroxide selected from NaOH, KOH, and LiOH; for cleaning semiconductor substrate surface |
| 07/13/2006 | US20060154837 Technique on ozone water for use in cleaning semiconductor substrate |
| 07/13/2006 | US20060153331 Method of manufacturing a semiconductor device and an apparatus for use in such a method |
| 07/13/2006 | US20060151854 Polishing composition and rinsing composition |
| 07/13/2006 | US20060151008 Cleaning method, method for removing foreign particle, cleaning apparatus, and cleaning liquid |
| 07/13/2006 | DE10329122B4 Verfahren zur Reinigung von lebensmittelverarbeitenden Maschinen mit Lochscheiben sowie Reinigungsmasse zur Verwendung Methods for cleaning up of food processing machines with perforated discs and cleaning composition for use |
| 07/13/2006 | DE102004063801A1 Preparation of ascorbic acid granulates, used for preparing particulate shaped washing/cleaning agents, comprises granulation of ascorbic acid, a water-soluble polymer, as bonding agents, and optionally an inorganic carrier material |
| 07/12/2006 | EP1679361A1 Cleaning agent for substrate and cleaning method |
| 07/12/2006 | EP1678288A1 Compositions based on fluorinated hydrocarbons and secondary butanol for defluxing electronic boards |
| 07/12/2006 | EP1678266A2 A cleaning and multifunctional coating composition containing an organosilane quaternary compound and methods of using |
| 07/12/2006 | EP1567636B1 Detergent compositions |
| 07/12/2006 | EP1345848B1 Composition comprising an oxidizing and complexing compound |
| 07/12/2006 | CN1802731A Removal of post-etch residues in semiconductor processing |
| 07/12/2006 | CN1264066C Stripping liquid for photoresist and photoresist stripping method using the same stripping liquid |
| 07/12/2006 | CN1263835C Fabric conditioning composition |
| 07/12/2006 | CN1263834C Cleaning solution for photoresist agent and method for forming pattern by it |
| 07/11/2006 | US7074749 Nonionic surfactants or anionic surfactants based on oxo alcohols having 11 to 13 carbon atoms |
| 07/11/2006 | US7073519 An aqueous cleaning formulation contains 5 to 50 wt % of at least one alkali metal hydroxide selected from sodium hydroxide and potassium hydroxide, 0.01 to 1 wt % of a water-soluble amino acid, 0.001 to 0.05 wt % of N,N'-methylene bisacrylamide, and 0.001 to 0.05 wt % of azobisisobutyronitrile |
| 07/06/2006 | WO2003062520A8 A method of dry cleaning articles using densified carbon dioxide |
| 07/05/2006 | EP1675935A2 Stable compositions of spores, bacteria and/or fungi |
| 07/05/2006 | EP1358670B1 Process for removing residues from the microstructure of an object |
| 07/05/2006 | CN1798827A Detergent component and process for its preparation |
| 07/05/2006 | CN1798826A Cleaning agent for removing solder flux and method for cleaning solder flux |
| 07/05/2006 | CN1798581A Cleaning and decontamination formula for surfaces contaminated with prion-infected material |
| 07/05/2006 | CN1263100C Wafer cleaning module and method for cleaning the surface of a substrate |
| 07/05/2006 | CN1262634C Detergent-impregnated article |
| 07/04/2006 | US7071154 Azeotrope-like compositions and their use |