Patents for C11D 11 - Special methods for preparing compositions containing mixtures of detergents (14,845) |
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02/24/2009 | US7494962 cleaning solvent for electronic parts, precision machinery components; extraction solvent |
02/24/2009 | US7494512 Compositions and methods for cleaning textile substrates |
02/24/2009 | CA2306242C Methods and apparatus for cleaning semiconductor substrates after polishing of copper film |
02/19/2009 | US20090048141 Chemical Compositions and Uses |
02/19/2009 | US20090047352 Colourant Compositions and Their Use |
02/18/2009 | CN101370923A Process for the treatment of fiber materials |
02/18/2009 | CN100463117C Composition for cleaning semiconductor element, semiconductor element and manufacturing method thereof |
02/17/2009 | US7491252 Tantalum barrier removal solution |
02/11/2009 | EP2022841A1 A composition for use in the laundering or treatment of fabrics |
02/04/2009 | CN101360815A Method and system for cleaning inner component of container for processing heavy hydrocarbon stream |
02/03/2009 | US7485615 Process for producing granular anionic surfactant |
02/03/2009 | US7485614 Mixing the hydrotrope, crutcher mix moisture, polymer, silicate and adjunct crutcher ingredients in a crutcher to form a slurry;injecting a gas into the slurry under pressure; forming the slurry into a detergent granule |
02/03/2009 | US7485611 Including alcohol; solubilizing inorganic salts and polar organic compounds; damage-free, residue-free cleaning |
02/03/2009 | CA2392587C Use of polymeric material in the treatment of hard surfaces |
02/03/2009 | CA2355235C Process for preparing a low tfm detergent bar composition |
01/29/2009 | WO2009015137A1 Process for making a secondary alcohol cleaning product |
01/29/2009 | WO2008157670A3 Method for protecting substrates and removing contaminants from such substrates |
01/28/2009 | EP1212150B1 Lactam compositions for cleaning organic and plasma etched residues for semiconductor devices |
01/28/2009 | CN100456429C Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
01/28/2009 | CN100455649C Cleaning agent and cleaning method for ridding titanium and titanium alloy building materials of discoloration |
01/27/2009 | US7482315 cleaning solution contains anionic surfactant sulfonates or sulfates, and a propoxylated ammonium cationic surfactant; remove dirt from vehicles such as cars, trucks, motorcycles, snowmobiles, bicycles, vans, buses, trailers, railway trains; storage stability; concentrate and diluted formulation |
01/27/2009 | US7481973 Composition and process for chemical and thermal disinfection |
01/27/2009 | US7481949 Polishing composition and rinsing composition |
01/27/2009 | CA2431925C Rinse aid surface coating compositions for modifying dishware surfaces |
01/27/2009 | CA2431780C Coatings for modifying hard surfaces and processes for applying the same |
01/27/2009 | CA2431776C System and method for cleaning and/or treating vehicle surfaces |
01/22/2009 | WO2009011348A1 Method for producing anionic surfactant powder particle |
01/22/2009 | WO2008141858A3 Detergent having active ingredients that improve the primary detergency |
01/22/2009 | WO2008119836A3 Detergent containing soil-releasing substances |
01/22/2009 | WO2005105967A9 Binding agent for solidification matrix |
01/21/2009 | EP2016163A1 Fast release granules |
01/21/2009 | CN101347780A Cleaning agent, cleaning method and cleaning apparatus |
01/20/2009 | US7479474 post-etch resist residue removal using H2SiF6 or HBF4; N-methyl-2-pyrroldione an organic solvent; an amine e.g. ethanolamine, nitrilotris(methylene phosphonic acid) a corrosion inhibitor and water; pH less than 7; environmental friendly |
01/20/2009 | US7479165 Method of laundry washing |
01/20/2009 | CA2391613C Injection-moulded water-soluble container |
01/20/2009 | CA2389868C Segmented process for cleaning in place |
01/15/2009 | US20090018049 Binding agent for solidification matrix |
01/14/2009 | EP2014757A1 Rinse aid |
01/14/2009 | EP2013326A1 A packaged cleaning composition concentrate and a method and system for forming a cleaning composition |
01/14/2009 | EP1802733B1 Absorptive particles |
01/14/2009 | EP1451642B1 Chemical rinse composition |
01/14/2009 | CN201181188Y Firecracker and washing powder integrated machine |
01/14/2009 | CN101346457A Method for producing detergent particles |
01/13/2009 | US7475712 Extraction cleaning with tank mounting |
01/08/2009 | WO2009006603A1 Rinse aid |
01/08/2009 | WO2009005012A1 Flush toilet on-tank solid detergent |
01/08/2009 | US20090008820 Injection Molded Water-Soluble Container |
01/08/2009 | US20090008600 Method and composition for polishing a substrate |
01/08/2009 | US20090007932 Aqueous composition containing a semiconductor |
01/07/2009 | EP2012345A1 Semiconductor production plant |
01/07/2009 | EP1649079B1 Method for inhibiting corrosion using quaternary ammonium carbonates |
01/07/2009 | CN100448941C Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
01/07/2009 | CN100448936C Gumming medium |
01/06/2009 | US7473380 Etching liquid |
01/01/2009 | US20090005285 Polyalkyleneoxide-co-polydimethylsiloxane nonionic surfactant comprising ethylene oxide-propylene oxide groups and other surfactants such as dimethylditallowammonium chloride; cleaning compounds for laundering clothing, linen and drapery; shrinkage and wrinkle resistance |
01/01/2009 | US20090001314 aqueous acidic solution for cleaning the surface of a semiconductor wafer to remove photoresist material and dielectric trimethylsilane or dimethylsilane material to render an oxide-free substrate; comprising hydrofluoric acid, ammonium fluoride and citric acid, acetic acid; without leave gummy residues |
12/31/2008 | EP2009087A2 Process for preventing or minimizing dye redeposition using polyester |
12/30/2008 | US7470290 Hydroscopic polymer gels for easier cleaning |
12/30/2008 | US7469883 Cleaning method and solution for cleaning a wafer in a single wafer process |
12/30/2008 | CA2397241C Pouched compositions comprising peracid |
12/30/2008 | CA2368428C Solid pot and pan detergent |
12/25/2008 | US20080319070 Sanitizing and Cleaning Composition and its Use for Sanitizing and/or Cleaning Hard Surfaces |
12/25/2008 | US20080318828 Incorporation of Antioxidant in Detergent Composition |
12/24/2008 | WO2008157670A2 Method for protecting substrates and removing contaminants from such substrates |
12/24/2008 | WO2008155518A1 Alkaline hard surface cleaning composition |
12/24/2008 | WO2008155078A1 Method for cleaning surfaces or items based on a gelatin adhesive |
12/24/2008 | EP2006281A2 Process for preparing highly soluble straight alkyl benzene sulphonates |
12/24/2008 | EP2004791A1 Washing or cleansing agent granulates |
12/24/2008 | DE19936614B4 Verfahren zur Herstellung eines Waschmittels A process for the production of a detergent |
12/24/2008 | CA2696161A1 Method for protecting substrates and removing contaminants from such substrates |
12/24/2008 | CA2688526A1 Alkaline hard surface cleaning composition |
12/23/2008 | US7468105 CMP cleaning composition with microbial inhibitor |
12/23/2008 | US7467632 spraying a cleaning solution containing water and an ionic surfactant (polyvinylpyrrolidone or copolyme of acrylic acid or ester and vinylpyrrolidone) over the photoresist film before or after the exposing with radiation for preventing undesired photoresist pattern formation caused by ghost images |
12/18/2008 | WO2008153921A1 Odor elimination composition for use on soft surfaces |
12/18/2008 | WO2001090284A9 POST-ADDED α-SULFOFATTY ACID ESTER COMPOSITIONS AND METHODS OF MAKING AND USING THE SAME |
12/18/2008 | US20080312125 Solvents containing cycloalkyl alkyl ethers and process for production of the ethers |
12/18/2008 | US20080311752 Pore Sealing and Cleaning Porous Low Dielectric Constant Structures |
12/18/2008 | CA2688052A1 Odor elimination composition for use on soft surfaces |
12/17/2008 | EP2001988A2 Improved alkaline solutions for post cmp cleaning processes |
12/17/2008 | EP2001984A1 Cleaning solutions including preservative compounds for post cmp cleaning processes |
12/17/2008 | EP1917340B1 Method for removing ionic contaminants from the surface of a workpiece |
12/16/2008 | US7465701 Detergent composition |
12/16/2008 | US7465395 Using environmentally friendly alkyl benzoate solvents to dissolve at least a portion of a petroleum-based substance; removing the solvent containing dissolved residue; and extracting the residue from the solvent with CO2 |
12/11/2008 | WO2008148502A1 Solid particles of hydrophobic bleach activators |
12/11/2008 | US20080305979 Cleaning agent for removing solder flux and method for cleaning solder flux |
12/10/2008 | CN100442449C Removal of post-etch residues in semiconductor processing |
12/10/2008 | CN100441672C A composition for use in the laundering or treatment of fabrics, and a process for making the composition |
12/10/2008 | CN100441671C Process for making detergent product |
12/09/2008 | CA2462807C Decontamination of surfaces contaminated with prion-infected material with gaseous oxidizing agents |
12/04/2008 | WO2008145423A1 Granular foam control agents |
12/04/2008 | US20080296767 Composition for cleaning semiconductor device |
12/04/2008 | US20080296196 Injection Molded Water-Soluble Container |
12/04/2008 | DE102007025875A1 Körnige Schaumregulierungsmittel Granular foam control agents |
12/03/2008 | EP1996690A1 Fabric treatment composition and process for preparation thereof |
12/03/2008 | CN101316923A Process for making an ionic liquid comprising ion actives |
12/03/2008 | CN100440445C Polishing composition and rinsing composition |
12/03/2008 | CN100439483C Textile care composition |
12/02/2008 | US7459422 Process for making a granular detergent composition having improved solubility |
12/02/2008 | CA2445448C Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent |
12/02/2008 | CA2375469C Method for the production of liquid cleaning agent or detergent compositions |